室温下射频磁控溅射制备ZnO:Al透明导电薄膜及其性能研究

采用射频磁控溅射技术,在室温下,以ZnO:Al2O3(2%Al2O3(质量比))为靶材,在石英玻璃基底上,采用不同工艺条件制备了ZnO:Al(AZO)薄膜。使用扫描电子显微镜观察了薄膜的表面形貌,X射线衍射分析了薄膜的结构,四探针测量仪得到薄膜的表面电阻,轮廓仪测量了薄膜厚度,并计算了电阻率,最后采用分光光度计测量了薄膜的透过率;研究了溅射功率、溅射气压与薄膜厚度对薄膜电阻率及透过率的影响。结果表明:所制备的AZO薄膜具有(002)择优取向,并且发现薄膜厚度对薄膜的光电性能有明显影响,溅射气压和溅射功率对薄膜电学性能有较大影响,但是对薄膜透过率影响不大。当功率为1kW、溅射气压0.052Pa、AZO薄膜厚度为250nm时,其电阻率为8.38×10-4Ω·cm,波长在550nm处透过率为89%,接近基底的本底透过率92%。当薄膜厚度为1125 nm时薄膜的电阻率降至最低(6.16×10-4Ω·cm)。     

二步热氧化法制备SnO_2薄膜的特性(英文)

采用二步热氧化法制备SnO2薄膜.首先把真空蒸发法制备的金属锡膜在低于锡熔点的氧气气流中氧化半小时,然后提高氧化温度至400-550℃,继续氧化2小时.通过XRD,SEM和UV-VIS光谱仪分析氧化温度对薄膜的晶体结构、表面形貌和光学性质的影响.XRD分析得知在氧化温度为400℃时能观察到不同的SnO2衍射峰.氧化温度在550℃时能观察到(11O),(101),(200)和(211)衍射峰.如果氧化温度低于550℃,衍射峰(200)很难观察到.通过SEM测量, SnO2薄膜表面致密均匀,而且表面颗粒大小与氧化温度有很大的联系.通过UV-VIS透过光谱得知随着氧化温度的升高,SnO2薄膜的光透过率也升高,光学禁带宽度也随着氧化温度的升高而升高.这种制备SnO2薄膜的工艺具有适于大面积制造,低成本,过程容易控制等很多优点.     

室温下射频磁控溅射制备ZnO∶Al透明导电薄膜及其性能研究

采用射频磁控溅射技术,在室温下,以ZnO∶Al203(2％Al2O3(质量比))为靶材,在石英玻璃基底上,采用不同工艺条件制备了ZnO∶Al(AzO)薄膜.使用扫描电子显微镜观察了薄膜的表面形貌,X射线衍射分析了薄膜的结构,四探针测量仪得到薄膜的表面电阻,轮廓仪测量了薄膜厚度,并计算了电阻率,最后采用分光光度计测量了薄膜的透过率;研究了溅射功率、溅射气压与薄膜厚度对薄膜电阻率及透过率的影响.结果表明:所制备的AZO薄膜具有(002)择优取向,并且发现薄膜厚度对薄膜的光电性能有明显影响,溅射气压和溅射功率对薄膜电学性能有较大影响,但是对薄膜透过率影响不大.当功率为1kW、溅射气压0.052 Pa、AZO薄膜厚度为250nm时,其电阻率为8.38×10-4Ω·cm,波长在550 nm处透过率为89％,接近基底的本底透过率92％.当薄膜厚度为1125 nm时薄膜的电阻率降至最低(6.16×10-4 Ω·cm).     

TMA脉冲和吹扫时间对原子层沉积的氧化铝薄膜的影响

采用原子层沉积技术(ALD)进行Al_2O_3薄膜工艺研究,获得85℃低温Al_2O_3薄膜ALD的最佳工艺条件。使用椭偏仪测试厚度,使用扫描探针显微镜对薄膜表面形貌进行分析,使用紫外-分光光度计对薄膜的透过率进行分析,所用水汽透过率测试仪器是自行开发的基于钙电学法的测试仪器。分析了在85℃低温下的生长工艺条件对薄膜性能的影响,从前驱体脉冲时间,吹扫时间等工艺条件,对Al_2O_3薄膜的工艺条件进行优化。以三甲基铝(TMA)和H_2O为前驱体制备的Al_2O_3薄膜:沉积速率为0.1nm/cycle,表面粗糙度为0.46nm,对550nm波长光透过率为99.2%,薄膜厚度不均匀性为1.89%,200 nm的Al_2O_3薄膜的水汽透过率为1.55×10~(-4) g/m~2/day。     

金属间化合物Ni3Al薄膜的制备及性能研究

采用直流磁控共溅射法,在衬底温度为450℃的SiO2基体上制备了厚度为500nm的Ni3Al薄膜,X射线衍射(XRD)和透射电子显微镜(TEM)等测试表明,薄膜为(111)取向的L12型晶体结构金属间化合物。采用纳米压痕方法测试了薄膜的力学性能,其硬度为8.00GPa,弹性模量为200GPa。为克服亚微米级薄膜氧化增重难以测量的困难,采用四探针测试金属薄膜电阻的方法,间接给出了薄膜的腐蚀性能和高温氧化程度。结果表明Ni3Al金属间化合物薄膜的氧化速率为2.28×10-13g2/(cm4.s),薄膜具有良好的高温抗氧化性能。     

磁控溅射氧气流量对非晶InGaZnO薄膜特性的影响研究

采用射频磁控溅射法在不同氧气流量条件下制备了非晶In Ga Zn O(a-IGZO)薄膜。利用霍尔效应,X射线光电子能谱(XPS)和光透过率谱研究了氧气流量对a-IGZO薄膜性能影响的规律。研究表明a-IGZO薄膜呈现n型半导体特性。当氧气流量为0.5 m L/min时薄膜电子迁移率达到最大12 cm2/Vs。当氧气流量大于1 m L/min时,薄膜呈现出半绝缘电导特性。XPS揭示了a-IGZO薄膜中In,Ga,Zn元素均以In3+,Ga3+及Zn2+价态存在,氧气流量分别为0和4 m L/min的a-IGZO薄膜的O 1s高分辨率XPS图谱表明低氧气流量a-IGZO薄膜中存在与氧空位相关的氧晶格元素O 1s峰而高氧气流量样品中没有显示此峰,表明生长过程中增加氧气流量降低了a-IGZO中氧空位缺陷浓度。此外,a-IGZO薄膜在可见光范围内的光透过率随氧气流量的增加而提高,当氧气流量为1 m L/min时a-IGZO薄膜平均透过率达到80%,光学禁带宽度为3.37 e V,为实现高性能透明a-IGZO-TFT器件奠定基础。     

基于响应面法的原子层沉积高阻隔膜研究

目的 研究分析等离子辅助原子层沉积技术(ALD)技术在PET表面上沉积超薄Al2O3阻隔层的工艺优化。方法 采用单因素结合响应面设计试验法,对Al2O3/PET薄膜的沉积速率(GPC)进行优化,通过AFM分析得到薄膜的生长模式和表面粗糙度,最后用水蒸气透过率表征薄膜的阻隔性能。结果 最大GPC的沉积参数:TMA脉冲时间为0.17 s、吹扫时间为11 s、O2的脉冲时间为0.35 s、吹扫时间为10 s、沉积速率为0.215 nm/cycle;薄膜以层状生长模式生长,表面粗糙度均方根(RMS)为0.58 nm;沉积500个循环后薄膜的水透过率从7.456 g∙d/m²降低到0.319 g∙d/m²。结论 通过响应面法优化了ALD制备工艺参数,Al2O3在PET表面沉积100 nm左右时,水蒸气阻隔性提高了25倍。     

退火对Cr3+离子掺杂Al2O3薄膜的结构及发光性能影响

用脉冲激光沉积技术在Si(100)基底上制备了纯Al2O3、掺杂浓度为0.3%、1%(质量分数)的Cr3+∶Al2O3薄膜。制备态的薄膜为立方γ-Al2O3结构,经800℃真空条件下退火1h样品的结晶度有所提高,呈现α-Al2O3相与γ-Al2O3相的衍射峰。薄膜基本保持了靶材中原有各元素成分比例,平均粒径为250nm,形貌为条形。与Al2O3粉体相比,制备态薄膜在386nm处的发光峰强度明显提高。这可归因于薄膜中氧空位的增加使双氧空位吸收电子所产生的F2+色心浓度提高。薄膜经真空退火后在332、398nm附近的发光峰强度明显增强,这是由于薄膜中氧空位的增加提高了F+、F色心浓度。与此同时,制备态薄膜在386nm附近发光峰经退火后由386nm蓝移至381nm,可归因于退火后制备态薄膜的内应力得到了释放。1%(质量分数)Cr3+掺杂薄膜在646、694nm出现Cr3+离子由4 T2能级跃迁至4 A2能级及由E-能级跃迁至4 A2能级产生的荧光发光峰。     

高光学质量Yb:YAG透明陶瓷的制备及激光参数研究

以高纯Y₂O₃, α-Al₂O₃, Yb₂O₃粉体作为原料, 采用固相反应和真空烧结法(1750 ℃, 30 h)制备了高光学质量的Yb:YAG透明陶瓷。5.0at% Yb:YAG陶瓷中Yb ³⁺的实测浓度为6.41×10 ²⁰ cm ^-3, 晶胞密度为4.65 g/cm ³。本工作重点研究了Yb:YAG陶瓷的显微结构、光谱特性和激光性能参数。场发射扫描电镜(FESEM)结果表明, Yb:YAG陶瓷的结构均匀致密、晶界干净平直, 平均晶粒尺寸为(19±3) μm。该陶瓷样品(厚度为4.0 mm)在400 nm处的直线透过率为82.5%, 在1100 nm处的透过率为85.2%。泵浦波长940 nm处的泵浦饱和光强最小, 激光波长1030 nm处的泵浦阈值功率最低, 940 nm泵浦1030 nm激光的品质因子为1.02×10 ^-22 cm·s。通过计算增益截面表明Yb:YAG陶瓷宽带可调谐, 是理想的激光增益材料。     

功率密度对中频磁控溅射制备的氧化锌镓薄膜性能的影响

利用中频磁控溅射方法,溅射Ga2O3含量为6.7wt%的氧化锌镓陶瓷靶材,在低温下(约40℃)制备了ZGO薄膜.考察了溅射功率密度对ZGO薄膜的晶体结构、电学和光学性能的影响.结果表明:溅射功率密度对薄膜的结构、红外反射以及导电性能有较大影响.当溅射功率密度为3.58W/cm2,氩气压力为0.8Pa时,薄膜的电阻率低达1.5×10-3Ω·cm,方块电阻为23Ω时,可见光(λ＝400nm～800nm)平均透过率高于90%.     

Influences of process parameters on texture and microstructure of NiO films

The experimental result shows that the preferred orientations of NiO thin films are closely related to the working pressure of argon. All of NiO(111), NiO(200), and NiO(220) diffraction peaks are observed in the XRD patterns and exhibited random orientation of NiO film when the film is deposited in low Ar pressure of 0.67 Pa. As the Ar pressure is increased to 2.67 Pa, only the NiO(200) peak appears and shows (200)-textured NiO films. However, the lattice parameter of NiO film deposited in high Ar pressure of 2.67 Pa is 0.426 nm, which is much larger than that of the NiO bulk (0.417 nm). The lattice parameter can be reduced by post-annealing the film because the interstitial Ar atoms are released from the NiO lattice, decreasing continuously from 0.423 to 0.417 nm as the NiO films are annealed by rapid thermal annealing (RTA) from 300 to 600 °C.     

Au and NiO nanocrystals doped into porous sol-gel SiO(2) films and the effect on optical CO detection

Thin-film composites comprised of NiO and NiO/Au nanoparticles in a porous SiO(2) matrix have been prepared using the sol-gel technique. When at elevated temperatures (200?°C< T<350?°C) and exposed to carbon monoxide, the films undergo reversible changes in optical transmittance at wavelengths in the visible-near IR region. For NiO composite films heated at 330?°C and exposed to 1% CO in air, there is an increase in transmittance which approaches 2-4% over most of the visible range. For NiO/Au composite films the transmittance increase exhibits a wavelength dependence, with a maximum change which is close to 6% at λ≈630?nm and which is close to zero in the Au plasmon resonance range (λ≈550?nm).     

制备条件对电致变色氧化镍薄膜特性的影响

在充氧气的真空室内 ,用电子束蒸发NiO粉末颗粒的方法分别以 0 1和 0 8nm/s的淀积速率制备了氧化镍薄膜 ,并在不同的环境中对薄膜进行热处理。研究了薄膜结构和电致变色特性与淀积速率的关系 ,发现以较慢和较快速率淀积的薄膜分别具有NiO晶粒的 (2 0 0 )和 (111)不同择优取向 ,前者致色范围较小 ,后者致色范围较大。还研究了热处理对薄膜的结构、动态致色范围、致色效率 ,以及红外光谱特性的影响 ,发现热处理对薄膜的致色效率影响较小 ,然而对动态致色范围的影响很大。     

Characterization of crystalline structure and morphology of NiO thin films

We investigated the relation of sputtering powers with structural and morphological properties of nickel oxide (NiO) thin films. NiO thin films were fabricated by using an rf-reactive sputtering method on Si(100) substrates with a Ni target in a partial pressure of oxygen and argon. The films were deposited by various rf-sputtering powers from 100 to 200 W at room temperature. The phases and crystalline structures of the deposited films were investigated by using grazing incident X-ray diffraction (XRD). The thickness and surface morphology of the films were investigated by using a field emission-scanning electron microscopy (FE-SEM). The different sputtering conditions drastically affected the crystallinity and the surface morphology of NiO thin films. A combined analysis of the data obtained from X-ray diffraction and SEM images demonstrates that the preferred orientation of NiO films tends to grow from (111) to (200) direction as increasing the sputtering power, which can be explained by in terms of the surface energy along the indexing plane in an fcc structure. As increasing the rf power, lattice constants decreased from 4.26 to 4.20 angstroms and samples became high-quality crystals. Under our experimental condition, NiO films prepared at 150 W with 20% partial pressure of oxygen and 7 cm distance from the sample to the target show the best quality of the crystal.     

Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO–Eosin B and NiO–Erythrosin J/electrolyte (I₂/I⁻) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.     

交换耦合双层膜NiO/Ni81Fe19的基片温度效应研究

用射频磁控溅射方法在不同基片温度下玻璃基片上分别制备NiO单层膜、NiFe单层膜和NiO／NiFe双层膜,研究了不同基片温度对膜的磁性能的影响．用振动样品磁强计（VSM）分析了膜的磁特性,结果表明：基片温度260℃时淀积的NiFe膜矫顽力Hc为184A·m^－1,小于室温淀积NiFe膜的H_c（584A·m^－1）,且磁滞回线的矩形度更好．室温下淀积NiO（50nm）／NiFe（15nm）双层膜的Hc为4000A·m^－1,交换耦会场（H_EX）仅为1600A·m^－1,磁滞回线的短形度很差,而260℃时淀积的双层膜的Hc下降到3120A·m^－1,H_EX却增大为4640A·m^－1,同时磁滞回线的矩形度也得到改善,其截止温度T_B高达230℃．X射线衍射（XRD）分析了膜的织构,结果表明：室温下淀积NiO膜呈现（220）织构,而260℃时淀积NiO膜呈现（111）织构;室温和260℃淀积的NiFe膜都呈（111）织构,但后者晶粒比前者大．     

Structural,optical, and photocatalytic investigation of nickel oxide@graphene oxide nanocomposite thin films by RF magnetron sputtering

Despite the recent advancement in graphene oxide (GO) as a host material in energy and environmental sectors, its composite thin films with metal oxides such as nickel oxide (NiO) and its optical, structural, chemical state, and photocatalytic activities have been poorly explored. Herein, we have reported the GO/NiO thin films preparation by a combination of chemical and physical deposition techniques (i.e. spin coating followed by DC/RF sputtering). The as-prepared composites thin films were characterised using Raman spectroscopy, X-ray diffraction/photoelectron spectroscopy scanning electron microscopy, and atomic force microscopy. The surface topography confirmed the uniform deposition of NiO over thin films of GO. The XPS results showed the formation of NiC along with the partial reduction in GO into graphene with their existing four constituents, i.e. NiO, NiC, GO, in the thin film composites. The classical plasmon, Wemple and Didomenico model, was first time applied for GO/NiO to compute energy loss functions, and dispersion energy parameters. The theoretical calculated values for the deposited GO/NiO thin films were found to be in very close agreement to the standard classical plasmon values. The change in spin orbital movement of Ni is considered due to the interaction between its nanoparticles and basal planes of GO. Thin films applied for the photodegradation of recalcitrant organic pollutant 2-chlorophenol (2-CP) revealed the dependence of photocatalytic efficiency on particle size and also on the interaction of GO with NiO rather than the ratio of NiO and GO in the films.     

Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

Nickel oxide thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique in a pure oxygen atmosphere with sputtering power of 150 W and substrate temperature of 523 K. Crystalline properties of NiO films as a function of film thickness were investigated using X-ray diffraction. XRD analysis revealed that (200) is the preferred orientation and the orientation of the films changed from (200) to (220) at film thickness of 350 nm. The maximum optical transmittance of 60% and band gap of 3.82 eV was observed at the film thickness of 350 nm. The lowest electrical resistivity of 5.1 Ω cm was observed at a film thickness of 350 nm, thereafter resistivity increases with film thickness.     

NiO-based nanostructured thin films with Pt surface modification for gas detection

Nanocrystalline NiO thin films were prepared by dc reactive magnetron sputtering in a mixture of oxygen and argon and subsequently coated by Pt on an NiO film surface. Very thin Pt overlayers with a thickness of about 3 and 5 nm have been deposited by magnetron sputtering. Then, the modified NiO films have been analyzed by TEM, EELS and AES. NiO thin films showed a polycrystalline structure (fcc NiO phase) with the size of nanocrystals ranging from a few nanometres to 10 nm. TEM observations both of unmodified and Pt-modified NiO films revealed that they were formed by nanocrystals and an amorphous phase. Uniformly distributed Pt particles were produced on top of the NiO surface. According to AES measurements, the presence of Ni in the spectra recorded from Pt pad indicated that the Pt layer has discontinuous nature. Electrical responses of NiO-based sensor structures towards hydrogen have been measured.     

NiO/In2O3纳米复合材料的制备及气敏性能研究

采用水热法结合水浴法制备出了NiO/In2O3纳米复合材料,利用扫描电子显微镜(SEM)、透射电子显微镜(TEM)和X射线衍射仪(XRD)等对其微观形貌和晶相进行表征分析。表征结果表明,制备所得In2O3纳米微球直径为200~300 nm,其表面均匀包覆厚度约为20 nm的NiO纳米片。气敏测试结果表明,基于NiO/In2O3异质结纳米复合材料的气体传感器对甲醛的最佳工作温度为220℃;在最佳工作温度下,对浓度为1×10^-5的甲醛气体响应可达到20,响应/恢复时间分别为4 s/16 s,且具有较好的重复性和选择性。最后,对分级结构及p-n异质结对其气敏机理进行了探讨。