XPS Studies of Chemical States of NiO/NiFe Interface

Ta/NiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6×103 A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe= Ni + FeO and 3NiO+2Fe =3 Ni+Fe203. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field Hex and the coercivity Hc of NiO/NiFe are affected by these defects.     

MAXIMUM ENTROPY DECONVOLUTION OF XPS PEAK

Necessity of XPS spectrum,deconvolution,disadvantages of the traditional Fast Fourier Tranderm decon-volution method(FFT),princtple,method and advantage ofMaximum Entropy Deconvolution Method (MEM) are de-scribed.Criteria for determing the number of data points sam-pled in MEM are the main point disccussed in the paper,someXPS deconvolution applications of our MEM software showthat the MEM makes XPS deconvolution much easier than thetraditional FFT method.     

Interface chemical states of NiO/NiFe films and their effects on magnetic properties

Ta/NiOx/Ni81Fe19/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field ( Hex) and the coercivity ( Hc) of NiOx/Ni81Fe19 as a function of the ratio of Ar to O2 during the deposition process were studied. The composition and chemical states at the interface region of NiOx/NiFe were also investigated using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that the ratio of Ar to O2 has great effect on the nickel chemical states in NiOx film. When the ratio of Ar to O2 is equal to 7 and the argon sputtering pressure is 0.57 Pa, the x value is approximately 1 and the valence of nickel is + 2. At this point, NiOx is antiferromagnetic NiO and the corresponding Hex is the largest. As the ratio of Ar/O2 deviates from 7, the exchange coupling field ( Hex) will decrease due to the presence of magnetic impurities such as Ni +3 or metallic Ni at the interface region of NiOx/NiFe, while the coercivity ( Hc) will increase due to     

Magnetic property and interlayer segregation in spin valve metal multilayers

The experimental results show that the exchange coupling field of NiFe/FeMn for Ta/ NiFe/FeMn/Ta multilayers is higher than that for the spin valve multilayers Ta/NiFe/Cu/NiFe/FeMn/ Ta. In order to find out the reason, the composition and chemical states at the surfaces of Ta( 12nm)/ NiFe(7nm), Ta( 12nm)/NiFe(7nm)/Cu(4nm) and Ta( 12nm)/NiFe(7nm)/Cu(3nm)/NiFe(5nm) were studied using the X-ray photoelectron spectroscopy (XPS). The results show that no elements from lower layers float out or segregate to the surface for the first and second samples. However, Cu atoms segregate to the surface of Ta(12nm)/NiFe(7nm)/Cu(3nm)/NiFe(5nm) multilayers, i.e. Cu atoms segregate to the NiFe/FeMn interface for Ta/NiFe/Cu/NiFe/FeMn/Ta multilayers. We believe that the presence of Cu atoms at the interface of NiFe/FeMn is one of the important factors causing the exchange coupling field of Ta/NiFe/FeMn/Ta multilayers to be higher than that of Ta/NiFe/Cu/NiFe/ FeMn/Ta multilayers.     

溶胶-凝胶法制备BiFeO3:Y3+纳米粉末及其光催化性能研究

多功能铁电材料是近年来的热门材料,为了研究铁电材料在光催化中的应用,通过溶胶-凝胶法在空气氛围下制备了铁酸铋（BiFeO₃）和不同Y³⁺掺杂浓度（Bi_1–xY_xFeO₃）的纳米粉体材料。通过X射线衍射仪（X-ray diffraction,XRD）,扫描电镜（scanning electron microscopy,SEM）和X射线光电子能谱（X-ray photoelectron spectroscopy,XPS）表征了样品的结构、形貌和表面化学组成等物理化学性质。并利用分光光度计和光化学反应实验测试了样品的吸收谱和在紫外灯照射下的光催化效果。研究发现,掺杂Y³⁺不会改变晶格结构,但是减小了晶粒尺寸和禁带宽度。同时,根据O 1s的XPS窄谱扫描的拟合分析发现,引入Y³⁺可以有效提高氧空位的含量,而氧空位可以降低空穴-电子对的复合率,提高载流子利用率。因此,掺杂Y³⁺可以提高BiFeO₃的光催化效率,使其成为一种很有潜力的光催化材料。     

Tantalum oxide barrier in magnetic tunnel junctions

Tantalum as an insulating barrier can take the place of A1 in magnetic tunnel junctions (MTJs). Ta barriers in MTJs were fabricated by natural oxidation. X-ray photoelectron spectroscopy (XPS) was used to characterize the oxidation states of Ta barrier.The experimental results show that the chemical state of tantalum is pure Ta5~ and the thickness of the oxide is 1.3 nm. The unoxidized Ta in the barrier may chemically reacted with NiFe layer which is usually used in MTJs to form an intermetallic compound,NiTa2- A magnetic “dead layer“ could be produced in the NiFe/Ta interface. The “dead layer“ is likely to influence the spinning electron transport and the magnetoresistance effect.     

Influence of Aluminum Ions Implantation on Corrosion Behavior of Zircaloy-2 Alloy in 1M H2SO4

The specimens were implanted with aluminum ions with fluence ranging from 1× 10^16 to 1× 10^17 ions/cm^2 to study the effect of aluminum ion implantation on the aqueous corrosion behavior of zircaloy-2 by metal vapor vacuum arc source （MEVVA） at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy （XPS） and Auger electron spectroscopy （AES）, respectively. Transmission electron microscopy （TEM） was used to examine the microstructure of the aluminum-implanted samples. Glancing angle X-ray diffraction （GAXRD） was employed to examine the phase transformation due to the aluminum ion implantation. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zircaloy-2 in a 1 M H2SO4 solution. It is found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy-2 implanted with aluminum ions. Finally, the mechanism of the corrosion behavior of aluminum- implanted zircaloy-2 was discussed.     

纳米碳管／二氧化硅复合凝胶玻璃的XPS研究

分别以物理掺杂和化学掺杂的方式,采用溶胶-凝胶法制备了未经表面修饰纳米碳管（CNTs）和经r-氨基丙基三乙氧基硅烷（NH2（CH2）3Si（OC2H5）3,APTES）修饰纳米碳管的有机改性SiO2复合凝胶玻璃。在此基础上,以X射线光电子能谱（XPS）为表征手段,对所得两种复合凝胶玻璃中SiO2基质和掺杂CNTs的化学状态进行研究。结果表明,掺杂CNTs改变了复合凝胶玻璃中C和O的原子百分比,对SiO2基质的网络结构产生影响,但对SiO2基质的组成未产生显著影响;无论是在物理掺杂还是化学掺杂的有机改性SiO2复合凝胶玻璃中,CNTs与SiO2间均存在一定的Si—C结合键;在CNTs-SiO2复合凝胶玻璃中,以APTES作为桥梁,实现了CNTs与SiO2网络间的化学键合。     

Comparison of room-temperature multiferroics in Bi4Fe2TiO12 film and bulk

It was reported that both dielectricity and magnetism at room temperature were appreciably improved in Bi₄Fe₂TiO₁₂ film compared with Bi₄Fe₂TiO₁₂ bulk. X-ray diffraction profiles reveal similar crystalline nature and random orientation of the two, but X-ray photoelectron spectroscopy (XPS) experiments indicate that it is 1.4 eV lower binding energy of core-state O1s in the film relative to that of the bulk, so the improvement of multiferroics in the film is attributed to oxygen vacancies and high fraction of interface. The results have promising applications in multifunctional integrated devices.     

Comparison of room-temperature multiferroics in Bi_4Fe_2TiO_(12) film and bulk

It was reported that both dielectricity and magnetism at room temperature were appreciably improved in Bi4Fe2TiO12 film compared with Bi4Fe2TiO12 bulk.X-ray diffraction profiles reveal similar crystalline nature and random orientation of the two,but X-ray photoelectron spectroscopy (XPS) experiments indicate that it is 1.4 eV lower binding energy of core-state Ols in the film relative to that of the bulk,so the improvement of multiferroics in the film is attributed to oxygen vacancies and high fraction of interface.The results have promising applications in multifunetional integrated devices.     

A new method to evaluate the hydraulic activity of Al-Si materials

Slag, fly ash, gangue and 500°C calcined gangue are analyzed by using identical coupled plasma optical emission spectroscopy (ICP), X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and magnetic angle spinning nuclear magnetic resonance (MAS NMR). Research results show that there is a negative linear relationship between the Si 2p and Al 2p binding energies of Al-Si materials and the compressive strength of aluminosilicate based cementitious materials prepared with these Al-Si materials, i.e. the lower the binding energies, the higher the compressive strength. Indeed, the Si 2p and Al 2p binding energies of Al-Si materials can be used to indicate their hydraulic activity. The binding energies of the four examined materials increase in the order of slag, fly ash, 500°C calcined gangue and untreated gangue. Moreover, the binding energies of Si 2p, Al 2p and O 1s of every Al-Si material have excellent correlation. By using the Al 2p binding energy and 27Al MAS NMR spectra, the coordination number of aluminum in slag is determined to be four, while that in gangue, is six. Based on the aforementioned discoveries, this paper presents a new effective method to evaluate the hydraulic activity of Al-Si materials by using the surface binding energies of silicon and aluminum of Al-Si materials. Supported by the National Natural Science Foundation of China (Grant No. 50474002) and the Key Project of Ministry of Education of China (Grant No.104231)     

金刚石表面Ar离子溅射效应的电子能谱分析

用X射线光电子能谱(XPS)对微波等离子体(MPCVD)合成的金刚石进行了Ar离子溅射效应原位分析．原始表面的Cls光电子峰位于285．80eV，随着溅射时间的延长，Cls峰位向低结合能方向移动，1h后移至285．40eV．在溅射过程中，Cls的半高峰宽(FWHM)由最初的1．80eV增加到2．20eV．Cls峰的解叠结果表明经Ar离子溅射后，金刚石表面出现了石墨态碳，而且其含量随溅射的增强而增加．由于Ar离子的溅射，俄歇电子谱(XAES)也发生了明显的变化，XAES微分特征距离D值则由14．37eV增加到19．34eV，同时C的价带电子谱(VBS)金刚石特征消失，这些结果补充证明了Ar离子的溅射效应是诱导金刚石向石墨转化．最后讨论了溅射效应的机制．     

钨掺杂α-FeOOH制备及染料废水降解

针对现今水污染问题,采用空气氧化法在碱性条件下制备了α-Fe OOH和钨掺杂α-Fe OOH来降解污水中的染料.利用傅里叶红外光谱仪、扫描电子显微镜、X射线衍射仪和光电子能谱仪等对样品的形貌和结构进行了表征.以α-Fe OOH作为Fenton反应的铁源并与过氧化氢形成Fenton体系,考察该体系对染料甲基橙和酸性铬兰k溶液的降解性能.结果表明,在最佳条件下,当加入钨掺杂α-Fe OOH时,甲基橙和酸性铬兰k的降解率分别达到99.8%和81.0%;同样条件下,当加入无掺杂α-Fe OOH时,甲基橙和酸性铬兰k的降解率只有75.2%和61.3%.     

Effect of copper ions implantation on the corrosion behavior of ZIRLO alloy in 1 mol/L H2SO4

1. IntroductionZIRLO alloy is widely used in the nuclear industrybecause of its low thermal neutron capture cross sec-tion, favorable mechanical properties, and good corro-sion resistance. For example, ZIRLO alloy can serve asfuel cladding, spreaders for …     

Irradiation damage simulation of Zircaloy-4 using argon ions bombardment

To simulate irradiation damage, argon ion was implanted in the Zircaloy-4 with the fluence ranging from 1 × 10^16 to 1 × 10^17 cm^-2, using accelerating implanter at an extraction voltage of 190 kV and liquid nitrogen temperature. Then the influence of argon ion implantation on the aqueous corrosion behavior of Zircaloy-4 was studied. The valence states of elements in the surface layer of the samples were analyzed using X-ray photoelectron spectroscopy （XPS）. Transmission electron microscopy （TEM） was used to examine the microstructure of the argon-implanted samples. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted Zircaloy-4 in 1 mol/L HzSO4 solution. It is found that there appear bubbles on the surface of the samples when the argon fluence is 1 × 10^16 cm^-2. The microstructure of argon-implanted samples changes from amorphous to partial amorphous, then to polycrystalline, and again to amorphous. The corrosion resistance of implanted samples linearly declines with the increase of fluence approximately, which is attributed to the linear increase of the irradiation damage.     

Al靶中稀土Y含量对薄膜CrAlTiN的影响

研究了Al靶中加入不同含量的稀土Y对CrAlTiN薄膜的影响。应用SEM、EDS、XPS、显微硬度计对薄膜样品进行分析。结果表明,在Al靶材中加入稀土Y后,不但提高了薄膜的厚度,而且随着稀土Y含量的增加,薄膜的表面相逐渐由CrN、Cr2N向Cr变化,Al的含量也是随着Y含量的增加而增加。CrAlTiN薄膜的硬度随着稀土Y含量的升高而降低,并且随着Y含量的升高而逐渐趋于1500 HV。     

光电探测器薄膜生长条件及机理分析

将苝四甲酸二酐（3,4,9,10-perlenetetracrboxylic dianhydride,PTCDA）真空蒸发到无机半导体p-Si衬底上,研制的p-Si/PTCDA异质结光电探测器,对光照非常敏感,是一种响应度很高的宽带光电子元器件。讨论分析了不同的衬底制备条件制备p-Si/PTCDA异质结薄膜的情况,实验结果表明,制备过程中细微的环境变化,显著影响了器件质量,通过分析成膜质量与器件内部微观机制、能带结构、载流子输运之间的关系,确定制备异质结有机薄膜的硅晶面选择,以及衬底的温度最佳的选择范围。     

脉冲激光沉积CN_x薄膜的微观组织结构表征

利用脉冲激光烧蚀CNx靶,在室温至450℃基片温度时沉积CNx薄膜.利用扫描电镜(SEM)、X射线衍射(XRD)、X射线光电子谱(XPS)和拉曼光谱(Raman)等对CNx薄膜的表面形貌、化学成分、结晶性以及价键状态进行了分析.结果表明:所得CNx薄膜呈非晶状态,表面形貌与沉积温度密切相关,基片温度高于150℃时薄膜表面较为光滑.随着基片温度的增加,薄膜中C—N键的面积分数从31.2%逐渐减少至14.1%,N—sp3C和N—sp2C键的面积分数随之减少,300℃时最利于形成sp3键.Raman光谱中比值ID/IG总体呈上升趋势,G峰的位置向高波数(高频)方向移动且半高宽(FWHM)下降,薄膜由CNx薄膜的无序结构逐渐向高有序化程度类石墨结构转变,石墨化程度增加.     

Effect of electropolishing on electrochemical behaviours of titanium alloy Ti-10V-2Fe-3Al

The electrochemical behaviours of titanium alloy Ti-10V-2Fe-3Al after electropolishing in a self-developed electrolyte in comparison with conventional grinding were studied by electrochemical impedance spectroscopy (EIS).Optical microscopy (OM),scanning electron microscopy (SEM),atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to evaluate the surface characteristics of the alloy.It was found from the EIS experiments that the polarization resistance (Rp) was increased,the double layer capacitance (Qc) was decreased and the electrochemical impedance of the alloy was enhanced by electropolishing.The electropolished surface was flat,smooth and bright and its roughness was 3.310 nm.To underline the advantage of electropolishing process against grinding to provide the anodic oxidation process with a higher quality substrate,the ground and electropolished titanium alloys were anodized in parallel under the same conditions.The corrosion behaviours of the two kinds of anodized titanium alloys were compared.It was revealed that electropolishing generated a high quality substrate and improved the corrosion resistance of anodic oxide film formed on titanium alloy Ti-10V-2Fe-3Al.Furthermore,the mechanism of electropolishing improving the corrosion resistance of the anodic oxide film was proposed.     

煤中黄铁矿表面细菌氧化的XRD及SEM/TEM研究

借助于XRD和SEM/TEM 等表面分析测试技术,对煤中黄铁矿表面经氧化亚铁硫杆菌作用前后的表面微观结构的变化进行了研究.作为对比,同时采用了氧化剂（H2O2）对黄铁矿表面进行氧化试验.结果表明,氧化亚铁硫杆菌在黄铁矿表面的氧化形式与氧化剂（H2O2）在黄铁矿表面的氧化形式不同.从黄铁矿表面微观结构的变化来看,氧化剂氧化的结果多出现钮扣状的片起,表现为较为剧烈的直接强氧化作用,而氧化亚铁硫杆菌氧化则呈现坑蚀,表现为相对缓和的吸附氧化作用.这为研究细菌对煤中黄铁矿表面的作用机理提供了一定的参考.