Influence of oxygen pressure on the structural, electrical and optical properties of VO2 thin films deposited on ZnO/glass substrates by pulsed laser deposition

The influence of oxygen pressure on the structural and electrical properties of vanadium oxide thin films deposited on glass substrates by pulsed laser deposition, via a 5-nm thick ZnO buffer, was investigated. For the purposes of comparison, VO₂ thin films were also deposited on c-cut sapphire and glass substrates. During laser ablation of the V metal target, the oxygen pressure was varied between 1.33 and 6.67 Pa at 500 °C, and the interaction and reaction of the VO₂ and the ZnO buffer were studied. X-ray diffraction studies showed that the VO₂ thin film deposited on a c-axis oriented ZnO buffer layer under 1.33 Pa oxygen had (020) preferential orientation. However, VO₂ thin films deposited under 5.33 and 6.67 Pa were randomly oriented and showed (011) peaks. Crystalline orientation controlled VO₂ thin films were prepared without such expensive single crystal substrates as c-cut sapphire. The metal-insulator transition properties of the VO₂/ZnO/glass samples were investigated in terms of electrical conductivity and infrared reflectance with varying temperatures, and the surface composition was investigated by X-ray photoelectron spectroscopy.     

Capacitance�Cvoltage characteristics of Pt/Bi2VO5.5/p-Si structures

Ferroelectric Bi₂VO_5.5 thin films were fabricated on p-type (100) Si substrates by sol?Cgel method and then annealed at different temperatures. The microstructures and surface morphologies of the Bi₂VO_5.5 thin films were examined by X-ray diffraction and atomic force microscope, respectively. The results indicate that the Bi₂VO_5.5 thin films show high c-axis preferred orientation and are compatible well with p-type Si substrates. The capacitance?Cvoltage characteristics of Pt/Bi₂VO_5.5/Si capacitors measured at 1 MHz shows a clockwise hysteresis loop. The memory window of the hysteresis loop is 0.42 V with the gate voltage from ?4 to 4 V. It is found that the memory window may be determined by the competition between ferroelectric polarization and charge injection.     

Phase transition and switching in pyrolytic VO2 films

VO₂ films about 3000 Å thick have been prepared by the pyrolysis of vanadile acetylacetonate (C₅H₇O₂)₂ VO. The changes in the electrical, optical and structural properties of the films during the phase transition have been investigated. Various switching effects in VO₂ films have also been studied.     

Characteristics of CeOx–VO2 composite thin films synthesized by sol–gel process

Pure vanadium dioxide (VO₂) and CeOx–VO₂ (1.5 < x < 2) composite thin films were grown on muscovite substrate by inorganic sol–gel process using vanadium pentaoxide and cerium(III) nitrate hexahydrate powder as precursor. The crystalline structure, morphology and phase transition properties of the thin films were systematically investigated by X-ray diffraction, Raman, X-ray photoelectron spectroscopy, FE-SEM and optical transmission measurements. High quality of the VO₂ and CeOx–VO₂ composite films were obtained, in which the relative fractions of +4 valence state vanadium were above 70 % though the concentrations of cerium reached 9.77 at %. However, much of cerium compounds were formed at the edge of grains and the addition of cerium resulted in more clearly defined grain boundaries as shown in SEM images. Meanwhile, the composite films exhibited excellent phase transition properties and the infrared transmittance decreased from about 70 to 10 % at λ = 4 μm bellow and above the metal–insulator phase transition temperature. The metal–insulator phase transition temperatures were quite similar with about 66 °C of the pure VO₂ and CeOx–VO₂ composite thin films. But hysteresis widths increased with more addition of cerium, due to the limiting effect of grain boundaries on the propagation of the phase transition. Particularly, the CeOx–VO₂ composite film with an addition of 7.82 at % Ce showed a largest hysteresis width with about 20.6 °C. In addition, the thermochromic performance of visible transmittance did not change obviously with more addition of cerium.     

Porous nano-structured VO2 films with different surfactants: synthesis mechanisms, characterization, and applications

Porous nano-structured vanadium dioxide (VO₂) thin films have been prepared on mica substrates via sol–gel process using surfactant cetyltrimethyl ammonium bromide, nonionic surfactant polyethylene glycol, and anionic surfactant sodium dodecyl sulfate as nano-structure directing agents. Models concerning the structure forming were proposed to explain the synthesis mechanisms between V₂O₅ colloid and different surfactants. Porous nano-structured VO₂ films with sphere-shaped, island-shaped and strip-shaped nanocrystals are synthesized in the experiments, and the optical properties and thermochromic properties of these films are compared. The porous nano-structured VO₂ films showed excellent infrared transmittance (nearly 70 %), low transition temperature (59.7 °C without doping), wide hysteresis width (37.8 °C), and different optical transmittance difference before and after the phase transition (39–67 %). The results suggest that these porous nano-structured VO₂ films have significant importance in practical application in VO₂-based optical and electronic devices.     

New intelligent multifunctional SiO2/VO2 composite films with enhanced infrared light regulation performance,solar modulation capability,and superhydrophobicity

Abstract

Highly transparent, energy-saving, and superhydrophobic nanostructured SiO₂/VO₂ composite films have been fabricated using a sol–gel method. These composite films are composed of an underlying infrared (IR)-regulating VO₂ layer and a top protective layer that consists of SiO₂ nanoparticles. Experimental results showed that the composite structure could enhance the IR light regulation performance, solar modulation capability, and hydrophobicity of the pristine VO₂ layer. The transmittance of the composite films in visible region (T_lum) was higher than 60%, which was sufficient to meet the requirements of glass lighting. Compared with pristine VO₂ films and tungsten-doped VO₂ film, the near IR control capability of the composite films was enhanced by 13.9% and 22.1%, respectively, whereas their solar modulation capability was enhanced by 10.9% and 22.9%, respectively. The water contact angles of the SiO₂/VO₂ composite films were over 150°, indicating superhydrophobicity. The transparent superhydrophobic surface exhibited a high stability toward illumination as all the films retained their initial superhydrophobicity even after exposure to 365 nm light with an intensity of 160 mW^.cm^?2 for 10 h. In addition, the films possessed anti-oxidation and anti-acid properties. These characteristics are highly advantageous for intelligent windows or solar cell applications, given that they can provide surfaces with anti-fogging, rainproofing, and self-cleaning effects. Our technique offers a simple and low-cost solution to the development of stable and visible light transparent superhydrophobic surfaces for industrial applications.     

Study on optical and electrical switching properties and phase transition mechanism of Mo6+-doped vanadium dioxide thin films

In the present work using V₂O₅ and MoO₃ powders as precursors, a novel method, the inorganic sol-gel method, was developed to synthesize Mo⁶⁺ doped vanadium dioxide (VO₂) thin films. The structure, valence state, phase transition temperature, magnitude of resistivity change and change in optical transmittance below and above the phase transition of these films are determined by XRD, XPS, four-point probe equipment and spectrophotometer. The results showed that the main chemical composition of the films was VO₂, the structure of MoO₃ in the films didn't change, and the phase transition temperature of the VO₂ was obviously lowered with increasing MoO₃ doped concentration. The magnitude of resistivity change and change in optical transmittance below and above phase transition were also decreased, of which the magnitude of resistivity change was more distinct. However, when the MoO₃ concentration was 5 wt%, the magnitude of resistivity change of doped thin films still reached more than 2 orders, and the change in optical transmittance below and above phase transition was maintained. Analysis showed that the VO₂ doped films formed local energy level, and then reduced the forbidden band gap of VO₂ as the donor defect changing its optical and electrical properties and lowering the phase transition temperature.     

Compositional and metal-insulator transition characteristics of sputtered vanadium oxide thin films on yttria-stabilized zirconia

Vanadium dioxide (VO₂) thin films have been shown to undergo a rapid electronic phase transition near 70 °C from a semiconductor to a metal, making it an interesting candidate for exploring potential application in high speed electronic devices such as optical switches, tunable capacitors, and field effect transistors. A critical aspect of lithographic fabrication in devices utilizing electric field effects in VO₂ is the ability to grow VO₂ over thin dielectric films. In this article, we study the properties of VO₂ grown on thin films of Yttria-Stabilized Zirconia (YSZ). Near room temperature, YSZ is a good insulator with a high dielectric constant ($\epsilon _{\rm r} > 25$\epsilon _{\rm r} > 25). We demonstrate the sputter growth of polycrystalline VO₂ on YSZ thin films, showing a three order resistivity transition near 70 °C with transition and hysteresis widths of approximately 7 °C each. We examine the relationship between chemical composition and transition characteristics of mixed phase vanadium oxide films. We investigate changes in composition induced by low temperature post-deposition annealing in oxidizing and reducing atmospheres, and report their effects on electronic properties.     

Vanadium oxide films with improved characteristics for ir microbolometric matrices

Vanadium oxide (VO_x) films intended for use in uncooled IR microbolometric matrices were deposited by reactive magnetron sputtering on silicon substrates. Optimum deposition conditions were determined, which provide for the obtaining of films possessing a current 1/f noise level 3–10 times lower, extended dynamic range, and increased working temperature interval. It was found that the 1/f noise level of the VO_x films depends on the VO₂ phase content and grain size. It is suggested that the observed 1/f noise is caused by the martensite transformation characteristic of the semiconductor-metal phase transition in VO₂.     

Novel synthesis and electrochemical properties of Mn(VO<Subscript>3</Subscript>)<Subscript>2</Subscript> as a high capacity electrode material in lithium-ions batteries

Mn(VO₃) powders was successfully synthesized by an effective and simple route-rheological phase reaction method and investigated as a cathode material for lithium-ion batteries. The structures, morphologies, phase purity of the prepared powder were characterized by X-ray diffraction, transmission electron microscope and X-ray photo-electron spectrometry, respectively. The results showed that the different heat temperatures could influence the particle size and crystallinity of the product. The charge-discharge experiments were performed to investigate the electrochemical properties of Mn(VO₃)₂ powder at a constant current density of 1.0 mA/cm² in a potential range of 0.0 and 3.5 V. The discharge capacity (441.1 mAh/g) showed only 31.7% losses of the initial discharge capacity (645.9 mAh/g) after 40 cycles.     

Oxygen pressure dependent VO2 crystal film preparation and the interfacial epitaxial growth study

High quality VO₂ crystal films have been prepared on sapphire substrates by pulsed laser deposition method and the effects of oxygen pressure on the crystal phase structure are investigated. Results indicate that the phases and microstructures of VO₂ films are strongly sensitive to oxygen pressure. High oxygen pressure tends to form coarse B-VO₂ nanocrystals while low pressure favors a flat M1-VO₂ film epitaxial growth. X-ray diffraction φ-scan patterns confirm the [020] epitaxial growth orientation of the M1-VO₂ film and the in-plane lattice epitaxial relationship at the interface is also examined. Raman spectra indicate that M1-VO₂ phase has much stronger Raman scattering modes than B-VO₂, and the clear phonon modes further confirm the idea stoichiometry of VO₂ crystal film. Infrared transmittance spectra as the function of temperature are recorded and the results show that M1-VO₂ crystal films undergo a distinct infrared transmittance variation across metal insulator transition boundary, while B-VO₂ exhibits negligible thermochromic switching properties in the temperature range concerned. The pronounced phase transition behavior of the M1-VO₂ crystal film makes it a promising candidate for optical filter/switch and smart window applications in the future.     

Structural, electrical and optical properties of thermochromic VO2 thin films obtained by reactive electron beam evaporation

We present the structural and physical characterization of vanadium dioxide (VO₂) thin films prepared by reactive electron beam evaporation from a vanadium target under oxygen atmosphere. We correlate the experimental parameters (substrate temperature, oxygen flow) with the films structural properties under a radiofrequency incident power fixed to 50 W. Most of the obtained layers exhibit monocrystalline structures matching that of the monoclinic VO₂ phase. The temperature dependence of the electrical resistivity and optical transmission for the obtained films show that they present thermoelectric and thermochromic properties, with a phase transition temperature around 68 °C. The results show that for specific experimental conditions the VO₂ layers exhibit sharp changes in electrical and optical properties across the phase transition.     

Microstructures and thermochromic properties of tungsten doped vanadium oxide film prepared by using VOX-W-VOX sandwich structure

Tungsten doped vanadium oxide (VO_X) thin films were prepared by oxygen annealing VO_X-W-VO_X sandwich layers. X-ray photoelectron spectroscopy, X-ray diffraction and field emission scanning electron microscope were employed to characterize the compositions, crystal structures and surface morphologies, respectively. It was demonstrated that sandwich structure suppressed the crystallization of VO_X, and that V⁵⁺ was reduced by diffused W atom to V⁴⁺. The results of surface morphologies indicated that the grain arrangement of W doped vanadium dioxide film exhibited some regular patterns compared with the random grain distribution of undoped film. Electrical measurements showed that the square resistance of V₂O₅ film and semiconductor-metal transition temperature of VO₂-V₂O₅ film decreased obviously after W doping. In addition, thermal hysteresis loop was observed in W doped V₂O₅ film with thick W middle layer. The investigation of optical properties indicated that the optical band gap of W doped V₂O₅ film decreased with the increase of thickness of W middle layer, and the optical switching performance in the near-infrared range of VO₂-V₂O₅ slightly weakened after W doping.     

Preparation of VO2 films by organometallic chemical vapour deposition and dip-coating

Low-pressure organometallic chemical vapour deposition (OMCVD) and dip-coating of VO₂ films using vanadyl tri(isobutoxide) as the starting material were investigated. In OMCVD, discontinuous VO₂ films, which were composed of fine needle crystals, formed under very limited conditions, around 600° C with a flow rate of oxygen gas of 0.2 to 0.5 cm³ sec^–1. However, very uniform and tightly packed VO₂ films were grown by deposition at 300 to 700° C in the absence of oxygen gas and subsequent annealing in nitrogen at 500° C for 2 h. The films exhibited a sharp semiconductor to metal transition at 60 to 70° C, accompanied by a change in the resistivity by four to five orders of magnitude. In dip-coating with two-step heat-treatments (300° C for 1 h in nitrogen and subsequently 500° C for 2 h in nitrogen), of the gel films formed from VO(O-i-Bu)₃-H₂O-i-PrOH system, uniform (0 1 1) oriented VO₂ films were formed. A transition in the electrical conductivity by two to two and a half orders of the magnitude was found to occur around 60° C. Before and after the transition, no distinct variation in the XRD pattern was observed.     

Recent progress in VO2 smart coatings: Strategies to improve the thermochromic properties

Vanadium dioxide (VO₂) has attracted a great interest for smart coating applications because of its promising thermochromic properties. Thermochromic performance of VO₂ is closely related to the phase composition and the microstructure, which are largely dependent on the synthesis method and growth control. This review summarizes the recent progress in fabrication of VO₂ by gas deposition. Representative deposition techniques, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), sol–gel and chemical solution methods and their relative merits are discussed. To be practically applicable, high-performance thermochromic VO₂ films are desired, often featured with a suitable phase transition temperature (T_c), high luminous transmittance (T_lum) and good modulation capability of solar energy (ΔT_sol). Focused on the strategies used to improve thermochromic properties, this review also covers topics such as multilayer construction, elemental doping, substrate selection, and structure modification. Some theoretical progresses in understanding thermochromic coatings, including phase transition mechanism and energy modeling are also provided. Although significant progress has been made in improving the thermochromic performance of VO₂ films, challenges are still present, particularly in commercial applications. Discussions on future trend and perspectives, as well as some important issues, of VO₂ films used as smart coatings will be given finally.     

Thermochromes VO2 für die Beschichtung von Architekturglas

In recent years vanadium dioxide films were discussed as thermochromic window coatings. Up to now it is not possible to deposit films, the properties of which are well-suited for technical application. In the following properties of reactively rf sputtered VO₂ films on a laboratory scale are reported. Besides optical measurements, analytical techniques as photoelectron spectometry, electron energy loss spectrometry, and secondary ion mass spectrometry are applied to VO₂ films for the first time. We expect that these investigations will result in a better understanding of the metal-to-semiconductor transition, and other film properties as for example electronic defects and diffusion profiles at the interfaces and their effects on the band structure, thus aiming at superior film processing. In the following a survey over first results is presented.     

Molybdenum-doped vanadium dioxide coatings on glass produced by the aqueous sol-gel method

Thin films of vanadium dioxide (VO₂) on glass substrates were produced by the aqueous sol-gel method. Various levels of doping were achieved by adding small quantities of a water-soluble molybdenum compound to the sol. After dip coating, the substrates were reduced by heat treatment in a low-pressure carbon monoxide/carbon dioxide (CO/CO₂) atmosphere. The change in electrical conductivity with temperature, and optical reflectance in the semiconductor and metallic phases were measured and compared to undoped VO₂ films. Doping the VO₂ films with molybdenum lowered the transition temperature of the semiconductor-to-metal phase change; at a doping level of 7 at.% the transition temperature was measured at 24 °C, as indicated by the electrical conductivity. All the films showed a substantial change in reflectance upon heating through the transition. The optical reflectance in the semiconductor state increased slightly with additional dopant, while the reflectance in the metallic state remained constant.     

Enhanced hydrophilicity of the Si substrate for deposition of VO2 film by sol–gel method

We have illustrated the role of hydrophilic nature of Si substrate played in the improvement of the contact performance between the vanadium dioxide (VO₂) film and Si substrate. The VO₂ films were fabricated by sol–gel method on single crystal Si substrate, which was pre-treated with hydrophilic solution and obtained a quite improved hydrophilicity. The bonding of Si substrate with precursor V₂O₅ gel was interpreted. The morphology and crystalline structure of the films were investigated by field-emission scanning electron microscopy, atomic force microscopy and X-ray diffraction. It is shown that the surface of the film on Si substrate with enhanced hydrophilicity is quite homogeneous and uniform. The film exhibits the formation of VO₂ phase with (011) preferred orientation. Moreover, the optical pump induced phase transition property of the film was studied by terahertz time-domain spectroscopy, which revealed around 70% reduction of transmission at 0.1–1.5?THz in the VO₂ film across the phase transition.     

等离子体电解氧化法制备多孔TiO2/V2O5复合物膜层及其增强光催化产氢活性

较差的光催化产氢效率极大地阻碍了TiO₂光催化剂的工业化应用。为此,本文在含有NH₄VO₃的磷酸盐溶液中,采用等离子体电解氧化(PEO)法制备了多孔TiO₂/V₂O₅复合膜光催化剂,通过扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射(XRD)、X射线光电子谱(XPS)和紫外可见漫反射光谱(UV-Vis DRS)对其组成、结构及光吸收性质进行了表征,并采用气相色谱评价了薄膜催化剂的光催化产氢性能,研究了电解液中NH₄VO₃含量对膜的结构、组成和光催化产氢性能的影响。结果表明:复合膜催化剂主要由锐钛矿和金红石型TiO₂组成,具有微孔结构,V₂O₅主要以无定形形式存在于膜中,与TiO₂有很强的相互作用,影响TiO₂的晶面间距。研究发现,元素V抑制了TiO₂的结晶和金红石型TiO₂的形成,扩大了薄膜的光学吸收范围。针对Na₂S+ Na₂SO₃溶液中的光催化产氢性能的研究显示,在质量浓度为1 g/L NH₄VO₃的电解液中制备的TiO₂/V₂O₅薄膜的光催化活性最高,优于近年来报道的其他光催化剂。光催化重复实验表明,该复合膜催化剂具有较高的稳定性和较为恒定的光催化活性。     

Poly(vinylidene fluoride)/poly(methyl methacrylate)/TiO2 blown films: preparation and surface study

Blown films of poly(vinylidene fluoride) (PVDF) and poly(methyl methacrylate) (PMMA) blends and PVDF/PMMA/TiO₂ composites were prepared by melting-extrusion for the first time. The crystalline structure and surface morphology PVDF/PMMA (DFMA) blown films were investigated using differential scanning calorimeter (DSC), atomic force microscope (AFM), and X-ray diffractometry (XRD). PVDF/PMMA/TiO₂ blown films were further prepared and underwent surface treatment. The results show that PVDF/PMMA/TiO₂ blown films present good mechanical properties, and acrylic acid surface-grafted films exhibit good adhesion capability and long-lasting hydrophilicity, making them attractive as encapsulation materials.