Phase stabilization and microstructural studies of lead lanthanum titanate thin films

Thin ferroelectric films of PLTx (Pb_1−xLa_xTi_1−x/4O₃) have been prepared by a sol-gel spin coating process. As deposited films were thermally treated for crystallization and formation of perovskite structure. Characterization of these films by X-ray diffraction (XRD) have been carried out for various concentrations of La (x = 0.04, 0.08 and 0.12) on ITO coated corning glass substrates. For a better understanding of the crystallization mechanism, the investigations were carried out on films annealed at temperatures (350, 450, 550 and 650 °C). Characterization of these films by X-ray diffraction shows that the films annealed at 650 °C exhibit tetragonal phase with perovskite structure. Atomic force microscope (AFM) images are characterized by slight surface roughness with a uniform crack free, densely packed structure. Fourier transform infrared spectra (FTIR) studies of PLTx thin films (x = 0.08) deposited on Si substrates have been carried out to get more information about the phase stabilization.     

Improved dielectric and ferroelectric properties in Ti-doped BiFeO3-PbTiO3 thin films prepared by pulsed laser deposition

Ti-modified thin films of multiferroic 0.72Bi(Fe_1 − xTi_x)O₃-0.28PbTiO₃ (BFPT, x = 0 and 0.02) solid solution were prepared by pulsed laser deposition. The BFPT (x = 0 and 0.02) films possess a tetragonal structure with highly preferential (001) orientation. The effects of the ionic substitution on the properties of BFPT (x = 0 and 0.02) films have been investigated. The leakage current of the BFPT (x = 0.02) thin film is significantly reduced, and the dielectric and ferroelectric properties greatly improved by the aliovalent ionic substitution of Ti⁴⁺ for Fe³⁺. The BFPT (x = 0.02) thin film exhibits a reasonably high remnant polarization P_r with 2P_r up to 90 μC/cm² at 312 kV/cm and a switchable polarization up to 92 μC/cm² at 417 kV/cm.     

Spectroscopic ellipsometry investigations of the optical properties of manganese doped bismuth vanadate thin films

The optical properties of Bi₂V_1−xMn_xO_5.5−x {x = 0.05, 0.1, 0.15 and 0.2 at.%} thin films fabricated by pulsed laser deposition on platinized silicon substrates were studied in UV-visible spectral region (1.51-4.17 eV) using spectroscopic ellipsometry. The optical constants and thicknesses of these films have been obtained by fitting the ellipsometric data (Ψ and Δ) using a multilayer four-phase model system and a relaxed Lorentz oscillator dispersion relation. The surface roughness and film thickness obtained by spectroscopic ellipsometry were found to be consistent with the results obtained by atomic force and scanning electron microscopy. The refractive index measured at 650 nm does not show any marginal increase with Mn content. Further, the extinction coefficient does not show much decrease with increasing Mn content. An increase in optical band gap energy from 2.52 to 2.77 eV with increasing Mn content from x = 0.05 to 0.15 was attributed to the increase in oxygen ion vacancy disorder.     

Enhanced ferroelectric properties of Pb(Zr0.80Ti0.20)O3/PbO thin films prepared by radio frequency magnetron sputtering

The Pb(Zr_0.80Ti_0.20)O₃ (PZT) thin films with and without a PbO buffer layer were deposited on the Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by radio frequency (rf) magnetron sputtering method. The PbO buffer layer improves the microstructure and electrical properties of the PZT thin films. High phase purity and good microstructure of the PZT thin films with a PbO buffer layer were obtained. The effect of the PbO buffer layer on the ferroelectric properties of the PZT thin films was also investigated. The PZT thin films with a PbO buffer layer possess better ferroelectric properties with higher remnant polarization (P_r = 25.6 μC/cm²), and lower coercive field (E_c = 60.5 kV/cm) than that of the films without a PbO buffer layer (P_r = 9.4 μC/cm², E_c = 101.3 kV/cm). Enhanced ferroelectric properties of the PZT thin films with a PbO buffer layer is attributed to high phase purity and good microstructure.     

Annealing effect on structural and electrical properties of thermally evaporated Cd1−xMnxS nanocrystalline films

Thin films of Cd_1−xMn_xS (0 ≤ x ≤ 0.5) were deposited on glass substrates by thermal evaporation. All the films were deposited at 300 K and annealed at 573 K. The as-deposited and the annealed films were characterized for composition, structure and microstructure by using energy-dispersive analysis for X-rays, X-ray diffraction, scanning electron microscopy and atomic force microscopy. Electrical conductivity was studied in the temperature range 190-450 K. All the films exhibited wurtzite structure of the host material with the grain size varying in the range between 36 and 82 nm. Resistivity of all the films is strongly dependent on Mn content and annealing temperature and lies in the range 13-160 Ω cm.     

Composition dependent preferential orientation, dielectric and ferroelectric properties of Pb(ZrxTi1 − x)O3 thin films derived by sol-gel process

Pb(Zr_xTi_1 − x)O₃ (x = 0.35, 0.40, 0.60, 0.65) thin films were prepared by sol-gel spin on technique. From the X-ray diffraction analysis, PZT films with Zr-rich compositions (x = 0.60 and 0.65) had (111) preferential orientation and the preferential orientation changed to (100) for Ti-rich compositions (x = 0.35 and 0.40). The dielectric measurements on the above compositions at room temperature showed that the dielectric constant values were higher in Zr-rich compositions compared to Ti-rich compositions. The ferroelectric behavior measured in terms of the remnant polarization (P_r) and coercive field (E_c) up to an applied field of 260 kV/cm depicted that the Zr-rich PZT films with (111) preferential orientation had higher P_r and lower E_c values compared to the Ti-rich PZT films with (100) preferential orientation can be understood from the domain switching mechanism.     

Microstructure and electrical properties of Ba0.7Sr0.3(Ti1 − xZrx)O3 thin films prepared on copper foils with sol-gel method

Ba_0.7Sr_0.3(Ti_1 − xZr_x)O₃ (x = 0, 0.1, 0.2) (BSZT) thin films have been prepared on copper foils using sol-gel method. The films were annealed in an atmosphere with low oxygen pressure so that the substrate oxidation was avoided and the formation of the perovskite phase was allowed. The X-ray diffraction results show a stable polycrystalline perovskite phase, with the diffraction peaks of the BSZT films shifting toward the smaller 2θ with increasing Zr content. Scanning electron microscopy images show that the grain size of the BSZT thin films decreases with increasing Zr content. High resolution transmission electron microscopy shows the clear lattice and domain structure in the film. The dielectric peaks of the BSZT thin films broaden with increasing Zr content. Leakage current density of Ba_0.7Sr_0.3(Ti_1 − xZr_x)O₃ (x = 0.1) thin film is the lowest over the whole applied voltage.     

V-doping effects on ferroelectric properties of K0.5Bi4.5Ti4O15 thin films

V-doped K_0.5Bi_4.5Ti₄O₁₅ (K_0.5Bi_{4.5 − x/3}Ti_4 − xV_xO₁₅, KBTiV-x, x = 0.00, 0.01, 0.03, and 0.05) thin films were prepared on a Pt(111)/Ti/SiO₂/Si(100) substrate by a chemical solution deposition method. The thin films were annealed by using a rapid thermal annealing process at 750 °C for 3 min in an oxygen atmosphere. Among them, KBTiV-0.03 thin film exhibited the most outstanding electrical properties. The value of remnant polarization (2P_r) was 75 μC/cm² at an applied electric field of 366 kV/cm. The leakage current density of the thin film capacitor was 5.01 × 10⁻⁸ at 100 kV/cm, which is approximately one order of magnitude lower than that of pure K_0.5Bi_4.5Ti₄O₁₅ thin film capacitor. We found that V doping is an effective method for improving the ferroelectric properties of K_0.5Bi_4.5Ti₄O₁₅ thin film.     

Effects of oxygen pressure on the microstructural,ferroelectric and magnetic properties of BiFe0.95Mn0.05O3 thin films grown on Si substrates

We have investigated the effects of oxygen pressure on the microstructure, leakage current, ferroelectric and magnetic properties of BiFe_0.95Mn_0.05O₃ (BFMO) thin films epitaxially grown on SrRuO₃, SrTiO₃, and TiN-buffered (001)-oriented Si substrates. X-ray diffraction θ?2θ scans and scanning electron microscope images reveal that the epitaxy and microstructures of the BFMO films were strongly dependent on oxygen pressure during film deposition. Epitaxial BFMO films can be obtained in a low oxygen pressure of 2 Pa while polycrystalline BFMO films were obtained in a relatively high oxygen pressure of 15 Pa. Furthermore, the oxygen pressure strongly influences the ferroelectric properties of the BFMO films grown on Si. The remnant polarization (2P _r) of approximately 107 μC/cm² and coercive field (2E _c) of approximately 580 kV/cm were observed for the epitaxial BFMO films grown in a low oxygen pressure of 2 Pa. The saturation magnetization of the BFMO films decreases with increasing oxygen pressure while the magnetic coercive field remains unchanged.     

Characterization of nanostructured photosensitive (NiS)x(CdS)(1−x) composite thin films grown by successive ionic layer adsorption and reaction (SILAR) route

Recently ternary semiconductor nanostructured composite materials have attracted the interest of researchers because of their photovoltaic applications. Thin films of (NiS)_x(CdS)_(1−x) with variable composition (x = 1-0) had been deposited onto glass substrates by the successive ionic layer adsorption and reaction (SILAR) method. As grown and annealed films were characterised by X-ray diffraction, scanning electron microscopy and EDAX to investigate structural and morphological properties. The (NiS)_x(CdS)_(1−x) films were polycrystalline in nature having mixed phase of rhombohedral and hexagonal crystal structure due to NiS and CdS respectively. The optical and electrical properties of (NiS)_x(CdS)_(1−x) thin films were studied to determine compsition dependent bandgap, activation energy and photconductivity. The bandgap and activation energy of annealed (NiS)_x(CdS)_(1−x) film decrease with improvement in photosensitive nature.     

Dependence of Zr content on electrical properties of Bi3.15Nd0.85Ti3-xZrxO12 thin films synthesized by chemical solution deposition (CSD)

The Bi_3.15Nd_0.85Ti_3-xZr_xO₁₂ (BNTZ) thin films with Zr content (x = 0, 0.05, 0. 1, 0.15, and 0.2) were prepared on Pt/Ti/SiO₂/Si (100) substrates by chemical solution deposition (CSD) technique. The crystal structures of BNTZ films were analyzed by X-ray diffraction (XRD). The effects of Zr contents on the ferroelectric, dielectric properties, and leakage current of BNTZ films were thoroughly investigated. The XRD results demonstrated that all the films possessed a single phase bismuth-layered structure and exhibited the highly preferred (117) orientation. Among these films, the film with Zr content x = 0.1 held the maximum remanent polarization (2P_r) of 50.21 μC/cm² and a low coercive field (2E_c) of 210 kV/cm.     

Structure and optical properties of AlxZn1−xO alloys by sol-gel technique

Al_xZn_1−xO (x = 0-0.5) thin films were prepared on quartz glass substrates by sol-gel technique. X-ray diffraction (XRD), scanning electron microscope (SEM), and X-ray photoelectron spectroscopy (XPS) were employed for microstructure characterization of these thin films. In films with up to 20 at.% Al incorporation, compound nano-crystal phase was observed while wurtzite structure disappeared. Zn3d electron binding energy and Zn LMM‘s chemical shift were both increased by more than 0.4 eV. Transmittance spectra revealed that these films possessed high transmittance in the visible region, and the end of UV absorption edge shifted to less than 300 nm when Al content exceeds 20 at.% due to quantum confinement effect.     

Giant pyroelectric coefficient of Mn-doped PLT thin films epitaxially grown on (001) Pt/MgO

The c-axis-oriented epitaxial thin films of Mn-doped Pb_1−xLa_xTi_1−x/4O₃ (PLT) on (001) Pt/MgO substrates were prepared by rf-magnetron sputtering. To investigate the effect of the doped ion, 0-1.7 mol% MnO₂ added to the PLT target powder. The temperature dependence of the relative dielectric constant ?_r measurements and modified Curie-Weiss plots suggested that the increasing of diffuseness n was induced by high-La substitution and the diffuseness n of PLT thin films decreased by the addition of Mn, considerably. Inner stress and thermodynamic analysis were carried out and the results propose that the increasing of γ with Mn doping caused by increasing the misfit strain of the c-axis-oriented epitaxial PLT thin films and substrate. As a result, giant pyroelectric coefficient (γ = 15.8 × 10⁻⁸ C/cm² K) of Mn-doped epitaxial PLT thin film was achieved.     

Study on Mn-induced Jahn–Teller distortion in BiFeO3 thin films

Present work reports Raman spectroscopy study of single-phase Mn-doped BiFeO₃ [BiFe_1?x Mn _x O₃ (0 ≤ x ≤ 0.20)] polycrystalline thin films carried out in backscattering geometry. De-convolution of Raman spectra showed a gradual transition in the crystal symmetry from rhombohedral (?R) to multiphase [rhombohedral (?R) + tetragonal (?T)] structure with increasing Mn doping concentration in BiFe_1?x Mn _x O₃ (BFMO) thin films. X-ray diffraction (XRD) along with Le-Bail extraction refinement confirms that the structural symmetry lowering in BFMO thin films occurs at about 10 % Mn doping concentration. A blue shift is observed in the direct energy band gap of BFMO thin films from 2.53 to 2.87 eV (at T = 295 K) and is attributed to the local symmetry lowering and local induced strain in Fe³⁺ environment resulted from Jahn–Teller distortion in (MnFe)³⁺O₆ octahedral unit. Second-derivative analysis of FTIR spectra in the spectral regions (420–470) cm^?1 and (480–680) cm^?1 further indicates the favourable structure distortion leading to the simultaneous exhibition of enhanced ferromagnetic and ferroelectric properties owing to Mn substitution in host BiFeO₃ lattice.     

Effect of dopant concentration on the structural, electrical and optical properties of Mn-doped ZnO films

The Mn-doped ZnO (Zn_1 − xMn_xO) thin films with manganese compositions in the range of 0-8 at.% were deposited by radio-frequency (RF) magnetron sputtering on quartz glass substrates at room temperature (RT). The influence of Mn concentration on the structural, electrical and optical properties of Zn_1 − xMn_xO films has been investigated. X-ray diffraction (XRD) measurements reveal that all the films are single phase and have wurtzite structure with (002) c-axis orientation. The chemical states of Mn have been identified as the divalent state of Mn²⁺ ions in ZnO lattice. As the content of Mn increases, the c-lattice constant and the optical band gap of the films increase while the crystalline quality deteriorates gradually. Hall-effect measurements reveal that all the films are n-type and the conductivity of the films has a severe degradation with Mn content. It is also found that the intensity of RT photoluminescence spectra (PL) is suppressed and saturates with Mn doping.     

The influence of annealing temperatures on the properties of Bi2VO5.5/LaNiO3/Si thin films

Bi₂VO_5.5 ferroelectric thin films were fabricated on LaNiO₃/Si(100) substrate via chemical solution deposition. Ferroelectric and dielectric properties of the thin films annealed at 500-700 °C were studied. The thin film annealed at 700 °C exhibited more favorable ferroelectric and dielectric properties than those annealed at lower temperatures. The values of remnant polarization 2P_r and coercive field E_c for the film annealed at 700 °C are 10.62 µC/cm² and 106.3 kV/cm, respectively. The leakage current of the film is about 1.92 × 10^− 8 A/cm² at 6 V. The possible mechanism of the dependence of electrical properties of the films on the annealing temperature was discussed.     

Nanograins dependent dielectric constant, tunability, phase transition, impedance spectroscopy and leakage current of (Pb1 − xSrx)TiO3 thin films

Nanostructured (Pb_1 − xSr_x)TiO₃ (PST) (x = 0.1, 0.2 and 0.3) thin films have been prepared by chemical solution deposition process using spin coating technique. The solution as such was deposited on Pt/Ti/SiO₂/Si substrates and annealed at 650 °C/3h. Nanograins dependent dielectric properties of PST films show dielectric constant up to the higher frequency region, low losses, large tunability and phase transition at small temperature. The impedance data has been fitted by Cole-Cole model to study the effect of grain boundaries on the dielectric properties. The current-voltage characteristics have been measured to study leakage current in PST films and described by Poole-Frenkel emission model. It is suggested that the key carrier transport process in PST films is emission of electrons from a trap state near the metal-film interface into a continuum of states associated with each conductive dislocation. The activation energy value for carrier transport in PST films is obtained from temperature-dependent current-voltage characteristics.     

Synthesis and characterization of ferromagnetic cobalt-doped tin dioxide thin films

Co-doped SnO₂ thin films are grown on sapphire (0001) substrates at 600 °C by the technique of dual-beam pulsed laser deposition. The prepared films show preferred orientation in the [100] direction of the rutile structure of SnO₂. Nonequilibrium film growth process results in doping Co into SnO₂ much above the thermal equilibrium limit. A Film with 3% of Co is ferromagnetic at room temperature with a remanent magnetization of ∼ 26% and a coercivity of ∼ 9.0 mT. As Co doping content x increases, the optical band gap absorption edge (E₀) of the Co-doped SnO₂ thin films initially shows a redshift at low x up to x = 0.12 and then increases at the higher x, which are attributed to the sp-d exchange interactions and alloying effects, respectively.     

Structure transition and multiferroic properties of Mn-doped BiFeO3 thin films

Pure BiFeO₃ (BFO) and Mn-doped BiFe_1?yMn_yO₃ thin films were prepared on FTO/glass (SnO₂: F) substrates by using a sol–gel method. The effects of Mn-doping on the structure and electric properties of the BFO thin films were studied. The X-ray diffraction (XRD) analysis reveals a structure transition in the Mn-doped BiFe_0.96Mn_0.04O₃ (BFMO) thin film. The Rietveld refined XRD patterns conform the trigonal (R3c: H) and tetragonal (P422) symmetry for the BFO and BFMO thin films, respectively. The structure transition and the mixed valences of Mn ions substantially improve the electric properties of the BFMO thin film. The remnant polarization (P _r) of the BFMO thin film was 105.86 μC/cm² at 1 kHz in the applied electric field of 865 kV/cm. At an applied electric field of 150 kV/cm, the leakage current density of BFMO thin film is 1.42 × 10^?5 A/cm². It is about two orders of magnitude lower than that of the pure BFO thin film (1.25 × 10^?3 A/cm²). And the enhanced saturated magnetization of the BFMO thin film is 4.45 emu/cm³.     

Structural and optical properties of Er-doped Y2Ti2O7 thin films by sol-gel method

Er³⁺-doped Y₂Ti₂O₇ and Er₂Ti₂O₇ thin films were fabricated by sol-gel spin-coating method. A well-defined pyrochlore phase Er_xY_2-xTi₂O₇ was observed while the annealing temperature exceeded 800 °C. The average transmittance of the Er_xY_2-xTi₂O₇ thin films annealed at 400 to 900 °C reduces from ∼ 87 to ∼ 77%. The refractive indices and optical band gaps of Er_xY_2-xTi₂O₇ (x = 0-2) annealed at 800 °C/1 h vary from 2.20 to 2.09 and 4.11 to 4.07 eV, respectively. The ∼ 1.53 μm photoluminescence spectrum of Er³⁺ (5 mol%)-doped Y₂Ti₂O₇ thin films annealed at 700 °C/1 h exhibits the maximum intensity and full-width at half maximum (∼ 60 nm).