Stacking-faults in tellurium-doped gallium arsenide

Samples of bulk-grown gallium arsenide single crystals, taken from both static freeze, and Czochralski ingots doped to a high level with tellurium, have been examined using transmission electron microscopy. Observation of single and multiple stacking-fault layers which have fault vectors of the kindR=a/3111 is reported. It is shown by diffraction contrast experiments that the stacking-fault defects are extrinsic. They are thought to be rafts of tellurium substituting for arsenic in {111} planes. The prevalence of the observed layer defects correlates well with the increase in carrier concentration in certain regions of the crystals.     

Electrical and optical properties of annealed gallium arsenide thin films on glass substrates

The effects of annealing in vacuum on the electrical and optical properties of GaAs thin films deposited by the flash evaporation method were studied. Thin films of compound GaAs deposited upon glass substrates at room temperature were annealed in a vacuum of 2×10^–6 torr at different temperatures up to 350° C. The properties of the films depended strongly on annealing temperature. The lowest resistivity measured was about 1.6 × 10⁴ cm at an annealing temperature of about 240° C. The activation energy of as-deposited and annealed films were measured and compared. Optical absorption measurements of the asdeposited samples and the samples annealed at a temperature of 240° C were made as a function of photon energy.     

The nature of inclusions in heavily tellurium-doped gallium arsenide

Large elongated inclusions in heavily Te-doped 〈001〉 Czochralski pulled, GaAs crystals have been studied by a combination of scanning and transmission electron microscopy, electron microprobe analysis and X-ray topography. They have been shown to lie along the 〈110〉 directions in the {001} growth plane and to consist of two parts, an outer single crystal region of varying composition based on Ga₂Te₃ and an inner polycrystalline core rich in Te and As. Their crystallography has been interpreted in terms of impurity segregation and facet formation during crystal growth while their composition is discussed with reference to the Ga-As-Te phase diagram.     

Electrical properties of thin metal zinc films

Thin metal zinc films 40 to 200 nm thick are deposited by thermal evaporation at room temperature onto glass substrates with a deposition rate of 0.2 to 0.7 nm sec^–1. The electrical resistivity is measured as a function of film thickness, deposition rate and annealing temperature. The experimental results show that electrical resistivity decreases as the film thickness, deposition rate and annealing temperature increase, while the temperature coefficient of resistivity increases with the increase in the film thickness. The calculated values of the activation energy for the conduction electrons increases as the film thickness and deposition rate increase. The well known Fuchs-Sondheimer model is applied for zinc films. The theoretically calculated values for the electrical resistivity and the temperature coefficient of resistivity are in good agreement with the experimental results.     

Electrical properties of polycrystalline GaInAs thin films

Polycrystalline Ga_xIn_1 − xAs films with x ranging from 0 to 1 were deposited on glass substrates by molecular-beam deposition at 240 or 350 °C. Room temperature Hall-effect measurements showed that the Ga_xIn_1 − xAs films deposited at either temperature exhibit high electron concentrations in the range of 10¹⁸ cm^− 3 for x ≤ 0.21 while the electron concentration decreases with increasing Ga content for x ≥ 0.29 to be < 10¹⁵ cm^− 3 at x = 0.64. Even at the low deposition temperature of 240 °C, the electron mobility remains > 400 cm²/(V s) at x ~ 0.2 and then decreases with Ga content to be ~ 40 cm²/(V s) at x = 0.64. Temperature-varying Hall-effect measurements in the range of 100-390 K revealed that both the electron concentration and mobility of the samples with x ≤ 0.21 are almost independent of the measurement temperature, while those of the samples with x ≥ 0.30 decrease with decreasing measurement temperature. The concentrations and ionization energies of donor levels were deduced from the temperature dependence of the electron concentration with the non-parabolicity of the conduction band taken into account. The temperature dependences of electron mobility in the samples with x ≥ 0.30 are well explained in terms of thermionic electron emission across the grain-boundary barriers assuming fluctuation in potential barrier height, while the almost temperature-independent high electron mobilities in the samples with x ≤ 0.21 are attributed to the absence of potential barrier at the grain boundaries.     

Electrical properties of electrodeposited CdTe thin films

The electrical properties of electrodeposited CdTe thin films have been studied. The temperature-dependent electrical conductivity data obtained have been used to determine the conductivity type and semiconductor parameters (E _g, B, and α) of the films.     

Electrical properties of ZrO2 thin films

Electrical properties of sputtered ZrO₂ thin films have been studied using impedance spectroscopy, isothermal transient ionic current and current–voltage measurements. ZrO₂ have different dielectric properties when fresh, i.e. newly deposited, or aged. A fresh sample can arbitrarily show two different behaviors consisting of a d.c. conductivity with a relaxation peak superimposed on it. The d.c. conductivity shows either of two different values. The aged sample has a lower d.c. conductivity and the relaxation peak is found at much lower frequencies. Fresh samples of ZrO₂ also show switching behavior which aged samples never do. Analyses of current–voltage characteristics indicate hopping as the main conduction process.     

Electrical properties of thin oxidized aluminium films

Thin aluminium films of thickness 40 to 200 nm were deposited on to glass substrates at 573 K in a high vacuum. The deposition was carried out layer by layer and the interfaces between these layers were exposed to oxygen. The electrical resistivity was studied as a function of the film thickness, annealing time, annealing temperature and oxygen pressure. The temperature coefficient of resistivity and the activation energy for the conduction electrons were studied as a function of the film thickness and oxygen pressure. Fuchs-Sondheimer theory for electrical conduction was applied to the experimental results. The mean free path of the conduction electrons was calculated as a function of temperature and agreed well with the theoretical relation.     

Electrical properties of electron-gun-evaporated InAs thin films

Measurements of the resistivity and the Hall coefficient versus the temperature (77–300 K) and the magnetic field (0–11 kG) were performed on InAs thin films (100–1500 Å thick) obtained by vacuum evaporation from an electron gun and condensation onto glass substrates at room temperature. Analysis of the electrical results reveals the typical behaviour of disordered structures. The conductivity versus temperature curves exhibit an anomalous sharp variation which appears to separate two temperature ranges characterized by different conductivity slopes. Observation of the samples in a transmission electron microscope reveals the polycrystalline structure of the films. Electron spectroscopy for chemical analysis shows the sample to be non-stoichiometric with an excess of indium in the inner layers and the presence of indium and arsenic oxides at the surface of the films. Numerical analysis, performed with a multiparametric best-fit procedure, shows that the conductivity conforms to the percolation conductivity model but with an exponential temperature dependence, in accordance in the high temperature region with the more recent hypotheses regarding disordered structures.     

Electrical and optical properties of silicon-doped gallium nitride polycrystalline films

Si-doped GaN films in polycrystalline form were deposited on quartz substrates at deposition temperatures ranging from 300–623 K using r.f. sputtering technique. Electrical, optical and microstructural properties were studied for these films. It was observed that films deposited at room temperature contained mainly hexagonal gallium nitride (h-GaN) while films deposited at 623 K were predominantly cubic (c-GaN) in nature. The films deposited at intermediate temperatures were found to contain both the hexagonal and cubic phases of GaN. Studies on the variation of conductivity with temperature indicated Mott’s hopping for films containing c-GaN while Efros and Shklovskii (E-S) hopping within the Coulomb gap was found to dominate the carrier transport mechanism in the films containing h-GaN. A crossover from Mott’s hopping to E-S hopping in the ‘soft’ Coulomb gap was noticed with lowering of temperature for films containing mixed phases of GaN. The relative intensity of the PL peak at ∼2·73 eV to that for peak at ∼3·11 eV appearing due to transitions from deep donor to valence band or shallow acceptors decreased significantly at higher temperature. Variation of band gap showed a bowing behaviour with the amount of cubic phase present in the films.     

Electrical properties of electron-beam-evaporated indium oxide thin films

Crystalline (b.c.c.) indium oxide (In₂O₃) powder was evaporated using an electron beam and the structure of the deposited films was found to be amorphous. Studies of the a.c. conductance of films of various thicknesses were carried out in the audio frequency range (200 Hz to 30 kHz) at various temperatures. The current-voltage characteristics of the films were also studied. The dielectric breakdown field strength was determined for several film thicknesses and at various temperatures. The activation energies for the a.c. and d.c. conduction processes were estimated and the results are discussed.     

Electrical properties of vanadium tungsten oxide thin films

The vanadium tungsten oxide thin films deposited on Pt/Ti/SiO₂/Si substrates by RF sputtering exhibited good TCR and dielectric properties. The dependence of crystallization and electrical properties are related to the grain size of V_1.85W_0.15O₅ thin films with different annealing temperatures. It was found that the dielectric properties and TCR properties of V_1.85W_0.15O₅ thin films were strongly dependent upon the annealing temperature. The dielectric constants of the V_1.85W_0.15O₅ thin films annealed at 400 °C were 44, with a dielectric loss of 0.83%. The TCR values of the V_1.85W_0.15O₅ thin films annealed at 400 °C were about −3.45%/K.     

Electrical properties of sol-gel processed PLZT thin films

Sol-gel processed lanthanum-modified lead zirconate titanate (PLZT) thin films consisting of two different perovskite phase contents were fabricated on indium tin oxide coated Corning 7059 glass substrates with two different heating schedules: direct insertion at 650° C for 30 min and at 500° C for 2h. Optical transmittance spectra, polarization versus electric field curves, relative dielectric constant versus frequency and capacitance versus d.c. bias voltage curves of the samples were investigated. The samples showed a good transparency of over 70% and interference oscillation. A thin film consisting of mainly perovskite phase showed a slim loop hysteresis in the polarization versus electric field curve and in the capacitance versus d.c. bias voltage curve, indicating the presence of ferroelectric domains, but a film consisting of mainly pyrochlore phase did not. The dielectric constant and loss factor of the thin film consisting of mainly perovskite phase were about 90 and about 0.2, respectively, at relatively low frequency and showed dispersion of the dipolar polarization of permanent dipole moment in the ferroelectric perovskite phase in the frequency range between 10 kHz and 1 MHz.     

Electrical properties of In doped CdS thin films

Indium doped polycrystalline cadmium sulphide CdS:In thin films have been prepared by the spray pyrolysis technique on glass substrates in an enclosed dome. The different scattering mechanisms such as lattice, impurity and grain boundary scattering for CdS:In films are observed at low temperature, in the range of 303 to 120 K. The experimentally determined mobilities due to these scatterings are well interpreted with those of theoretically calculated mobilities. The d.c. conductivity for CdS:In films has also been studied in the same temperature region. The Mott variable range hopping conduction process followed below the temperature of 150 K. The Mott parameters such as N(E _F ), R, W and are found to be 1.26 × 10¹⁹ eV^–1cm^–3, 9.8 × 10^–-7cm, 0.02 eV^–1 and 2.38 × 10⁶cm^–1, respectively from the conductivity data.     

Electrical properties of thermally evaporated tellurium thin films

Results of dielectric and conduction properties of vacuum evaporated tellurium (Te) thin film capacitors (Al-Te-Al) have been reported in the frequency range 1–100 kHz at various temperatures (303–423 K). Loss factor (tanδ) which shows a maximum with frequency increases with rise of temperature and tanδ _max shift towards high frequency region. The large values of capacitance and dielectric constant (ɛ′) in the low frequency region indicate the possibility of an interfacial polarization mechanism.I-V characteristics show ohmic, space charge limited (SCLC) and thermionic emission conduction mechanisms to operate at low, intermediate and high voltages respectively. Various transport parameters have been calculated. It has been observed that the Schottky type of conduction is predominant in the high field region and the Schottky barrier height has been determined. The Hall coefficient, Hall mobility and carrier concentration are also discussed.     

Electrical and optical properties of TiN thin films

TiN thin films have been grown by reactive magnetron sputtering. It has been shown that an Ohmic contact to TiN thin-film can be made from indium. The TiN thin films have been shown to be n-type semiconductors with a carrier concentration of 2.88 × 10²² cm^?3 and resistivity of ρ = 0.4 Ω cm at room temperature. The activation energy for conduction in the TiN films at temperatures in the range 295 K < T < 420 K is 0.15 eV. The optical properties of the TiN thin films have been investigated. The material of the TiN thin films has been shown to be a direct gap semiconductor with a band gap E _g = 3.4 eV.     

Electrical properties of thin V-A1 alloy films

The electrical properties of V-Al alloy films of various thicknesses and compositions were studied. The V-Al films were evaporated using an electron gun in vacuum (pressure p ≈ 10^-5 Pa) onto quartz substrates at room temperature. The film resistivity vs. temperature was measured in situ in a vacuum of 10^-8-10^-6 Pa at temperatures ranging from 300 to 850 K. A saturation effect was observed in the resistivity. The above findings were analysed in terms of the shunt resistance model.