Effects of annealing on CuInSe2 films grown by molecular beam epitaxy

CuInSe₂ (CIS) thin films with a range of Cu/In ratios were grown by molecular beam epitaxy on GaAs (0 0 1) at substrate temperatures of T_s = 450–500°C and the effects of annealing under various atmospheres have been investigated. Photoluminescence spectra obtained from an ex-situ vacuum annealed CIS film at a temperature of T_A = 350°C showed a red-shift and a broadening of an emission peak (peak c) which originally appeared at 0.970 eV before annealing and the red-shifted peak c was found to consist of two overlapping peaks. The excitation power dependence of these overlapping peaks indicated the radiative recombination processes associated with the emissions to be a conduction band to acceptor transition (peak at 0.970 eV) and a transition due to donor-acceptor pairs (peak at 0.959 eV), indicating the formation of a shallow donor-type defect during the vacuum annealing process. The origin of this defect has tentatively been attributed to Se vacancies. On the other hand, the molar fraction of oxygen increased with increasing annealing temperature in dry-air. An epitaxially grown In₂O₃ phase was found both in Cu-rich and In-rich films annealed at T_A 350°C, which was not observed in the films annealed in Ar atmosphere. Thermodynamic calculations based on the Cu---In---Se---O---N system showed In₂O₃ to be the most stable phase in good agreement with the experimental results.     

Pyrite (FeS2) thin films prepared by spray method using FeSO4 and (NH4)2Sx

A simple spray method for the preparation of pyrite (FeS₂) thin films has been studied using FeSO₄ and (NH₄)₂S_x as precursors for Fe and S, respectively. Aqueous solutions of these precursors are sprayed alternately onto a substrate heated up to 120°C. Although Fe–S compounds including pyrite are formed on the substrate by the spraying, sulfurization of deposited films is needed to convert other phases such as FeS or marcasite into pyrite. A single-phase pyrite film is obtained after the sulfurization in a H₂S atmosphere at around 500°C for 30 min. All pyrite films prepared show p-type conduction. They have a carrier concentration (p) in the range 10¹⁶–10²⁰ cm⁻³ and a Hall mobility (μ_H) in the range 200–1 cm²/V s. The best electrical properties (p=7×10¹⁶ cm⁻³, μ_H=210 cm²/V s) for a pyrite film prepared here show the excellence of this method. The use of a lower concentration FeSO₄ solution is found to enhance grain growth of pyrite crystals and also to improve electrical properties of pyrite films.     

Influence of In2S3 film properties on the behavior of CuInS2/In2S3/ZnO type solar cells

Solar cells of CuInS₂/In₂S₃/ZnO type are studied as a function of the In₂S₃ buffer deposition conditions. In₂S₃ is deposited from an aqueous solution containing thioacetamide (TA), as sulfur precursor and In³⁺. In parallel, variable amounts of In₂O₃ are deposited that have an important influence on the buffer layer behavior. Starting from deposition conditions determined in a preliminary study, a set of parameters is chosen to be most determining for the buffer layer behavior, namely the solution temperature, the concentration of thioacetamide [TA], and the buffer thickness. The solar cell results are discussed in relation with these parameters. Higher efficiency is attained with buffer deposited at high temperature (70 °C) and [TA] (0.3 M). These conditions are characterized by short induction time, high deposition rate and low In₂O₃ content in the buffer. On the other hand, the film deposited at lower temperature has higher In₂O₃ content, and gives solar cell efficiency sharply decreasing with buffer thickness. This buffer type may attain higher conversion efficiencies if deposited on full covering very thin film.     

An investigation into effect of cationic precursor solutions on formation of CuInSe2 thin films by SILAR method

SILAR deposition of CuInSe₂ films was performed by using Cu²⁺–TEAH₃ (cupric chloride and triethanolamine) and In³⁺–CitNa (indium chloride and sodium citrate) chelating solutions with weak basic pH as well as Na₂SeSO₃ solution at 70 °C. A separate mode and a mixed one of cationic precursor solutions were adopted to investigate effects of the immersion programs on crystallization, composition and morphology of the deposited CuInSe₂ films. Chelating chemistry in two solution modes was deducted based on IR measurement. The XRD, XPS and SEM results showed that well-crystallized, smoothly and distinctly particular CuInSe₂ films could be obtained after annealing in Ar at 400 °C for 1 h by using the mixed cationic solution mode.     

Optical and electrochemical properties of V2O5:Ta Sol–Gel thin films

Vanadium and tantalum-doped vanadium pentoxide, V₂O₅ and V₂O₅:Ta thin films (2.5 and 5 mol% of Ta) were prepared using sol–gel dip-coating technique.The coating solutions were prepared by reacting vanadium (V) oxytripropoxide and tantalum ethoxide (V) as precursors using anhydrous isopropyl alcohol as solvent.The films were deposited on a transparent glass substrate with ITO conducting film by dip-coating technique, with a withdrawal of 20 cm/min from the vanadium–tantalum solution and heat treated at 300 °C for 1 h. The resulting films were characterized by cyclic voltammetry, optical spectroscopy and by X-ray diffraction analysis (XRD). XRD data show that the films thermally treated at 300 °C were crystalline.A charge density of 70 mC/cm² was obtained for the film with 5 mol% of Ta, with an excellent stability up to 1500 cycles.     

Electrochromic properties of Nb2O5 sol–gel coatings

Sol–gel niobium oxide coatings are promising electrochromic materials. The sols have been prepared by a sonocatalytic mixing of NbCl₅ powder, butanol and acetic acid. Thermal analysis (DTA/TG) coupled to mass spectrometry has been performed on Nb₂O₅ precipitates to quantitatively analyse the effluents. Transparent and defect-free single and multilayers coatings have been deposited on ITO-coated glass by a dip-coating process and then calcined between 400°C and 600°C. The coatings structure change from amorphous to crystalline (TT form) and the later ones are highly textured. The films present a reversible and fast insertion/extraction kinetics for Li⁺ ions. After insertion the amorphous coatings present a grey-brown color, while the crystalline ones are dark blue. The maximum charge density exchanged with a three-layer 200 nm thick coating sintered at 600°C was 16 mC/cm² with a corresponding spectral transmission change practically wavelength-independent varying from 80% to 20%. The coloring efficiency determined at λ=600 nm was 22 cm²/C.     

Fabrication of CuInSe2 films and solar cells by the sequential evaporation of In2Se3 and Cu2Se binary compounds

Cu₂Se/In_xSe(x≈1) double layers were prepared by sequentially evaporating In₂Se₃ and Cu₂Se binary compounds at room temperature on glass or Mo-coated glass substrates and CuInSe₂ films were formed by annealing them in a Se atmosphere at 550°C in the same vacuum chamber. The In_xSe thickness was fixed at 1 μm and the Cu₂Se thickness was varied from 0.2 to 0.5 μm. The CuInSe₂ films were single phase and the compositions were Cu-rich when the Cu₂Se thickness was above 0.35 μm. And then, a thin CuIn₃Se₅ layer was formed on the top of the CuInSe₂ film by co-evaporating In₂Se₃ and Se at 550°C. When the thickness of CuIn₃Se₅ layer was about 150 nm, the CuInSe₂ cell showed the active area efficiency of 5.4% with V_oc=286 mV, J_sc=36 mA/cm² and FF=0.52. As the CuIn₃Se₅ thickness increased further, the efficiency decreased.     

Preparation of CuIn1−xGaxSe2 thin films by sputtering and selenization process

CuIn_1−xGa_xSe₂ polycrystalline thin films were prepared by a two-step method. The metal precursors were deposited either sequentially or simultaneously using Cu–Ga (23 at%) alloy and In targets by DC magnetron sputtering. The Cu–In–Ga alloy precursor was deposited on glass or on Mo/glass substrates at either room temperature or 150°C. These metallic precursors were then selenized with Se pellets in a vacuum furnace. The CuIn_1−xGa_xSe₂ films had a smooth surface morphology and a single chalcopyrite phase.     

Effect of the sintering temperature on the photocatalytic activity of ZnO+Zn2TiO4 thin films

ZnO+Zn₂TiO₄ thin films were obtained by the sol–gel method, the precursor solutions were prepared using two Ti/Zn ratios: 0.49 and 0.69. The films were deposited on glass slide substrates and sintered at temperatures in the 200–600 °C range in increments of 50 °C, with the goal of studying the dependence of the photocatalytic activity (PA) on the annealing temperature. The films were characterized by X-ray diffraction and UV–Vis spectroscopy. The PA was evaluated by measuring the UV–Vis absorption spectra of the methylene blue in aqueous solution before and after photobleaching, using the Lambert–Beer's principle. The higher photocatalytic activities were obtained from the films with sintering temperature around 450 °C, for both Ti/Zn ratios studied.     

Optical properties of sol–gel deposited Al2O3 films

Highly transparent, uniform and corrosion resistant Al₂O₃ films were prepared on stainless-steel and quartz substrates by the sol–gel process from stable coating solutions using aluminum-sec-butoxide, Al(OBu^s)₃ as precursor, acetylacetone, AcAcH as chelating agent and nitric acid, HNO₃, as catalyzer. Films up to 1000 nm thick were prepared by multiple spin coating deposition, and were characterized by X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), Fourier transform infrared spectroscopy (FTIR), optical spectroscopy and micro Vickers hardness test. XRD of the film heat treated at 400°C showed that they had an amorphous structure. XPS confirmed that they were stoichiometric Al₂O₃. The refractive index (n) and extinction coefficient (k) were found to be n=1.56±0.01 and k=0.003±0.0002 at 600 nm, respectively. The surface microhardness and corrosion resistance investigations showed that Al₂O₃ films improved the surface properties of stainless-steel substrates.     

Electrical and luminescent properties of CuGaSe2 crystals and thin films

CuGaSe₂ thin films with thicknesses of about 2 μm were prepared by flash and single source evaporation onto mica and (1 1 0)-oriented ZnSe substrates in the substrate temperature range 150–450°C. The obtained polycrystalline CuGaSe₂ films had the chalcopyrite structure with the predominant growth direction 2 2 1. Hall effect, conductivity and luminescence measurements have been carried out on CuGaSe₂ thin films and source materials: CuGaSe₂ single crystals grown by Bridgman technique and by chemical vapour transport using I₂ as transport agent. All films and crystals are p-type. Two acceptor levels with ionization energies E_A150–56 meV and E_A2130–150 meV have been identified as due to Ga vacancy and presence of Se atoms on interstitial sites respectively.     

Electrochromic properties of heat-treated thin films of CeO2–TiO2–ZrO2 prepared by sol–gel route

CeO₂–TiO₂–ZrO₂ thin films were prepared using the sol–gel process and deposited on glass and ITO-coated glass substrates via dip-coating technique. The samples were heat treated between 100 and 500 °C. The heat treatment effects on the electrochromic performances of the films were determined by means of cyclic voltammetry measurements. The structural behavior of the film was characterized by atomic force microscopy and X-ray diffraction. Refractive index, extinction coefficient, and thickness of the films were determined in the 350–1000 nm wavelength, using nkd spectrophotometry analysis.Heat treatment temperature affects the electrochromic, optical, and structural properties of the film. The charge density of the samples increased from 8.8 to 14.8 mC/cm², with increasing heat-treatment temperatures from 100 to 500 °C. It was determined that the highest ratio between anodic and cathodic charge takes place with increase of temperature up to 500 °C.     

Some physical investigations on AgInS2 sprayed thin films

AgInS₂ thin films have been prepared on glass substrates by the spray pyrolysis process using an aqueous solution which contains silver acetate (AgCH₃CO₂), thiourea (SC(NH₂)₂) and indium chloride (InCl₃) as precursors. The depositions were carried out in the range of the substrate temperature from 260 to 420 °C. The value of the concentration ratio in the spray solution of indium and silver elements x=[Ag⁺]/[In³⁺] was varied from 1 to 1.5 with [In³⁺]=10⁻² M and [S²⁻]/[In³⁺] was taken constant, equal to 4. The structural study shows that AgInS₂ thin film, prepared at 420 °C using optimal concentration ratio x=1.3 crystallizes in the chalcopyrite phase with a strong (1 1 2) X-ray diffraction line. Moreover, microprobe analysis (EPMA) shows that a nearly stoichiometric composition is obtained for these experimental conditions. Indeed, the atomic percentage of elements were. 24.5, 25.0, 49.5 for Ag, In and S, respectively. On the other hand from transmission and reflectance spectra, the obtained band gap energy is 1.83 eV for such film.     

RF sputter deposition of the high-quality intrinsic and n-type ZnO window layers for Cu(In,Ga)Se2-based solar cell applications

Transparent ZnO films were prepared by rf magnetron sputtering, and their electrical, optical, and structural properties were investigated under various sputtering conditions. Aluminum-doped n-type(n-ZnO) and undoped intrinsic-ZnO (i-ZnO) layers were deposited on a glass substrate by incorporating different targets in the same reaction chamber. The n-ZnO films were strongly affected by argon ambient pressure and substrate temperature, and films deposited at 2 mTorr and 100°C showed superior properties in resistivity, transmission, and figure of merit (FOM). The sheet resistance of ZnO film was less dependent on film thickness when the substrate was heated during deposition. These positive effects of elevated substrate temperature are presumably attributed to the rearrangement of the sputtered atoms by the heat energy. Also, the films are electrically uniform through the 5 cm×5 cm substrate. The maximum deviation in sheet resistance is less than 10%. All of the films showed strong (0 0 2) diffraction peak near 2θ =34°. The undoped i-ZnO films deposited in the mixture of argon and oxygen gases showed high transmission properties in the visible range, independent of the Ar/O₂ ratio, while resistivity rose with increased oxygen partial pressure. The Cu(In,Ga)Se₂ solar cells, incorporating bi-layer ZnO films (n-ZnO/i-ZnO) as window layer, were finally fabricated. The fabricated solar cells showed 14.48% solar efficiency under AM 1.5 conditions (100 mW/cm²).     

Study of electron-beam evaporated Sn-doped In2O3 films

Electron beam evaporated Sn-doped In₂O₃ films have been prepared from the starting material with composition of (1 − x) In₂O₃ − -x SnO₂, where x = 0.0, 0.010, 0.025, 0.050, 0.090, and 0.120. X-ray photoelectron spectroscopy, Rutherford backscattering spectrometry, and X-ray diffraction analysis were carried out on the films. Luminous transmittance and electrical resistivity of the films, show weak dependence on x. The composition of the film ([Sn]/[In] atomic ratio) was found to differ from that of the starting material. In fact, the atomic ratio was higher in the film than in the starting material by a factor which increases with x (ranging from 1.0 to 2.6). There is a relatively broad resistivity minimum in the layer atomic ratio range Sn/In = 0.06 − -0.09. These results compare well with those reported in the literature for Sn-doped In₂O₃ films, prepared by pyrolitic (spray) method.     

Photoluminescence studies of p-type chalcopyrite AgInS2:Sn

Chalcopyrite AgInS₂:Sn thin films were prepared by spray pyrolysis technique for a constant ratio of [Ag]/[In]=1.5 and different SnCl₄ concentrations (0.05, 0.1 and 0.2 ml) in the spray solution obtaining x=[SnCl₄]/[Ag]+[In]=0.01, 0.02, 0.04. All films were deposited at substrate temperature of 375 °C. The deposited film for which x=0.02 exhibited p-type conductivity, having band-gap energies of 1.87 and 2.01 eV. Photoluminescence (PL) studies reveal several PL bands located at 1.45, 1.68, 1.70, 1.80 and 1.88 eV at 10 K. Each one of these PL structures are related to different defects, the 1.45 eV emission is related to indium vacancies, 1.80 eV emission to interstitial silver (Ag_in) or Indium in sites of silver (Ag_In), whereas, the other emissions (1.70 and 1.88 eV) are related with a donor–acceptor pair recombination and free to bound transition, respectively, due to sulphur vacancies. Sn in excess modifies the emission bands located at 1.70 and 1.88 eV; we found that Sn reduces sulphur vacancies and PL spectra are dominated by acceptor impurities.     

Effect of copper diffusion on photovoltaic characteristics of CuGaSe2–GaAs cells

CuGaSe₂–GaAs heterojunctions were fabricated by fast evaporation of polycrystalline CuGaSe₂ from a single source on n-type GaAs substrates. The best CuGaSe₂–GaAs photocell (without an antireflective coating) exhibited an efficiency of 11.5%, J_sc=32 mA/cm², V_oc=610 mV and FF=0.60. The spectral distribution of photosensitivity of CuGaSe₂–GaAs junctions extends from 400 to 900 nm. The CuGaSe₂ films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM) techniques. XRD analysis indicated that the thin films were strongly oriented along the (1 1 2) plane. SEM studies of CuGaSe₂ films showed nearly stoichiometric composition with grain size about 1–2 μm. The energy dispersive X-ray spectroscopy (EDX) analysis of Cu concentration distribution in n-type GaAs showed that Cu diffused from the film into n-type GaAs during the growth process resulting in formation of the latent p–n homojunction in substrate. The diffusion coefficient of Cu in GaAs at growth temperature (520°C) estimated from EDX measurements was 6×10⁻⁸ cm²/s.     

Preferential oxidation of CO in H2 stream on Au/CeO2–TiO2 catalysts

A series of Au catalysts supported on CeO₂–TiO₂ with various CeO₂ contents were prepared. CeO₂–TiO₂ was prepared by incipient-wetness impregnation with aqueous solution of Ce(NO₃)₃ on TiO₂. Gold catalysts were prepared by deposition–precipitation method at pH 7 and 65 °C. The catalysts were characterized by XRD, TEM and XPS. The preferential oxidation of CO in hydrogen stream was carried out in a fixed bed reactor. The catalyst mainly had metallic gold species and small amount of oxidic Au species. The average gold particle size was 2.5 nm. Adding suitable amount of CeO₂ on Au/TiO₂ catalyst could enhance CO oxidation and suppress H₂ oxidation at high reaction temperature (>50 °C). Additives such as La₂O₃, Co₃O₄ and CuO were added to Au/CeO₂–TiO₂ catalyst and tested for the preferential oxidation of CO in hydrogen stream. The addition of CuO on Au/CeO₂–TiO₂ catalyst increased the CO conversion and CO selectivity effectively. Au/CuO–CeO₂–TiO₂ with molar ratio of Cu:Ce:Ti = 0.5:1:9 demonstrated very high CO conversion when the temperature was higher than 65 °C and the CO selectivity also improved substantially. Thus the additive CuO along with the promoter and amorphous oxide ceria and titania not only enhances the electronic interaction, but also stabilizes the nanosize gold particles and thereby enhancing the catalytic activity for PROX reaction to a greater extent.     

Oxidative photoelectrochemical technology with Ti/TiO2 anodes

Rutile and anatase TiO₂ films have been grown on Ti plates by thermal (500–800°C) and anodic oxidation followed by thermal annealing (400–500°C), respectively. The photoelectrochemical efficiency of these photoanodes, evaluated by current density measurements in the photooxidation of 4-methoxybenzyl alcohol in deaerated CH₃CN, has been determined. The photocurrent efficiency increases with the thickness of the TiO₂ rutile film up to 1 μm (the most efficient thickness). At the wavelengths furnished by the irradiation apparatus similar thicknesses of anatase and rutile films show nearly the same efficiencies. Anodic bias produces similar relative increases of current intensity in both crystalline forms.     

Preparation of Cu(In,Ga)Se2 thin films from Cu–Se/In–Ga–Se precursors for high-efficiency solar cells

Improved preparation process of a device quality Cu(In,Ga)Se₂ (CIGS) thin film was proposed for production of CIGS solar cells. In–Ga–Se layer were deposited on Mo-coated soda-lime glass, and then the layer was exposed to Cu and Se fluxes to form Cu–Se/In–Ga–Se precursor film at substrate temperature of over 200°C. The precursor film was annealed in Se flux at substrate temperature of over 500°C to obtain high-quality CIGS film. The solar cell with a MgF₂/ITO/ZnO/CdS/CIGS/Mo/glass structure showed an efficiency of 17.5% (V_oc=0.634 V, J_sc=36.4 mA/cm², FF=0.756).