气相沉积技术制备6.5wt%Si高硅钢的研究进展

综述了化学气相沉积法(CVD)、物理气相沉积法(PVD)和等离子体化学气相沉积法(PCVD)三类气相沉积技术制备高硅钢的工艺和路线,并对其前景进行了展望。     

现代刀具涂层制备技术的研究现状

刀具涂层是一种机床工具行业的重要材料,其性能直接影响数控机床的机械加工精度.概述了刀具涂层材料的特点、要求及涂层制备技术的发展,分析了化学气相沉积法、物理气相沉积法、等离子体增强化学气相沉积法及溶胶-凝胶法等几种涂层制备方法的优缺点.结合国内外刀具涂层的研究现状及发展趋势,指出在大力发展化学气相沉积涂层和物理气相沉积涂层技术的同时,开发两者相结合的新型工艺,推动国内刀具涂层技术的快速发展.     

铝铜薄膜复合技术的研究现状

综述了铝、铜薄膜复合技术的研究现状,介绍了气相沉积法和扩散连接方法对铝、铜薄膜的复合。气相沉积分为化学气相沉积和物理气相沉积,最受人们青睐的是物理气相沉积中的磁控溅射沉积法;扩散连接方法中讲述了扩散连接的过程,扩散工艺参数对扩散层组织结构、扩散层厚度的影响。     

铸铁文物用气相缓蚀剂研究

采用气相甄别法、失重法和封闭空间挥发减量法研究了多种气相缓蚀剂(VCI)对铁器文物的缓蚀效果,以此为基础,研制出了缓蚀性能优异的复合气相缓蚀剂。用扫描电子显微镜(SEM)和X射线散射能谱(EDS)研究了该缓蚀剂的缓蚀机理。     

气相缓蚀剂的研究进展

气相缓蚀剂使用简便、效果显著,已得到广泛应用,发展气相缓蚀剂评价方法,深入研究气相缓蚀剂机理,对气相缓蚀剂发展有着重要的作用和意义。本文阐述了气相缓蚀剂的机理、影响因素,介绍了失重法、电化学分析法、形态及结构分析等评价方法,总结了气相缓蚀剂的发展历程和研究前沿。     

铼及铼合金的应用现状及制造技术

比较详细地介绍了铼在石油化工、航空航天、冶金工业和电子工业等领域的应用.对铼制品的主要制备方法如电化学沉积法,粉末冶金法,电子束-物理气相沉积法和化学气相沉积法作了系统地总结和分析.     

TiO2薄膜制备技术研究进展

综述了目前较常用的制备TiO2薄膜的方法,包括溶胶-凝胶法、液相沉积法、化学气相沉积法、物理气相沉积法、电沉积法、喷雾热解沉积法、原子层沉积技术、离子自组装技术和水热法等,并对各方法进行了比较.     

纳米涂层应用及主要制备方法

介绍了纳米涂层的主要应用方面，概括介绍了目前常用的纳米涂层的制备方法，包括刷涂、热喷涂法、化学气相沉积、物理气相沉积、等离子化学气相沉积、溶胶—凝胶法等。     

化学气相沉积法制备难熔金属的研究现状与前景

难熔金属材料以其熔点高、高温性能好和耐腐蚀性优异等特点被广泛应用于航空航天、化学化工和国防军工等领域。化学气相沉积法是目前获得高纯致密、尺寸精确的难熔金属制品的最佳手段。本文介绍了钨、钼、钽、铌和铼五种难熔金属元素的应用领域,综述了采用不同的化学气相沉积法制备难熔金属及其合金的工艺、制品性能和具体用途,总结了金属源先驱体类型对化学气相沉积工艺的影响,分析展望了化学气相沉积法在制备难熔金属上的应用前景。     

最新高功能CVD成膜技术

随着工业技术的快速发展,对工业材料高功能、高性能化的要求也更高。作为高功能的工艺技术有气相沉积法。气相沉积大体分为两类即化学气相沉积法(CVD法)与物理气相沉积法(PVD法)。特别是CVD法,由于是通过在气相中或在基板表面的化学反应形成所要求的材料的薄膜,因此通过控制流入反应室内的化合物气体,可以高纯度地合成多种材料。     

Mechanism of scaling on oxidation reactor wall in TiO2 synthesis by chloride process

1 Introduction Titania particles are synthesized by the gas-phase oxidation of titanium tetrachloride in a high temperature tubular flow reactor on a large industrial scale. This so-called chloride process has been reported by several researchers[1?5]. In…     

Influence of TiCl4 treatment on performance of dye-sensitized solar cell assembled with nano-TiO2 coating deposited by vacuum cold spraying

Titanium tetrachloride (TiCl4) treatment was employed to TiO2 coating deposited on fluoride-doped tin oxide (FTO) conducting glass and indium oxide doped tin oxide (ITO) conducting glass, respectively. The nano-crystalline TiO2coating was deposited using a composite powder composed of polyethylene glycol (PEG) and 25 nm TiO2 particles by vacuum cold spraying (VCS) process. A commercial N-719 dye was used to adsorb on the surface of TiO2 coating to prepare TiO2 electrode, which was applied to assemble dye-sensitized solar cell (DSC).The cell performance was measured under simulated solar light at an intensity of 100 mW·cm-2.Results show that with an FTO substrate the DSC composed of a VCS TiO2 electrode untreated by TiCl4 gives a short-circuit current density of 13.1 mA·cm-2 and an open circuit voltage of 0.60 V corresponding to an overall conversion efficiency of 4.4%. It is found that after TiCl4 treatment to the VCSTiO2 electrode with an FTO substrate, the short circuit current density of the cell increases by 31%, the open-circuit voltage increases by 60 mV and a higher conversion yield of 6.5% was obtained. However, when an ITOsubstrate is used to deposit TiO2 coating by VCS, after TiCl4 treatment, the conversion efficiency of the assembled cell reduces slightly due to corrosionof the conducting layer on the ITO glass by TiCl4.     

二氧化钛纳米粉体的加糖热解法制备

分别采用钛酸四丁酯(无水乙醇作为溶剂)和稳定的四氯化钛(蒸馏水作为溶剂)为两种钛源,以加糖热解法[1]在不同的温度下处理得到二氧化钛粉体,并利用扫描电镜和X射线衍射对粉体微观结构和晶型进行分析.结果表明,两种制备方法得到的粉体晶粒尺寸均一,在50 nm左右.而锐钛矿和金红石型的成相温区存在明显差异:前者在300到500℃之间合成出较纯的锐钛矿相,600到700℃之间完成锐钛矿到金红石型的晶相转变;后者300℃就已经形成较好的锐钛矿结晶相,晶相转变发生在700到900℃之间.而两种方法的成相温度均低于一般方法.     

Production and Purification of TiCl<Subscript>4</Subscript>

A brief history of TiCl4 production and purification is given. Chlonnator feed materials for the production of TiCI4 are classified. The thermodynamics and kinetics of TiCl4 production by chlorination of TiO2 are discussed. Problems encountered in the chlorination and purification steps are outlined in detail.     

TiCl_4水解法制备TiO_2纳米颗粒包覆Ag纳米线阵列结构

采用水热法制备了TiO2纳米颗粒包覆Ag纳米线阵列结构。通过选区电子衍射手段确定了TiO2包覆层的晶体结构为锐钛矿。研究了TiCl4溶液浓度和温度对TiO2/Ag包覆结构形貌的影响,结果显示0.1 mol/L的TiCl4溶液能够得到连续均匀的TiO2包覆层,当TiCl4溶液浓度高于0.1mol/L时,水解产生的HCl在水热环境下会对Ag纳米线造成不同程度的腐蚀。80℃条件下能够得到较为均匀的TiO2包覆层和较高的结晶度;温度过低时,TiO2包覆层的结晶不明显,温度过高时,水解产生的HCl会对Ag纳米线产生腐蚀。     

TiO2 thin film photocatalyst

It is well known that the photocatalyfic activity of TiO2 thin films strongly depends on the preparing methods and post-treatmaent conditions, since they have a decisive influence on the chemical and physical properties of TiO2 thin films.Therefore, it is necessary to elucidate the influence of the preparation process and post-treatment conditions on the photocatalytic activity and surface microstructures of the films. This review deals with the preparation of TiO2 thin film photocatalysts by wet-chemical methods (such as sol-gel, reverse micellar and liquid phase deposition) and the comparison of various preparation methods as well as their advantage and disadvantage. Furthermore, it is discussed that the advancement of photocatalytic activity, super-hydrophilicity and bactericidal activity of TiO2 thin film photocatalyst in recent years.     

聚乙二醇对TiO2-SiO2粒子的生成及光催化性能影响

以TiCl4为原料,采用自组装技术制备TiO2-SiO2复合粒子,加入聚乙二醇2000（PEG 2000）,探讨聚乙二醇对TiO2-SiO2粒子生成及光催化降解甲基橙的影响。研究发现：随组装次数的增多,复合粒子表面TiO2 的含量增多;随PEG2000的加入,TiO2颗粒间呈现一定的孔隙,使TiO2层粒子的表面积增加;样品经550 ℃煅烧,得到均为锐钛矿与金红石的混合相,且随着PEG2000含量的增加,锐钛矿的相对含量随之增加;光催化实验表明,PEG2000的掺杂使TiO2-SiO2的光催化性能得以提高。     

Effect of La^3＋ on evolution of TiO2 coating layers on lamellar sericite and their pigmentary properties

TiO2-coated sericite powders were prepared by the chemical deposition method starting from lamellar sericite and TiCl4 in the presence of La3+. After calcination at 900 ℃ for 1 h, the resultant TiO2 nanoparticles on the sericite surfaces exist in anatase phase. The light scattering indexes of the TiO2-coated lamellar sericite powders are dozens of times higher than those of the naked lamellar sericite powders, varying with different contents of La3+. The presence of La3+ in the deposition solution is beneficial to the formation of the small-sized anatase TiO2 nanoparticles. The presence of La3+ also favors the formation of the dense and uniform island-like TiO2 coating layers in a large range of the mass ratio of TiO2 to sericite from 5% to 20%. XPS analysis shows that when La3+ is absent in the reaction solution, TiO2 coating layers anchor on the sericite surface via Ti-O-Si and Ti-O-Al bonds. The presence of La3+ causes the formation of Si-O-La and Al-O-La bonds on the sericite surface and Ti-O-La bond on the surface of TiO2 coating layers.     

Phase formation regularities in nanometer powders of Al-Cu-X ternary alloys prepared by gas evaporation process

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Synthesis of iron(Ⅲ)-doped nanostructure TiO2/SiO2 and their photocatalytic activity

Iron(Ⅲ)-doped nanostructure TiO2-coated SiO2 (TiO2/SiO2) particles were prepared using the layer-by-layer assembly technique and their photocatalytic property was studied. TiO2 colloids were synthesized employing the sol-gel method with TiCl4 as a precursor. The samples were characterized by Fourier transform infrared spectroscopy (FTIR), SEM, EDS, XPS, and XRD. The experimental results show that TiO2 nanopowders on the surface of SiO2 particles are well distributed, the amount of TiO2 is increased with the adding of coating layers, the pure anatase-TiO2 coating layers are synthesized at 500℃, and the photocatalytic activity of Fe3+-doped TiO/SiO2 is higher than tnat of undoped TiO2/SiO2.