电沉积Ni-W-P非晶态合金工艺研究

研究了Bi-W-P非晶态合金的电沉积方法;讨论了电沉积液的温度、pH值和电流密度对镀层结构及成分的影响;同时对电沉积液的pH值和电流密度对镀层的硬度及耐蚀性的影响进行了研究。     

电沉积Ni—W—P非晶态合金工艺的研究

研究了Ni—W—P非晶态合金的电沉积方法;讨论了电沉积液的温度、pH值和电流密度(DK)对镀层结构及成分的影响;同时对电沉积液的pH值和电流密度对镀层硬度及耐蚀性的影响进行了研究。     

电沉积镍-碳钠米管复合镀层的工艺研究

利用电沉积方法制备了镍-碳纳米管复合镀层.分析了镀液中碳纳米管的悬浮量、镀液温度、pH值、阴极电流密度及搅拌速度对镀层中碳纳米管含量的影响.扫描电镜结果表明,碳纳米管能均匀地嵌镶于基体中,并且端头露出,覆盖于基体表面.     

电沉积Fe-Cr合金研究

三价铬盐的二甲基酰胺（ＤＭＦ）水溶液体系电沉积Ｆe-Cr合金,可获得含Ｃr12%-65%(质量分数）的光亮合金镀层,研究了阴极电流密度,镀液pH值,三价铬盐浓度对镀层分的影响及合金层耐腐蚀性能。     

直流电沉积Ni-W-P镀层研究

采用直流电沉积法,在低碳钢表面成功沉积Ni-W-P镀层。应用X射线荧光(XRF)、扫描电子显微镜(SEM)、俄歇电子能谱(AES)、X射线衍射(XRD)仪等方法,研究电流密度、镀液pH值和镀液温度对Ni-W-P镀层成分、表面形貌和结构的影响。结果表明,电流密度和镀液pH值的变化对Ni-W-P镀层成分的影响很大,而电流密度、镀液pH值和温度对镀层厚度的影响较小。电流效率随着电流密度和镀液温度的增大分别降低和升高,而随着镀液pH值的变化,在pH=7.0时有极大值。镀液pH值对Ni-W-P镀层结构有较大影响,在pH=8.0时,镀层呈现明显的Ni(111)峰,此时镀层硬度达到极大值7130MPa。在此基础上,对Ni-W-P镀层的电沉积机制做了进一步探讨。     

电镀锌铁合金工艺及光亮剂的研究

介绍了一种硫酸盐电镀锌铁合金工艺及新型光亮剂。研究了镀液中FeSO4.7H2O浓度、锌铁总离子浓度、光亮剂用量、阴极电流密度、pH值、温度等因素对镀层含铁量的影响。结果表明:随着镀液中锌铁总离子浓度和温度的升高,镀层的含铁量降低;随着阴极电流密度和pH值的增大,镀层的含铁量先增加,后降低;随着FeSO4.7H2O浓度的升高,镀层的含铁量增加。探讨了新型光亮剂对镀层的影响,获得了最佳电镀方案。     

电沉积Ni—W—非晶态合金工艺研究

研究了Ｎｉ－Ｗ－Ｐ非晶态合金的沉积方法;讨论了电沉积液的温度、ＰＨ值和电流密度对镀层结构及成分的影响;同时对电沉积液的ＰＨ值和电流密对镀层的硬度及耐蚀性的影响进行了研究。     

碳纳米管／锡基轴瓦合金复合减摩镀层的制备

采用复合电沉积方法在铜基轴瓦合金的表面制备碳纳米管/锡基轴瓦合金复合减摩镀层,研究了电沉积工艺参数对碳纳米管/锡基复合镀层的组织与性能的影响.结果表明,当阴极电流密度为1.5A/dm2,镀液中碳纳米管的质量浓度为2 g/L、镀液的pH值为1时,镀层生长良好,碳纳米管分布均匀.     

工艺因素对氨基磺酸盐镀铟阴极电流效率的影响

对氨基磺酸盐体系镀铟阴极电流效率的影响因素及其规律进行了系统的研究,通过分析镀液pH值、电流密度、镀液温度、添加剂以及电镀时间与阴极电流效率的关系,确定了镀铟最佳工艺参数.结果表明:当pH值为1.8～2.0,电流密度为1.8～2.2 A/dm2,温度为20～30 ℃,胺类添加剂加入量少于0.2g/L,电沉积1min,可以获得银白色的铟镀层,且阴极电流效率达到80%以上.     

工艺参数及稳定剂抗坏血酸对电沉积NiFeW合金的影响

为获得性能良好的镍铁钨合金镀层,研究了镀液pH 值、温度、电流密度、稳定剂抗坏血酸浓度对镍铁钨合金镀层成分和镀层沉积速率、显微硬度的影响。结果表明: 镀液pH 值对镀层W含量和镀层沉积速率影响较大;镀液温度对镀层沉积速率、镀层成分和镀层硬度影响均较大;随抗坏血酸浓度增加,镀层沉积速率逐渐降低,镀层表面形貌更加粗糙。在镀液pH = 4,温度60 ℃,电流密度4 A/dm2,抗坏血酸浓度3 g /L 时,镀层沉积速率和镀层的显微硬度较高,表面光亮致密,耐蚀性好。     

T91钢表面复合电沉积Ni/CrAl镀层的工艺研究

采用复合电沉积法在T91钢表面制备Ni/CrAl镀层,研究了CrAl微粒在镀层中的含量与搅拌强度、镀液pH值、电流密度及温度的关系,确定最佳工艺参数为:电流密度2.5～4.5A/dm2,pH值4～4.5,温度30℃。采用该工艺制备了较高CrAl含量的复合镀层,并对工艺参数影响复合电沉积的机理进行了简单探讨。     

Electrodeposition behavior and characteristics of Ni-carbon nanotube composite coatings

Ni-CNT (carbon nanotube) composite coatings were processed by electrodeposition and their hardness and corrosion characteristics were investigated with variations of CNT concentration in an electrolyte solution and electrodeposition current density. With increasing the CNT concentration in the electrodeposition bath and the current density, more CNTs are incorporated into Ni matrix. Hardness values of the Ni-CNT coatings are irrelevant to the CNT concentration in the solution, the current density, and current mode, implying poor adhesion of CNTs to Ni matrix. With increasing the CNT content in the coating, the corrosion resistance of the Ni-CNT composite coating becomes inferior due to the porous microstructure.     

无氰电镀液中超声电沉积耐腐蚀纳米晶铜镀层

通过超声辅助电沉积法,在无氰络合电镀液中以高阴极电流密度在钕铁硼磁体上电沉积获得纳米晶铜防护镀层,研究了不同超声波频率下的镀层形貌、晶粒尺寸、显微硬度和耐腐蚀性能。结果表明,随着超声波频率的增加,络合电镀液体系的铜电沉积有效阴极电流密度显著增加,相应的阴极电流效率也提高,从而获得致密的纳米晶铜镀层。在阴极电流密度为4.0 A·dm^-2和超声波频率为40 kHz的条件下,能够获得平均晶粒尺寸为18.8 nm的铜镀层。超声辅助电沉积法还能促进烧结钕铁硼基体盲孔内的铜沉积,从而改善基体与镀层之间的结合力。在同样的镀层厚度下,烧结钕铁硼表面所沉积镀层的耐腐蚀性随超声波频率的提高而优化。     

镍硫钴析氢电极的制备及性能研究

采用电沉积方法制备Ni-S-Co合金电极,通过正交实验和极化曲线测试研究了CoSO4·7H2O浓度、电流密度、电镀液温度、电沉积时间和电解液温度对Ni-S-Co电极析氢性能的影响.采用SEM,XRD和EDXA对镀层的形貌、结构和组成进行观察和分析.实验结果表明:制备具有最佳析氢活性的Ni-S-Co电极的工艺条件是25 ...     

电沉积Fe-Ni-Cr纳米晶镀层的制备及性能研究

采用脉冲电沉积方法从Cr³⁺溶液中制备Fe-Ni-Cr纳米晶合金镀层,利用SEM,EDS和XRD对Fe-Ni-Cr合金镀层的表面形貌、化学组成和晶粒结构进行观察;利用电化学工作站对镀层进行极化曲线测试并与传统的304不锈钢进行对比。结果表明：电沉积镀层为纳米晶,无裂纹,表面光亮,晶粒尺寸大多分布在10~40 nm之间,镀层主要元素成分含量Cr为25.52%,Fe为59.61%,Ni为6.55%,与传统304不锈钢相比, Fe-Ni-Cr纳米晶镀层在5%的H₂SO₄溶液的自腐蚀电位提高了近30 mV,自腐蚀电流密度降低了近1/8,维钝电流降低了近1/10。因此,Fe-Ni-Cr纳米晶合金镀层表现出更好的耐蚀性。     

“Stopping off” Materials for Use in the Electro-Deposition of Nickel

The results are presented of a quantitative study of the phosphoric acid anodizing of high purity aluminium. The effects of electrolyte concentration, temperature, anodizing time, current density and air agitation on the coating weight, metal loss, coating ratio and density of the anodic coating were investigated.

The use of phosphoric acid anodic coatings as a base for electrodeposition is discussed with particular reference to plating in a copper pyrophosphate solution and the growth of copper deposits in the anodic film. Tests on chromium/nickel/copper electrodeposits on 38 aluminium alloy are briefly described.     

超疏水Co-MoS2复合镀层的制备及其性能

采用一步电沉积法制备了具有优异耐磨耐蚀的超疏水Co-MoS₂复合镀层。利用扫描电镜、X射线衍射仪、激光共聚焦显微镜、接触角测试仪及电化学工作站等系统研究了电流密度和电沉积时间对复合镀层的微观形貌结构、润湿性、自清洁效果、耐磨和耐蚀性能的影响规律及机理。结果表明,当电流密度为20 A/dm²,电沉积时间为30 min时,Co-MoS₂复合镀层实现超疏水效果,接触角达到最大值约151.4°,具有良好的自清洁防污性能。在2.5 kPa压力下与800 目砂纸摩擦1200 mm后,镀层表面仍具有高于146°接触角的良好疏水性,表现出优异的耐磨性能。该超疏水复合镀层还具有较好的耐腐蚀性能。一步电沉积法简单、经济高效且环保制备了高性能超疏水复合镀层,可望实现超疏水材料的实际应用。     

工艺参数对Ni-纳米La2O3复合电沉积的影响

在氨基磺酸镍镀液中加入La2O3纳米颗粒,制备了Ni 纳米La2O3复合镀层.利用正交试验法研究了微粒悬浮量、电流密度、搅拌速度、温度等工艺参数对复合电沉积的影响,并用扫描电子显微镜对复合镀层的表面形貌进行了分析.结果表明,La2O3颗粒悬浮量对复合镀层La2O3共沉积量的影响最大;复合镀层中La2O3颗粒共沉积量越大、电流密度越小,其表面越平整、组织越致密.     

Effect of current density on the corrosion protection performance of polyaniline coated AISI 4140 steel

The present work reports on electropolymerisation of aniline onto AISI 4140 steel substrate at room temperature in oxalic acid media by the potentiodynamic electrodeposition method. The effect of coating current density on the morphology of conductive polymer films and their corrosion behaviour has been investigated. The electrolyte solution comprised 0.1 M aniline?+?0.3 M oxalic acid. The effects of deposition current density changes (0.1, 0.2, 0.3, 0.4 and 0.5?mA cm^?2) on the films were investigated. The PANI film was characterised using cyclic voltammetry and optical microscopy; it was covered with a dark green-yellow homopolymer film of strongly adherent homogeneous characteristic. The corrosion behaviour of steel electrodes with and without polyaniline (PANI) film in 3.5 wt-% NaCl solution was investigated through anodic polarisation curves. The results indicated that the PANI coating obtained under 0.2?mA cm^?2 was the most corrosion protective.     

Characterization of nanocrystalline Co–W coatings on Cu substrate,electrodeposited from a citrate-ammonia bath

Cobalt–tungsten nanocrystalline coatings were electrodeposited on copper substrate using different current densities. The deposited coatings were single phase solid solution with an average grain size of about 18 nm, showing a nodular type of surface morphology. By increasing the deposition current density, the density of nodules was increased, with no obvious variation in grain size. Electrochemical impedance spectroscopy (EIS) confirmed the codeposition of tungsten through reduction of tungsten oxide film formed during the electrodeposition process. However, the role of ternary complexes in the bath cannot be ruled out, especially at lower cathodic potentials. The Co–W coating deposited at lower current densities showed higher tungsten content, microhardness, wear resistance and friction coefficient. However, this coating showed an inferior corrosion resistance. By increasing the deposition current density, a low tungsten coating with high corrosion resistant was obtained. This is attributed to the lower value of exchange current density of water reduction in the present of oxygen (i₀^H2O) achieved on the coating with lower tungsten content.