稀土Dy掺杂纳米SnO_2薄膜的结构与气敏特性

采用真空蒸发法在玻璃衬底上制备稀土Dy掺杂Sn薄膜,对薄膜进行合适的氧化、热处理后获得Dy掺杂SnO2薄膜.用X射线衍射、场发射扫描电子显微镜、静态配气法对薄膜性能进行测试,研究不同掺Dy含量和热处理条件对SnO2薄膜的影响.结果显示,制备的SnO2薄膜呈金红石结构为n型;在相同热处理条件下,Dy掺杂可明显缩短薄膜氧化、热处理的时间;适当掺入稀土Dy可明显改善SnO2薄膜的结构、气敏特性.掺Dy 3at%后可大大提高SnO2薄膜对丙酮气体的灵敏度.     

热处理温度和掺杂浓度对AZO薄膜微结构的影响

采用溶胶-凝胶法在普通裁玻片上制备了（002）择优取向的AZO薄膜,研究了不同的热处理温度和掺杂浓度对薄膜微结构的影响。利用XRD和SEM表征了AZO薄膜晶体结构的择优取向和表面形貌。结果表明,热处理温度为450℃,择优取向最强,热处理温度高于或低于450℃时,择优取向都减弱;当掺杂浓度为2％时,AZO的择优取向最强,随着Al掺杂浓度的增大,薄膜的晶粒尺寸减小,薄膜变得更加致密。     

溶胶-凝胶法制备的ITO薄膜电学及光学性能的研究

以无机盐为出发原料．采用溶胶-凝胶法制备了氧化铟锡(ITO)透明导电薄膜。进一步研究了热处理气氛、温度、Sn掺杂量时In2O3薄膜电学及光学性能的影响。分别在氮气、真空和空气3种环境下对薄膜进行热处理．结果表明真空热处理后薄膜的导电性最好。研究了薄膜方块电阻随锡掺杂量的变化．发现薄膜的方阻随掺锡量的增加先减小后增加,并在掺杂量为7mol％左右时达到最低;另外探讨了热处理温度对薄膜光电性能的影响．结果发现薄膜方块电阻随热处理温度的升高而减小．且热处理温度高于700℃后变化不显著,薄膜在可见光区平均透过率随热处理温度升高呈上升趋势。本研究所制得的薄膜可见光区(400-800nm)平均透过率可达85％、方阻约为66Ω。     

Ar-CdCl_2热处理和稀土Nd掺杂对CdS/CdTe复合薄膜结构及其光学性能的影响

在TCO玻璃衬底上依次采用化学水浴法和真空热蒸发工艺沉积CdS、CdTe薄膜,并在不同条件下进行热处理,制备了CdS/CdTe异质结复合薄膜。通过X射线衍射、扫描电镜,紫外-可见(U-V)透射光谱研究了不同温度下稀土Nd掺杂以及Ar-CdCl2热处理对薄膜结构、形貌和光学性能的影响。结果表明:不同条件下制备的薄膜均具有(111)晶面择优取向;样品表面形貌在不同条件下热处理后存在剧烈的差异,随着热处理温度的升高,薄膜晶粒增大;掺入Nd并在Ar-CdCl2氛围下热处理后,薄膜致密且粒径均匀,粒径明显增大,其(111)晶面的择优取向进一步增强。U-V透射光谱分析表明,Ar气氛下热处理对改善薄膜的光吸收作用并不明显,但掺Nd和在Ar-CdCl2氛围下热处理均可明显增强薄膜的光吸收性能,这对于提高太阳电池的光谱响应是非常有利的。     

温度对Zn掺杂TiO2薄膜光电化学性能的影响

以四氯化钛为前驱体,以ZnCl2为锌源,采用溶胶-凝胶法在纯钛基体上制备了Zn掺杂纳米TiO2薄膜(Zn-TiO2),研究了温度对Zn掺杂纳米TiO2薄膜在0.2mol/L Na2SO4中的光电化学性能的影响。根据Mott-Shottky曲线可知,Zn-TiO2薄膜为n型半导体;经过300℃热处理的Zn-TiO2薄膜,导带位置最高,空间电荷层宽度W最大。从电化学阻抗谱得到,光照下300℃热处理的Zn-TiO2薄膜电阻较暗态下降低最多。通过线性伏安曲线发现,300℃热处理的Zn-TiO2薄膜具有最强的光电流。     

铝离子掺杂氧化锌薄膜的溶胶-凝胶法制备及性能

运用室温溶胶-凝胶技术和热处理工艺,在载玻片上制备了铝离子掺杂的ZnO薄膜.采用X射线衍射(XRD)和扫描电子显微镜(SEM)对薄膜的成分、结构和形貌进行了表征;采用紫外-可见光分光光度计对薄膜的透光性能进行了研究.结果表明,所制备的氧化锌薄膜为六方纤锌矿结构,沿C轴方向择优生长;铝离子的掺杂没有改变氧化锌的基本结构,所掺杂的铝离子为取代锌离子的替位掺杂;热处理后,氧化锌颗粒为六角形针(柱)状形貌;随着热处理温度的升高,薄膜的透光率增大;经600℃热处理后随着铝离子掺杂浓度的增加,薄膜的透光率先增大后减小,当铝离子掺杂浓度为2%时透光率最大;当铝离子掺杂浓度较大时,晶格畸变的影响使薄膜的透光率减小.当溶胶浓度为0.6mol/L、铝离子掺杂浓度为2%和热处理温度为600℃时,所制备薄膜的质量和性能最好.     

稀土Ce2O3掺杂TiO2薄膜的结构和光学特性

采用真空热蒸发法在玻璃、单晶硅衬底上制备Ce2O3掺杂TiO2薄膜，研究热处理和Ce2O3掺杂对薄膜性能的影响。结果显示，热处理可明显改善薄膜的结构和光学性能，Ce2O3掺杂可降低薄膜晶型转化温度。TiO2薄膜（玻璃衬底）经600℃热处理由锐钛矿转为金红石结构；当掺Ce2O3含量为5at％时热处理温度为500℃薄膜就已开始发生晶型转变。薄膜表面颗粒较均匀，存在程度不同的孔洞和颗粒聚集现象；掺Ce2O3后薄膜表面致密度明显增强。薄膜（玻璃衬底）的光学带隙从3．74eV降至3．60eV。     

电子束蒸发法制备TiO2薄膜的折射率研究

用电子束蒸发法制备TiO2薄膜,并对其进行300℃、400℃、850℃热处理和掺杂.详细研究了工艺参数、热处理和掺杂对TiO2薄膜折射率的影响.实验结果表明:镀制高折射率的氧化钛薄膜最佳工艺参数为基片温度200℃、真空度2×10-2 Pa、沉积速率0.2 nm/s;随着热处理温度的升高,薄膜折射率也逐渐增大;适量掺杂CeO2(CeO2:Ti0质量比1.7:12)会提高薄膜的折射率,过量掺杂CeO2反而会降低折射率.     

环保型TiO2薄膜玻璃性能的研究

采用溶胶－凝胶法在玻璃表面制备了TiO2薄膜和掺杂铈或镧TiO2薄膜，利用高效液相色谱仪（HPLC）、紫外－可见分光光度计、扫描电镜（SEM）等测试手段，研究了不同气氛条件下热处理的TiO2薄膜对油酸光催化降解的影响，TiO2薄膜中掺杂稀土铈或稀土镧对油酸光催化降解的影响，薄膜内TiO2晶粒的分布及形态，薄膜表面化学稳定性等。结果表明空气气氛下处理的TiO2薄膜光催化效率最高。掺杂铈或镧有利于提高TiO2薄膜的光催化降解效率，涂层有利于提高玻璃的化学稳定性，但提高的程度不一。     

Al-N共掺杂型ZnO薄膜的制备及其性能研究

采用溶胶-凝胶法制备了Al-N共掺ZnO薄膜.用X射线光电子能谱检测Al-N共掺杂情况;用X射线衍射仪、原子力显微镜、场发射扫描电镜、分光光度计、霍尔测量仪等分析测试手段,分别研究了Al-N共掺的掺杂浓度和热处理温度对薄膜的结晶性能、微观形貌和光电性能的影响.结果表明:在基质ZnO溶胶浓度为0.5mol/L,Al-N掺杂摩尔浓度为10%,热处理温度600℃下,Al-N共掺ZnO薄膜的结晶性能、微观形貌和光电性能最佳.     

Studies of key technologies for large area CdTe thin film solar cells

The structure and main manufacturing technologies of CdTe film solar cells of large area are reviewed. Among the technologies, some have been developed for application in a pilot manufacturing line. The high resistant SnO₂ (HRT) thin films have been fabricated by PECVD. The effects of annealing on the structure and properties have been studied. A surface etching process of CdTe in low temperature and lower concentration of nitric acid has been developed. The Cd_1 − xZn_xTe ternary compound films have been studied. In order to improve the back contact layer, Cd_0.4Zn_0.6Te layer with 1.8 eV band gap as a substitute for ZnTe layer is introduced in CdTe cells. The effects of the technologies on performance of CdTe cells and feasibility of application in the modules are discussed.     

Effects of substrate temperature and post-deposition anneal on properties of evaporated cadmium telluride films

The effects of substrate temperature and post-deposition heat treatment steps on the morphology, structural, optical and electrical properties of thin film CdTe layers grown by vacuum evaporation were investigated. Scanning electron microscopy and X-ray diffraction (XRD) techniques were employed to study the structural changes. It was observed that the grain sizes and morphologies of as-deposited layers were similar for substrate temperatures of − 173 °C and − 73 °C. However, CdTe films produced at a substrate temperature of 27 °C had substantially larger grain size and clearly facetted morphology. Annealing at 200-400 °C in air did not cause any appreciable grain growth in any of the films irrespective of their growth temperature. However, annealing at 400 °C reduced faceting in all cases and initiated fusing between grains. XRD studies showed that this behavior after annealing at 400 °C coincided with an onset of a degree of randomization in the originally strong (111) texture of the as-grown layers. Optical band gap measurements showed sharpening of the band-edge upon annealing at 400 °C and a band gap value in the range of 1.46-1.49 eV. Resistivity measurements indicated that annealing at 400 °C in air forms a highly resistive compensated CdTe film. All results point to 400 °C to be a critical annealing temperature at which optical, structural and electrical properties of CdTe layers start to change.     

Electrical and photoelectrical behaviour of CdTe structures

The electrical and photoelectrical behaviour of Au/n-CdTe junctions prepared on CdTe monocrystalline substrates and CdTe epitaxial layers grown on n⁺ GaAs substrates were studied. The electrical and photoresponse properties depended very strongly on the parameters of the compensated high-resistive layer at the CdTe surface formed by annealing during preparation.     

Effects of CdCl2 treatment and annealing on CdS/SnO2/glass heterostructures for solar cells

Effects of CdCl₂ post-growth treatments and annealing under different conditions on the surface and interface properties of CdS/SnO₂/glass heterostructure were studied. CdS thin films were grown on SnO₂-coated glass substrates for CdS/CdTe heterojunction solar cells by the solution growth technique. It was found that CdCl₂ post-growth treatments and annealing enhanced the CdS-related XRD peaks, narrowed the CdS characteristic Raman bands, removed or depressed the disorder related Raman features, and improved the CdS film crystalline quality significantly, which are advantageous to the application in solar cells as a window layer material.     

The copper influence on the PL spectra of CdTe thin film as a component of the CdS/CdTe heterojunction

The influence of annealing in the presence of CdCl₂ and a thin copper layer deposited onto CdTe on the photoluminescence spectra of CdTe, as a component of CdS/CdTe heterojunction, has been studied for two excitation wavelengths: 0.337 μm and 0.6328 μm. The behavior of the PL was studied as a function of the measurement temperature and excitation intensity. At 0.6328 μm excitation, the interface PL consists of a known 1.43X band, and the chloride annealing enhances radiative transitions at 1.536 eV. The intensity of the 1.536 eV transitions increases when Cu is present. The PL of as-deposited CdTe films prepared in the presence of oxygen has the 1.45X band attenuated when excited with 0.337 μm excitation wavelength.     

Surface and thin film analysis of CdTe layers for solar cells

A solid state diffusion source with appropriate concentrations of donor and acceptor impurities has been used for studying the processes which occur during the thermal treatment of CdTe layers. The surface of the CdTe is investigated by XPS before and after annealing. The element ratios on the CdTe layer surface are determined in at%. Mathematical processing of the XP spectra is used to establish the ratios between the elements bound on the CdTe layer surface. The chemistry of the annealing-caused changes in CdTe layer properties are discussed.     

Characterization and photovoltaic device application of dip-coated and rapid thermal annealed CdS films

The structure, composition, electronic and optical properties of dip-coated CdS in the as-deposited condition and following rapid thermal annealing have been investigated. It has been shown that oxygen incorporated in the CdS film can be leached out following rapid thermal annealing. Strongly oriented CdS films with resistivity = 0.16 cm and free electron concentration = 2.65 × 10¹⁷ cm^–3 have been grown. Thin film heterojunction devices fabricated by non-aqueous electrodeposition of CdTe on a glass-ITO-CdS cathode have been shown to exhibit good rectification behaviour and photovoltaic activity.     

Effects of a ZnTe buffer layer on structural quality and morphology of CdTe epilayer grown on (001)GaAs by molecular beam epitaxy

The structural properties, crystalline quality and surface morphology of CdTe thin films without and with a ZnTe buffer layer grown on (001)GaAs by molecular beam epitaxy (MBE) have been studied. CdTe thin film directly prepared on GaAs substrate displays (111) orientation with an island growth mode, whereas the CdTe epilayers with a ZnTe buffer are (001)-oriented single-crystalline film with a two-dimensional (2D) growth mode. The morphology and surface root-mean-square (RMS) roughness of CdTe epilayers are also dramatically improved by using a ZnTe buffer. Furthermore, it is suggested that the high-temperature (HT) ZnTe buffer grown at 360 °C is more efficient for enhancing CdTe structural quality than the low-temperature (LT) one at 320 °C. The CdTe epilayer on the HT-ZnTe buffer shows a narrower full-width at half-maximum (FWHM) of double-crystal X-ray rocking curve (DCXRC) for (004) reflection and a smaller RMS roughness.     

Properties of electrochemically deposited CdTe thin films: annealing effect

CdTe thin film have been deposited onto stainless steel and fluorine doped tin oxide coated glass substrates from aqueous acidic bath using electrodeposition technique. The different preparative parameters, such as deposition time, bath temperature, pH of the bath have been optimized by photoelectrochemical (PEC) technique get good quality photosensitive material. The deposited films are annealed at different temperature in presence of air. Annealing temperature is also optimized by PEC technique. The film annealed at 200 °C showed maximum photosensitivity. Different techniques have been used to characterize the as deposited and also annealed (at 200 °C) CdTe thin film. The X-ray diffraction (XRD) analysis showed the polycrystalline nature and a significant increase in the XRD peak intensities is observed for the CdTe films after annealing. Optical absorption shows the presence of direct transition with band gap energy 1.64 eV and after annealing it decreases to 1.50 eV. Energy dispersive analysis by X-ray study for the as-deposited and annealed films showed nearly stoichiometric compound formation. Scanning electron microscopy reveals that spherically shaped grains are more uniformly distributed over the surface of the substrate for the annealed CdTe film. Photovoltaic output characteristics and spectral response of the annealed film have been carried. The fill factor and power conversion efficiency (η) of the cell are found to be 71 and 3.89 %.     

Structural,dielectric, and electrical studies on thermally evaporated CdTe thin films

Sandwich structures of cadmium telluride (CdTe) thin films between Ag electrodes were prepared by thermal evaporation technique at a vacuum of ~2 × 10⁻⁵ torr. Structural characterization of these thin films was performed using X-ray diffraction (XRD) studies. The effect of temperature and frequency on the electrical and dielectric properties of these films was studied in detail and reported in this article. The experimental study indicates that for the CdTe thin film the dielectric constant and dielectric loss increases with temperature and decreases with frequency. However, A.C. conductivity increases both with temperature and frequency. The data of complex impedance measurements over the same range of temperature and frequency are used to describe the relaxation behavior of the CdTe film. Our results indicate that the transport behavior of carriers in CdTe thin films is consistent with the correlated barrier hopping (CBH) model.