Characterization of the annealing impact on La2O3/HfO2 and HfO2/La2O3 stacks for MOS applications

The impact of various rapid thermal annealing used during the integration on the La₂O₃/HfO₂ and HfO₂/La₂O₃ stacks deposited by Atomic Layer deposition was analyzed. The consequences of lanthanum localization in such stacks on the evolution of the films during the rapid thermal annealing are investigated in term of morphology, crystalline structure, silicate formation and film homogeneity as a function of the depth. It appeared that the La₂O₃ location has an impact on the temperature of the quadratic phase formation which could be linked to the formation of SiOHfLa silicate and the resistance of the films to dissolution in HF 0.05 wt%.     

Structural and Electrical Characters of Ba0.6Sr0.4TiO3/La0.5Sr0.5CoO3 Thin Films by Plus Laser Deposition

Epitaxial Ba0.6Sr0.4TiO3 (BST) thin films were deposited on LaAlO3 (LAO) substrates with the conductive metallic oxide La0.5Sr0.5CoO3 (LSCO) film as a bottom electrode by pulsed laser deposition (PLD). X-ray diffraction ~2 and Ф scan showed that the epitaxial relationship of BST/LSCO/LAO was [001] BST//[001] LSCO//[001] LAO. The atomic force microscope (AFM) revealed a smooth and crack-free surface of BST films on LSCO-coated LAO substrate with the average grain size of 120 nm and the RMS of 1.564 nm for BST films. Pt/BST/LSCO capacitor was fabricated to perform CapacitanceVoltage measurement indicating good insulating characteristics. For epitaxial BST film, the dielectric constant and dielectric loss were determined as 471 and 0.03, respectively. The tunabilty was 79.59% and the leakage current was 2.6310-7 A/cm2 under an applied filed of 200 kV/cm. Furthermore, it was found that epitaxial BST (60/40) films demonstrate well-behaved ferroelectric properties with the remnate polarization of 6.085 C/cm2 and the coercive field of 72 kV/cm. The different electric properties from bulk BST (60/40) materials with intrinsic paraelectric characteristic are attributed to the interface effects.     

Effects of La2O3 incorporation in HfO2 gated nMOSFETs on low-frequency noise

The effect of La₂O₃ incorporation on the spatial trap distribution in HfO₂ gate dielectrics is investigated. The incorporation of La₂O₃ in HfO₂ dielectric has been found to improve the effective mobility in addition to reduced interface-state density. The trap distribution analysis in the HfO₂ layer extracted by combining the charge pumping (CP) method and the low-frequency noise (LFN) method has revealed significant reduction in the amount of traps at HfO₂/SiO₂-interlayer interface and in the HfO₂ layer by La₂O₃ incorporation.     

晶体光谱特性

测量了0.8 at.-% Nd3+:Y0.5Gd0.5VO4的吸收光谱和荧光发射谱,光谱显示该晶体在808.5 nm有很强的偏振光吸收峰,且π偏振光(E∥C)吸收远强于σ偏振光(E⊥C)吸收,半高宽度分别为4.5 nm和12 nm,吸收截面分别为19.69×10-20 cm2和6.41×10-20 cm2;其荧光发射( 4F3/2→ 4I11/2跃迁)峰值波长在1064 nm,半高宽度为3.7 nm; 4F3/2→ 4I11/2跃迁的荧光寿命为110 μs;光谱特性表明Nd3+:Y0.5Gd0.5VO4晶体是潜在的高效率激光晶体材料.     

Yb掺杂原子数分数为0.5%的Yb:Y3MAl5O12晶体的光谱分析

采用提拉法生长了Yb掺杂原子数分数为0.5%的Yb:Y3Al5O12(Yb:YAG)晶体,对晶体的吸收光谱和荧光光谱进行了分析。与Yb掺杂原子数分数为5%的Yb:YAG晶体进行了对比,得出采用940 nm激光二极管(LD)抽运晶体最为合适。原子数分数为0.5%的Yb:YAG晶体相对于原子数分数为5%的Yb:YAG晶体自吸收效应的影响要小。测量了原子数分数为0.5%的Yb:YAG晶体的荧光寿命为0.95 ms,与理论值很接近。因此采用原子数分数为0.5%的Yb:YAG晶体作为激光工作物质将有利于高效、小型集成化的固体激光器的发展。     

溶胶—凝胶法制备BST铁电薄膜及性能研究

研究了一种以水为溶剂的(Ba     

Ba_(0.5)Sr_(0.5)TiO_3薄膜电容的尺寸效应研究

采用射频磁控溅射和微细加工技术制备了不同尺寸的钛酸锶钡(Ba0.5Sr0.5TiO3,BST)平行板电容,研究了低频和高频条件下不同尺寸BST平行板电容的电容密度和Q值的变化情况。结果表明,由于存在边缘效应,BST薄膜电容的电容密度及Q值都具有尺寸效应。低频时,随着电容面积增大,电容密度减小,Q值增大。高频时,随着电容面积增大,电容密度及Q值减小。     

High mobility strained Si0.5Ge0.5/SSOI short channel field effect transistors with TiN/GdScO3 gate stack

Short channel p-type metal-oxide-semiconductor field effect transistors (MOSFETs) with GdScO₃ gate dielectric were fabricated on a quantum well strained Si/strained Si_0.5Ge_0.5/strained Si heterostructure on insulator. Amorphous GdScO₃ layers with a dielectric constant of 24 show small hysteresis and low density of interface states. All devices show good performance with a threshold voltage of 0.585 V, commonly used for the present technology nodes, and high I_on/I_off current ratios. We confirm experimentally the theoretical predictions that the drive current and the transconductance of the biaxially strained (1 0 0) devices are weakly dependent on the channel orientation. The transistor’s hole mobility, extracted using split C-V method on long channel devices, indicates an enhancement of 90% (compared to SiO₂/SOI transistors) at low effective field, with a peak value of 265 cm²/V s. The enhancement is however, only 40% at high electrical fields. We demonstrate that the combination of GdScO₃ dielectric and strained SiGe layer is a promising solution for gate-first high mobility short channel p-MOSFETs.     

激光烧结快速合成La2(MoO4)3材料

针对已有的固相合成法和湿化学法等合成方法中存在的工艺复杂、反应时间长、反应不充分等缺点,提出应用激光烧结快速合成技术制备质地致密、成型较好的La2(MoO4)3材料。对样品的拉曼光谱，X射线衍射,样品表面形貌和热膨胀性进行了分析和讨论。结果表明，制备的样品基本上是单一相的La2(MoO4)3，扫描电镜显示出样品表面多为细小晶粒的团聚体;能谱分析表明样品表面上各小晶粒的成分基本相同，说明得到的样品成分均匀;La2(MoO4)3在低温下是单斜结构，达到室温及以上时为正交结构，其极有可能是各向异性负热膨胀材料。     

Advantage of further scaling in gate dielectrics below 0.5 nm of equivalent oxide thickness with La2O3 gate dielectrics

N-type metal-oxide-semiconductor field-effect transistor (MOSFET) with an equivalent oxide thickness (EOT) of 0.37 nm has been demonstrated with La₂O₃ as a gate dielectric for the first time. Despite the existence of parasitic capacitances at gate electrode and inversion layer in the channel, a sufficient drain current increment in both linear and saturation regions have been observed, while scaling the gate oxide from 0.48 to 0.37 nm in EOT. Therefore, continuous scaling of EOT below 0.5 nm is still effective for further improvement in device performance.     

基于La0.7Sr0.3FeO3的微结构乙醇气体传感器的研制

以La_0.7Sr_0.3FeO₃为敏感材料，设计制成了一种新型的共平面结构气体传感器.基于有限元分析软件Ansys对该传感器结构进行了优化设计.实验测得该传感器对于500ppm浓度乙醇气体的灵敏度为8.0，功耗为261mW，是同种敏感材料烧结型传感器功耗的2/3，响应时间约为1.5s，恢复时间约为2.5s，是一种功耗低、灵敏度高、稳定性好的微结构乙醇气体传感器.     

Solvothermal synthesis of Bi2O3/BiVO4 heterojunction with enhanced visible-light photocatalytic performances

Novel, three-dimensional, flower-like Bi2O3/BiVO4 heterojunction photocatalysts have been prepared by the combination of homogeneous precipitation and two-step solvothermal method followed by thermal solution of NaOH etching process. The as-obtained samples were fully characterized by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray analysis, Brunauer-Emmett-Teller surface area, and UV-vis diffusereflectance spectroscopy in detail. The crystallinity, microstructure, specific surface area, optical property and photocatalytic activity of samples greatly changed depending on solvothermal reaction time. The photocatalytic activities of samples were evaluated on the degradation of methyl orange (MO) under visible-light irradiation. The Bi2O3/BiVO4 exhibited much higher photocatalytic activities than pure BiVO4 and conventional TiO2 (P25). The result revealed that the three-dimensional heterojunction played a critical role in the separation of the electron and hole pairs and enhancement of the interfacial charge transfer efficiency, which was responsible for the enhanced photocatalytic activity.     

Dielectric and Electrical Conductivity Relaxation in 0.5Li2O-0.5Na2O-2B2O3 Glasses

The frequency and temperature dependence of the dielectric constant, electric modulus, and electrical conductivity of the transparent glasses of composition 0.5Li₂O-0.5Na₂O-2B₂O₃ were investigated in the 100 Hz to 10 MHz frequency range. The dielectric data have been analyzed using the Cole–Cole equation with the addition of a conductivity term. The electrical conductivity was found to obey Jonscher’s universal law. Conductivity plots were not found to follow Summerfield scaling due to the mixed alkali effect. The imaginary part of electric modulus spectra was modeled using the Kohlrausch–Williams–Watts relation. The stretching exponent, β, was found to be 0.56 and temperature independent.     

Nanoscale analysis of YBa2Cu3O7−x/La0.67Ca0.33MnO3 interfaces

The structure of interfaces in superconducting/ferromagnetic YBa₂Cu₃O_7−x/La_0.67Ca_0.33MnO₃ superlattices has been analyzed by scanning transmission electron microscopy and high spatial resolution electron energy loss spectroscopy. Individual layers are flat over long lateral distances. The interfaces are coherent, free of defects, exhibiting no roughness, and are located at the BaO plane of the superconductor. Concerning chemical disorder, EELS measurements show the absence of measurable chemical interdiffusion within experimental error bars.     

基于Alq3光耦合层的新型顶发射蓝光有机电致发光器件

研制了一种结构为Ag/Glass/ITO/TAPC/mCP/mCP∶Firpic/TPBi/LiF/Al/Ag/Alq₃的顶发射有机电致发光器件,通过在ITO玻璃衬底背面生长一层Ag反射膜,使器件发出的蓝光被反射膜反射到顶电极出射。利用顶电极表面的Alq₃光耦合层有效地提升了金属复合阴极的透射率,降低了器件的微腔效应。实验结果表明,当光耦合层厚度为30nm时,获得了最大电流效率和最大亮度分别为8.91cd/A和5758cd/m²的蓝光顶发射有机电致发光器件(TEOLED);同时,在10V电压下,其色坐标为(0.157,0.320),当亮度从1cd/m²变化到5000cd/m²时,其色坐标仅漂移(0.002,0.010),表现出良好的色稳定性。     

Profiling of traps in SiO2/Al2O3 gate stack by the charge pumping technique

In this paper, we present our results on the distribution and generation of traps in a SiO₂/Al₂O₃ transistor. The investigation has been carried out by using charge pumping measurements, both variable voltage and frequency techniques, and constant voltage stress.By increasing the amplitude of the gate pulse we observe an increase of the charge recombined per cycle closely related to the contribution of shallow traps near the SiO₂/Al₂O₃ interface. By reducing the pulse frequency we measure an increase in the charge pumping current due to traps located deeper in the Al₂O₃. By combining charge pumping and constant voltage stress measurements, we found that the traps are mostly generated near the Si/SiO₂ interface.     

YAlO3∶Eu3+发光纳米纤维的制备与表征

采用静电纺丝技术制备了聚乙烯吡咯烷酮PVP/[Y(NO3)3+Al(NO3)3+Eu(NO3)3]复合纤维,将其进行热处理,得到了YAlO3:Eu3+发光纳米纤维。采用X射线衍射(XRD)、扫描电镜(SEM)、荧光光谱等技术对样品进行了表征。PVP/[Y(NO3)3+Al(NO3)3+Eu(NO3)3]复合纤维经1200℃焙烧2h后,获得了YAlO3:Eu3+纳米纤维,属于正交晶系,空间群为Pnma。用Shapiro-Wilk方法检验了纤维直径分布情况,在95%的置信度下,纤维直径属于正态分布。PVP/[Y(NO3)3+Al(NO3)3+Eu(NO3)3]复合纤维表面光滑,纤维分散性较好,有很好的长径比,尺寸均一,平均直径为(152.9±26.0)nm;YAlO3:Eu3+纳米纤维的平均直径为(106.7±20.2)nm。在234nm的紫外光激发下,YAlO3:Eu3+纳米纤维的主要发射峰位于590nm和609nm处,分别属于Eu3+的5 D0→7F1跃迁和5 D0→7F2跃迁,Eu3+掺杂离子浓度对YAlO3:Eu3+发射峰的峰型与位置均没有影响,当Eu3+掺杂离子浓度为5%时,YAlO3:Eu3+纳米纤维发光最强。     

Photo-induced doping effect and dynamic process in monolayer MoSe2

Dynamic processes of electron transfer by optical doping in monolayer MoSe₂ at 6 K are investigated via measuring time resolved photoluminescence (PL) traces under different excitation powers. Time-dependent electron transfer process can be analyzed by a power-law distribution of t^−α with α = 0.1–0.24, depending on the laser excitation power. The average electron transfer time of approximately 27.65 s is obtained in the excitation power range of 0.5 to 100 μW. As the temperature increases from 20 to 44 K, the energy difference between the neutral and charged excitons is observed to decrease.     

太赫兹瞬态光谱研究La0.7Ca0.3MnO3薄膜的温度相关相变

利用太赫兹瞬态光谱研究了La_0.7Ca_0.3MnO₃薄膜的热力学性质。La_0.7Ca_0.3MnO₃薄膜的金属-绝缘体相变温度在260 K左右,与铁磁-顺磁相变温度几乎相同。结果表明,La_0.7Ca_0.3MnO₃薄膜的电导率与薄膜中磁矩取向密切相关。研究发现在40～200 K的低温范围内,La_0.7Ca_0.3MnO₃薄膜的电导率可以用Drude模型拟合,在210～290 K的高温范围内可以用Drude-Lorentz模型拟合。