全方位离子注入及增强沉积工业机和应用

报道了等离子体源离子注入 (PSII)或等离子体浸没离子注入 (PIII)及增强沉积工业机的实验结果及应用。该机真空室直径 90 0mm ,高 10 5 0mm ,立式放置 ,抽气系统由分子泵及机械泵构成并且实现了PLC控制 ,本底真空小于 4× 10 - 4Pa。等离子体由热阴极放电或三个高效磁过滤式金属等离子体源产生 ,因此可实现全方位离子注入或增强沉积成膜。该机的负高压脉冲最高幅值为 80kV ,最大脉冲电流为 6 0A ,重复频率为 5 0— 5 0 0Hz ,脉冲上升沿小于 2 μs,并且可根据需要产生脉冲串。其等离子体密度约为 10 8— 10 10 ·cm- 3,膜沉积速率为 0 .1— 0 .5nm/s。     

铝合金、钛合金的全方位离子注入与沉积复合处理工艺研究

铝合金、钛合金等材料具有许多优良性能,广泛用于航空、航天、舰艇及能源化工等工业部门,但是这两种材料的耐磨损性能较差。本研究利用了全方位离子注入与沉积（PIII＆D）技术来强化处理这些合金表面,采用离子注入＋过渡层＋耐磨损层的复合强化处理工艺,通过摩擦磨损试验来研究不同的过渡层结构和厚度对磨损性能的影响。实验结果表明,通过优化过渡层结构和厚度,耐磨损性能有了很大的提高。     

氢氦离子注入机的研制

本文介绍了正研制的氢氦离子注入机的结构和各部分的主要性能指标。它的最高能量为200 keV,可按一定比例同时用氢氦两种离子进行注入实验。该机经调试,各项主要指标已达设计要求,工作稳定可靠。     

低能氮离子注入固体乙酸钠的质量沉积效应

对２５ｋｅＶ氮离子束辐照固体乙酸钠引起基分子结构的变化进行了研究，通过红外光谱的测定，发现氮离子辐照乙酸钠样品后的产物中含有新的化学基团，再配合 水合茚三酮反应等化学方法，分析得知辐照后的样品中含有氰基和氨基等产物。     

CG-100强流离子注入机

离子注入机经过20多年的发展,其主要技术指标已达较高水平。最近几年除了用于半导体掺杂的弱流机外,用于材料改性的强流机及用于超大规模集成电路研制的高能、超高能(MeV)注入机都有了较大的发展。     

GCr15表面钽沉积及碳离子注入的摩擦性能的研究

GCr15钢广泛用于各类轴承制造.为提高其摩擦性能,用磁控溅射法在GCr15轴承钢试样表面沉积厚约100 nm的钽膜,再进行不同注量的50 keV碳离子注入.用Ф6的GCr15钢球做对磨试验,测试它们的摩擦性能,用SEM观察磨痕形貌.结果表明,处理后GCr15钢改性层的Ta2C含量随注量增加,摩擦性能得以提高.载荷1 N、滑动速度50 mm/s条件下,注入3×1017ions/cm2的试样耐磨性是原始试样的1.65倍;表面沉积钽膜后,摩擦系数由未处理前的0.8～1下降至0.5左右,钽膜注碳后摩擦系数更降至0.2～0.3,注入层主要以磨粒磨损为主.     

离子注入修饰电极的研制及其在分析化学中的应用

离子注入是一种成熟的材料表面改性技术.1995年李启隆研究组将其引入分析化学领域,研制了离子注入修饰电极.本文简述离子注入及其应用发展概况.并在此基础上简述离子注入修饰电极的研制、特点及其在分析化学中的应用.     

离子注入微型半导体探测器的研制

国际上最早使用的微型探测器是盖革-缪勒计数器,并用它首次对活体内的肿瘤进行了测试。六十年代以来,它逐步为半导体探测器所代替。七十年代以来,微型半导体探测器已广泛地用于血流动力学、肺功能研究以及食管、胃和眼睛等体内和体表器官的诊断。我们也曾用半导体硅探测器对甲状腺节结进行过测试,效果良好。     

Ti-PS nanocomposites by plasma immersion ion implantation and deposition

We synthesize Ti-PS nanocomposites by plasma immersion ion implantation and deposition (PIII&D) technique. Ti nanoparticles at size of 5-15 nm are found in PS matrix. We propose the formation of Ti nanoparticles as a result of the combined effect of ion implantation and ion condensation in PIII&D process. X-ray photoelectron spectroscopy measurements reveal that Ti atoms have three different chemical states, metal, oxide and carbide. While surface Ti atoms are oxidized, embedded Ti atoms keep their metallic states by surrounding PS matrix. We characterize optical absorbance of Ti-PS nanocomposites by UV-VIS measurements. An adsorption peak due to the excitation of localized surface plasmon is found at wavelength 337.5 nm and the fractal nature of Ti-PS nanocomposites broaden absorption wavelength from UV to infrared. In addition, we use a protein assay to measure protein immobilization. It is found that the amount of protein immobilized on Ti-PS nanocomposites is almost twice than that on pristine PS. The enhancement mechanisms are attributed to the increased surface roughness as well as covalent linkages between protein molecules and functional groups on the surface of Ti-PS nanocomposites.     

PⅢD技术制备Ti/DLC纳米多层薄膜

采用等离子体浸没离子注入与沉积(PⅢ&D)技术在2Cr13钢表面制备了Ti/DLC纳米多层薄膜.分析了膜层的微观结构和机械特性.实验结果表明:纳米多层膜具有完整、清晰的调制层结构,薄膜的显微硬度均得到明显的提高.硬度较低的膜层具有较好的膜基结合强度和优良的摩擦性能,从综合性能看:纳米多层薄膜保持了类金刚石(DLC)薄膜低摩擦系数的特性,具有良好的承载能力以及膜一基结合特性.     

PIIID技术制备Ti/DLC纳米多层薄膜

采用等离子体浸没离子注入与沉积（PIII＆D）技术在2Cr13钢表面制备了Ti／DLC纳米多层薄膜,分析了膜层的微观结构和机械特性。实验结果表明：纳米多层膜具有完整、清晰的调制层结构,薄膜的显微硬度均得到明显的提高,硬度较低的膜层具有较好的膜基结合强度和优良的摩擦性能,从综合性能看：纳米多层薄膜保持了类金刚石（DLC）薄膜低摩擦系数的特性,具有良好的承载能力以及膜-基结合特性。     

Argon plasma immersion ion implantation of polystyrene films

Plasma immersion ion implantation (PIII), using bias voltages of 5, 10, 15 and 20 kV in an argon plasma and fluences in the range of 2 × 10¹⁴-2 × 10¹⁶ ions/cm², was applied to 100 nm polystyrene films coated on silicon wafer substrates. The etching kinetics and structural changes induced in the polystyrene films were investigated with ellipsometry, Raman and FTIR spectroscopies, optical and scanning electron microscopies, atomic force microscopy and contact angle measurements. Effects such as carbonisation, oxidation and cross-linking were observed and their dependence on the applied bias voltage is reported. Variations in the etching rate during the PIII process and its relationship to carbonisation of the modified surface layer are explored.     

Development and experimental study of large size composite plasma immersion ion implantation device

Plasma immersion ion implantation(PⅢ) overcomes the direct exposure limit of traditional beamline ion implantation, and is suitable for the treatment of complex work-piece with large size. PⅢ technology is often used for surface modification of metal, plastics and ceramics. Based on the requirement of surface modification of large size insulating material, a composite full-directional PⅢ device based on RF plasma source and metal plasma source is developed in this paper. This device can not only realize gas ion implantation, but also can realize metal ion implantation, and can also realize gas ion mixing with metal ions injection. This device has two metal plasma sources and each metal source contains three cathodes. Under the condition of keeping the vacuum unchanged, the cathode can be switched freely. The volume of the vacuum chamber is about 0.94 m~3, and maximum vacuum degree is about 5?×?10~(-4) Pa. The density of RF plasma in homogeneous region is about 10~9 cm~(-3), and plasma density in the ion implantation region is about 10~(10) cm~(-3). This device can be used for large-size sample material PⅢ treatment, the maximum size of the sample diameter up to 400 mm. The experimental results show that the plasma discharge in the device is stable and can run for a long time. It is suitable for surface treatment of insulating materials.     

等离子体浸没离子注入圆筒内表面的时空尺度

等离子体浸没离子注入与工件外表面的注入不同 ,存在空间和时间上的尺度。研究结果表明 ,由于内腔 ,如内筒的有限尺寸 ,使注入电压的利用率降低 ,同时使内部等离子体快速耗尽 ,对于特定的内筒 ,利用提高注入电压从而提高注入能量只能在一定的电压范围内实现。在典型的外表面注入工艺条件下 ,内表面离子的耗尽速度是惊人的。如在对于直径 2 0cm的圆筒在 30kV、2× 10 15ions/cm3的条件下 ,等离子体耗尽时间仅为 0 .5 5 μs ,这个时间甚至小于多数脉冲电源的上升沿时间。结果表明 ,内部等离子体源的硬件结构可能是一种有效的解决方法。     

Nitrocarburizing of AISI-304 stainless steel using high-voltage plasma immersion ion implantation

AISI-304 austenitic stainless steel has been nitrocarburized in N₂ and C₂H₂ ambient using high-voltage plasma immersion ion implantation (PIII) technology. The use of different PIII treatment times revealed important hints with respect to the microstructural, mechanical and corrosion properties of the nitrocarburized layer. Grazing incidence X-ray diffraction (GIXRD) shows the presence of nitride (γ_N and CrN) and carbide (γ_C and Fe₃C) phases. Glow discharge optical spectroscopy (GDOS) has been used to characterize the elemental depth profiles in which the thickness of the modified layers is derived. Dynamic microindentation method is used for the study of mechanical performance of the nitrocarburized layer as well as the untreated material. The microhardness has been increased to a maximum value of more than nine times compared to that of the untreated one. The corrosion performance is characterized by potentiodynamic polarization technique and was found to be treatment time dependent.     

Etching and structure changes in PMMA coating under argon plasma immersion ion implantation

A thin (120 nm) polymethylmethacrylate coating was treated by plasma immersion ion implantation with Ar using pulsed bias at 20 kV. Ellipsometry and FTIR spectroscopy and gel-fraction formation were used to detect the structure transformations as a function of ion fluence. The kinetics of etching, variations in refractive index and extinction coefficient in 400-1000 nm of wavelength, concentration changes in carbonyl, ether, methyl and methylene groups all as a function of ion fluence were analyzed. A critical ion fluence of 10¹⁵ ions/cm² was observed to be a border between competing depolymerization and carbonization processes. Chemical reactions responsible for reorganization of the PMMA chemical structure under ion beam treatment are proposed.     

等离子体浸没离子注入绝缘材料的研究

等离子体浸没离子注入是一种新形式的离子注入技术,是利用负偏压工件周围形成的等离子体鞘层进行离子加速、进而获得离子注入.等离子体注入的前提条件是工件导电,因此对于绝缘材料的等离子体注入可能存在问题.本文从理论和实际处理的角度论证了绝缘材料等离子体注入的可能性、可操作性,并给出了一些实际例证.