HgCdTe材料的溴-甲醇抛光工艺研究

碲镉汞(HgCdTe)红外探测器制备中的化学-机械抛光工艺会在碲镉汞材料表面形成一定深度的损伤层。用溴-甲醇化学机械抛光取代溴腐蚀工艺,有效地降低了抛光过程所产生的表面损伤。在溴-甲醇抛光工艺中,可变参数有溶液的浓度比、抛光时间、转盘转速等,不同的参数组合对于抛光效果有不同的影响,经过正交试验可以以较少的试验次数高效经济地得到最佳的溴-甲醇抛光工艺参数组合。以该优化参数进行抛光所得到的碲镉汞材料通过XRD测试以及Ar+刻蚀后表面形貌的测试表明,HgCdTe晶片表面剩余损伤大大减小。     

激光辐照对长波HgCdTe光导探测器电学参数的影响

对长波HgCdTe光导探测器进行了低于其永久损伤阈值的变功率激光辐照 ,测量辐照前后器件的电阻 温度特性 ,用电阻 温度特性研究材料参数的方法对实验结果进行拟合 ,结果表明辐照后HgCdTe探测器件的组分变大 ,并由此计算得到探测器性能突变后 ,器件的电子迁移率与电子浓度均有一定程度减小。认为这可能是由于激光辐照的热效应使N型HgCdTe光导器件的表面及体内均产生的一定的变化所致     

激光辐照对长滤HgCdTe光导探测器电学参数的影响

对长波HgCdTe光导探测器进行了低于其永久损伤阈值的变功率激光辐照，测量辐照前后器件的电阻－温度特征，用电阻－温度特征研究材料参数的方法对实验结果进行拟合，结果表明辐照后HgCdTe探测器件的组分变大，并由此计算得到探测器性能突变后，器件的电子迁移率与电子浓度均有一定程度减小。认为这可能是由于激光辐照的热效应使N型HgCdTe光导器件的表面及体内均产生的一定的变化所致。     

弱P型碲镉汞材料和陷阱模式光导探测器

窄禁带碲镉汞(HgCdTe)为电子和空穴混合导电的多载流子体系材料,特别是对于弱p型材料,由于电子和空穴的迁移率相差大约两个数量级,更容易受到少数载流子电子的干扰,因此单一磁场的霍尔测试无法区分迁移率较低性能较差的n型材料和p型材料.通过变温变磁场的霍尔测试对两种碲镉汞材料的磁输运特性进行了测试区分.另外对由弱p型材料...     

激光辐照对长波HgCdTe光导探测器电学参数的影响

对长波HgCdTe光导探测器进行了低于其永久损伤阈值的变功率激光辐照,测量辐照前后器件的电阻-温度特性,用电阻-温度特性研究材料参数的方法对实验结果进行拟合,结果表明辐照后HgCdTe探测器件的组分变大,并由此计算得到探测器性能突变后,器件的电子迁移率与电子浓度均有一定程度减小.认为这可能是由于激光辐照的热效应使N型HgCdTe光导器件的表面及体内均产生的一定的变化所致.     

利用迁移率谱技术研究p型碲镉汞材料

窄禁带碲镉汞(HgCdTe)是电子和空穴混合导电的多载流子体系材料,特别是对于p材料,由于电子和空穴的迁移率相差大约两个数量级(b=μe/μh≈102),更容易受到少数载流子电子的干扰,因此单一磁场的霍尔测试无法准确有效地给出p型材料的电学参数.通过变温变磁场的霍尔测试对p型HgCdTe材料的磁输运特性进行了测试,结合...     

退火工艺对HgCdTe材料位错密度及电学性能影响的研究

实验分别采用高低温退火和循环变温退火方式对液相外延生长的HgCdTe材料进行饱和汞压热处理,研究了两种热处理工艺对碲镉汞材料位错密度及电学性能的影响。结果表明：相较于高低温退火,经循环变温退火后HgCdTe材料的位错密度有了明显的降低,并且材料的迁移率有了显著的提升。研究发现循环变温退火是一种较好提升HgCdTe材料性能的热处理方法。     

Si基HgCdTe变面积光伏探测器的变温特性研究

通过变面积Si基HgCdTe器件变温I-V测试和暗电流特性拟合分析,研究了不同偏压下n-on-p型Si基HgCdTe光伏器件的暗电流成分与Si基HgCdTe材料少子扩散长度和少子寿命随温度的变化规律.在液氮温度下,随着反向偏压的增大器件的表面漏电流在暗电流中所占比重逐渐增加.在零偏压下,当温度低于200 K时材料的少子...     

碲镉汞表面硫化的光电子能谱及器件性能研究

利用X射线光电子谱(XPS)对HgCdTe表面的硫化特性进行了研究,发现溴腐蚀后的表面硫化处理可以去掉表面的氧化层, Te富集的程度大大减少,硫化处理后再长硫化锌对器件进行钝化,可以大大减少器件的表面漏电,增加器件工作电压和提高器件性能。     

HgCdTe环孔p-n结光伏探测器暗电流机制

P-n结I-V特性是红外光伏探测器的一个重要指标,它直接决定了探测器的动态电阻和热噪声,决定了探测器的性能.实验主要对离子刻蚀环孔P-n结HgCdTe长波光伏探测器进行变温,I-V特性测试分析.通过对测试实验数据拟合,从理论上计算了探测器在不同温度及不同偏压下的暗电流,得到一些相关的材料和器件性能参数.希望利用分析计算结果了解工艺中存在的问题,对改进工艺及提高器件性能提供理论依据.     

复合效应对掺杂氧化物透明导电薄膜的影响

首次引入复合效应对不同价态差的掺杂氧化物透明导电（TCO）薄膜的载流子浓度及其迁移率进行了分析。对于较高温下制备的TCO薄膜,对载流子迁移率起主要作用的散射机制是带电离子散射和电中性复合粒子散射。带电离子散射迁移率与带电离子的有效电荷数大致呈反比关系,在载流子浓度相同的情况下,随着复合几率增大,价态差分别为3和4的TCO薄膜中的带电离子的平均有效电荷分别趋于1和2,因此带电离子散射迁移率也随之增大,分别趋于价态差为1和2的TCO薄膜的带电离子散射迁移率。而对于价态差为3的TCD薄膜,由于电中性复合粒子的数量较少,对载流子的散射最弱,因此在复合几率较大的情况下,价态差为3的TCO薄膜有可能获得比价态差为1的TCO薄膜更高的载流子迁移率。     

Electron mobility in two-dimensional electron gas in AIGaN/GaN heterostructures and in bulk GaN

We report on temperature dependencies of the electron mobility in the two-dimensional electron gas (2DEG) in AIGaN/GaN heterostructures and in doped bulk GaN. Calculations and experimental data show that the polar optical scattering and ionized impurity scattering are the two dominant scattering mechanisms in bulk GaN for temperatures between 77 and 500K. In the 2DEG in AIGaN/GaN heterostructures, the piezoelectric scattering also plays an important role. Even for doped GaN, with a significant concentration of ionized impurities, a large volume electron concentration in the 2DEG significantly enhances the electron mobility, and the mobility values close to 1700 cm²/Vs may be obtained in the GaN 2DEG at room temperature. The maximum measured Hall mobility at 80K is nearly 5000 cm²/Vs compared to approximately 1200 cm²/Vs in a bulk GaN layer. With a change in temperature from 300 to 80K, the 2DEG in our samples changes from nondegenerate and weakly degenerate to degenerate. Therefore, in order to interpret the experimental data, we propose a new interpolation formula for low field mobility limited by the ionized impurity scattering. This formula is valid for an arbitrary degree of the electron gas degeneracy. Based on our theory, we show that the mobility enhancement in the 2DEG is related to a much higher volume electron concentration in the 2DEG, and, hence, to a more effective screening.     

Temperature‐dependent Hall‐effect measurements of p‐type multicrystalline compensated solar grade silicon

In this study, we have investigated the Hall majority carrier mobility of p‐type, compensated multicrystalline solar grade silicon (SoG‐Si) wafers for solar cells in the temperature range 70–373 K. At low temperature (~70 K) the difference in the mobilities measured for the compensated and the uncompensated reference samples is the highest, and the measured mobility shows dependence on the compensation ratio. Mobilities decrease with increasing temperature, and towards room temperature, the mobilities of the different samples are in the same range. The measurements show that, for these samples, the contribution from lattice scattering is dominating over ionized impurity scattering at room temperature. In the range of interest for silicon solar cells (above room temperature), the trend in carrier mobility is similar for all the samples, and the measured value for the sample with low compensation ratio and low doping density is comparable to the uncompensated references. A comparison of resistivity and majority carrier density measured by the Hall setup at room temperature and by four‐point probe and glow discharge mass spectroscopy, respectively, is reported as well. Copyright © 2012 John Wiley & Sons, Ltd.     

不同腐蚀时间对CZT(211)B衬底的影响分析

主要分析了不同溴甲醇(溴体积比为0.05%)腐蚀时间对CZT(211)B衬底表面粗糙度、总厚度偏差、红外透过率、Zn值以及X射线衍射半峰宽(FWHM)的影响。研究发现即使使用溴体积比0.05%的溴甲醇溶液腐蚀5 s,衬底表面粗糙度都会由0.5 nm增加至1.5 nm以上。随着腐蚀时间的增加CZT(211)B衬底总厚度偏差逐渐增加。使用溴甲醇作为抛光液的两个样品的Zn值明显低于使用氨水作为抛光液的样品,同时该两样品的X射线衍射半峰宽和红外透过率随腐蚀时间的变化趋势一致,但不同于使用氨水作为抛光液的样品,说明不同的抛光液影响CZT(211)B衬底表面Zn值以及表面损伤层等表面状态。     

The dopant density and temperature dependence of electron mobility and resistivity in n-type silicon

Traditional analysis of electron mobility in n-type silicon neglects the effect of electron-electron scattering in the mobility calculations. As a result, theory fails to conform with experiment when dopant density exceeds 2 × 10¹⁶ cm^?3. In this work, an improved theoretical model for computing mobility and resistivity as functions of dopant density and temperature has been developed for n-type silicon. The model has been applied to phosphorus-doped silicon for dopant densities from 10¹³ to 10¹⁹ cm^?3, and temperatures between 100 and 500 K. The mobility was calculated analytically by appropriately combining lattice, ionized impurity and neutral impurity scattering contributions. The effect of electron-electron scattering was incorporated empirically for dopant densities greater than 2 × 10¹⁶ cm^?3. Additionally, the anisotropic scattering effect was included in the mobility formulations. Resistivity measurements on seven phosphorus-doped silicon wafers with dopant densities from 1.2 × 10¹⁴ to 2.5 × 10¹⁸ cm^?3 were carried out for temperatures from 100 to 500 K. Electron mobility at 300 K was deduced from resistivity and junction C-V measurements for dopant densities from 10¹⁴ to 10¹⁸ cm^?3. Agreement between theoretical calculations and experimental data for both electron mobility and resistivity of phosphorus-doped silicon was within ±7% in the range of dopant densities and temperatures studied.     

GeOI pMOSFETs空穴迁移率的物理模型

A physical model of hole mobility for germanium-on-insulator p MOSFETs is built by analyzing all kinds of scattering mechanisms, and a good agreement of the simulated results with the experimental data is achieved, confirming the validity of this model. The scattering mechanisms involved in this model include acoustic phonon scattering, ionized impurity scattering, surface roughness scattering, coulomb scattering and the scattering caused by Ge film thickness fluctuation. The simulated results show that the coulomb scattering from the interface charges is responsible for the hole mobility degradation in the low-field regime and the surface roughness scattering limits the hole mobility in the high-field regime. In addition, the effects of some factors, e.g. temperature, doping concentration of the channel and the thickness of Ge film, on degradation of the mobility are also discussed using the model, thus obtaining a reasonable range of the relevant parameters.     

Electron scattering profiles in SOS films measured by temperature-dependent Hall effect

The electron scattering mechanisms at every depth in heteroepitaxial SOS films have been investigated by measuring the temperature dependence of Hall mobility. It appears that, above the `critical? temperature Tc=120 K, lattice scattering prevails only in the proximity of 1/SiO, while ionised impurity scattering becomes dominant near the substrate (2000 ? from Si/Al2O3) even at room temperature.     

Electron Scattering Mechanism of FTO Films Grown by Spray Pyrolysis Method

Transparent conducting thin films of fluorine-doped SnO₂ (FTO) were deposited on glass substrates by spray pyrolysis. This work studies electron scattering mechanisms of the FTO films through analysis of the temperature-dependent mobility. The mechanisms of lattice vibration and dislocation scattering were not important in the degenerate FTO films. The mean free path was found to be considerably smaller than the grain size, suggesting that ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms     

II类超晶格探测器背面减薄技术研究

为了验证外延材料制备工艺试验的正确性,减少GaSb衬底对红外光的吸收,同时提升探测器的可靠性和长期稳定性,需要对II类超晶格红外探测器的GaSb衬底进行减薄处理。采用机械抛光法和机械化学抛光法实现II类超晶格探测器的GaSb衬底背面减薄,最后利用专用腐蚀液腐蚀的方法将GaSb衬底全部去除,使II类超晶格材料完全露出。扫描电镜测试表明,超晶格材料腐蚀阻挡层能起到较好的阻挡作用,材料表面光滑,衬底无残留。探测器性能测试结果表明,减薄后的探测器芯片性能未发生变化。     

Dislocation scattering in n-GaN

The scattering of carriers due to dislocations is studied. Unlike semiconductors such as Si or GaAs, the major scattering mechanism for undoped or lightly doped samples is dislocation scattering instead of ionized impurity scattering. It was found that for GaN samples in the dislocation scattering region, the mobility is a function of the dislocation density and free carrier concentration, via a relationship. Temperature-variation mobility plots also indicate that a T^3/2 dependence component is present, which is also attributed to dislocation scattering.