添加微量高熔点金属对无铅焊料性能的影响

研究了在SnAgCu、SnAgBi、SnZn三个系列无铅焊料中添加质量分数为0.1%的高熔点金属(Ni、Co、Fe)对其熔融特性、力学基本性能和浸润性的影响。结果表明,添加微量高熔点金属对焊料的熔融特性影响小于2%。添加微量Ni能明显改善SnAgCu系和SnZn系焊料的力学性能,并能使SnAgBi系焊料在铜表面的接触角降低约10%~14%。添加微量Co或Fe后的新焊料仅少部分性能指标有所提高,而部分性能参数则严重下降。     

微量RE和Al对Sn-9Zn焊料组织与性能的影响

采用正交试验研究了微量RE和Al对Sn-9Zn无铅焊料电导率、硬度、润湿性及微观组织的影响,并与传统锡铅焊料进行了对比。Sn-9Zn焊料的电性能及力学性能优于传统锡铅焊料,但润湿性较差。添加微量RE和Al可以显著提高Sn-9Zn合金铺展率、细化组织,且不降低焊料电导率和力学性能,最佳w(RE)和w(Al)分别为0.05%和0.10%,铺展率达到61.98%,与Sn-9Zn相比提高了13.40%,硬度为20.90HB,电导率为8.15×106S/m。     

微量元素添加对多元Sn-Bi系焊料合金组织与性能的影响

传统焊料合金由于熔点温度高,不能满足部分有机基板、温度敏感器件以及3D封装等多层封装形式的低温封装要求.以Sn-Bi合金为基体,通过添加微量Ag、Cu、Co和Ni元素形成新型多元合金,对多元合金的熔化性能、润湿性能、微观组织和力学性能进行研究.结果 表明:微量元素的添加(质量分数0～1％)对多元Sn-Bi系合金的固相线...     

混合稀土对Sn-0.70Cu-0.05Ni钎料组织与性能的影响

向Sn-0.70Cu-0.05Ni无铅钎料中添加微量混合稀土元素RE(主要是La和Ce),研究了RE添加量对该钎料合金显微组织及性能的影响.结果表明,添加微量的RE能显著细化该钎料合金组织,抑制金属间化合物的生长,改善合金的组织分布,提高钎料的润湿性及力学性能.当w(RE)为0.10%时,钎料的润湿力,拉伸强度分别为3...     

纳米颗粒增强无铅复合焊料的研究现状

熔化温度、润湿性及长期使用过程中的可靠性决定了无铅焊料的应用范围.通过添加适量纳米颗粒可显著提高无铅焊料的性能,特别是添加适量纳米Ag颗粒后SnCu焊料蠕变断裂寿命是未添加时的13倍.介绍了添加纳米颗粒对无铅焊料的物理化学性能的影响;探讨了纳米颗粒增强无铅复合焊料微观结构和力学性能;展望了纳米颗粒增强手段对焊料应用的前...     

Sn-Bi-Sb无铅焊料微观结构及性能

研究了Sn-（1．3～1．5）Bi-（0．4～0．6）sb无铅焊料的制备工艺和微观组织,并测试了钎料的相关物理、力学性能,阐述了焊料的力学性能与微观结构特征间的关系。试验测试结果表明：该焊料具有较高的强度和塑性,具有良好的润湿铺展性和机械加工性能。焊料微观结构由（Sn）、B（SbSn）第二相和（Bi）所构成,其抗拉强度为55．4MPa,延伸率为35．9％,扩展率为80．6％,熔点为226．9℃～234．4℃。     

微量锗对Sn-0.7Cu-0.05Ni钎料微观组织与性能的影响

为改善Sn-0.7Cu-0.05Ni钎料抗氧化性差及溶铜速率快的问题,向Sn-0.7Cu-0.05Ni钎料中添加微量锗,研究了不同锗添加量(质量分数0.01%~0.10%)对SnCuNi钎料合金显微组织及性能的影响。结果表明,微量的锗能显著细化Sn-0.7Cu-0.05Ni钎料合金组织,抑制金属间化合物的生长,改善合金的组织分布,提高钎料的润湿性及力学性能。此外,锗的添加还能显著提高钎料的抗氧化性并降低溶铜速率,当锗的质量分数从0增至0.10%时,溶铜速率从0.117 m/s降至0.110 m/s。     

Sn—Bi无铅焊料的研究

通过总结传统Sn-Pb焊料的特点和研制无铅焊料的条件,综述Sn-Bi无铅焊料低熔点等优点以及脆性大、易偏析的缺点,分析添加In,Ag,AI,Sb等微量合金元素对Sn-Bi无铅焊料微观组织及性能的影响,提出了此合金系焊料的抗蠕变性、导电性、润湿性、拉伸性能等尚待完善的性能及可采用合金化、开发新型焊剂等新方法使Sn-Bi焊料成为理想的无铅焊料,为无铅焊料的进一步研究提供一定的参考.     

新型无铅焊料的研制

由于目前使用的Sn3.5AgCu无铅焊料,温度较高、润湿性较差.在Sn3.5AgCu无铅钎料中添加金属元素Ga、Bi,并改变Ag的含量,对其合金进行熔化温度、润湿性、力学性能和微观组织研究.研究表明,添加Ga、Bi并改变Ag含量有利于降低Sn3.5AgCu合金的熔化温度和改善其润湿性,并提高了力学性能.     

Sn-37Pb焊球与Ni/NiP UBM界面反应特性研究

通过对共晶锡铅焊球与Ni/NiP UBM层扫描电镜界面微观组织观察和成分分析,研究了Sn-37Pb/Ni和Sn-37Pb/NiPUBM焊点界面反应特性。研究表明芯片侧界面IMC由Ni层到焊料的顺序为:靠近Ni层界面化合物为(Ni,Cu)_3Sn,靠近焊料侧化合物为(Cu,Ni)_6Sn_5;PCB板侧界面IMC包括靠近NiP层的NiSnP化合物和靠近焊料侧的(Cu,Ni)_6Sn_5化合物,NiSnP是由于Ni的扩散形成。PCB板侧NiP镀层中存在微裂纹缺陷,此裂纹缺陷会导致金属间化合物中产生裂纹,从而对焊点力学性能和可靠性产生不良的影响。     

Effect of Metal Bond-Pad Configurations on the Solder Microstructure Development of Flip-Chip Solder Joints

Various microstructural zones were observed in the solidified solder of flip-chip solder joints with three metal bond-pad configurations (Cu/Sn/Cu, Ni/Sn/Cu, and Cu/Sn/Ni). The developed microstructures of the solidified flip-chip solder joints were strongly related to the associated metal bond pad. A hypoeutectic microstructure always developed near the Ni bond pad, and a eutectic or hypereutectic microstructure formed near the Cu pad. The effect of the metal bond pads on the solder microstructure alters the Cu solubility in the molten solder. The Cu content (solubility) in the molten Sn(Cu) solder eventually leads to the development of particular microstructures. In addition to the effect of the associated metal bond pads, the developed microstructure of the flip-chip solder joint depends on the configuration of the metal bond pads. A hypereutectic microstructure formed near the bottom Cu pad, and a eutectic microstructure formed near the top Cu pad. Directional cooling in the flip-chip solder joint during the solidification process causes the effects of the metal bond-pad configuration. Directional cooling causes the Cu content to vary in the liquid Sn(Cu) phase, resulting in the formation of distinct microstructural zones in the developed microstructure of the flip-chip solder joint.     

The microstructure of eutectic Au-Sn solder bumps on Cu/electroless Ni/Au

In this work we studied the initial microstructure and microstructural evolution of eutectic Au-Sn solder bumps on Cu/electroless Ni/Au. The solder bumps were 150–160 m in diameter and 45–50 m tall, reflowed on Cu/electroless Ni/Au, and then aged at 200°C for up to 365 days. In addition, Au-Ni-Sn-alloys were made and analyzed to help identify the phases that appear at the interface during aging. The detailed interfacial microstructure was observed using a transmission electron microscope (TEM). The results show that the introduction of Au from the substrate produces large islands of-phase in the bulk microstructure during reflow. Two Au-Ni-Sn compounds are formed at the solder/substrate interface and grow slowly during aging. The maximum solubility of Ni in the—phase was measured to be about 1 at.% at 200°C, while Ni in the-phase is more than 20 at.%. The electroless Ni layer is made of several sublayers with slightly different compositions and microstructures. There is, in addition, an amorphous interaction layer at the solder/electroless Ni interface.     

Microstructure evolution of gold-tin eutectic solder on Cu and Ni substrates

The microstructures of the eutectic Au20Sn (wt.%) solder that developed on the Cu and Ni substrates were studied. The Sn/Au/Ni sandwich structure (2.5/3.75/2 μm) and the Sn/Au/Ni sandwich structure (1.83/2.74/5.8 μm) were deposited on Si wafers first. The overall composition of the Au and the Sn layers in these sandwich structures corresponded to the Au20Sn binary eutectic. The microstructures of the Au20Sn solder on the Cu and Ni substrates could be controlled by using different bonding conditions. When the bonding condition was 290°C for 2 min, the microstructure of Au20Sn/Cu and Au20Sn/Ni was a two-phase (Au₅Sn and AuSn) eutectic microstructure. When the bonding condition was 240°C for 2 min, the AuSn/Au₅Sn/Cu and AuSn/Au₅Sn/Ni diffusion couples were subjected to aging at 240°C. The thermal stability of Au20Sn/Ni was better than that of Au20Sn/Cu. Moreover, less Ni was consumed compared to that of Cu. This indicates that Ni is a more effective diffusion barrier material for the Au20Sn solder.     

A reliability comparison of electroplated and stencil printed flip-chip solder bumps based on UBM related intermetallic compound growth properties

The effects of under bump metallurgy (UBM) microstructures on the intermetallic compound (IMC) growth of electroplated and stencil printed eutectic Sn-Pb solder bumps were investigated. The process parameters and their effects on UBM surface morphology and UBM shear strength were studied. For the electroplating process, the plating current density was the dominant factor to control the Cu UBM microstructure. For the stencil printing process, the zincation process has the most significant effect on the Ni UBM surface roughness and Ni grain sizes. In both processes, the good adhesion of UBM to aluminum can be obtained under suitable UBM processing conditions. Samples with different UBM microstructures were prepared using the two processes. The resulting samples were thermal aged at 85/spl deg/C, 120/spl deg/C, and 150/spl deg/C. It was observed that the Cu UBM surface roughness had larger effect on the IMC growth and solder ball shear strength than the Ni UBM surface roughness. The thickness of Cu/sub 3/Sn and Cu/sub 6/Sn/sub 5/ IMC depended strongly on the UBM microstructure. However, for Ni/Au UBM, no significant dependence was observed. More likely, the thickness of Au-Ni-Sn IMC near the IMC/solder interface was controlled by the amount of gold and the gold diffusion rate in the solder. Shear tests were performed after thermal aging tests and thermal/humidity tests. Different failure modes of different sample groups were analyzed. Electroless Ni UBM has been developed because it is a mask-less, low-cost process compared to electroplated Cu UBM. This study demonstrated that the process control was much easier for Ni UBM due to its lower reactivity with Sn material. These properties made Ni UBM a promising candidate for the lead-free solder applications.     

Interfacial reaction and mechanical reliability of PTH solder joints with different solder/surface finish combinations

The effects of minor Ni addition (0.05 wt.%) on the microstructures and mechanical reliability of the lead-free solder joints used in the pin through hole (PTH) components were carefully investigated using a scanning electron microscope (SEM), a field-emission electron probe x-ray microanalyzer, and a pull tester. The PTH walls (i.e., Cu) of printed circuit boards (PCBs) were coated with organic solderability preservative (OSP) or electroless nickel/immersion gold (ENIG) surface finish before soldering. During soldering, the pins of the electronic components were first inserted into the PTHs deposited with OSP or ENIG, and then joined using a Sn–3Ag–0.5Cu (SAC) solder bath through a typical wave-soldering process. After wave soldering, a rework (the second wave soldering) was performed, where an SAC or Sn–0.7Cu–0.05Ni (SCN) solder bath was employed. The SCN joints were found to possess a higher tensile strength than the SAC ones in the OSP case. The sluggish growth of Cu₃Sn, along with few Kirkendall voids at the solder/Cu interface caused by minor Ni addition into the solder alloy (i.e., SCN), was believed to be the root cause responsible for the increase in the strength value. However, the mechanical strength of the PTH components was revealed to be insensitive to the solder composition in the alternative case where an ENIG was deposited over the PTH walls. The implication of this study revealed that minor addition of Ni into the solder is beneficial for the solder/Cu joints, but for the solder/Ni(P) joints.     

Interfacial reaction between Sn-0.7Cu (-Ni) solder and Cu substrate

The interfacial reaction between Sn-0.7mass%Cu-(Ni) solders and a Cu substrate was investigated to reveal the effect of the addition of Ni to Sn-Cu solder on the formation of intermetallic compounds (IMCs). Sn-0.7Cu-xNi solders (x=0, 0.05, 0.1, 0.2 mass%) were prepared. For the reflow process, specimens were heated in a radiation furnace at 523 K for 60 sec, 300 sec, and 720 sec to estimate the interfacial reaction between the molten solder and Cu substrate. Then, for the aging process, some specimens were heat-treated in an oil bath at 423 K for 168 h and 504 h. The cross sections of soldered specimens were observed to measure the dissolution thickness of the Cu substrate and the thickness of the IMC and to investigate the microstructures of IMC. The results showed that, just after the reflow process, the dissolution thickness of the Cu substrate increased with the increase of Ni content in the Sn-0.7Cu-xNi solder and the thickness of the IMC between the solder and Cu substrate was the minimum in the Sn-0.7Cu-0.05Ni solder. After the aging process, the IMC grew with the increase of aging time. In the case of 0.05% Ni, the IMC thickness was the thinnest regardless of aging time. It is clear that 0.05% Ni addition to Sn-0.7Cu solder very effectively inhibits the formation and growth of the IMC between solder and Cu substrate. Electron probe microanalysis of the IMC showed that the IMC layer in the Sn-0.7Cu-Ni solder contained Ni, and the IMC was expressed as (Cu_1−y ,Ni _y )₆Sn₅.     

Improvement of High-Temperature Performance of Zn-Sn Solder Joint

Pb-based solders are used as high-temperature solders in power semiconductor devices. Although the use of Pb is globally restricted, alternative materials cannot replace the Pb-based solder. This study proposes that the Pb-based solder can be replaced by Zn-Sn alloys. Die shear tests revealed that some Zn-Sn solder joints between Cu substrates had a higher shear strength between 300 K and 543 K than those between Fe-42Ni substrates. The microstructure of the Zn-Sn solder joints between Cu substrates showed network microstructures consisting of a Zn phase and ε-CuZn₅ phase and direct connection between the network microstructures and intermetallic compound layer. These morphologies of the high melting phase should improve the shear strength even at the elevated temperature of 543 K.     

Interfacial reaction of Pb-Sn solder and Sn-Ag solder with electroless Ni deposit during reflow

The interfaces between electroless Ni-P deposit and Pb-Sn solder and Sn-Ag solder were formed by reflowing for different time periods to examine their microstructures and microchemistry. It was found that the Pb-Sn solder interface is more stable than the Sn-Ag solder interface. Sn-Ag solder reacts quickly with the electroless Ni-P deposit and forms nonadherent Ni-Sn intermetallic compounds (IMCs). Pb-Sn solder reacts slowly and forms adherent Ni-Sn IMC. A P-rich Ni layer, revealed as a dark layer under scanning electron microscopy (SEM), is formed on the electroless Ni-P deposit due to the solder reaction. For short reflow times, this P-rich Ni layer consists of only Ni₃P compound, but during prolonged reflow, new crystals of Ni₂P, Ni₅P₄, and NiP₂ are also found to be formed from the amorphous electroless Ni-P layer.     

Kinetics of Au-containing ternary intermetallic redeposition at solder/UBM interface

In this study, the effects of the under bump metallurgy (UBM) structure and Cu content in solders on the redeposition rate of Au-containing ternary intermetallics at the solder/UBM interface were investigated. A UBM structure with a Ni diffusion barrier, Au/Ni/Cu, appeared to promote the redeposition of ternary Au-containing intermetallics at the solder/UBM interface of the ternary during the solid-state aging treatment and the Au-embrittlement of the solder interconnections. Copper added to the eutectic Sn-Pb and Sn-Ag solders was observed to be very effective in retarding the redeposition by forming the ternary intermetallics in solder matrices and preventing the Au-embrittlement. These phenomena were discussed with the microstructures observed. Jointly appointed by CAAM at POSTECH     

Influence of Cu content on compound formation near the chip side for the flip-chip Sn-3.0Ag-(0.5 or 1.5)Cu solder bump during aging

Sn-Ag-Cu solder is a promising candidate to replace conventional Sn-Pb solder. Interfacial reactions for the flip-chip Sn-3.0Ag-(0.5 or 1.5)Cu solder joints were investigated after aging at 150°C. The under bump metallization (UBM) for the Sn-3.0Ag-(0.5 or 1.5)Cu solders on the chip side was an Al/Ni(V)/Cu thin film, while the bond pad for the Sn-3.0Ag-0.5Cu solder on the plastic substrate side was Cu/electroless Ni/immersion Au. In the Sn-3.0Ag-0.5Cu joint, the Cu layer at the chip side dissolved completely into the solder, and the Ni(V) layer dissolved and reacted with the solder to form a (Cu_1−y,Ni_y)₆Sn₅ intermetallic compound (IMC). For the Sn-3.0Ag-1.5Cu joint, only a portion of the Cu layer dissolved, and the remaining Cu layer reacted with solder to form Cu₆Sn₅ IMC. The Ni in Ni(V) layer was incorporated into the Cu₆Sn₅ IMC through slow solid-state diffusion, with most of the Ni(V) layer preserved. At the plastic substrate side, three interfacial products, (Cu_1−y,Ni_y)₆Sn₅, (Ni_1−x,Cu_x)₃Sn₄, and a P-rich layer, were observed between the solder and the EN layer in both Sn-Ag-Cu joints. The interfacial reaction near the chip side could be related to the Cu concentration in the solder joint. In addition, evolution of the diffusion path near the chip side in Sn-Ag-Cu joints during aging is also discussed herein.