High-speed sensing scheme for CMOS DRAMs

A significant improvement in sensing speed over the half-V_DD bit-line precharge sensing scheme is obtained by precharging the bit line to approximately 2/3 V_DD. The 2/3-V_DD sensing scheme also results in higher-bit-line capacitance, asymmetrical bit-line swing, and higher power consumption. However, the speed advantage of 2/3-V_DD sensing may outweigh the disadvantages and can significantly improve DRAM performance. For the unboosted word-line case, symmetrical bit-line swing can be retained by limiting the bit-line downward voltage swing through a clamping circuit added to the sense amplifier, resulting in almost no loss of stored charge in a cell. The authors show that the 2/3-V_DD sensing with a limited bit-line swing has several distinct advantages over the half-V_DD sensing scheme and is particularly suitable for high-performance high density CMOS DRAMs     

Half-V/SUB DD/ bit-line sensing scheme in CMOS DRAMs

A sensing scheme in which the bit line is precharged to half V/SUB DD/ is introduced for CMOS DRAMs. The proposed circuitry uses a PMOS memory array and incorporates the following features: (1) a complementary sense amplifier consisting of NMOS and PMOS cross-coupled pairs; (2) clocked pulldown of the latching node; (3) complementary clocking of the PMOS pullup; (4) full-sized dummy cell generation of reference potential for sensing; (5) shorting transistor to equalize precharge potential of bit lines; and (6) depletion NMOS decoupling transistors for multiplexing bit lines. The study shows that the half-V/SUB DD/ bit-line sensing scheme has several unique advantages, especially for high-performance high-density CMOS DRAMs, which compared to the full-V/SUB DD/ bit-line sensing scheme used for NMOS memory arrays or the grounded bit-line sensing scheme for PMOS arrays in CMOS DRAMs.     

Novel Co-Design of NAND Flash Memory and NAND Flash Controller Circuits for Sub-30 nm Low-Power High-Speed Solid-State Drives (SSD)

As the cell size of the NAND flash memory has been scaled down by 40%–50% per year and the memory capacity has been doubling every year, a solid-state drive (SSD) that uses NAND as mass storage for personal computers and enterprise servers is attracting much attention. To realize a low-power high-speed SSD, the co-design of NAND flash memory and NAND controller circuits is essential. In this paper, three new circuit technologies, the selective bit-line precharge scheme, the advanced source-line program, and the intelligent interleaving, are proposed. In the selective bit-line precharge scheme, an unnecessary bit-line precharge is removed during the verify-read and consequently the current consumption decreases by 23%. In the advanced source-line program scheme, a hierarchical source-line structure is adopted. The load capacitance during the program pulse is reduced by 90% without a die size overhead. As a result, the current consumption is reduced by 48%. Finally, with the intelligent interleaving, a current peak is suppressed and a high-speed parallel write operation of the NAND flash memories is achieved. By using these three technologies, both the NAND flash memory and the NAND controller circuits are best optimized. At the sub-30 nm generation, the current consumption of the NAND flash memory decreases by 60% and the SSD speed improves by 150% without a cost penalty or circuit noise.      

A 1.2- to 3.3-V wide voltage-range/low-power DRAM with acharge-transfer presensing scheme

A charge-transfer presensing scheme (CTPS) for 0.8-V array operation with a 1/2 V_cc bit-line precharge achieves a five times larger readout voltage and 40% improvement in sensing speed compared with conventional sensing schemes. Operation over a 1.2- to 3.3-V range is achieved. A nonreset row block control scheme (NRBC) for power-consumption improvement in data-retention mode is proposed which decreases the charge/discharge number of the row block control circuit. By combining CTPS and NRBC, the data-retention current is reduced by 75%     

A full bit prefetch DRAM sensing circuit

A DRAM sensing circuit that achieves both a fast RAS access time and a high-bandwidth burst operation is proposed. For the data burst capability of synchronous DRAM's, 256-bit-long data I/O lines are divided into eight segments. A small local latch is provided for each segment of 32 bit-line pairs to prefetch eight data out of the 256 sense amplifiers. A local buffer is connected to eight local latches through selection switches. Burst read operations, up to eight bits, are done by activating selection switches and the local buffer serially. Besides this prefetch capability, the segmented data I/O line results in very small capacitance, only 0.09 pF. The sensing scheme uses nMOS bit switches and a full Vdd precharge voltage for bit and segmented data I/O lines. Then, after sense amplifiers are turned on, only low-going bit lines are connected to the segmented data I/O lines without any voltage disturbance because of the small capacitance. The proposed circuit, therefore, realizes a high-speed RAS access, which is 16 ns faster than a conventional DRAM. A circuit layout design based on a 0.5-μm design rule shows no area impact     

A current direction sense technique for multiport SRAM's

This paper describes two techniques for low-power single-end multiport SRAMs: a current direction sense circuit and a write bit-line swing control circuit. The sense circuit's input node is clamped at an intermediate voltage level, and the circuit transforms current direction into a logic value. It operates four times faster than a CMOS inverter, when driver sizes are equal, When it is applied to a single-end multiport SRAM, access is accelerated 3.2 times faster than that with a CMOS inverter with no increase in power consumption. The write bit-line swing control circuit reduces the bit-line precharge level within the limit of correct operation by using a memory cell replica. The control circuit reduces power consumption for bit-line driving and pseudoread cell current by 40%     

A 4-Mbit DRAM with half-internal-voltage bit-line precharge

A single 5-V supply 4-Mb dynamic random access memory (DRAM) was developed by using a buried-storage-electrode memory cell, a half-internal-voltage bit-line precharge method combined with a constant voltage converter, and a high signal-to-noise ratio sensing scheme. The chip was designed in a double-polycide, single-Al, epitaxial substrate NMOS technology with a 0.8-/spl mu/m minimum design rule. As a result, a 4M word/spl times/1-bit DRAM with 95-ns typical access time and 99.2-mm/SUP 2/ chip area was attained by 10.58-/spl mu/m/SUP 2/ storage cells.     

A low-noise folded bit-line sensing architecture for multigigabitDRAM with ultrahigh-density 6F2 cell [CMOS design]

The 6F² cell is widely known for its small area, but its sensing is unstable due to the large array noise. A new low-noise sensing scheme for a 6F² DRAM cell is proposed, employing two noise reduction methods: the divided sense and combined restore scheme and the bit-line noise absorbing scheme. They can reduce word-line to bit-line as well as bit-line to bit-line coupling noises. The bit-line noise is reduced to 85% of that of a conventional scheme with only 0.05% area overhead, which is negligible compared to the area saving by using a 6F² cell. The total chip area and the sensing time can he reduced to 85 and 87%, respectively, compared to conventional DRAM. A 2 kbit DRAM test chip with a 6F² cell Is fabricated using 256 M DRAM technology, and its stable operations are confirmed     

X-Calibration: A Technique for Combating Excessive Bitline Leakage Current in Nanometer SRAM Designs

In an SRAM circuit, the leakage currents on the bit lines are getting increasingly prominent with the dwindling of transistors' threshold voltages as the technology scales down to 90 nm and beyond. Excessive bit-line leakage current results in slower read operations or even functional failure. In this paper, we present a new technique, called X-calibration, to combat this phenomenon. Unlike the previous method that attempts to compensate the leakage current directly, this scheme first transforms the bit-line leakage current into an equilibrium offset voltage across the bit-line pair, and then simple circuitry is utilized to cancel this offset accurately at the input of the sense amplifier so that the sensing is not affected by the bit-line leakage. SPICE simulation of a 1 Kbit SRAM macro shows that this X-calibration scheme can handle 83% higher bit-line leakage current than the previous bit-line leakage compensation scheme. Measurement results of the test chip show that the SRAM macro adopting X-calibration scheme can cope with up to 320 $mu{hbox{A}}$ bit-line leakage current.      

A 0.25-/spl mu/m 3.0-V 1T1C 32-Mb nonvolatile ferroelectric RAM with address transition detector and current forcing latch sense amplifier scheme

Nonvolatile 32-Mb ferroelectric random access memory (FRAM) with-a 0.25-/spl mu/m design rule was developed by using an address transition detector (ATD) control scheme for the application to SRAM and applying a common plate folded bit-line cell scheme with current forcing latch sense amplifier (CFLSA) for increasing sensing margin, and adopting a dual bit-line reference voltage generator (DBRVG) for high noise immunity. Compared to a conventional FRAM device, the total chip size is reduced by 10.87%, which was achieved by using a single section data line (SSDL) and removing large gate-oxide capacitors, which is typically used for reference voltage generator for 1T1C FRAM. Furthermore, the imbalance of reference bit-line capacitance and main bit-line capacitance was resolved by using the CFLSA technique.     

A divided/shared bit-line sensing scheme for ULSI DRAM cores

A new dynamic RAM (DRAM) signal sensing principle, a divided/shared bit-line (DSB) sensing scheme, is proposed. This sensing scheme provides folded bit-line sensing operation in a crosspoint-type memory cell array. The DSB scheme offers a high-density DRAM memory core with the common-mode array noise eliminated. A bit-line architecture based on this new sensing principle and its operation are demonstrated. A divided/pausing bit-line sensing (DIPS) scheme, which is an application of this DSB principle to the conventional folded bit-line type of memory cell arrangement, is also proposed. The DIPS architecture achieves complete pausing states for alternate bit lines throughout the active period. These alternate pausing bit lines shield the inter-bit-line coupling noise between active bit lines. Here the inter-bit-line coupling noise is eliminated by a slight architectural change to the conventional folded bit-line memory cell array. These new memory core design alternatives provide high-density DRAM memory cores suitable for the 64-Mb level and beyond. with the memory array noise reduced significantly     

A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using aNAND flash memory technology

A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-μm triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm², and the effective cell size including the overhead of string select transistors is 2.0 μm²     

A fault-tolerant 30 ns/375 mW 16K/spl times/1 NMOS static RAM

A fault-tolerant 30950 mil/SUP 2/ (19.9 mm/SUP 2/) 16K/spl times/1 static MOS RAM has been fabricated with a single polysilicon E/D NMOS process. Using circuit techniques normally restricted to dynamic RAMs, but adapted for asynchronous operation, the device achieves a typical access time of 30 ns while dissipating only 375 mW. Among the topics discussed in a new single-polysilicon memory cell configuration, the first truly asynchronous bootstrap circuit, an active bit-line equilibration and precharge scheme, and a new power-efficient substrate bias generator. Also described is an on-chip redundancy scheme which consumes approximately 2 percent of the total chip area, does not compromise access time and can be programmed using standard test equipment.     

Cell-plate-line/bit-line complementary sensing (CBCS) architecturefor ultra low-power DRAMs

In the realization of gigabit scale DRAMs, one of the most serious problems is how to reduce the array power consumption without degradation of the operating margin and other characteristics. This paper proposes a new array architecture called cell-plate-line/bit-line complementary sensing (CBCS) architecture which realizes drastic array power reduction for both read/write operations and refresh operations, and develops a large readout voltage difference on the bit-line and cell-plate-line. For read/write operations, the array power reduces to only 0.2%, and for refresh operations becomes 36%, This architecture requires no unique process technology and no additional chip area. Using a test device with a 64-Mb DRAM process, the basic operation has been successfully demonstrated. This new memory core design realizes a high-density DRAM suitable for the 1-Gb level and beyond with power consumption significantly reduced     

The charge-share modified (CSM) precharge-level architecture forhigh-speed and low-power ferroelectric memory

A charge-share modified (CSM) precharge-level architecture for selective subdataline activation designed to simultaneously achieve high-speed and low-power ferroelectric nonvolatile memories is described. In this architecture, to read the data of only one memory cell destructively, the precharge level of the selected subdataline is modified by charge-sharing between the subdataline and main dataline. This architecture enables high-speed read operations, because the operations of modifying the precharge level and reading the data of memory cells are achieved simultaneously. Three circuit technologies are used in the CSM architecture to increase the operating margin: self-timing precharge circuits which solve the polarization disturbance problem without adding extra signal lines or timing margins, a boosted precharge level technique which increases the signal voltage of the nonvolatile data, and shared dummy cell circuits which improve the precision of the reference voltage over that of a conventional voltage generator. These techniques and circuits are evaluated for a simulated 16-Mb ferroelectric memory. They reduce the access time by 20 ns to 51 ns compared with the conventional architecture, while reducing the memory array current to less than 1% that of the all-subdataline activation technology     

A boosted negative bit-line SRAM with write-assisted cell in 45 nm CMOS technology

A new 11 T SRAM cell with write-assist is proposed to improve operation at low supply voltage.In this technique,a negative bit-line voltage is applied to one of the write bit-lines,while a boosted voltage is applied to the other write bit-line where transmission gate access is used in proposed 11 T cell.Supply voltage to one of the inverters is interrupted to weaken the feedback.Improved write feature is attributed to strengthened write access devices and weakened feedback loop of cell at the same time.Amount of boosting required for write performance improvement is also reduced due to feedback weakening,solving the persistent problem of half-selected cells and reliability reduction of access devices with the other suggested boosted and negative bit-line techniques.The proposed design improves write time by 79％,63％ and slower by 52％ with respect to LP 10 T,WRE 8 T and 6 Tcells respectively.It is found that write margin for the proposed cell is improved by about 4×,2.4× and 5.37× compared to WRE8 T,LP10 T and 6 T respectively.The proposed cell with boosted negative bit line (BNBL) provides 47％,31％,and 68.4％ improvement in write margin with respect to no write-assist,negative bit line (NBL) and boosted bit line (BBL) write-assist respectively.Also,new sensing circuit with replica bit-line is proposed to give a more precise timing of applying boosted voltages for improved results.All simulations are done on TSMC 45 nm CMOS technology.     

A low-power charge-recycling ROM architecture

This paper describes a newly proposed low-power charge-recycling read-only memory (CR-ROM) architecture. The CR-ROM reduces the power consumption in bit lines, word lines, and precharge lines by recycling the previously used charge. In the proposed CR-ROM, bit-line swing voltage is lowered by the charge recycling between bit lines. When N bit lines recycle their charges, the swing voltage and the power of the bit lines become 1/N and 1/N/sup 2/ compared to the conventional ROMs, respectively. As the number of N increases, the power saving in bit lines becomes salient. Also, power consumption in word lines and precharge lines can be reduced theoretically to half by the proposed charge-recycling techniques. The simulation results show that the CR-ROM consumes 60%/spl sim/85% of the conventional low-power ROMs with 1 K /spl times/ 32 b. A CR-ROM with 32 Kb was implemented in a 0.35-/spl mu/m CMOS process. The power dissipation is 6.60 mW at 100 MHz with 3.3 V and the maximum operating clock frequency is 150 MHz.     

A 0.5-μm, 3-V 1T1C, 1-Mbit FRAM with a variable referencebit-line voltage scheme using a fatigue-free reference capacitor

A 0.5-μm, 3-V operated, 1TIC, 1-Mbit FRAM with 160-ns access time has been developed. In FRAM, a reference voltage design using a ferroelectric capacitor is difficult because of the degradation due to fatigue, a chip-to-chip variation, and a temperature dependence. A variable reference voltage scheme is generated to solve this problem, boosting a fatigue-free and temperature-independent MOS reference capacitance by a driver. The driver is operated from a compact reference voltage generator that provides 32 equally divided voltages and occupies only half the layout area of a conventional one. During sense operation, memory-cell capacitance C_ferr is larger than reference-cell capacitance C_MOS. A double word-line pulse scheme has also been developed to eliminate a bit-line capacitance imbalance in the bit-line pairs, where a memory cell and a reference cell are separated from the bit-line pairs during sense operation. A six-order improvement in imprint lifetime has been achieved by the new scheme     

A high-speed sensing scheme for 1T dynamic RAMs utilizing theclamped bit-line sense amplifier

A clamped-bit-line sense amplifier (CBLSA) capable of very high-speed operation in one-transistor (1T) DRAM applications has been developed. Results from an experimental test chip demonstrate that the speed of the new circuit is insensitive to bit-line capacitance. Circuit speed is also found to be insensitive to the initial bit-line difference voltage. The CBLSA maintains a low impedance fixed potential on the bit lines during sensing, virtually eliminating sensitivity to inter-bit-line noise coupling and minimizing power supply bounce during sensing. The new sense amplifier operates at higher speeds than conventional circuits and still dissipates less power     

A high-speed clamped bit-line current-mode sense amplifier

A clamped bit-line current-mode sense amplifier that maintains a low-impedance fixed potential on the bit lines is introduced. Using a general model for active-drive memory cells that include the two-transistor (2T) and three-transistor (3T) dynamic cells and the four-transistor/two-resistor (4T-2R) and six-transistor (6T) static cells, the new sense amplifier is shown to have a response speed that is insensitive to bit-line capacitance. This is achieved by relocating the large bit-line capacitance to a node within the sense amplifier that has only a minimal effect on the speed of the circuit. Bit-line clamping also minimizes inter-bit-line voltage noise coupling