A 99-mm2 0.7-W single-chip MPEG-2 422P@ML video, audio,and system encoder with a 64-Mb embedded DRAM for portable 422P@HLencoder system

A scalable single-chip 422P@ML MPEG-2 video, audio, and system encoder LSI for portable 422P@HL system is described. The encoder LSI is implemented using 0.13-μm embedded DRAM technology. It integrates 3-M logic gates and 64-Mb DRAM in an area of 99-mm². The power consumption is suppressed to 0.7 W by adopting a low-power DRAM core. It performs real-time 422P@ML video encoding, audio encoding, and system encoding with no external DRAM. Furthermore, the encoder LSI realizes a 422P@HL video encoder with multichip configuration, due to its scalable architecture. This results in a PC-card size 422P@HL encoder for portable HDTV codec system     

Optimized redundancy selection based on failure-related yield modelfor 64-Mb DRAM and beyond

An optimized redundancy scheme for 64-Mb dynamic RAM (DRAM) and beyond that is based on a failure-related yield model is described. This model accounts for three-dimensional memory cell structures and individual design rules used in individual sections of the chip. Failure-mode parameters for the model are determined by performing a trial fuse-blowing test on 4-Mb DRAMs. The test employs a memory tester without requiring complicated visual inspections. The dependence of the yield on block division and the number of spare elements for a 64-Mb DRAM are investigated. In the estimation as a redundancy scheme for the 64-Mb DRAM, more than two spare rows and two spare columns in 1-Mb or less subblocks are shown to be necessary     

A 1.0-V 230-MHz column access embedded DRAM for portable MPEGapplications

This paper describes a 32-Mb embedded DRAM macro fabricated using 0.13-μm triple-well 4-level Cu embedded DRAM technology, which is suitable for portable equipment of MPEG applications. This macro can operate 230-MHz random column access even at 1.0-V power supply condition. The peak power consumption is suppressed to 198 mW in burst operation. The power-down standby mode, which suppresses the leakage current consumption of peripheral circuitry, is also prepared for portable equipment. With the collaboration of array circuit design and the fine Cu metallization technology, macro size of 18.9 mm² and cell efficiency of 51.3% are realized even with dual interface and triple test functions implemented     

256-Mb DRAM circuit technologies for file applications

256-Mb DRAM circuit technologies characterized by low power and high fabrication yield for file applications are described. The newly proposed and developed circuits are a self-reverse-biasing circuit for word drivers and decoders to suppress the subthreshold current to 3% of the conventional scheme, and a subarray-replacement redundancy technique that doubles chip yield and consequently reduces manufacturing costs. An experimental 256-Mb DRAM has been designed and fabricated by combining the proposed circuit techniques and a 0.25-μm phase-shift optical lithography, and its basic operations are verified. A 0.72-μm² double-cylindrical recessed stacked-capacitor (RSTC) cell is used to ensure a storage capacitance of 25 fF/cell. A typical access time under a 2-V power supply voltage was 70 ns. With the proper device characteristics, the simulated performances of the 256-Mb DRAM operating with a 1.5-V power supply voltage are a data-retention current of 53 μA and an access time of 48 ns     

A 29-ns 64-Mb DRAM with hierarchical array architecture

A 29-ns (RAS access time), 64-Mb DRAM with hierarchical array architecture has been developed. For consistent high yields and high speed, a CMOS segment driver circuit is used as a hierarchical word line scheme. To achieve high speed, precharge signal (PC) drivers for equalizing the bit lines pairs, and shared sense amplifier signal (SHR) drivers are distributed in the array. To enhance sense amplifiers speed in low array voltage, an over driven sense amplifier is adopted. A hierarchical I/O scheme with semidirect sensing switch is introduced for high speed data transfer in the I/O paths. By combining these proposed circuit techniques and 0.25-μm CMOS process technologies with phase-shift optical lithography, an experimental 64-Mb DRAM has been designed and fabricated. The memory cell size is 0.71×1.20 μm ², and the chip size is 15.91×9.06 mm². A typical access time under 3.3 V power supply voltage is 29 ns     

A 100-MHz 4-Mb cache DRAM with fast copy-back scheme

A 4-Mb cache dynamic random access memory (CDRAM), which integrates 16-kb SRAM as a cache memory and 4-Mb DRAM into a monolithic circuit, is described. This CDRAM has a 100-MHz operating cache, newly proposed fast copy-back (FCB) scheme that realizes a three times faster miss access time over with the conventional copy-back method, and maximized mapping flexibility. The process technology is a quad-polysilicon double-metal 0.7-μm CMOS process, which is the same as used in a conventional 4-Mb DRAM. The chip size of 82.9 mm² is only a 7% increase over the conventional 4-Mb DRAM. The simulated system performance indicated better performance than a conventional cache system with eight times the cache capacity     

A 45-ns 64-Mb DRAM with a merged match-line test architecture

A single 3.3-V 64-Mb dynamic RAM (DRAM) with a chip size of 233.8 mm² has been fabricated using 0.4-μm CMOS technology with double-level metallization. The dual-cell-plate (DCP) cell structure is applied with a cell size of 1.7 μm², and 30-fF cell capacitance has been achieved using an oxynitride layer (t_eff=5 nm) as the gate insulator. The RAM implements a new data-line architecture called the merged match-line test (MMT) to achieve faster access time and shorter test time with the least chip-area penalty. The MMT architecture makes it possible to get a RAS access time of 45 ns and reduces test time by 1/16000. A parallel MMT technique, which is an extended mode of MMT, leads to the further test-time reduction of 1/64000. Therefore, all 64 Mb are tested in only 1024 cycles, and the test time is only 150 μs with 150-ns cycle time     

A 90-MHz 16-Mb system integrated memory with direct interface toCPU

This paper describes a system integrated memory with direct interface to CPU which integrates an SRAM, a DRAM, and control circuitry, including a tag memory (TAG). This memory realizes a computer system without glue chips, and thus enables a computer system which is low cost, low power, and compact size, but still with sufficient performance. Also fast clock cycle time and access time is realized using a newly proposed clock driver and internal signal generator. This memory is fabricated with a quad-polysilicon double-metal 0.55-μm CMOS process which is the same as used in a conventional 16-Mb DRAM. The chip size of 145.3 mm² is only a 12% increase over the conventional 16-Mb DRAM. The maximum operating frequency is 90-MHz and the operating current at cache-bit is 156-mA. This memory is suitable for various types of computer systems such as personal digital assistants (PDA's), personal computer systems, and embedded controller applications     

A 2.5-V 2.0-Gbyte/s 288-Mb packet-based DRAM with enhanced cellefficiency and noise immunity

A 2.5-V 288-Mb packet-based DRAM with 32 banks and 18-DQ organization architecture achieving a peak bandwidth of 2.0-GB/s at V _DD=2.25 V and T=100°C has been developed using (1) an area- and performance-efficient chip architecture with a mixture of high-speed interface circuits with DRAM peripheral circuits to increase cell efficiency; (2) a multilevel controlled bitline equalizing scheme and a distributed sense amplifier driving scheme to enhance DRAM core timing margin while increasing the number of cells per wordline for cell efficiency over the previous subwordline driving scheme; (3) a flexible column redundancy scheme with multiple fuse boxes instead of excessive spare memory cell arrays for 143 internal I/O architecture; and (4) optimized I/O circuits and pin parasitic design including pad and package to maximize the operating frequency     

Word-line architecture for highly reliable 64-Mb DRAM

A unique word-line voltage control method for the 64-Mb DRAM and beyond is proposed. It realizes a constant lifetime for a thin gate oxide. This method controls word-line voltage and compensates reliability degradation in the thin gate oxide for cell-transfer transistors. It keeps the time-dependent dielectric breakdown (TDDB) lifetime constant under any conditions of gate oxide thickness fluctuation, temperature variation, and supply voltage variation. This method was successfully implemented in a 64-Mb DRAM to realize high reliability. This chip achieved a 10⁵ times reliability improvement and a 0.3~1.8-V larger word-line voltage margin to write ONE data into the cell     

A 55-ns 16-Mb DRAM with built-in self-test function usingmicroprogram ROM

A single 5-V power supply 16-Mb dynamic random-access memory (DRAM) has been developed using high-speed latched sensing and a built-in self-test (BIST) function with a microprogrammed ROM, in which automatic test pattern generation procedures were stored by microcoded programs. The chip was designed using a double-level Al wiring, 0.55-μm CMOS technology. As a result, a 16-Mb CMOS DRAM with 55-ns typical access time and 130-mm² chip area was attained by implementing 4.05-μm² storage cells. The installed ROM was composed of 18 words×10 b, where the marching test and checkerboard scan write/read test procedures were stored, resulting in successful self-test operation. As the BIST circuit occupies 1 mm² and the area overhead is about 1%, it proves to be promising for large-scale DRAMs     

A mixed-signal 0.18-μm CMOS SoC for DVD systems with432-MSample/s PRML read channel and 16-Mb embedded DRAM

This paper describes a fully integrated single-chip CMOS mixed-signal system on a chip (SoC) for DVD RAM and ROM systems. It integrates a 32-b RISC CPU, formatter, servo digital signal processor (DSP), 16-Mb DRAM, error correction code (ECC), ATA interface, and partial-response-maximum-likelihood (PRML) read channel with 7-b interpolated parallel analog-to-digital converter (ADC). Increasing the bus bandwidth by using embedded DRAM, a hardware ECC engine, and four parallel digital finite-impulse response (FIR) filters contributes to the high playback speed of 16×. PR(3,4,4,3) architecture has been used in the read channel system for optical disc systems. The obtained wide tangential tilt margin of ±0.6° is due to the use of this PRML read channel technique. The interpolated parallel scheme has attained a high number of effective bits of 6.3 for 72-Mz input frequency at 432-MSample/s operation without any calibration technique, with low power consumption of 180 mW in a small core size of 1.05 mm². This SoC has been fabricated in 0.18-μm 1PS3AL CMOS embedded DRAM technology. It contains 24 million transistors in a 144-mm ² die and consumes 1.2 W at 432-MSample/s operation. This low power consumption allows the use of a low-cost plastic package. As a result, we can compose highly reliable DVD RAM and ROM systems with this SoC and some tiny components     

A 12.5-ns 16-Mb CMOS SRAM with common-centroid-geometry-layoutsense amplifiers

A 16-Mb CMOS SRAM using 0.4-μm CMOS technology has been developed. This SRAM features common-centroid-geometry (CCG) layout sense amplifiers which shorten the access time by 2.4 ns. A flexible redundancy technique achieves high efficiency without any access penalty. A memory cell with stacked capacitors is fabricated for high soft-error immunity. A 16-Mb SRAM with a chip size of 215 mm² is fabricated and an address access time of 12.5 ns has been achieved     

A 23-ns 1-Mb BiCMOS DRAM

A 1-Mb BiCMOS DRAM having a 23-ns access time is described. The DRAM uses a direct sensing technique and a nonaddress-multiplexing configuration. This technique combines the NMOS differential circuit on each pair of data lines with a common highly sensitive bipolar circuit. The resulting chip has been verified to have high-speed characteristics while maintaining a wide operating margin and a relatively small chip size of 62.2 mm², in spite of a 1.3-μm lithography level     

40-mm2 3-V-only 50-MHz 64-Mb 2-b/cell CHE NOR flashmemory

This paper presents a 3-V-only 64-Mb 4-level-cell (2-b/cell) NOR-type channel-hot-electron (CHE) programmed flash memory fabricated in 0.18-μm shallow-trench isolation CMOS technology. The device (die size 40 mm²) is organized in 64 1-Mb sectors. Hierarchical column and row decoding ensures complete isolation between different sectors during any operation, thereby increasing device reliability while still providing layout area optimization. Staircase gate-voltage programming is used to achieve narrow threshold-voltage distributions. The same program throughput as for bilevel CHE-programmed memories is obtained, thanks to parallel programming. A mixed balanced/unbalanced sensing approach allows efficient use of the available threshold window. Asynchronous (130-ns access time) and burst-mode (up to 50-MHz data rate) reading is possible. Both column and row redundancy is provided to ensure extended failure coverage. Error correction code techniques, correcting 1 failed over 32 data cells, are also integrated     

A 150-MHz graphics rendering processor with 256-Mb embedded DRAM

A 150-MHz graphics rendering processor with an integrated 256-Mb embedded DRAM, delivering a rendering rate of 75 M polygons/s, is presented, 287.5 M transistors are integrated on a 21.3×21.7 mm ² die in a 0.18-μm embedded DRAM CMOS process with six layers of metal. Design methodologies for hierarchical electrical and physical design of this very large-scale IC, including power distribution, fully hierarchical timing design, and verification utilizing a newly developed nonlinear model, clock design, propagation delay, and crosstalk noise management in multi-millimeter RC transmission lines, are presented     

An experimental 1.5-V 64-Mb DRAM

Low-voltage circuit technologies for higher-density dynamic RAMs (DRAMs) and their application to an experimental 64-Mb DRAM with a 1.5-V internal operating voltage are presented. A complementary current sensing scheme is proposed to reduce data transmission delay. A speed improvement of 20 ns was achieved when utilizing a 1.5-V power supply. An accurate and speed-enhanced half-V_CC voltage generator with a current-mirror amplifier and tri-state buffer is proposed. With it, a response time reduction of about 1.5 decades was realized. A word-line driver with a charge-pump circuit was developed to achieve a high boost ratio. A ratio of about 1.8 was obtained from a power supply voltage as low as 1.0 V. A 1.28 μm² crown-shaped stacked-capacitor (CROWN) cell was also made to ensure a sufficient storage charge and to minimize data-line interference noise. An experimental 1.5 V 64 Mb DRAM was designed and fabricated with these technologies and 0.3 μm electron-beam lithography. A typical access time of 70 ns was obtained, and a further reduction of 50 ns is expected based on simulation results. Thus, a high-speed performance, comparable to that of 16-Mb DRAMs, can be achieved with a typical power dissipation of 44 mW, one tenth that of 16-Mb DRAMs. This indicates that a low-voltage battery operation is a promising target for future DRAMs     

A modular architecture for a 6.4-Gbyte/s, 8-Mb DRAM-integratedmedia chip

A modular architecture for a DRAM-integrated, multimedia chip with a data transfer rate of 6 to 12 Gbyte/s is proposed. The architecture offers the design flexibility in terms of both DRAM capacity and the logic-memory interface for use in a wide variety of applications. A DRAM macro built from cascadable DRAM bank modules having a 256-kb memory capacity and 128-b I/Os provides flexibility and reconfigurability of DRAM capacity and a high data transfer rate with an area of 6.4 mm² /Mb. A data transfer circuit (called the “reconfigurable data I/O attachment”), which is attached to the I/O lines of the DRAM macro, provides a flexible logic-memory interface by changing the data-transfer routes between the DRAM macro and logic circuits in real time. A 6.4-Gbyte/s test chip (called the “media chip”) for three-dimensional computer graphics was fabricated to test the proposed design methodology. It integrates an 8-Mb DRAM and four pixel processors on an 8.35×14.6-mm chip by using a 0.4-μm CMOS design rule     

A 30-ns 256-Mb DRAM with a multidivided array structure

A 256-Mb DRAM with a multidivided array structure has been developed and fabricated with 0.25-μm CMOS technology. It features 30-ns access time, 16-b I/Os, and a 35-mA operating current at a 60-ns cycle time. Three key circuit technologies were used in its design: a partial cell array activation scheme for reducing power-line voltage bounce and operating current, a selective pull-up data-line architecture to increase I/O width and reduce power dissipation, and a time-sharing refresh scheme to maintain the conventional refresh period without reducing operational margin. Memory cell size was 0.72 μm². Use of the trench isolated cell transistor and the HSG cylindrical stacked capacitor cells helped reduce chip size to 333 mm²     

A wafer-scale-level system integrated LSI containing eleven 4-MbDRAMs, six 64-kb SRAMs, and an 18 K-gate array

A system integrated LSI chip (SLSI) that contains eleven 4-Mb DRAMs, six 64-kb SRAMs, and an 18 K-gate array, for a graphics application system is described. To implement the SLSI on a silicon chip, three key techniques have been developed: (1) system redundancy for defect relief; (2) chip configuration and fabrication with blade masking to achieve a hybrid 38.16×50.4-mm² chip; and (3) large-capability and high-reliability 324-pin 54×86-mm² plastic pin grid array package. Using a system redundancy technique, a 60% yield for the SLSI is achieved with a 40% yield for the DRAM itself. That is twice the 30% yield of the conventional repair scheme. Access times are 65 ns for the DRAM and 14 ns for the SRAM with a 3.9-W chip power dissipation