共查询到19条相似文献,搜索用时 187 毫秒
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光学薄膜界面粗糙度互相关特性与光散射 总被引:10,自引:4,他引:6
为了研究光学薄膜界面的互相关特性及光散射特性,介绍了光学薄膜的散射理论和模型。依据光学薄膜矢量散射的表达式,借助于总背向散射理论分析了光学薄膜界面互相关特性对光散射的影响,并用实验验证和分析了TiO2单层薄膜膜层厚度,K9玻璃基底粗糙度以及离子束辅助沉积(IBAD)工艺等因素对光学薄膜界面互相关特性的影响。结果表明,根据矢量光散射理论计算的光学薄膜界面互相关特性和光散射的关系与实验测量结果一致。随着基底粗糙度、薄膜光学厚度的增加,薄膜界面的互相关特性会变差,采用离子束辅助沉积的TiO2单层薄膜的膜层界面互相关性明显好于不用离子束辅助沉积的薄膜。 相似文献
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利用泰勒霍普森相关相干表面轮廓粗糙度仪(Talysurf CCI)分别对基底和采用电子束热蒸发技术沉积的15层二氧,化钛(TiO2)和二氧化硅(SiO2)为膜料的介质高反膜的膜层间的界面粗糙度进行了研究,并对不同工艺下沉积的薄膜界面粗糙度以及不同基底粗糙度上沉积的薄膜的表面粗糙度进行了比较.实验结果表明:TiO2薄膜对基底或下表面粗糙度有较好的平滑作用,随着TiO2和SiO2膜层的交替镀制,膜层间表面粗糙度呈现出低高交替的现象,随着膜层层数的增加,膜层间界面粗糙度低高变化范围减小;采用离子束辅助沉积工艺时,膜层问界面粗糙度低高变化范围较小.总散射损耗的理论计算表明:中心波长处完全非相关模型下的总散射损耗小于完全相关模型下的总散射损耗.实验结果表明:界面粗糙度的相关度约为0.4. 相似文献
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斜角入射沉积TiO_2薄膜的光学特性和表面粗糙度 总被引:3,自引:0,他引:3
采用电子束热蒸发技术在K9玻璃基底上以不同的沉积入射角沉积了单层TiO2薄膜,研究了不同入射沉积角沉积的TiO2薄膜的光学特性、填充密度和表面粗糙度,并比较了不同膜层厚度下薄膜表面粗糙度与入射沉积角之间的关系。研究结果表明,随着入射沉积角的增加,TiO2薄膜的透射率增加,透射峰值向短波移动,薄膜的填充密度从入射沉积角0°时的0.801降低到入射沉积角为75°时的0.341;薄膜的表面粗糙度随着入射沉积角的增加而增加,当入射沉积角为75°时,薄膜的表面粗糙度略高于基底的表面粗糙度。在沉积入射角不变时,随着膜层厚度的增加,膜层的表面粗糙度降低。 相似文献
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YbF3和ZnS薄膜的折射率和厚度的分光光度法测定 总被引:1,自引:0,他引:1
本文给出了一种简单而准确地确定光学薄膜折射率和厚度的方法。利用分光光度计分别测量光学薄膜样品以及基底透射率曲线,采用柯西(Cauchy)色散模型以及非线性单纯形优化法对透射率测量曲线进行拟合,从而确定薄膜的光学常数和厚度。采用电子束热蒸发和电阻热蒸发方法,分别在CaF2基底上镀制ZnS薄膜和在Al2O3基底上镀制YbF3薄膜,通过测量其在400nm-2600nm波段内的透射率曲线,计算出ZnS和YbF3薄膜材料的折射率色散曲线以及膜层厚度。 相似文献
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薄膜光学常数的精确测定对于设计和制备多层薄膜具有重要意义。在JGS1型熔融石英基底上,采用热蒸发沉积方法制备了不同厚度的LaF3单层薄膜样品,利用光度法来获取弱吸收薄膜和基底的光学常数,计算得到其在185~450nm范围内折射率n和消光系数k的色散曲线。实验结果表明,当膜层厚度较薄时,LaF3薄膜折射率表现出不均匀性现象。随着薄膜厚度的增加,薄膜折射率不均匀性减小。在求解过程中选用不均匀模型后,拟合结果与实际测试光谱曲线吻合得很好,提高了薄膜光学常数的计算精度。 相似文献
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Low-k dielectric carbon doped silicon dioxide films 105-1255 nm in thickness, prepared by plasma-enhanced chemical vapor deposition (PECVD) in a six-station sequential deposition system and in a single deposition station, have been investigated for their optical properties using an optical spectrometer coupled with a hot stage. A decrease in refractive index, n, for films with six sub-layers compared with films with a single layer of similar thickness has been observed. This decreased refractive index is thought to be caused by the different effect of crystallinity of the substrate, as a film interface effect is introduced due to the different deposition methods. Both types of PECVD thin films show an increasing refractive index with increasing thickness, which could be attributed to the increased effective density with the increased thickness indicated from Fourier transform infrared spectroscopy microstructure analysis. Cauchy dispersion function is found to be valid for films within all the thickness range and with different deposition methods from visible spectrum to IR spectrum. The refractive index is found to decrease as the temperature increases from 25 to 450 °C at a fixed wavelength for all the films. 相似文献
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Thin alloy films of palladium(Pd) and silver(Ag) are deposited onto glass substrates via the direct current(DC) magnetron technique.The hydrogen sensor probe consists of optical fiber bundle and Pd/Ag optical thin film.when the sensor is exposed to hydrogen,the refractive index of Pd/Ag optical thin layer will diminish and cause attenuation changes of the reflective light.It is observed that the thickness of Pd/Ag alloy layer can affect the hydrogen sensor signal.Under different substrate temperatures,several Pd/Ag samples are coated with different thicknesses of Pd/Ag alloy,and the results of a hydrogen sensor based on reflective light from the Pd/Ag alloy thin film are discussed. 相似文献
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提出了一种同时测量强吸收衬底上薄膜厚度和折射率的方法。对生长于强吸收衬底上的透明薄膜,提出在该薄膜上镀一层薄金属,形成金属-薄膜-强吸收衬底的类波导结构。由于小角度入射光在强吸收衬底上具有较强的反射率,使该结构可容纳一系列共振模。利用自由空间耦合技术和导出的共振模模式本征方程,同时确定透明薄膜的厚度和折射率。实验中测量了硅衬底上制备的聚甲基丙烯酸甲酯(PMMA)薄膜的折射率和厚度,测量的相对误差均小于10-3。该方法具有简便、可靠、可测量任意折射率薄膜的优点。 相似文献
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We have studied the thin film morphology of a semiconducting polymer photovoltaic blend comprising an electron acceptor poly(9,9-dioctylfluorene-co-benzothiadiazole) (F8BT) and the donor poly(9,9′-dioctylfluorene-co-bis-N,N′-(4-butylphenyl)-bis-N,N′-phenyl-1,4 phenylenediamine) (PFB). The molecular weight and blend weight ratio of the constituent polymers were used to modify the morphology. The average chemical composition of the bulk of F8BT:PFB blend in thin films was mapped using Raman microscopy at different depths from the air-film interface through controlled successive etching from the upper surface layer using an oxygen plasma. Correlating the lateral to the vertical Raman analysis of the phase separation of the film (blend weight ratio of 50:50) reveals that the μm scale de-mixed lateral phase structure seen on the free surface is present throughout most of the film thickness, though there is also some F8BT content within the PFB-rich wetting layer on the glass substrate, which we consider is due to the F8BT-rich interface at the surface to the substrate. The dependence of photovoltaic performance on morphology is discussed. 相似文献
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SiO2薄膜折射率的准确拟合分析 总被引:9,自引:4,他引:5
精确的光学常数对于设计和制备高品质的光学薄膜非常重要,尤其是那些光学性能对折射率变化敏感的薄膜。SiO_2是一种常用的低折射率材料,因与常用基底折射率相近使其准确拟合有一定难度。实验通过离子束溅射制备了SiO_2单层膜。考虑测量时的误差和基底折射率的影响,采用透射率包络和反射率包络得到了SiO_2的折射率,并用所得折射率进行反演来对这两种途径在实际测量拟合过程中的准确性进行比对。分析表明,剩余反射率在实际的测量过程中误差更小,直接用测量镀膜前后基片的剩余反射率值可以更简便更准确地得到SiO_2的折射率,能达到10~(-2)的精度。 相似文献
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