ChCl-Urea低共熔溶剂中Ni-P合金的电沉积行为研究

以氯化胆碱-尿素(ChCl-Urea)低共熔溶剂为基础液,电沉积制备Ni-P合金镀层。采用循环伏安和计时电流技术对Ni-P合金镀层的电沉积机理进行研究,使用扫描电子显微镜(SEM/EDS)和X射线衍射(XRD)对镀层的微观形貌、元素组成和物相组成进行表征,利用动电位极化曲线对镀层的耐腐蚀性能进行分析。结果表明,Ni-P合金镀层在ChCl-Urea-NiCl₂-NaH₂PO₂低共熔溶剂中的电沉积过程是受扩散步骤控制的不可逆过程,且成核机理为三维连续成核,该体系下可制得光亮、平滑、致密的镀层。     

电镀CrNiFe合金工艺条件研究

研究了从氯化物—硫酸盐电介质中电镀CrNiFe合金。槽的组成、电沉积条件和镀层的组成。在Cr~(3+)、Ni~(2+)、Fe~(2+)共沉积中,Ni~(2+)、Fe~(2+)共沉积属异常共沉积。槽中Fe~(2+)的浓度对镀层组成有很大影响。     

电沉积Ni-Co-Cr合金镀层及其耐蚀性研究

采用电化学恒电流技术在铜基体上沉积制备了Ni-Co-Cr三元合金镀层,研究了电流密度、温度及pH值对合金镀层成分的影响.利用SEM和EDS研究了Ni-Co-Cr合金镀层的形貌与成分,通过交流阻抗技术研究了镀层的耐蚀性.采用弯曲实验法测定了镀层的结合力.结果表明,在阴极电流密度为100 mA/cm2,镀液温度为25℃,pH为2.5条件下沉积的合金镀层致密均匀,化学组成中Cr含量达到最高(达到10％,该成分为10.22％ Cr,21.61％ Ni,59.86％ Co,质量分数,氧和铜含量未计入),具有优化耐蚀性.     

ChCl-Urea低共熔溶剂中银锡合金的电沉积行为研究

以氯化胆碱-尿素(ChCl-Urea)低共熔溶剂为基础液,电沉积制备银锡合金镀层,采用循环伏安曲线、计时电流曲线对银锡合金的电化学过程进行分析,使用扫描电子显微镜(SEM)对银锡合金镀层微观形貌进行研究,利用极化曲线对银锡合金镀层的耐蚀性进行分析.结果表明,ChCl-Urea低共熔离子液体体系中,银锡的成核方式为三维瞬...     

低共熔溶剂中Ni-Co合金电沉积的工艺研究

在摩尔比为1∶2的氯化胆碱-尿素(ChCl-Urea)低共熔溶剂中,在纯铜基体表面制备Ni-Co合金镀层.分别研究沉积温度、沉积电位、主盐浓度比三种因素对Ni-Co合金沉积镀层的影响,通过观察镀层的微观形貌,并利用极化曲线对Ni-Co合金镀层的耐蚀性进行分析,确定ChCl-Urea-NiCl2·6H2O-CoCl2·6...     

电沉积Ni-Co-Cr合金镀层的电化学性能

采用电化学恒电流技术在铜基体上沉积制备了Ni-Co-Cr三元合金镀层,研究了柠檬酸钠、硼酸及十二烷基硫酸钠对合金镀层的耐蚀性能影响.结果表明：在柠檬酸钠的浓度为200 g/L,糖精的浓度为1.4 g/L,硼酸的浓度为40 g/L,十二烷基硫酸钠的浓度为0.18 g/L,在此条件下沉积的合金镀层耐蚀性能最佳.     

Ni-P/纳米TiO2复合镀层的制备与性能

采用电泳沉积-化学镀两步法制备了化学镀Ni-P/纳米TiO2复合镀层,研究了电场强度、电流及电泳时间对电泳工艺的影响,确定了合适的化学镀工艺参数,用X射线衍射和扫描电镜对复合镀层的结构进行分析,测试了复合镀层的显微硬度,用甲基橙为模型反应物对复合镀层进行光催化降解实验.实验结果表明,纳米TiO2颗粒在复合镀层中分布均匀,在镀态下和经过热处理后复合镀层显微硬度均高于化学镀镍磷合金,复合镀层催化效果与纳米二氧化钛涂层相当.     

-βSiC纳米颗粒对Ni-Co共电沉积合金结构和性能的影响

采用复合电沉积方法在Ni基体上制备了(Ni-Co)-SiC纳米复合镀层,该镀层的组织结构与电沉积Ni-Co合金(晶粒尺寸:110 nm)镀层不同,由Ni-Co固溶体基体(晶粒尺寸:50 nm)和均匀分布其中的SiC纳米颗粒(晶粒尺寸:45 nm)组成。SiC纳米颗粒的加入大大细化了镀层的组织,增加了镀层的显微硬度.电化学实验表明:SiC纳米颗粒使金属还原电位发生正移,降低了Ni-Co合金镀液的极化作用.     

电沉积及激光辅助电沉积镍基镀层表面形貌研究

采用电沉积技术和激光辅助电沉积技术制取了Ｎｉ－Ｐ,Ｎｉ－Ｗ－Ｃｏ合金镀层和Ｎｉ－Ｐ、Ｎｉ－ Ｗ－Ｃｏ与硬质颗粒ＳｉＣ、Ｂ４Ｃ共沉积形成的复合镀层．用光学显微镜和扫描电镜观察了不同 的施镀条件下镀层的表面形貌,分析了其变化的影响因素．分析结果表明：沉积速度和颗 粒的添加量是影响镀层表面形貌的两个重要因素．     

恒定磁场下用脉冲电沉积法制备金刚石工具的实验研究

在采用脉冲电沉积制备纳米镍-钴合金镀层的过程中,引入外加恒定磁场,磁场方向与电场方向垂直。采用扫描电镜和X射线衍射观察的结果表明:恒定磁场的引入可使镀层表面晶粒细化,让纳米镍-钴合金镀层表面更平整、致密;在外加磁场电压为7 V时,镀层硬度达到最大值583 HV,比无磁场影响制得的镀层硬度值提高了112 HV。在外加磁场电压为7 V时,脉冲电沉积制备的金刚石工具比无磁场制备的金刚石工具使用寿命提高了21%。     

Fe^2＋质量浓度对纳米晶Ni-Fe合金电沉积层耐蚀性的影响

采用直流电沉积技术在黄铜基体上制备出低Fe高Ni的纳米晶Ni-Fe合金镀层。研究不同Fe2＋质量浓度（2～12 g/L）对合金镀层的表面形貌、镀层成分、相结构、镀层显微硬度和耐蚀性的影响规律。实验结果表明,电镀Ni-Fe合金可获得纳米晶结构,当Fe2＋质量浓度为4 g/L时,硬度较高,为658 HV。在质量分数为3.5%的NaCl溶液中,Fe2＋质量浓度为4 g/L时,合金镀层的耐蚀性最好,自腐蚀电流密度较小,约为0.430μA/cm2,涂层电阻较大,约为143 400Ω,比基体黄铜提高约40倍。     

合金电镀的理论发展及镍合金电镀的最新进展

近几年来,合金电镀的发展十分迅速,在镀种不断增加,工艺配方不断改进的同时,也注重了对合金电镀的共沉积机理的研究。本文主要对多元合金共沉积的数学模型及脉冲电流对合金电镀的影响作了综述,同时对新近发展较快的镍合金电镀的性能及配方进行了讨论。     

苯胺的电聚合研究

利用环—盘电极探讨了酸性水溶液中苯胺的电化学聚合行为。环电极设置在－０．２Ｖ（ｖｓ．ＳＣＥ）,在首次扫描过程中,盘电位超过０．７５Ｖ（ｖｓ．ＳＣＥ）时,盘电流和环电流均迅速增加。在盘上形成的电活性物质具有足够动力学寿命,迁移至环上并被还原,实验中,检测到了环电极上的聚苯胺膜。苯胺单体的聚合速率还依赖于苯胺浓度和酸度     

Electrochemical behaviors of Zn-Fe alloy and Zn-Fe-TiO2 composite electrodeposition

Electrochemical behaviors of Zn-Fe alloy and Zn-Fe-TiO₂ composite electrodeposition in alkaline zincate solutions were studied respectively by the methods of linear potential sweep and cyclic voltammetry. From the results it can be concluded that Zn shows under potential deposition, Zn-Fe alloy codeposition is anomalous codeposition and Zn-Fe alloy cathode polarization is increased with the introduction of additive. From the view point of electrochemistry, the reasons that the content of Fe in the Zn-Fe coating changes with the composition of the electrolyte and the process conditions altering and the relationship between the content of Fe and the appearance of the coating are interpreted. The cathode polarization of Zn-Fe alloy codeposition is enhanced obviously with addition of additive. In the course of composite electrodeposition, TiO₂ has less promotion to electrodeposition of zinc ions than to iron ions, while the electrodeposition of iron ions improves the content of TiO₂ in composite coating, which is in agreement with the results of process experiments.     

Electrochemical behaviors of Zn-Fe alloy and Zn-Fe-TiO_2 composite electrodeposition

Electrochemical behaviors of Zn-Fe alloy and Zn-Fe-TiO2 composite electrodeposition in alkaline zincate solutions were studied respectively by the methods of linear potential sweep and cyclic voltammetry. From the results it can be concluded that Zn shows under potential deposition, Zn-Fe alloy codeposition is anomalous codeposi-tion and Zn-Fe alloy cathode polarization is increased with the introduction of additive. From the view point of electrochemistry, the reasons that the content of Fe in the Zn-Fe coating changes with the composition of the electrolyte and the process conditions altering and the relationship between the content of Fe and the appearance of the coating are interpreted. The cathode polarization of Zn-Fe alloy codeposition is enhanced obviously with addition of additive. In the course of composite electrodeposition, TiO2 has less promotion to electrodeposition of zinc ions than to iron i-ons, while the electrodeposition of iron ions improves the content of TiO2 in composite coating,     

氯化铵体系Zn－Ni合金电镀

研究了镀液成分和工艺参数对镀层Ｎｉ含量的影响，探讨了Ｚｎ－Ｎｉ合金共沉积机理，获得了耐蚀性为同等镀锌层６倍以上的光亮Ｚｎ－Ｎｉ（１３％）合金电镀的配方和工艺条件．     

锌镍合金电镀液在线分析中分离技术的研究

研究了锌镍合金电镀液在线分析中的萃取色层分离技术，通过对两种方法（负载法与合成法）制备的萃淋树脂的性能研究及萃取色层柱分离条件的考察，建立了以１－（２－吡啶偶氮）－间苯二酚为显色剂，在线分析的萃取色层分离光度分析方法，利用此法可将锌镍完全分离，实现锌镍的同时检测。该法的准确度和精密度均令人满意，变异系数小于１．２％，两种萃淋树脂的吸附容量分别可达１．９１ｍｇ／ｇ和８．７０ｍｇ／ｇ干树脂。     

盘式钻头齿圈强化工艺技术试验研究

在对盘式钻头齿圈失效机理分析的基础上。提出了齿图表面堆焊耐磨合金强化方法和镶嵌硬质合金齿圈强化方法，通过试验研究和对比分析，确定了冶金混合烧结固齿法镶嵌硬质合金齿圈强化盘式钻头。进一步的试验研究表明：采用冶金混合烧结固齿法镶嵌硬质合金齿圈来强化盘式钻头齿圈，其结合情况非常好；硬质合金齿圈的硬度、耐磨料磨损的能力和耐冲击磨料磨损的能力在烧结后都有进一步的提高，说明采用冶金混合烧结固齿法镶嵌硬质合金齿圈来强化盘式钻头齿圈是可行的。     

电泳-电沉积法制备Ni-Fe2O3复合镀层 及其氧化性能研究

先采用电泳沉积工艺在Ni基体上均匀沉积Fe2O3膜,然后采用电镀技术在Fe2O3膜中沉积金属Ni,得到含Fe2O3质量分数较高的Ni-Fe2O3复合镀层。分析了沉积电压对电泳沉积Fe2O3膜厚度的影响,研究了镀层的高温氧化性能,并对其氧化机理进行了探讨。使用傅里叶红外光谱、扫描电镜、能谱仪、X射线衍射仪对镀层的截面形貌、成分等进行了研究。结果表明:通过改变阴阳两极之间的电场强度或调整两极之间的距离,电泳沉积Fe2O3的厚度会发生很大的变化;经过一定温度热处理后,电泳沉积层中的有机物去除干净;使用电泳-电沉积法制备的Ni-Fe2O3镀层与基体之间的结合界面紧密、完整;复合沉积层在1 000℃高温条件下氧化后可以得到镍铁尖晶石结构的物质。     

Influence of bath composition on the electrodeposition of cobalt-molybdenum amorphous alloy thin films

Cobalt-molybdenum (Co-Mo) amorphous alloy thin films were deposited on copper substrates by the electrochemical method at pH 4.0. Among the experimental electrodeposition parameters, only the concentration ratio of molybdate to cobalt ions ([ MoO2-4 ]/[CO2 ]) was varied to analyze its influence on the mechanism of induced cobalt-molybdenum codeposition. Voltammetry was one of the main techniques, which was used to examine the voltammetric response, revealing that cobalt-molybdenum codeposi-tion depended on the nature of the species in solution. To correlate the type of the film to the electrochemical response, various co-bait-molybdenum alloy thin films obtained from different [ MoO2-4]/[Co2 ] solutions were tested. Crack-free homogeneous films could be easily obtained from the low molybdate concentrations ([ MoO2-4]/[Co2 ]≈0.05) applying low deposition potentials.Moreover, the content of molybdenum up to 30wt% could be obtained from high molybdate concentration; in this case, the films showed cracks. The formation of these cracked films could be predicted from the observed distortions in the curves of electric cur-rent-time (j-t) deposition transients. The films with amorphous stmeture were obtained. The hysteresis loops suggested that the easily film were obtained when the deposition potential was -1025 mV, and [ MoO2-4]/[Co2 ] was 0.05 in solution, which exhibited a nicer soft-magnetic response.