钛酸钡基PTC陶瓷溅射金属化研究

本文进行了钛酸钡基PTC陶瓷的溅射金属化研究。用直流磁控溅射技术来制备BaTiCO3基的PTC陶瓷电极,提出了Ti/Ni-Cu/Ag、Al/Ni-Cu/Ag这两种复合膜层的电极结构。实验结果表明了制备的底电极能与钛酸钡基PTC陶瓷产生良好的欧姆接触,且电极与瓷片间附着性好,耐高温无铅焊锡熔蚀的能力强。该电极制备方法生产成本较低,可控性强,适合用于大规模的工业生产中。     

Optical switching property of Pd-capped Mg-Ni alloy thin films prepared by magnetron sputtering

Pd-capped Mg-Ni alloy thin films were prepared by magnetron sputtering, on glass substrates, and the dependence of the optical switching property of these films on alloy composition and temperature has been investigated using diluted hydrogen gas and dry air for changing. The transition from the transparent state to the mirror state by dehydrization shows strong dependence on both factors, while the hydrization transition has weak dependence. At higher temperature, the dehydrization is much faster for Mg-rich Mg-Ni thin film whose transition is very slow at room temperature. By using heated air to change from the transparent state to the mirror state, a fast switching can be done for Mg-rich Mg-Ni alloy thin film which has a wide optical modulation range.     

A method to fabricate nanorod films on aluminum lattice membrane by magnetron sputtering

The development of the process of fabricating well-aligned nanostructures materials is one of the interesting subjects in current material science. This paper describes a new method to fabricate high-density, vertically-aligned nanorods of metal and metal compound by magnetron sputtering on aluminum lattice membrane (ALM). The ALM was formed by chemical etching of the hexagonal arrays of pore layer from the anodic aluminum oxide membrane, resulting in unnumbered hemisphere nanopits with uniform protuberant nanodots on the surface of aluminum. The ALM was employed as a substrate to fabricate well-aligned Ni, Cu, WC nanorod films by magnetron sputtering. Scanning electron microscopy images showed that the sputtered atoms have been absorbed preferentially onto the protuberant nanodots of ALM in the process of magnetron sputtering, and have begun to nucleate and grow into nanorods. The diameter of the nanorods depends on the diameter of hemisphere on the surface of the substrate, while the thickness of thin films can be controlled by deposition time.     

Al-Mg-B thin films prepared by magnetron sputtering

Hard, nanocomposite aluminum magnesium boride thin films were prepared on Si (100) substrates with a three target magnetron sputtering system. The films were characterized by X-ray diffraction, atomic force microscope, electron micro-probe, Fourier transform infrared spectroscopy and nanoindentation. The results show that the maximum hardness of the as-deposited films is about 30.7 GPa and these films are all X-ray amorphous with smooth surfaces. The influences of substrate temperature and boron sputtering power on the quality of the films are discussed. From the results of this work, magnetron sputtering is a promising method to deposit Al-Mg-B thin films.     

磁控溅射膜层厚度均匀性测试

在相对于平面磁控溅射阴极均匀区范围内安放硅片，镀膜后进行膜层厚度测试，然后计算膜层厚度均匀度。结果，片间厚度均匀性为1％～-1．7％；炉间厚度均匀性为3．5％～-2％。     

直流磁控溅射制备PbTe薄膜

采用直流磁控溅射的方式，用PbTe靶材溅射沉积在玻璃基底上得到了PbTe薄膜，薄膜生长速率约为100nm／min，通过控制溅射时间可沉积几纳米到几微米的不同厚度的薄膜。PbTe薄膜是面心立方结构的纤维状生长的薄膜，溅射沉积时间对薄膜的晶粒大小和结构有较大影响，溅射时间越长薄膜的晶粒越大，薄膜结构越致密，具有片层状结构。得到的PbTe薄膜是富Te的P型半导体薄膜，其电阻率随着薄膜厚度的增大而减小。     

Rf magnetron sputtering of polypropylene

Radio frequency magnetron sputtering of polypropylene (PP) using argon as a working gas was applied in order to prepare organic films. Changes of the structure and morphology of the PP target and sputtered films have been investigated by infrared spectroscopy, AFM and scanning electron microscopy. It has been shown that the sputtered films are hydrocarbon plasma polymers. The increased incorporation of OH groups into the deposited films was found as a consequence of the PP target history.     

Nanoporous Ti-metal film deposition using radio frequency magnetron sputtering technique for photovoltaic application

Nanoporous Ti-metal film electrode was fabricated by radio frequency (rf) magnetron sputtering technique on nanoporous TiO2 layer prepared by sol-gel combustion method and investigated with respect to its photo-anode properties of TCO-less DSCs. The porous Ti layer (approximately 1 microm) with low sheet resistance (approximately 17 Omega/sq.) can collect electrons from the TiO2 layer and allows the ionic diffusion of I(-)/I(3-) through the hole. The porous Ti layer with highly ordered columnar structure prepared by 8 mTorr sputtering shows the good impedance characteristics. The efficiency of prepared TCO-less DSCs sample is about 4.83% (ff: 0.6, Voc: 0.65 V, Jsc: 11.2 mA/cm2).     

Some features of magnetron sputtering

In a low pressure sputtering system of the magnetron type for depositing thin solid films, two different discharge modes occur: a positive space-charge-dominated mode and a negative space-charge-dominated mode. The positive space-charge-dominated mode predominates in a weak magnetic field of some few hundred gauss and is widely used for sputtering, although the current density is non-uniform at the cathode surface. The negative space-charge-dominated mode predominates in a strong magnetic field of more than several hundred gauss and is also used for sputtering since the mode shows uniform current distribution at the cathode surface.In the magnetron sputtering system the working pressure is so low that the scattering of sputtered atoms by gas molecules can be neglected. Thus energetic sputtered atoms impinge on the substrates during film growth. This causes some phenomena which are rarely observed in a conventional diode sputtering system, e.g. an abnormal surface texture and an unusual crystalline structure are found in the resultant sputtered films. There is evidence that thin films of compounds normally only formed at high temperature can be synthesized at lower substrate temperatures.     

非织造基磁控溅射纳米银薄膜导电性能的研究

在室温条件下采用射频磁控溅射在丙纶(PP)、聚乳酸(PLA)熔喷非织造布表面生长纳米银(Ag)薄膜,并且用等离子体预处理样品进行对比。采用扫描电子显微镜(SEM)对其形貌进行表征,采用四探针测试仪对所制备的纳米薄膜的导电性能进行表征。研究溅射时间、孔隙率及孔径分布和等离子处理对非织造基纳米银薄膜的导电性能的影响。实验表明:随着反应溅射时间的增加,薄膜的方块电阻值下降,导电性能增加;孔径大小也影响薄膜的导电性能,随着孔径的增大,薄膜的导电性能降低;等离子体处理对织物表面进行刻蚀,增加了纤维的比表面积,提高了纤维的润湿性能,改善了织物的导电性能。     

基于磁控溅射制备纳米微晶NiO_x薄膜的方法

使用一种配套于磁控溅射设备的基片液氮冷却装置制备了小颗粒度纳米微晶NiOx电致变色薄膜.当溅射参数完全相同时,借助于对基片的冷却可有效控制并降低NiOx薄膜的晶粒尺度.冷却基片所制备的NiOx薄膜的电致变色性能明显优于室温时制备的薄膜,且该薄膜的O/Ni比率也明显高于室温时制备的NiOx薄膜的O/Ni比率.     

直流磁控溅射制备铝薄膜的工艺研究

采用直流磁控溅射方法，以高纯Al为靶材，高纯Ar为溅射气体，在玻璃衬底上成功地制备了铝薄膜，并对铝膜的沉积速率、结构和表面形貌进行了研究。结果表明：A1膜的沉积速率随着溅射功率的增大先几乎呈线性增大而后缓慢增大；随着溅射气压的增加，沉积速率先增大，在一定气压时达到峰值后继续随气压的增大而减小。X射线衍射图谱表明Al膜结构为多晶态；用扫描电子显微镜对薄膜进行表面形貌的观察，溅射功率为2600W，溅射气压为0．4Pa时制备的Al膜较均匀致密。     

直流磁控溅射制备TiNxOy薄膜的性能研究

利用直流磁控溅射技术在玻璃衬底上制备了TiNxOy薄膜样品,研究了溅射过程中电压与N2流量之间的迟滞效应,通过X射线衍射（XRD）、UV-Vis分光光度计、四探针电阻仪等测试手段表征了样品的物相、光吸收谱、电阻等性能。结果表明：随着N2含量的提高和薄膜厚度的增加,XRD显示薄膜样品出现明显的衍射峰,吸收光谱向可见光方向展宽至500nm,电阻随着N2含量的提高呈逐渐下降的趋势。     

Low-temperature formation of photocatalytic Pt-anatase film by magnetron sputtering

Films of TiO₂ dispersed or coated with platinum were deposited on glass and Pt-buffered polyamide substrates respectively by magnetron sputtering. The photocatalytic activity of the films was evaluated through the decomposition of acetic acid under UV irradiation. The Pt-dispersed TiO₂ film of approximately 1.5 wt % platinum shows a maximum activity due to for the formation of anatase phase with a fine grain size. Platinum particles 20Å in thickness coated on anatase film greatly improves activity. The activity shows a steplike dependence of film thickness where the critical thickness varies between 150 and 200 nm depending on the deposition temperatures. The correlation between defects and activity was verified by measuring either the temperature dependence of electric resistance or the shift of binding energy from XPS.     

Properties of amorphous carbon films produced by magnetron sputtering

Amorphous carbon films were prepared by magnetron sputtering of a graphite target. Their electrical and optical properties obey the relationship governing the conduction mechanisms in amorphous semiconductors. Their microscopic and structural properties are characteristic of physically vapour-deposited films. A scattering of single crystals of carbon in an amorphous carbon matrix was obtained by triode sputtering of a graphite target.     

Effects of sputtering power on mechanical properties of Cr films deposited by magnetron sputtering

Abstract

Chromium (Cr) films were deposited on plain carbon steel sheets by dc and rf magnetron sputtering as well as by electroplating. Effects of dc or rf sputtering power on the deposition rate and properties such as, hardness, adhesion strength, surface roughness and corrosion resistance of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. Salt fog tests were used to evaluate the corrosion resistance of the samples. The deposition rate, hardness and surface roughness of the Cr film deposited by either dc or rf sputtering increase with the increase in sputtering power but the adhesion strength is nearly independent of the sputtering power. The deposition rate, hardness and adhesion strength of the Cr film deposited by dc sputtering are higher than those of the Cr film deposited by rf sputtering, but rf sputtering offers smoother surface and higher corrosion resistance. The sputter deposited Cr film is harder and has a smoother surface than the electroplated one. The sputter deposited Cr film also has higher corrosion resistance than the electroplated one, which may be attributed to the smoother surface of the sputter deposited film.     

反应磁控溅射研究进展

本文综述了反应磁控溅射技术的发展状态.分析了迟滞效应以及消除该效应的方法.这些方法.采用单极或双极脉冲技术可以有效的削除孤光现象.最后展望了反应磁控溅射的发展趋势.