双基地MIMO雷达杂波建模与分析

双基地多输入多输出(MIMO)雷达发射正交波形,不同地面杂波单元的回波信号形式存在明显差异,传统的杂波建模方法已不再适用。文中提出一种双基地MIMO雷达杂波建模方法,将地面划分为满足发射角度分辨率、接收角度分辨率、距离分辨率三重约束的杂波散射单元,并计算各单元的杂波回波信号,然后将各单元回波信号采用矢量相加求得总的杂波视频信号。最后通过对传统雷达杂波建模与本文建模方法的仿真与分析,增强了对双基地MIMO雷达杂波谱结构的认识,有助于开展对双基地MIMO雷达杂波抑制的研究。     

韦布尔分布海杂波的建模与FPGA实现

雷达回波模拟器在雷达设计中是不可缺少的一部分,对于雷达系统的设计发挥着重要作用,而海杂波模拟又是雷达回波模拟器设计中的关键一环.文章选取杂波建模中常用的韦布尔分布模型进行了分析,给出了其ZNML产生方法,并在FPGA实现,最后给出了实现的结果并与理论值比较,达到了很好的效果,可应用于雷达回波模拟器的设计中.     

PRC—CW雷达地杂波相关特性分析

本文分析了在低俯视角情形时地杂波要引起雷达回波信号展宽的事实,对于伪码调相连续波雷达来讲,某一时刻的回波信号将是此前一段时间内展宽的回波在此时刻的迭加,提出了计算伪码调相连续波雷达回波信号的迭加方法,在以往对地杂波特性研究结果的基础上,同时考虑了不同分辨单元间在空间和时间上的相关性质,研究该体制雷达地杂波回波信号的时间相关特性,并进行了计算机模拟,结果表明,与脉冲雷达相比,其地杂波的时间相关性将增     

DDS的雷达杂波信号模拟系统的研究

介绍了雷达杂波信号的建模与仿真原理，给出了一个基于直接数字频率合成的雷达杂波信号模拟系统的设计实例，该系统采用丁软硬件相结合形式，能灵活生成包括地杂波、海杂波、云雨杂波、箔条杂波在内的多种信号波形的雷达杂波回波信号。     

基于相干视频模拟法的机载脉冲多普勒雷达地杂波功率谱仿真分析

介绍机载脉冲多普勒雷达地杂波功率谱的3种计算方法并分别介绍其优缺点,重点研究用相干视频信号模拟法计算机载脉冲多普勒雷达地杂波散射单元回波信号的过程,详细阐述相干视频模拟法中关于距离和方位分辨单元的划分方法,建立地杂波散射单元回波信号模型,着重描述回波信号的矢量叠加过程,并给出具体的计算公式.最后,针对不同的试飞场景进行...     

机载MIMO雷达地杂波功率谱仿真分析

首先介绍多输入多输出体制雷达的地杂波模型,采用映像法将地面划分为杂波散射单元并计算各单元的回波信号,后将各单元回波信号采用矢量相加求得相干视频信号;然后给出了机载多输入多输出雷达地杂波回波信号分别经过波束合成和匹配滤波合成后杂波功率谱的峰值,并分析其经不同处理而获得不同增益值的原因.同时,对多天线接收和存在干扰条件下的地杂波功率谱进行了仿真,仿真结果表明计算的正确性.     

PRC-CW雷达地杂波相关特性分析

本文分析了在低俯视角情形时地杂波要引起雷达回波信号展宽的事实,对于伪码调相连续波雷达来讲,某一时刻的回波信号将是此前一段时间内展宽的回波在此时刻的迭加,提出了计算伪码调相连续波雷达回波信号的迭加方法,在以往对地杂波特性研究结果的基础上,同时考虑了不同分辨单元间在空间和时间上的相关性质,研究该体制雷达地杂波回波信号的时间相关特性,并进行了计算机模拟,结果表明,与脉冲雷达相比,其地杂波的时间相关性将增     

自然地面场景的机载PD雷达地杂波仿真

在模拟地杂波时，直接从数字高程图（DEM）数据出发，对各小面单元进行遮挡判断，并利用PD雷达的回波信号模型，计算出各DEM单元对雷达回波的贡献，从而得到总的雷达地杂波。仿真结果表明，该方法仿真的雷达地杂波能够很好地反映出特定地面的起伏特性，从而证明该方法是有效的和实用的。     

雷达杂波的仿真与实现

论述了一种雷达杂波信号的模拟方法及其硬件实现。该模拟器采用软硬件相结合的方法,由计算机实时解算每个杂波回波单元的方位、距离、散射系数等参数,然后将数据发送到硬件电路中,由硬件电路完成对雷达信号的采样、调制、恢复、幅度控制,最终产生杂波信号并输出。     

大入射余角下的海杂波建模方法研究

大入射余角下的海杂波模型适用于探测雷达发现强海杂波下的隐蔽目标,是目前最新的一种雷达海杂波回波建模方法。基于随时间变化的海表面动态模型和依赖探测雷达波束几何分割的有效照射区域模型,计算出的照射区域内海杂波回波是由该区域分割的众多散射单元的回波合成的。根据雷达特性将海表面用网格分割成小块,相关模型中的每一块都可当做一个RCS单元,仿真结果证实了杂波模型的有效性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.