Single step deposition method for nearly stoichiometric CuInSe2 thin films

This paper reports the production of high quality copper indium diselenide thin films using pulsed DC magnetron sputtering from a powder target. As-grown thin films consisted of pin-hole free, densely packed grains. X-ray diffraction showed that films were highly orientated in the (112) and/or (204)/(220) direction with no secondary phases present. The most surprising and exciting outcome of this study was that the as-grown films were of near stoichiometric composition, almost independent of the composition of the starting material. No additional steps or substrate heating were necessary to incorporate selenium and create single phase CuInSe₂. Electrical properties obtained by hot point probe and four point probe gave values of low resistivity and showed that the films were all p-type. The physical and structural properties of these films were analyzed using X-ray diffraction, scanning electron microscopy and atomic force microscopy. Resistivity measurements were carried out using the four point probe and hot probe methods. The single step deposition process can cut down the cost of the complex multi step processes involved in the traditional vacuum based deposition techniques.     

Characterization of stepwise flash-evaporated CuInSe2 films

CuInSe₂ (CIS) films were deposited by stepwise flash evaporation from polycrystalline powder source onto glass substrates held at various temperatures ranging from 100 to 560 K. The phase purity and microstructure were analyzed by transmission electron microscopy. The investigations show that films grown at 300 K and below were amorphous, whereas those grown at 370 K and above were polycrystalline in nature. The grain size in polycrystalline films were found to improve with increase in substrate temperature and during post-deposition annealing. The films had near stoichiometric composition as revealed by Rutherford backscattering spectrometry. Analysis of the optical transmittance spectra of CIS films deposited at 520 K yielded a value of ∼0.97 eV for the fundamental band gap.     

Structure and temperature dependence of conduction mechanisms in hot wall deposited CuInSe2 thin films and effect of back contact layer in CuInSe2 based solar cells

Copper indium diselenide (CuInSe₂) was prepared by direct reaction of high purity elemental Copper, Indium and Selenium. CuInSe₂ thin films were prepared on well-cleaned glass substrates by a hot wall deposition technique. The X-ray diffraction studies revealed that all the deposited films are poly crystalline in nature, single phase and exhibit chalcopyrite structure. The crystallites were found to have a preferred orientation along the (112) direction. Structural parameters of CuInSe₂ thin films coated with higher substrate temperatures were also studied. As the substrate temperature increases the grain size increases. The resistivity is found to decrease with increase in temperature. Two types of conduction mechanisms are present in the hot wall deposited CuInSe₂ films. In the temperature region below 215 K the conduction is due to a variable range hopping mechanism and in the temperature region above 215 K the conduction is due to a thermally activated process. It is observed that the solar cell with molybdenum as back contact has low series resistance (R_s), high shunt resistance (R_sh) and large fill factor (FF) when compared with CuInSe₂ based solar cells with other back contact material layers.     

Structural and optical characterization of CuInSe2 films deposited by hot wall vacuum evaporation method

Copper indium diselenide (CuInSe₂) compound was prepared by direct reaction of high-purity elemental copper, indium and selenium. CuInSe₂ thin films were deposited onto well-cleaned glass substrates by a hot wall deposition technique using quartz tubes of different lengths (0.05, 0.07, 0.09, 0.11 and 0.13 m). X-ray diffraction studies revealed that all the deposited films are polycrystalline in nature and exhibit chalcopyrite structure. The crystallites were found to have a preferred orientation along the (1 1 2) direction. Micro-structural parameters of the films such as grain size, dislocation density, tetragonal distortion and strain have been determined. The grain sizes in the films were in the range of 65-250 nm. As the tube length increases up to 0.11 m the grain size in the deposited films increases, but the strain decreases. The film deposited using the 0.13 m long tube has smaller grain size and more strain. CuInSe₂ thin films coated using a tube length of 0.11 m were found to be highly crystalline when compared to the films coated using other tube lengths; it has also been found that films possess the same composition (Cu/In=1.015) as that of the bulk. Scanning electron microscope analysis indicates that the films are polycrystalline in nature. Structural parameters of CuInSe₂ thin films deposited under higher substrate temperatures were also studied and the results are discussed. The optical absorption coefficient of CuInSe₂ thin films has been estimated as 10⁴ cm⁻¹ (around 1050 nm). The direct band gap of CuInSe₂ thin films was also determined to be between 1.018 and 0.998 eV.     

Phase evolution during CuInSe2 electrodeposition on polycrystalline Mo

Using structural analyses means of ex-situ Raman spectroscopy and X-ray diffraction combined with electrical measurements, we study the phase evolution in the growth by electrodeposition technique of CuInSe₂ on polycrystalline Mo. For this purpose the growth was stopped at different stages, and then the different layers were analysed. First growth steps seem to be controlled by the deposition of secondary phases, like elemental Se and Cu₂Se binary. After the deposition of approximately 300 nm of material, CuInSe₂ ternary and ordered vacancy compounds start to adequately form. At a thickness close to 2000 nm, the formation of binary Cu_xSe is observed, remaining up to the final growth process (4350 nm). All these results are compared with the kinetic model of the system under the consideration of the experimental composition evolution.     

One-step electrodeposited CuInSe2 thin films studied by Raman spectroscopy

CuInSe₂ thin films one-step electrodeposited under different conditions were studied by MicroRaman spectroscopy to identify and quantify the individual phases present in the films.From the analysis of the Raman spectra, the main ternary phase (CuInSe₂) and elementary selenium Se⁰ were clearly identified. Specific chemical etches confirm the presence of elementary selenium Se⁰ and copper selenide binary phases Cu_xSe in selenium rich film.The amounts of these two phases were evaluated from X-ray Fluorescence measurements and confirmed using phase selective chemical treatments.     

The influence of annealing temperature on the structural, electrical and optical properties of ion beam sputtered CuInSe2 thin films

CuInSe₂ (CIS) thin films were prepared by ion beam sputtering deposition of copper layer, indium layer and selenium layer on BK7 glass substrates followed by annealing at different temperatures for 1 h in the same vacuum chamber. The influence of annealing temperature (100-400 °C) on the structural, optical and electrical properties of CIS thin films was investigated. X-ray diffraction (XRD) analysis revealed that CIS thin films exhibit chalcopyrite phase and preferential (112) orientation when the annealing temperature is over 300 °C. Both XRD and Raman show that the crystalline quality of CIS thin film and the grain size increase with increasing annealing temperature. The reduction of the stoichiometry deviation during the deposition of CIS thin films is achieved and the elemental composition of Cu, In and Se in the sample annealed at 400 °C is very near to the stoichiometric ratio of 1:1:2. This sample also has an optical energy band gap of about 1.05 eV, a high absorption coefficient of 10⁵ cm⁻¹ and a resistivity of about 0.01 Ω cm.     

A study of textured non-stoichiometric MoTe2 thin films used as substrates for textured stoichiometric MoS2 thin films

Textured MoTe₂ films have been prepared by sequential evaporation of the constituents followed by annealing under a tellurium pressure. The films are systematically textured with the c-axis of the crystallites perpendicular to the plane of substrate, however, the film composition is difficult to control and even after process optimization the films are tellurium deficient. This is thought to be caused by the electro negativity difference of the constituents.The textured MoTe₂ films have been used as substrates on which to grow MoS₂ films by annealing under a pressure of sulfur that allows textured MoS₂ films to be grown with good crystalline properties. The presence of sulfur at the surface and annealing under dynamic vacuum is important for this process and moreover, suppresses the superficial oxidation of the Mo and Te constituents.     

Study on sulfur diffusion in CuInSe2 thin films using two thermal profiles

An insurmountable disadvantage of CuInSe₂ is the low band gap, which limits the open-circuit voltage to value well below 500 mV in solar cells. The incorporation of sulfur into CuInSe₂ thin film was investigated to establish a scientific basis for the graded band gap CuIn(Se_1 − x,S_x)₂ thin films. CuIn(Se_1 − x,S_x)₂ thin films were obtained by reactive annealing of Cu₁₁In₉ precursors in a mixture of sulfur and selenium atmosphere while post-sulfurization of single phase CuInSe₂ did not result in CuIn(Se_1 − x,S_x)₂ thin films. A band gap of 1.36 eV, was obtained for the prepared CuIn(Se_1 − x,S_x)₂.     

Structural and optical studies of nanocrystalline V2O5 thin films

We report the structural and optical properties of nanocrystalline thin films of vanadium oxide prepared via evaporation technique on amorphous glass substrates. The crystallinity of the films was studied using X-ray diffraction and surface morphology of the films was studied using scanning electron microscopy and atomic force microscopy. Deposition temperature was found to have a great impact on the optical and structural properties of these films. The films deposited at room temperature show homogeneous, uniform and smooth texture but were amorphous in nature. These films remain amorphous even after postannealing at 300 °C. On the other hand the films deposited at substrate temperature T_S > 200 °C were well textured and c-axis oriented with good crystalline properties. Moreover colour of the films changes from pale yellow to light brown to black corresponding to deposition at room temperature, 300 °C and 500 °C respectively. The investigation revealed that nanocrystalline V₂O₅ films with preferred 001 orientation and with crystalline size of 17.67 nm can be grown with a layered structure onto amorphous glass substrates at temperature as low as 300 °C. The photograph of V₂O₅ films deposited at room temperature taken by scanning electron microscopy shows regular dot like features of nm size.     

Role of oxygen in enhancing N-type conductivity of CuInS2 thin films

Post-growth treatments in air atmosphere were performed on CuInS₂ films prepared by the single-source thermal evaporation method. Their effect on the structural, optical and electrical properties of the films was studied by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), optical reflection and transmission and resistance measurements. The films were annealed from 100 to 350 °C in air. The stability of the observed N-type conductivity after annealing depends strongly on the annealing temperature. Indeed it is shown that for annealing temperatures above 200 °C the N-type conductivity is stable. The resistance of the N-CuInS₂ thin films correlates well with the corresponding annealing temperature. The samples after annealing have direct bandgap energies of 1.45-1.50 eV.     

Study of composition reproducibility of electrochemically co-deposited CuInSe2 films onto ITO

CuInSe₂ thin films were electrodeposited onto ITO substrates from aqueous solution containing 4.5 mM CuSO₄, 10 mM In₂(SO₄)₃ and 10 mM SeO₂ isopotentionally and by two-step deposition technique — changing the deposition potential during the deposition process step-wise: from lower to higher and vice versa in the potential range of − 0.6 to − 1.0 V (vs. Ag/AgCl). Solution pH was varied from 1.3 to 1.9 at temperatures 293 and 313 K to clarify the region for co-deposition of In-rich CuInSe₂ films on ITO with high composition reproducibility. Morphology and composition of CuInSe₂ layers depended not only on deposition temperature and potential, but also on the direction of potential change in the case of two-step process. The potential change from lower negative values to higher ones resulted in layers with low adhesivity. Alternatively, from higher potential to lower potential, the homogeneous, well-structured, adhesive and smooth layers were deposited. Modifying deposition periods in a two-step process, the chemical composition of films can be tailored. At pH < 1.9 reproducibility of the film's composition was low. ITO electrodes were found not to be stable at pH < 1.9.     

Instantaneous preparation of CuInSe2 films from elemental In, Cu, Se particles precursor films in a non-vacuum process

CuInSe₂ (CIS) films are successfully prepared by means of non-vacuum, instantaneous, direct synthesis from elemental In, Cu, Se particles precursor films without prior synthesis of CIS nanoparticle precursors and without selenization with H₂Se or Se vapor. Our precursor films were prepared on metal substrates by spraying the solvent with added elemental In, Cu, and Se particles. Precursor films were instantaneously sintered using a spot welding machine. When the electric power was fixed to 0.6 kVA, elemental In, Cu, or Se peaks were not observed and only peaks of CIS are observed by X-ray diffraction (XRD) on the film sintered for 7/8 s. We can observe XRD peaks indicative of the chalcopyrite-type structure, such as (101), (103) and (211) diffraction peaks. We conclude that the synthesized CIS crystals have chalcopyrite-type structure with high crystallinity.     

Preparation of CuAlO2 and CuCrO2 thin films by sol-gel processing

CuAlO₂ and CuCrO₂ thin films were prepared by sol-gel processing and subsequent thermal treatment in air and inert gas atmosphere. Resistivities of 700 Ω cm and 60 Ω cm with optical transmissions of 65% and 32% were achieved respectively. The crystallization temperature of 700 °C allows the preparation of CuCrO₂ on borosilicate glass. P-type conductivity was verified by Seebeck measurements and a transparent heterostructure including p-CuCrO₂ showed rectifying behavior.     

Cr-doped TiO2 thin films deposited by RF-sputtering

Cr-doped TiO₂ thin films with different band gaps were prepared. Higher Cr doping was beneficial to the formation of the rutile-TiO₂ phase over the anatase-TiO₂ phase. A 4.8% Cr-doped thin film indicated a band gap of 2.95 eV, which was lower than the band gap of the rutile-TiO₂. Cr doping was accompanied by the formation of not only the rutile-TiO₂ phase but also the Cr₂O₃ phase, lead to the degradation of the hydrophilicity. The TiO₂ thin films with the mixed phase were not desirable to improve the hydrophilicity.     

Investigations on TlBa2Ca2Cu3Ox superconducting thin films formation on LaAlO3 substrate

Investigations on pure superconducting phase TlBa₂Ca₂Cu₃O_x (Tl-1223) thin films formation, of about 100-125 nm in thickness, on (001) LaAlO₃ single crystal substrate, were made using radio-frequency sputtering deposition of Ba₂Ca₂Cu₃O_x precursor films and ex-situ thallination in sealed quartz tube. The precursor films were thallinated under different conditions of partial oxygen pressure, temperature, time and y thallium source content using unreacted pellets of composition Tl_yBa₂Ca₂Cu₃O_x. In all cases, strongly c-oriented multiphase films were obtained. A correlation between the Tl-1223 phase purity and the precursor film conditions of thallination is established. Temperature and time of thallination as well as the thallium source content and the partial pressure of oxygen play a key role in the quality of the obtained film. The films' onset temperature of the superconducting transition ranges between 90 and 103 K. It is shown that the best samples can be obtained from a dense precursor film and relatively medium thallination time.     

Characterization and optoelectronic properties of sol-gel-derived CuFeO2 thin films

In this study, CuFeO₂ thin films were deposited onto quartz substrates using a sol-gel and a two-step annealing process. The sol-gel-derived films were annealed at 500 °C for 1 h in air and then annealed at 600 to 800 °C for 2 h in N₂. X-ray diffraction patterns showed that the annealed sol-gel-derived films were CuO and CuFe₂O₄ phases in air annealing. When the films were annealed at 600 °C in N₂, an additional CuFeO₂ phase was detected. As the annealing temperature increased above 650 °C in N₂, a single CuFeO₂ phase was obtained. The binding energies of Cu-2p_3/2, Fe-2p_3/2, and O-1s were 932.5 ± 0.1 eV, 710.3 ± 0.2 eV and 530.0 ± 0.1 eV for CuFeO₂ thin films. The chemical composition of CuFeO₂ thin films was close to its stoichiometry, which was determined by X-ray photoelectron spectroscopy. Thermodynamic calculations can explain the formation of the CuFeO₂ phase in this study. The optical bandgap of the CuFeO₂ thin films was 3.05 eV, which is invariant with the annealing temperature in N₂. The p-type characteristics of CuFeO₂ thin films were confirmed by positive Hall coefficients and Seebeck coefficients. The electrical conductivities of CuFeO₂ thin films were 0.28 S cm^− 1 and 0.36 S cm^− 1 during annealing at 650 °C and 700 °C, respectively, in N₂. The corresponding carrier concentrations were 1.2 × 10¹⁸ cm^− 3 (650 °C) and 5.3 × 10¹⁸ cm^− 3 (700 °C). The activation energies for hole conduction were 140 meV (650 °C) and 110 meV (700 °C). These results demonstrate that sol-gel processing is a feasible preparation method for delafossite CuFeO₂ thin films.     

SiO2 layer thickness effects on the (001) texture of FePtCu:SiO2 nanocomposite films

The influence of SiO₂ layer thickness of (Fe₅₂Pt₄₈)₈₈Cu₁₂:SiO₂ multilayer nanocomposite films on their structural and magnetic properties were investigated. The films were deposited on (001) textured FePt films, and then annealed at 873 K. The crystalline texture of (Fe₅₂Pt₄₈)₈₈Cu₁₂:SiO₂ films changes drastically with respect to the thickness of the SiO₂ layers. In the film with 50-Å thick SiO₂ layers, the (111) peak was strong although the (001) orientation is dominant, and self-organized spherical FePtCu particles were formed in the SiO₂ matrix. However, in the film with 19-Å thick SiO₂ layers, flat FePt grains with perfect (001) orientation were obtained. In addition, twins with different crystalline orientations were seen in the above films with different thicknesses of the SiO₂ layers. Accordingly, different perpendicular hysteresis loops were obtained.     

Optical constants of Zn-doped CuInS2 thin films

Optical properties of Zn-doped CuInS₂ thin films grown by double source thermal evaporation method have been studied. The amount of the Zn source was determined to be 0%-4% molecular weight compared with CuInS₂ source. After that, samples were annealed in vacuum at the temperature of 450 °C in quartz tube. The optical constants of the deposited films were obtained from the analysis of the experimental recorded transmission and reflexion spectral data over the wavelength range 300-1800 nm. It is observed that there is an increase in optical band gap with increasing Zn % molecular weight. It has been found that the refractive index and extinction coefficient are dependent on Zn incorporation. The complex dielectric constants of Zn-doped CuInS₂ films have been calculated in the investigated wavelength range. It was found that the refractive index dispersion data obeyed the single oscillator of the Wemple-DiDomenico model, from which the dispersion parameters and the high-frequency dielectric constant were determined. The electric free carrier susceptibility and the carrier concentration on the effective mass ratio were estimated according to the model of Spitzer and Fan.     

Crystallization and electrical resistivity of Cu2O and CuO obtained by thermal oxidation of Cu thin films on SiO2/Si substrates

In this work, we study the crystallization and electrical resistivity of the formed oxides in a Cu/SiO₂/Si thin film after thermal oxidation by ex-situ annealing at different temperatures up to 1000 °C. Upon increasing the annealing temperature, from the X ray diffractogram the phase evolution Cu → Cu + Cu₂O → Cu₂O → Cu₂O + CuO → CuO was detected. Pure Cu₂O films are obtained at 200 °C, whereas uniform CuO films without structural surface defects such as terraces, kinks, porosity or cracks are obtained in the temperature range 300-550 °C. In both oxides, crystallization improves with annealing temperature. A resistivity phase diagram, which is obtained from the current-voltage response, is presented here. The resistivity was expected to increase linearly as a function of the annealing temperature due to evolution of oxides. However, anomalous decreases are observed at different temperatures ranges, this may be related to the improvement of the crystallization and crystallite size when the temperature increases.