Analysis of the effects of bias phase and wavelength choice on the design of dual-wavelength diffractive optical elements

Diffractive optical elements (DOEs) are often used in pattern formation for display purposes. Constructing these images from two or more colors greatly enhances their visual effect. To achieve this with DOEs is not simple, as they are inherently wavelength specific. We discuss an algorithm for designing quantized elements that produce distinct intensity patterns in the far field for two wavelengths. The benefits of applying bias phase to the dual-wavelength problem are investigated. The difference between the best and the worst choice of bias phase is shown to produce a variation of up to 2% in the efficiency. The mean square error can vary by up to a factor of 2 between the best and the worst case. It is also critically important to understand how the values of the two wavelengths affect the result. We present an analysis of how choosing different pairs of wavelengths in the design process affects the quality of our results.     

Red-green-blue interferometer for the metrology of discontinuous structures

Discontinuous surface profiles, e.g., diffractive optical elements (DOEs), are commonly measured by white-light interferometry. White-light interferometry needs significantly more memory capacity and computer time than does phase-shifting interferometry; there are approximately ten times more frames to be taken to gather the required information about the object under test. But usually the grooves of the DOEs are too deep for single-wavelength phase-shifting interferometry. Here we show how phase-shifting techniques can be applied to DOEs. For this purpose three interference patterns are recorded simultaneously by a three-chip color CCD camera at three wavelengths (Red-green-blue). It is possible to calculate separately the optical path difference at each pixel from the three phase patterns modulo 2pi. The algorithms used and experimental results are presented.     

Diffractive optical elements for beam shaping of monochromatic spatially incoherent light

Fresnel-type diffractive optical elements (DOEs) for general beam shaping of monochromatic, spatially incoherent light are demonstrated. Direct and indirect methods, i.e., adding a lens' phase to the designed Fraunhofer-type DOEs, are used for the design. The indirect method can reduce the calculation time by approximately half without loss of design accuracy. Two different design examples are shown. For one design the direct method gives a maximum sidelobe intensity of 5.0% of the maximum intensity in the signal window. For the second design the indirect method gives 23.0% of this value. The generated patterns can maintain their basic shapes over a long distance. The elements have been fabricated by directly using gray-scale commercial slides as masks. Experimental results are in close agreement with numerical predictions.     

Double diffractive optical element system for near-field shaping

Iterative algorithms based on Fourier transform are used for the design of diffractive optical elements (DOEs), which produce a given intensity distribution, usually at the far field. For the near field, these algorithms can also be used by changing the Fourier transform for the Fresnel transform. However, when the distance between the DOE and the observation plane is short, the results obtained with this modification are not always valid. In the present work, we develop a technique for obtaining the desired intensity distribution in the near field using two DOEs in tandem. We have designed an algorithm based on the standard Gerchberg-Saxton algorithm to determine the modulation of the two DOEs. The best results are obtained when the first DOE modulates the amplitude and the second DOE modulates the phase.     

Optimal quantization method for uneven-phase diffractive optical elements by use of a modified iterative Fourier-transform algorithm

A method based on an iterative Fourier-transform algorithm (IFTA) with phase optimization for phase-only multilevel diffractive optical elements (DOEs) is presented. Phase optimization by minimizing the mean-squared error composed of an amplitude-weighted probability-density function is performed in the IFTA iterations to ensure that the wavefront difference is minimized and thus to improve the DOEs' performance. Using the proposed method, we obtained a small standard deviation of diffraction efficiency of 20 uneven-phase DOEs, showing that DOEs with high diffraction efficiency did not vary significantly with the initial conditions. The simulation results of even- and uneven-phase four-level DOEs designed by use of direct and stepwise quantization IFTA methods are compared.     

Polarization-multiplexed diffractive optical elements with liquid-crystal displays

We show experimental results for programmable polarization multiplexing of diffractive optical elements (DOEs) onto two liquid-crystal displays (LCDs). The first LCD encodes the two multiplexed phase-only diffractive optical elements. The second LCD acts as a pixelated polarization rotator to change the polarization state for each of these two DOEs. Although the system requires precise alignment, the DOE's and polarization angles are fully programmable.     

Zeroth-order phase-contrast technique

What we believe to be a new phase-contrast technique is proposed to recover intensity distributions from phase distributions modulated by spatial light modulators (SLMs) and binary diffractive optical elements (DOEs). The phase distribution is directly transformed into intensity distributions using a 4f optical correlator and an iris centered in the frequency plane as a spatial filter. No phase-changing plates or phase dielectric dots are used as a filter. This method allows the use of twisted nematic liquid-crystal televisions (LCTVs) operating in the real-time phase-mostly regime mode between 0 and p to generate high-intensity multiple beams for optical trap applications. It is also possible to use these LCTVs as input SLMs for optical correlators to obtain high-intensity Fourier transform distributions of input amplitude objects.     

Completely passive method of speckle reduction utilizing static multimode optical fibre and two-dimensional diffractive optical element

ABSTRACT

In this paper, we present experimental results on speckle noise suppression using a completely passive method. The passivity of the method is achieved owing to the absence of any mechanical, electronic, or other dynamic influences on the optical scheme elements. In the experiment, a multimode semiconductor 520?±?5-nm laser with a spectral bandwidth of 2?nm, static two-dimensional (2D) and 2?×?1D diffractive optical elements (DOEs), as well as multimode single-core optical fibre and multimode optical fibre bundle were used. The dependence of the speckle reduction efficiency as a function of the optical fibre type and optical fibre length was measured for different DOEs. A speckle contrast of 0.148 and speckle reduction coefficient of 2.38 were obtained for a 2.5-m-long multimode optical fibre bundle. The experimental results confirmed that it is possible to construct completely passive optical circuits with reduced speckle noises using static multimode optical fibres and diffraction optical elements.     

Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 microm in diameter and 5.9 microm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.     

Effects of the spatial frequency composition of the target pattern and the number of quantization levels in diffractive beam shaper design

A mathematical model is derived, and numerical simulation is analyzed for laser beam shaping by using multilevel phase-only diffractive optical elements (DOEs). We used the simulated annealing algorithm to design the beam shapers. The result has an essential effect on the diffractive pattern quality caused by the spatial frequency composition of target patterns for the same incident gaussian beam size and target pattern area. The root mean square error between the diffractive and target patterns is smaller for the target patterns with lower spatial frequencies. Moreover, the effect of spatial frequency composition can be relaxed for the cases of larger incident gaussian beam size. In addition, finer quality control of a diffraction pattern can be obtained by increasing the number of quantization levels at the DOEs.     

Parametric dependencies of high-diffraction-order achromatized aplanatic configurations that employ circular or crossed-linear diffractive optical elements

The parametric relationships of achromatized transmissive and reflective diffractive optical elements (DOEs) are explored for a number of configuration classes as a function of diffraction order, focal ratio, wavelength, and field angle. The necessity for blazing high-diffraction-order DOEs is elucidated. The ray image sizes are presented in dimensionless imaging space and thus are applicable to any size of optical system. Several aplanatic configurations are evaluated.     

Sapphire-GaN-based planar integrated free-space optical system

We report on the design and fabrication of a planar integrated free-space optical system working on the basis of binary phase diffractive optical elements (DOEs) realized in GaN on a sapphire substrate. Group III-nitride/sapphire substrates enable the parallel monolithic integration of passive microoptical elements like lenses and gratings as demonstrated here and optoelectronic devices like light emitters and photodetectors on a single wafer. We present an approach for the simultaneous optimization of the efficiency of transmissive and reflective diffractive optical elements processed in a single lithographic etching step.     

Multi-wavelength optical pickup with diffractive optical elements

Abstract

A novel, to our knowledge, multi-wavelength diffractive optical pickup is presented. The pickup enables multi-focus imaging and increases the data transfer rate considerably. Parallel reading of two or more memory layers is possible. The different spots can be controlled independently. The optical pickup consists of different diffractive optical elements (DOEs). The measured full-width at half-maximum (FWHM) spot intensity for the DOE-pickup is 0.76 μm—close to the diffraction limited predicted value of 0.71 μm—indicating good optical performance. The measured highest diffraction efficiencies of the realized DOEs are about 92%.     

Diffractive optical elements designed for highly precise far-field generation in the presence of artifacts typical for pixelated spatial light modulators

Diffractive optical elements (DOEs) realized by spatial light modulators (SLMs) often have features that distinguish them from most conventional, static DOEs: strong coupling between phase and amplitude modulation, a modulation versus steering parameter characteristic that may not be precisely known (and may vary with, e.g., temperature), and deadspace effects and interpixel cross talk. For an optimal function of the DOE, e.g. as a multiple-beam splitter, the DOE design must account for these artifacts. We present an iterative design method in which the optimal setting of each SLM pixel is carefully chosen by considering the SLM artifacts and the design targets. For instance, the deadspace-interpixel effects are modeled by dividing the pixel to be optimized, and its nearest neighbors, into a number of subareas, each with its unique response and far-field contribution. Besides the customary intensity control, the design targets can also include phase control of the optical field in one or more of the beams in the beam splitter. We show how this can be used to cancel a strong unwanted zeroth-order beam, which results from using a slightly incorrect modulation characteristic for the SLM, by purposely sending a beam in the same direction but with the opposite phase. All the designs have been implemented on the 256 x 256 central pixels of a reflective liquid crystal on silicon SLM with a selected input polarization state and a direction of transmission axis of the output polarizer such that for the available different pixel settings a phase modulation of ~2pi rad could be obtained, accompanied by an intensity modulation depth as high as >95%.     

Modeling considerations for rigorous boundary element method analysis of diffractive optical elements.

Critical modeling issues relating to rigorous boundary element method (BEM) analysis of diffractive optical elements (DOEs) are identified. Electric-field integral equation (EFIE) and combined-field integral equation (CFIE) formulations of the BEM are introduced and implemented. The nonphysical interior resonance phenomenon and thin-shape breakdown are illustrated in the context of a guided-mode resonant subwavelength grating. It is shown that modeling such structures by using an open geometric configuration eliminates these problems that are associated with the EFIE BEM. Necessary precautions in defining the incident fields are also presented for the analysis of multiple-layer DOEs.     

Adjustable refractive power from diffractive moiré elements

We show how suitable combinations of cascaded diffractive optical elements (DOEs) can form a combined "moiré DOE" of adjustable refractive power and high diffraction efficiency. The optical power can be adjusted continuously by a mutual rotation of one DOE with respect to the other. Fresnel lenses and axicons of variable refractive power or spiral phase plates of adjustable helical charge can be realized this way.     

Diffractive light attenuators with variable transmission

Abstract

A new application of diffractive optical elements (DOEs) for continuous or multistage adjustment of optical radiation intensity is described. The diffractive attenuators are linear or circular gratings (amplitude or phase) with constant period and diffraction efficiency that varies across the grating. The zero order of diffraction is used as the output and transmitted through the grating without angular deviation. The diffractive attenuators, in distinction to conventional analogues, allow one to change the intensity of the light beam according to predetermined function and have no limitations for power of the regulated light beam. These elements can be used in optical systems as a beam splitter with adjusted splitting coefficient. The experimental results on a circular diffractive attenuator fabricated by direct laser writing on a chromium film are presented. The range of transmission variation was 20 times within a 340° angle of attenuator turn. The possibility to use a phase diffractive attenuator as a light radiation modulator for a powerful technological laser is discussed.     

Effects of fabrication errors in the diffractive optical element on the modulation transfer function of a hybrid lens

Diffractive optical elements (DOEs) are often used to improve the performance of optical systems. However, when a blazed DOE is machined, shape errors can be generated in the discontinuity region of the DOE due to the finite radius of the processing tool. We simulated the effects of this shape error on the optical path and modulation transfer function (MTF) in a hybrid lens for a compact camera module. The decrease rate of the MTF was larger in the low-spatial-frequency domain and when the light entered at a low incident angle.     

High-efficiency blazed diffractive optical elements for the violet wavelength fabricated by electron-beam lithography

Blazed diffractive optical elements (DOEs) were studied for the violet wavelength by electron-beam lithography. By optimizing electron-beam writing parameters and electron-dose distributions, we fabricated eight kinds of grating (period A = 10-0.54 microgm) with excellent blazed structure. It has been demonstrated that the measured diffraction efficiency values agreed well with the rigorous theoretical ones. For the fine period of 0.54 microm, we confirmed a peak appearance of 75.6% (TE) experimentally. A wave aberration as small as approximately 0.01 lambda (rms) was obtained for the first-order diffracted wave from the fabricated DOEs. Blazed DOEs for the violet wavelength could be used as key devices in a high-density optical disk pickup of the next generation.     

Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors

The intensity uniformity of the spots generated by fan-out diffractive optical elements (DOEs) (or kinoforms) is often highly sensitive to any fabrication error that leads to a deviation of the surface-relief depth of the DOE from its design value. Many of the fabrication errors, such as those that are due to insufficient control of development or etch rates, increase almost linearly with the desired relief depth in every position of the DOE. We present an algorithm for designing fan-out DOEs with a significantly reduced sensitivity of the intensity uniformity to such errors. The reduced sensitivity can be obtained without reducing the efficiency of the DOE. Experimental results for fabricated DOEs show that reduced sensitivity is also obtained in practice.