用VLS机制制备硅纳米线的生长阶段研究

在镀Ni的Si衬底上用硅烷高温分解的方法由VLS机制制备了硅纳米线，在不同的实验条件下研究了VLS机制生长的三个阶段：结晶阶段、共熔阶段和生长阶段，特殊条件下制备的处于结晶阶段的长度仅几十纳米的硅纳米线显示硅纳米线是从催化剂颗粒中长出来的，观察到的硅纳米线的生长过程说明VLS机制在纳米尺度仍然有效，可用于各种材料纳米线的制备。     

锰及其硅化物在Si(100)表面的反应外延生长

采用超高真空分子束外延-扫描隧道显微镜(UHVMBE-STM)系统研究了不同温度下锰及其硅化物在Si(100)-2 ×1重构表面上的外延生长情况.实验结果表明当生长过程中衬底温度控制在室温到135℃时,生成大小基本一致的锰纳米团簇;当衬底温度达到210℃时锰与硅开始发生反应,形成硅化物,并有纳米线结构出现;当衬底温度达到330℃时,纳米线完全被棒状物或不规则的三维岛状硅化物取代.随着沉积时衬底温度升高,生成物的成核密度与生长温度的关系与经典的二维岛成核理论相符合.     

化学气相沉积法制备GaN纳米线及其形貌结构和生长机理研究

采用化学气相沉积(CVD)法,分别以Ni、Au为催化剂,氨化金属Ga制备出GaN纳米线。运用SEM,EDX,TEM等表征手段分析了GaN纳米线的形貌与结构。通过改变氨化温度、生长时间、催化剂、衬底以及Ga源和衬底间的距离等生长条件,研究了其对GaN纳米线形貌和结构的影响,通过分析探讨纳米线的生长过程与机制,得到了生长GaN纳米线的最佳工艺。     

芯-壳结构/GaAs-AlGaAs纳米线中AlGaAs壳材料均匀性研究

Ⅲ-Ⅴ族半导体纳米线材料被认为是高速光电探测器最有前途的材料之一。采用金属有机化学气相沉积法在GaAs(111)B衬底上生长芯-壳结构/GaAs-AlGaAs纳米线材料,GaAs芯材料的生长机制为气相-液相-固相,而AlGaAs壳材料的生长机制为气相-固相。采用场发射扫描电子显微镜和微区光荧光谱仪等测试分析手段研究了AlGaAs壳材料横向、轴向和生长方向的均匀性,探讨了生长机制对均匀性的影响。在此基础上获得了组分均匀的高晶体质量的AlGaAs壳材料,其Al组分为0.14。     

催化剂辅助化学气相沉积法制备InN纳米线

采用催化剂辅助化学气相沉积法,通过固-液-气（V-L-S）机理控制在硅衬底上制备了高质量的InN纳米线。利用FESEM、XRD、HRTEM对制备的InN纳米线的表面形貌和结构进行了表征。分析表明合成的InN纳米线为标准的六方纤锌矿结构,纳米线沿[102]方向生长。室温PL光谱表明,制备的InN纳米线在1580rlIn（...     

磁性金属Fe纳米线的制备及其性能

本文尝试采用纳米Au颗粒作为催化剂,利用化学气相沉积法合成铁纳米线。并着重研究了不同沉积温度对纳米线生长过程的影响。研究结果表明,过低沉积温度无法分解二茂铁,而过高沉积温度则会导致二茂铁高温分解副反应发生,生成大量碳颗粒,从而阻碍铁纳米线的生长。作者在600℃沉积温度下,以二茂铁为反应前驱体和蓝宝石作为基板,通过纳米Au颗粒的催化作用首次成功获得了大批量的铁单晶纳米线,并进一步揭示了纳米线的气-固生长机制。此外,本文还对合成的单晶Fe纳米线的磁各向异性进行了探讨。     

硅纳米线的制备与生长机理

硅纳米线是一种新型的一维半导体光电材料.本文较系统地介绍了硅纳米线在制备技术、生长机理方面的研究现状与最新进展,主要就激光烧蚀法、化学气相沉积法、热气相沉积法及溶液法等制备方法和基于气-液-固机理的生长机理、氧化物辅助生长机理及固-液-固生长机理等作了较为详尽的论述.     

硅衬底上有序氮化铝纳米线阵列的生长

在450℃反应温度下,利用无水三氯化铝与叠氮化钠在25mL的不锈钢反应釜中直接反应,成功地在硅片衬底上制备了六方单晶氮化铝（h—AlN）纳米线有序阵列。这些纳米线呈长直线状,粗细均匀,直径约为100nm,长度均在几个微米以上。所有纳米线生长方向一致,而且与硅片衬底垂直。经过分析,纳米线由气液固机制生长而成.     

自催化生长GaSb纳米线及其在高性能紫外-可见-近红外光电探测器中的应用（英文）

本文应用镓金属液滴作为催化剂,采用化学气相沉积方法自催化合成了单晶GaSb纳米线.研究表明该GaSb纳米线为典型的p型半导体,霍尔迁移率为>0.042 cm^2V^-1s^-1.硅基和柔性衬底上构筑的基于GaSb纳米线的光电探测器,具有良好的紫外-可见-近红外宽光谱探测性能.硅基器件对500 nm的可见光响应率可达3.86×10^3A W-1,探测率可达3.15×10^13Jones;柔性器件在保持相似光电性能的同时,具有极好的机械柔韧性和稳定性.本文有助于更好地揭示自催化生长的GaSb纳米线的性能,并为进一步设计基于GaSb纳米线的功能光电器件打下了实验基础.     

二氧化锡纳米线的生长机理研究

使用水平石英管式电炉，以二氧化锡和石墨的混合物为原材料、高纯氮气为载气，在850℃温度下用直接热蒸发法制备二氧化锡纳米线．衬底硅片的直径为10mm，其上覆盖一层5nm厚的金催化剂．原材料放在石英舟中，离原材料30mm的下风口处放置硅衬底，原材料和硅衬底都放置在石英管的中部电炉的恒温区内．用扫描电子显微镜（SEM）和透射电子显微镜（TEM）观察到二氧化锡的纳米线结构；X射线衍射（XRD）表明二氧化锡纳米线具有四方金红石结构；选区电子衍射（SAED）照片表明二氧化锡纳米线具有完善的晶体结构．不同生长时间下制备样品的扫描电子显微镜和透射电子显微镜照片再现了二氧化锡纳米线的生长过程，该纳米线的生长符合传统的VLS生长机制．     

Silicon nanowires grown from copper oxalate

Si nanowires (SiNWs) have been synthesized facilely from products in the thermal decomposition of copper oxalate in a chemical vapor deposition (CVD) system by the vapor-solid-solid (VSS) mechanism. Raman investigations showed that the phonon confinement appeared in the grown SiNWs. We found the mechanism of catalyst formation to be that the initial copper oxalate micro balls were thermally decomposed to fabricate Cu and Cu₂O nanoparticles, which reacted with silane sequentially to form Cu₃Si, serving as the nuclei for the sequential VSS growth of SiNWs.     

Control of surface migration of gold particles on Si nanowires

On the surface of silicon nanowires (SiNWs) synthesized by gold (Au)-catalyzed chemical vapor deposition (CVD), Au particles 5-20 nm in diameter are formed if the growth conditions are within a specific range. We studied the mechanism of Au particle formation by growing SiNWs under different conditions, specifically by dynamically changing the growth parameters during the growth process. We show that insufficient supply of Si source to the Au-Si eutectic on top of the SiNWs enhances the migration of Au atoms on the surface of SiNWs in the form of Au-Si eutectic, which is precipitated on the surface as Au particles during cooling. We also show that using Au-Si eutectic on the surface of SiNWs as a catalyst enables one-step growth of branched SiNWs.     

Platinum nanoparticle decorated silicon nanowire arrays for photoelectrochemical hydrogen production

Wafer-scale high density aligned p-type silicon nanowire (SiNW) arrays decorated with discrete platinum nanoparticles (PtNPs) have been fabricated by metal assisted electroless etching followed by an electroless platinum deposition process, and systematic investigations of photoelectrochemical behavior of Pt/SiNW were also reported in this study. Coating of PtNPs on SiNW sidewalls yielded a more positive onset potential (Vos), which enhances the photoelectrochemical hydrogen generation performance of the photoelectrodes, though excessive PtNPs deposition leads to a decreased photocurrent. Additionally, we have demonstrated that the photoelectrode consisting of longer SiNWs yielded a higher limiting current. However, when the length of SiNWs was increased further to >4 μm, the limiting current dramatically reduced, which is presumably because an increased interface recombination and scattering resulting from the increased surface area of SiNWs begin to play a dominant role. The results demonstrate Pt/SiNW to be a promising hybrid system for photoelectrochemical water splitting, and device performance may be further improved via optimal conditions of PtNPs deposition time and SiNWs length.     

Pressure-induced orientation control of the growth of epitaxial silicon nanowires

Single crystal silicon nanowires (SiNWs) were synthesized with silane reactant using Au nanocluster-catalyzed one-dimensional growth. We have shown that under our experimental conditions, SiNWs grown epitaxially on Si(111) via the vapor-liquid-solid growth mechanism change their growth direction as a function of the total pressure. Structural characterization of a large number of samples shows that SiNWs synthesized at a total pressure of 3 mbar grow preferentially in the 111 direction, while the one at 15 mbar favors the 112 direction. Specifically by dynamically changing the system pressure during the growth process morphological changes of the NW growth directions along their length have been demonstrated.     

Ultrafast growth of single-crystalline Si nanowires

Silicon nanowires (SiNWs) have been catalytically synthesized by heat treatment of Si nanopowder at 980 °C. The SiNWs comprise crystalline Si nanoparticles interconnected with metal catalyst. The formation mechanism of nanowires generally depends on the presence of Fe catalysts in the synthesis process of solid–liquid–solid (SLS). Although gas phase of vapor–liquid–solid (VLS) method can be used to produce various of different nanowire materials, growth model based on the SLS mechanism by heat treatment is more ascendant for providing ultrafast growth of single-crystalline Si nanowires and controlling the diameter of them easily. The growth of single-crystalline SiNWs and morphology were discussed.     

Vapor-solid-solid growth of crystalline silicon nanowires using anodic aluminum oxide template

Silicon nanowires (SiNWs) were grown at low temperatures close to metal silicon eutectic point on a silicon substrate using gold catalyst coupled with assistance of the aluminum anodic oxide template. Either a vapor-solid-solid (VSS) growth process below metal silicon eutectic temperature or a vapor-liquid-solid (VLS) process at slightly higher temperatures was observed. The transmission electron microscopy coupled with both the X-ray energy dispersive spectroscopy and the selected area electron diffraction was adopted to characterize the SiNWs. Although the mechanism triggering the VSS process is still not clear, both the geometric and morphological characteristics of the SiNWs grown by the VSS process are discussed and compared with the SiNWs grown by the VLS process. The VSS SiNWs have a much slower growth rate (less than 100 nm/h), a smaller and more uniform diameter (in the range of 15.22 nm) due to a much slower rate of silicon diffusion and much smaller amount of silicon (6.8 wt.%) dissolved in the solid nanocatalyst.     

Large-area silicon nanowires from silicon monoxide for solar cell applications

Large-area upstanding silicon nanowires (SiNWs) were synthesized by hot-filament chemical vapor deposition (HFCVD) using silicon monoxide (SiO) powder as Si source under high vacuum (1.2 x 10(-5) Torr). Gold nanoparticles (AuNPs) were employed as catalyst, which were formed on Si substrate by in-situ reduction of gold chloride (AuCl3). The size and distribution of the Au nanoparticles can be easily controlled through chemical reaction conditions. Consequently, the diameter, length and density of SiNWs could be varied in certain range. The SiNWs obtained are single crystalline with growth directions predominantly along [01-1]. Silicon nanowires in large-scale and diameter less than 10 nm can be grown on different Si substrates with this method. Organic inorganic hybrid solar cells based on SiNWs arrays have been demonstrated.     

Synthesis, morphology and compositional evolution of silicon nanowires directly grown on SnO(2) substrates

We here propose an all-in situ method for growing vapor-liquid-solid (VLS) silicon nanowires (SiNWs) directly on SnO(2) substrates in a plasma-enhanced chemical vapor deposition system. The tin catalysts are formed by a well-controlled H(2) plasma treatment of the SnO(2) layer. The lowest temperature for the tin-catalyzed VLS SiNWs growth in a silane plasma is ～250?°C. The effects of substrate temperature and H(2) dilution of silane on the morphology and compositional evolution of the SiNWs were systematically investigated. The catalyst content in the SiNWs can be effectively controlled by the deposition temperature. Moreover, enhanced absorption (down to ～1.1?eV) is achieved due to the strong light trapping and anti-reflection effects in the straight and long tapered SiNWs.     

Effect of rf power on the growth of silicon nanowires by hot-wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique

Silicon nanowires (SiNWs) were synthesized by simultaneous evaporation of Au and Si deposition using H₂ diluted SiH₄. The deposition techniques combined hot-wire (HW) and plasma enhanced chemical vapor deposition (PECVD). Au wires were placed on the filament and heated simultaneously with the activation of the rf plasma for the dissociation of SiH₄ and H₂ gases. Five set of samples were deposited on ITO-coated glass substrate at different rf power varied from 20 to 100 W in an interval of 20 W, keeping other deposition parameters constant. High yield of SiNWs with diameter ranging from 60 to 400 nm and length about 10 μm were grown at rf power of 80 W (power density ~ 1018 mW cm⁻²). Rf power of 100 W (power density ~ 1273 mW cm⁻²) suppressed the growth of these SiNWs. The growth mechanisms of SiNWs are tentatively proposed. The nanocrystalline structure of SiNWs is confirmed by Raman spectra and HRTEM measurement.     

Photoluminescence and optical limiting properties of silicon nanowires

Si nanowires (SiNWs) have been produced by thermal vaporization on Si(111) substrate without catalysts added. The grown SiNWs have been characterized by Raman scattering, SEM, XRD, and electron diffraction and shown to be highly crystalline with only little impurities such as amorphous Si and silicon oxides. Photoluminescence (PL) study has illustrated that the Si band-to-band gap increases from 1.1 eV for bulk Si to 1.56 eV for the as-grown SiNWs due to quantum confinement effect. A strong PL peak at 521 nm (2.37 eV) is attributed to the relaxation of the photon-induced self-trapped state in the form of surface Si-Si dimers, which may also play an important role in optical limiting of SiNWs with 532-nm nanosecond laser pulses. With the observation of optical limiting at 1064 nm, nonlinear scattering is believed to make a dominant contribution to the nonlinear response of SiNWs.