Improvement of on/off ratio in ZnO thin-film transistor by using growth interruptions during metalorganic chemical vapor deposition

We developed a new method to realize enhancement-mode zinc oxide (ZnO) thin-film transistors (TFT) by metalorganic chemical vapor deposition (MOCVD). We used growth interruptions during MOCVD to encourage complete oxidation of deposited ZnO film, where diethylzinc and oxygen were used as sources. With this method, turn-off characteristics were significantly improved, and threshold voltage was shifted to positive voltages. ZnO TFTs grown at 450 °C showed 10⁷ on/off ratio with 18 cm²/V s mobility, and + 5 V threshold voltage. Our data support that the surface layer is also important in determining ZnO TFT characteristics.     

Flexible organic thin-film transistors using single-walled carbon nanotubes as an activated channel

We report on the fabrication of organic thin-film transistors (OTFTs) with a spun cross linked poly-4-vinylphenol (PVP) dielectric on a polyethersulphone (PES) flexible substrate. To improve the electrical performance of OTFTs, we employed a random single-walled carbon nanotubes (SWNTs) network as a carrier transfer underlay without sacrificing the flexibility of the TFTs. The random SWNTs showed that they can act as a semiconducting channel and conduction path to shorten the channel length in our TFTs. The flexible thin-film transistors (TFTs) with a random SWNTs/pentacene bilayer as an active channel exhibited an improved saturation field effect mobility (µ_sat) of 2.6 × 10^− 1 cm²/Vs compared to that of TFTs without the SWNTs underlay, while creating only a minor reduction of the current on/off ratio.     

The effect of thermal annealing sequence on amorphous InGaZnO thin film transistor with a plasma-treated source–drain structure

In this paper, the effects of thermal annealing and the plasma treatment sequence on the performance of amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) without conventional source/drain (S/D) layer deposition were investigated. We fabricated TFTs using two different processes, one where S/Ds were plasma-treated after thermal annealing, the second where the S/Ds were plasma-treated before annealing. The performance of the former exhibited a linear mobility of 4.97 cm²/V s, an on/off ratio of 4.6 × 10⁶, a V_th of 2.56 V, and a subthreshold slope of 0.65 V/decade. However, the TFT parameters of the latter sample were reduced to a linear mobility of 0.07 cm²/V s, an on/off ratio of 1.5 × 10⁵, a V_th of 2.33 V, and a subthreshold slope of 3.54 V/decade. It was shown that the sheet resistance of plasma-treated S/D areas increased after thermal annealing by about three orders of magnitude. As a result, the increase of the sheet resistance caused a decrease of TFT performance.     

N-type PTCDI–C13H27 thin-film transistors deposited at different substrate temperature

N-type organic thin-film transistors based on N,N′-ditridecylperylene-3,4,9,10-tetracarboxylic diimide have been fabricated by thermal evaporation at different substrate temperatures. The best device was obtained at 120 °C with a field-effect mobility of 0.12 cm²/V·s and threshold voltage around 46 V. In this work, the microstructure of the films is correlated with the device performance. In particular, the dependence of the activation energy for the channel conductance on gate voltages has been related to the properties of the layers.     

Thin film transistors by solution-based indium gallium zinc oxide/carbon nanotubes blend

Solution-based indium gallium zinc oxide (IGZO)/single-walled carbon nanotubes (SWNTs) blend have been used to fabricate the channel of thin film transistors (TFTs). The electrical characteristics of the fabricated devices were examined. We found a low leakage current and a higher on/off currents ratio for TFT with SWNTs compared to solution-based TFTs made without SWNTs. The saturation field effect mobility (μ_sat) of about 0.22 cm²/Vs, the current on/off ratio is ~ 10⁵, the subthreshod swing is ~ 2.58 V/decade and the threshold voltage (V_th) is less than − 2.3 V. We demonstrated that the solution-based blend active layer provides the possibility of producing higher performance TFTs for low-cost large area electronic and flexible devices.     

Stability of indium-oxide thin-film transistors by reactive ion beam assisted deposition

This work reports on the performance and stability of bottom-gate In₂O₃-TFTs with PECVD silicon dioxide gate dielectric. A highly-resistive amorphous In₂O₃ channel layer was deposited at room temperature by reactive ion beam assisted evaporation (IBAE). The field-effect mobility of the n-channel TFT is 33 cm²/V-s, along with an ON/OFF current ratio of 10⁹, and threshold voltage of 2 V. Device stability was demonstrated through measurement of the threshold voltage shift during long-term gate bias-stress and current stress experiments. Device performance, including stability, together with low-temperature processing, makes the indium-oxide TFT an attractive candidate for flexible transparent electronics, and display applications.     

High-performance amorphous indium-gallium-zinc oxide thin-film transistors with polymer gate dielectric

The fabrication of amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) with a spin-coated polymer gate dielectric on a glass substrate is reported. The interface state density at the poly(4-vinylphenol)/a-IGZO interface is only around 4.05 × 10¹¹ cm^− 2. The TFTs' threshold voltage, subthreshold swing, on-off current ratio, and carrier mobility are 2.6 V, 1.3 V/decade, 1 × 10⁵, and 21.8 cm²/V s, respectively. These characteristics indicate that the TFTs are suitable for use as nonvolatile memory devices and in flexible electronic applications.     

Fabrication of high performance low temperature poly-silicon backplanes on metal foil for flexible active-matrix organic light emission diode displays

We have developed Low Temperature Poly-Silicon (LTPS) backplanes on metal for flexible 2.8-in. Active-Matrix Organic Light Emission Diode (AM-OLED) displays. The PMOS devices exhibit interesting characteristics such as field-effect mobility of 83 cm²/V.s, on/off current ratio of more than 10⁷, a substhreshold slope of 0.47 V/dec, and a leakage current of 0.02 pA/μm at Vds = 0.1 V. Also, thin film transistors (TFT) characteristics were shown to be very homogeneous across the plates. These good performances are attributed to the possibility of developing an LTPS process on metal very close to the process existing on glass, thanks to the use of plasma enhanced chemical vapour deposition (PECVD) SiO₂ as the thick insulator, which provides to maintain high temperature budget. The influence of the metal substrate as a back-gate was studied as a function of the insulator thickness. Based on simulation and measurements, it was evidenced that the metal potential can have a significant influence on the TFT operation. Overall, this self-aligned LTPS process on metal seems to be very promising for the manufacturing of high quality and high resolution flexible AM-OLED displays.     

Highly conductive, undoped ZnO thin films deposited by electron-cyclotron-resonance plasma sputtering on silica glass substrate

The electrical and optical properties of undoped ZnO films deposited by electron cyclotron resonance (ECR) plasma sputtering at room temperature were characterized. The lowest resistivity we achieved was 2.6 × 10^− 3 Ωcm with optical transmittance at visible wavelengths higher than 85%. The X-ray diffraction (002) peak was weak and the rocking curve was asymmetrical, indicating that oxygen vacancies prevented large crystalline domains from forming. At low argon-sputtering-gas pressure, carrier concentration and Hall mobility increased with increasing argon pressure. When the optimum pressure (40 mPa) was exceeded, however, Hall mobility and optical transmittance were severely reduced, which indicated that excess Zn atoms were populated at the interstitials of the network. Admitting only 0.67 mPa of O₂ gas during deposition deteriorated resistivity over 1 MΩcm due to high excitation efficiency in the ECR plasma. Deposition under a higher magnetic field produced lower resistivities.     

Inkjet-printed InGaZnO thin film transistor

We report inkjet-printed InGaZnO (IGZO) thin film transistors (TFTs). IGZO ink was prepared by dissolving indium nitrate hydrate, gallium nitrate hydrate and zinc acetate dihydrate into 2-methoxyethanol with additional stabilizers. The resulting films were inkjet-printed with a resolution of 300 dots per inch using droplets with a diameter of 40 µm, and a volume of 35 pl. The films exhibited high optical transparency in the visible range and had a polycrystalline phase of InGaO₃(ZnO)₂ after thermal annealing treatment. The chemical composition of this IGZO sample was also determined, and shown to have high stoichiometric characteristics of low oxygen deficiency. The TFTs with a conventional inverted staggered structure using inkjet-printed IGZO as an active channel layer had a field-effect mobility of ~ 0.03 cm²/Vs in saturation region and an on-to-off current ratio greater than ~ 10⁴.     

Optical and electrical properties of 2 wt.% Al2O3-doped ZnO films and characteristics of Al-doped ZnO thin-film transistors with ultra-thin gate insulators

Al-doped ZnO (AZO) thin films have been prepared on the c-Si oriented direction of (100) and glass substrates, by radio frequency magnetron sputtering from ZnO-2 wt.% Al₂O₃ ceramic targets. The effects of the working pressure on the optical and electrical properties of the films have been studied. The optical properties, measured by the ultraviolet-visible system, show that the transmittance and optical bandgap energy are influenced by the working pressure. The Hall resistivity, mobility, and carrier concentration were obtained by a Hall measurement system and these parameters were also influenced by the working pressure. The AZO thin-film transistors (TFTs) were fabricated on highly doped c-Si substrates. The TFT structures were made up AZO as the active layer and SiO_xN_y/SiN_x/SiO_x as the gate layer with 20 nm and 35 nm thickness, respectively. The ultra-thin TFTs had an on/off current ratio of 10⁴ and a field-effect mobility of 0.17 cm²/V·s. These results show that it is possible to fabricate an AZO TFT that can be operated with an ultra-thin gate dielectric.     

Thin-film transistors with sol-gel deposited Mg0.1Zn0.9O films as active channel layer

We report on field-effect transistors using Mg_0.1Zn_0.9O thin film as channel layer. The effect of Mg is to increase the band gap and decrease the electron carrier concentration. The Mg_0.1Zn_0.9O film deposited by sol-gel method has a highly c-axis orientation and excellent optical properties. The devices display a channel mobility of 0.76 cm² V^− 1 s^− 1 and an on/off ratio of 400.     

A High‐Performance Optical Memory Array Based on Inhomogeneity of Organic Semiconductors

Organic optical memory devices keep attracting intensive interests for diverse optoelectronic applications including optical sensors and memories. Here, flexible nonvolatile optical memory devices are developed based on the bis[1]benzothieno[2,3‐d;2′,3′‐d′]naphtho[2,3‐b;6,7‐b′]dithiophene (BBTNDT) organic field‐effect transistors with charge trapping centers induced by the inhomogeneity (nanosprouts) of the organic thin film. The devices exhibit average mobility as high as 7.7 cm² V^?1 s^?1, photoresponsivity of 433 A W^?1, and long retention time for more than 6 h with a current ratio larger than 10⁶. Compared with the standard floating gate memory transistors, the BBTNDT devices can reduce the fabrication complexity, cost, and time. Based on the reasonable performance of the single device on a rigid substrate, the optical memory transistor is further scaled up to a 16 × 16 active matrix array on a flexible substrate with operating voltage less than 3 V, and it is used to map out 2D optical images. The findings reveal the potentials of utilizing [1]benzothieno[3,2‐b][1]benzothiophene (BTBT) derivatives as organic semiconductors for high‐performance optical memory transistors with a facile structure. A detailed study on the charge trapping mechanism in the derivatives of BTBT materials is also provided, which is closely related to the nanosprouts formed inside the organic active layer.     

Some physical properties of Sn-doped CdO thin films prepared by chemical bath deposition

Undoped and Sn-doped CdO thin films were prepared by the chemical bath deposition method by means of a procedure that improves the deposition efficiency. All as-grown films were crystallized in the cubic structure of cadmium peroxide (CdO₂) and transformed into CdO with a cubic structure after an annealing process. The as-grown films have a high resistivity (> 10⁶ Ω cm) and an optical bandgap around 3.6 eV. Undoped CdO displays an optical bandgap around 2.32–2.54 eV and has an electrical conductivity of 8 × 10^− 4 Ω cm. The Sn incorporation into CdO produces a blue shift in the optical bandgap (from 2.55 to 2.84 eV) and a decrease in the electrical conductivity.The deposition procedure described here gives colloid-free surface thin films as indicated by the surface morphology analysis.     

Characteristics of laser-annealed ZnO thin film transistors

We investigated the effects of laser annealing on ZnO thin film transistors (TFTs). ZnO layers were deposited on a bottom-gate patterned Si substrate by radio-frequency sputtering at room temperature. Laser annealing of the ZnO films reduced the full width at half maximum of the ZnO (002) diffraction peak from 0.49° to 0.1°. It reveals that the crystalline quality is improved by annealing effect. A SiO₂ formed in low temperature was used as the gate dielectric. Unannealed ZnO-TFTs were operated in enhancement mode with a threshold voltage of 21.6 V. They had a field-effect mobility of 0.004 cm²/Vs and an on/off current ratio of 134. Laser annealing of the ZnO-TFTs by 200 laser pulses reduced their threshold voltage to 0.6 V and increased their field-effect mobility to 5.08 cm²/Vs. The increase of mobility is originated from the crystallization enhancement of ZnO films after laser annealing.     

Electron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs

We have investigated the characteristics of transparent metal-insulator-semiconductor field-effect transistors (MISFETs) fabricated using InGaO₃(ZnO)_m (m=integer) single-crystalline thin films as n-channel layers and amorphous alumina as gate insulator films. The MISFETs exhibit good characteristics such as insensitivity to visible light illumination, off-current as low as ∼1 nA with a positive threshold voltage of ∼3 V and on/off current ratio of 10⁵. The field-effect mobility increased from ∼1 to ∼10 cm² (V s)⁻¹ as the m-value increased. Room temperature Hall mobility also increased. However, unexpectedly these values were lower than the field-effect mobility. It is explained by existence of shallow localized state in the homologous compounds.     

Flexible organic field-effect transistors and complementary inverters based on a solution-processable quinoidal oligothiophene derivative

We report on the fabrication and characterization of ambipolar organic field-effect transistors based on the solution-processable quinoidal oligothiophene [QQT(CN)4] and using a new fluorinated polymer (AL-X601) with a dielectric constant of 3.1 as dielectric material layer. As-prepared devices show ambipolar transport with hole and electron field-effect mobilities of 6 × 10⁻² and 5 × 10⁻³ cm²/V s respectively as well as an on and off state current ratio higher than 10³. Influence of a thermal annealing on the device performances was investigated and was found to lead to a majority carrier type conversion from a p-type to an n-type dominant behavior. QQT(CN)4 based field-effect transistors and complementary inverters fabricated on flexible substrates and using Al-X601 as gate dielectric material show high performance and good mechanical stability.     

Characteristics of transparent ZnO based thin film transistors with amorphous HfO2 gate insulators and Ga doped ZnO electrodes

Coplanar type transparent thin film transistors (TFTs) have been fabricated on the glass substrates. The devices consist of intrinsic ZnO, Ga doped ZnO (GZO), and amorphous HfO₂ for the semiconductor active channel layer, electrode, and gate insulator, respectively. GZO and HfO₂ layers were prepared by using a pulsed laser deposition (PLD) and intrinsic ZnO layers were fabricated by using an rf-magnetron sputtering. The transparent TFT exhibits n-channel, enhancement mode behavior. The field effect mobility, threshold voltage, and a drain current on-to-off ratio were measured to be 14.7 cm²/Vs, 2 V, and 10⁵, respectively. High optical transmittance (> 85%) in visible region makes ZnO TFTs attractive for transparent electronics.     

Thickness dependence of mobility of pentacene planar bottom-contact organic thin-film transistors

We have fabricated planar bottom-contact organic thin-film transistors as a function of the thickness of the pentacene active layer. The highest mobility of the planar bottom-contact transistors is 0.47 cm²/Vs with only a 7 nm pentacene active layer. Our planar bottom-contact transistors show much higher mobility than conventional bottom-contact counterparts and even higher than the reported mobility values of top-contact counterparts for each thickness in the range from 2.5 to 10 nm. We find that spike at the edges of source and drain electrodes seriously deteriorates device performance.     

Improved performance of fluorinated copper phthalocyanine thin film transistors using an organic pn junction: Effect of copper phthalocyanine film thickness

We have investigated the effect of film thickness of copper phthalocyanine (CuPc) on improving fluorinated copper phthalocyanine (F₁₆CuPc) thin film transistor (TFT) performance with an organic pn junction. Electron field-effect mobility is exponentially enhanced up to 2.0 × 10^− 2 cm² V^− 1 s^− 1 with increasing of CuPc film thickness, and then unchanged when the CuPc thickness is over the saturation thickness (3 monolayers). The charge carrier density at the interface of F₁₆CuPc/CuPc decreases the total TFT resistance, which leads to the increase of mobility. Threshold voltage is suppressed with increasing CuPc films. On the other hand, larger current on/off ratio is obtained when islanded CuPc films are formed on the surface of F₁₆CuPc films. Therefore, employing an organic pn junction is an effective and simple method to fabricate high performance of n-channel transistors for practical applications.