Preparation of Layer-by-Layer Self-Assembled Coating Modified Polyethylene Terephthalate Fabric with Flame Retardancy and UV Protection based on ZnO Nanopaticles

A hybrid coating containing zinc oxide (ZnO) nanoparticles, polyethyleneimine and sodium alginate was fabricated on the surface of polyethylene terephthalate (PET) fabric using layer-by-layer (LbL) self-assembled method. The construction of ZnO based coating on the surface of PET fabric resulted reduced DTG peak value compared with that of pure PET. Compared with the pure PET fabric, 4 bilayers coating obviously improved the fire resistance of PET fabric, as evidenced by the obvious reduction (39%) of peak heat release rate. UV transmission intensities of ZnO coated PET fabrics are lower at 320–400 nm than that of pure PET fabric.     

脉冲激光沉积ZnO薄膜的表面研究

脉冲激光沉积技术（PLD）目前已成为一种重要的制备氧化锌（ZnO）薄膜的技术,但是由于脉冲瞬间沉积时不能避免产生液滴及形成大小不一的颗粒,因此在制备高质量ZnO薄膜的表面均匀性方面还存在一定弊端。文章采用PLD（KrF准分子激光器：波长248 nm,频率5 Hz,脉冲宽度20 ns）方法在衬底温度450℃和氧气流量10 sccm下以高纯ZnO为靶材、在单晶硅衬底表面沉积120 min成功生长了ZnO薄膜。扫描电子图像（SEM）显示ZnO薄膜表面有明显凸起的颗粒,文章通过俄歇能谱仪对ZnO薄膜进行了研究,分析了ZnO薄膜的表面成分及凸起颗粒微观区域的成分。实验结果表明制备的ZnO薄膜表面明显突起的颗粒为ZnO颗粒,文章为PLD法制备ZnO薄膜易形成大小不一的颗粒提供了理论依据。     

苝染料杂化氧化锌薄膜的电沉积制备与表征

用含氯化锌(ZnCl2)和苝染料的二甲基亚砜溶液做电解液，可在ITO(氧化铟锡)导电玻璃上电化学沉积有机-无机杂化薄膜．薄膜的粒径尺寸约为300nm，杂化染料后的氧化锌(ZnO)薄膜的紫外可见吸收光谱相比纯ZnO薄膜明显宽泛而且偏向可见光部分．实验证明了染料敏化法提高ZnO薄膜光吸收能力的可行性．     

应用电泳沉积技术制备钛酸钡铁电陶瓷薄膜

采用电泳沉积技术在Pt电极基片上制备BaTiO3铁电陶瓷薄膜，探讨了电泳沉积过程中的控制因素（悬浮液体系，电场强度，料浆浓度，沉积时间等）对成膜性能的影响，并对薄膜材料的结构，性能进行了表征，实验结果表明；在1050℃（2h)的烧成温度下，经重复沉积一烧结2-3次可得到基本无缺陷的BaTiO3陶瓷薄膜，测量频率在1kHz，测量频率在1kHz时，室温（23℃）下的介电常数ε=2300，介电损耗tanδ=0.2。     

水热法制备In掺杂ZnO薄膜的表面形貌及其光学性质

采用水热法在ZnO籽晶层上制备了不同In掺杂量的ZnO薄膜,用X射线衍射仪(XRD)、原子力显微镜(AFM)、紫外可见分光光度计和荧光光谱仪等测试分析薄膜的微结构、表面形貌、透射谱和室温光致发光谱.结果表明,In离子的掺入未改变薄膜的晶相结构,但抑制了ZnO晶粒的生长,使得ZnO的结晶度明显下降.随着In含量的增加,薄膜表面rms粗糙度和平均颗粒尺寸均逐渐减小,光学带隙Eg先增大后减小.所有薄膜的PL谱中均观察到405 nm左右的紫光发光带,研究了In掺杂量对紫光发光带的强度和峰位的影响,并对其紫光发射机理进行了探讨.     

氮化硅薄膜的热丝化学气相沉积法制备及微结构研究

采用热丝化学气相沉积法,以Sill4、NH3、N2为反应气源,通过改变氮气流量沉积氮化硅薄膜.通过紫外-可见(UV-VIS)光吸收谱、傅里叶红外透射光谱(FTIR)、X射线衍射谱(XRD)等测试手段对薄膜的光学带隙、键合特性及晶相进行表征与分析.结果表明:薄膜主要表现为Si-N键合结构,当N2流量从20 sccm变化到40 sccm时,热丝能够充分的分解N2,薄膜中N原子过量,其周围的Si和H能充分的与N结合.但由于N2的解离能较高,当N2流量高于40 sccm时,氮气在反应过程中对薄膜内的氮原子反而起到了稀释作用,薄膜的有序程度增大,光学带隙减小,致密性降低.当氮气流量达到150 sccm时,在2θ为69.5°处出现了晶化β-Si3 N4的尖锐衍射峰,其择优取向沿(322)晶向,且Si3 N4晶粒显著增大.因此,氮气流量对薄膜中的氮含量有显著影响,适当的增加氮气流量有利于制备出优质含有小晶粒β-Si3 N4薄膜.     

等离子体化学气相沉积法制备致密性超浸润纳米硅氟薄膜

以含氟丙烯酸酯功能单体和硅烷为原料、无水乙醇为溶剂、氩气为工艺气体,经等离子体化学气相沉积在表面绝缘阻抗(SIR)测试板和无尘布上制得硅氟薄膜.探讨了硅烷种类和用量、含氟单体用量对镀硅氟薄膜试件性能的影响.结果表明,采用γ-甲基丙烯酰氧基丙基三甲氧基硅烷(KH 570)、γ-氨丙基三乙氧基硅烷(KH 550)和乙烯基三...     

溶液电沉积法制备苝酰亚胺类化合物薄膜

溶液电沉积法是一种具有沉积时间短,可以常温沉积以及沉积物在基底上附着力高等优点的薄膜制备方法.本文用水合肼增溶苝酰亚胺类化合物(PTCDI)的方法制备了可用于溶液电沉积的苝酰亚胺类化合物溶液.用紫外-可见分光光度法(UV-Vis)对溶解的过程进行了表征,并用顺磁共振(ESR)验证了水合肼对PTCDI的增溶过程实质上是化学反应过程.在制备苝酰亚胺类化合物溶液的基础上,采用阳极电沉积法在ITO导电玻璃上沉积出了薄膜.采用UV-Vis,扫描电镜(SEM)和X射线衍射仪(XRD)对薄膜进行了表征,证实得到了表面较为平整、具有可控结晶结构和形貌的PTCDI薄膜以及具有较宽光谱吸收范围的复合薄膜.     

沉淀法制备花状ZnO粉体及性能研究

以二水合乙酸锌提供锌源,氨水调节pH值,聚乙二醇-2000为改性剂,采用沉淀法在一定的工艺条件下得到了花状ZnO粉体。并以SEM、TEM及XRD等测试手段对产物的形貌及结构方面进行了表征。利用X射线衍射仪进行结晶结构分析,表明花状ZnO为六方纤锌矿结构;利用场发射电子扫描电镜进行样品形貌分析,表明花状结构ZnO是由纺锤状棒状结构组成,棒的长径比为2．10;利用场发射透射电镜进行结晶结构分析,表明花状ZnO是单晶与多晶的混合体,室温光致发光谱表明花状ZnO在380nm左右存在紫外发射峰。     

沉淀法制备花状ZnO粉体及性能研究

以二水合乙酸锌提供锌源,氨水调节pH值,聚乙二醇-2000为改性剂,采用沉淀法在一定的工艺条件下得到了花状ZnO粉体。并以SEM、TEM及XRD等测试手段对产物的形貌及结构方面进行了表征。利用X射线衍射仪进行结晶结构分析,表明花状ZnO为六方纤锌矿结构;利用场发射电子扫描电镜进行样品形貌分析,表明花状结构ZnO是由纺锤状棒状结构组成,棒的长径比为2．10;利用场发射透射电镜进行结晶结构分析,表明花状ZnO是单晶与多晶的混合体,室温光致发光谱表明花状ZnO在380nm左右存在紫外发射峰。     

Growth Mechanism of Silicon Carbide Films by Chemical Vapor Deposition below 1273

SiC films were prepared from the reaction of Si₂H₆ with C₂H₄ or C₂H₂ at relatively low temperatures ranging from 873 K to 1273 K by low-pressure chemical vapor deposition. The deposition rate profiles determined by gravimetry and the alloy composition (carbon content, x, for Si_1-xC_x) profiles determined by X-ray photoemission spectroscopy in the reactor were mainly investigated. The results revealed that the carbon content, x , was a function of the temperature, ratio of partial pressures of source gases, and source gas species (C₂H₄, C₂H₂). From these results we deduced that SiC formation occurred by two major competing reaction processes: (1) the silicon deposition processes, SiH₂ Si (wall) and Si₂H₆ Si (wall), and (2) the carbon deposition process, C₂H₄+ SiH₂ vinylsilane or C₂H₂+ SiH₂ ethynylsilane.     

Nanostructured Semiconducting Polymer Films with Enhanced Crystallinity and Reorientation of Crystalline Domains by Electrospray Deposition

Self‐organization of conjugated polymer such as poly(3‐hexylthiophene) (P3HT) causes directional anisotropy in the charge carrier mobility. In contrast to an edge‐on orientation formed in thin films of P3HT made by spin coating, in this study electrospray deposition rotates the orientation while producing nanopillar structures as a result of Coulombic fission and significant evaporation of solvent from the droplets. The nanostructured films are investigated by scanning electron microscopy. Due to substantial polymer–air interfaces oriented perpendicular to the substrate, P3HT molecules adopt a face‐on orientation with respect to the substrate plane that is confirmed by grazing incidence X‐ray diffraction. Additionally, enhanced crystallinity (29% increase) is confirmed by a redshift in the UV–vis absorption spectra. Because deposition by electrospray is a scalable nanomanufacturing method, these results inform the design of low‐cost device layers for large‐surface‐area applications such as light emitting diodes and photovoltaics.

     

Growth of Yttria-Stabilized Zirconia Thin Films on Textured Silver Substrates by Chemical Vapor Deposition

The effect of deposition conditions on the growth of yttria-stabilized zirconia (YSZ) films on textured silver substrates using the chemical vapor deposition (CVD) process was investigated. The crystalline structure of the YSZ film depended strongly on the deposition conditions, such as substrate temperature and deposition time. YSZ films prepared at 750°C using β-diketone chelate sources, which had an orientation of c -axis normal to the textured silver substrate surface. The YSZ surface was dense but not rough, and the YSZ film grew granular-like. The cross-sectional image of YSZ film showed the columnar growth feature; the growth rate was ∼20 nm/min.     

碳沉积法制富氮用炭分子筛的研究

本文提出的碳沉积法是用煤焦油馏分油的有机溶液浸渍煤炭化物,然后热解以进行“孔调变”。确定了最佳工艺条件,制得富氮性能良好的炭分子筛。并用D-A方程求取了各种样品的微孔结构参数。     

Fabrication of Dense Zirconia Electrolyte Films for Tubular Solid Oxide Fuel Cells by Electrophoretic Deposition

Electrophoretic deposition (EPD) is used to produce zirconia electrolyte films for tubular solid oxide fuel cells. A simple suspension chemistry (8-mol%-yttria-stabilized zirconia particles in acetic acid) yields films of similar quality to those from conventional approaches (such as electrochemical vapor deposition), but at potentially much less expense. A key factor in obtaining high-density, adherent films via the EPD approach is the application of a thin fugitive phase (carbon in this study) on the porous, doped lanthanum manganite cathode tubes prior to zirconia deposition.     

水热合成法制备ZnO纳米棒有序阵列薄膜

采用水热合成法在预先生长的ZnO种子层的玻璃衬底上制备出ZnO纳米棒有序阵列薄膜。通过X射线衍射、扫描电镜、透射电镜和选区电子衍射分析表明：所制备的薄膜由垂直于ZnO种子层的纳米棒组成,呈单晶六角纤锌矿ZnO结构,且沿[001]方向择优生长,纳米棒的平均直径和长度分别为10．0nm和3．3μm。     

液相沉积法制备TiO2薄膜及杀菌性能

采用液相沉积法（LPD）在玻璃的表面制得透明的TiO2薄膜,以XRD和SEM等方法对薄膜的物相、结构、形貌和光催化性能进行表征。通过热处理后TiO2薄膜对金黄色葡萄球菌（S．Aureus）和大肠杆菌（E．Coli）杀菌试验研究发现,在自然光照射下经热处理的TiO2薄膜具有良好的杀菌活性,400℃热处理的薄膜杀菌性能最优,在24h内可达到99％。同时对TiO2薄膜的杀菌机理进行了初号分析。     

液相沉积法制备金云母钛珠光颜料

以耐高温性能优于绢云母的金云母为基材,TiCl4为沉淀剂,SnCl4为晶型促进剂,通过液相沉积法成功制备金云母钛珠光颜料。通过X射线衍射(XRD)和扫描电子显微镜(SEM)分析对金云母钛珠光颜料的结构进行表征,重点探讨了该种液相沉积法对金云母钛珠光颜料的制备效果。结果表明TiO2纳米粒子均匀地包覆于金云母表面,且TiO2纳米粒子粒径均匀,分散性好。     

垂直排列法组装胶体晶体的最新进展

光子晶体是一种具有光子带隙的新型功能材料．利用胶体粒子自组装三维光子晶体由于其制备过程比较经济、简单，从而为很多人所关注．目前报道的方法已有多种．其中垂直排列法的简便易行使得其受到了广泛的研究，但另一方面这种方法本身的缺点也限制了它的使用范围．针对这种情况，很多研究机构提出了他们的改进方法．本文简要概述了在这一方面的最新进展，并且在本实验室已能够制备任意单分散、均一尺寸二氧化硅粒子的基础上，采用恒温快速蒸发自组装法得到了高质量的胶体晶体排列．