InGaAsP/InP Double Quantum Well Intermixing Induced by Phosphorus Ion Implantation

A quantum well intermixing(QWI) investigation on double quantum well(DQW) structure with two different emitting wavelength caused by phosphorus ion implantation and following rapid thermal annealing (RTA) was carried out by means of photoluminescence(PL). The ion implantation was performed at the energy of 120 kev with the dose ranging from 1 × 1011 cm-2 to 1× 1014 cm-2. The RTA was performed at the temperature of 700 ℃ for 30 s under pure nitrogen protection. The PL measurement implied that the band gap blue-shift from the upper well increases with the ion dose faster than that from lower well and the PL peaks from both QWs remained well separated under the lower dose implantation(～1×1011 cm-2 ) indicating that the implant vacancy distribution affects the QWI. When the ion dose is over ～ 1 × 1012 cm-2 , the band gap blue-shift from both wells increases with the ion dose and finally the two peaks merge together as one peak indicating the ion implantation caused a total intermixing of both quantum wells.     

Surface Morphology and Photoluminescence of 1.3μm Wavelength In（Ga） As／GaAs Quantum Dots

Self-organized In0.5 Ga0.5As/GaAs quantum island structure emitting at 1.35 μm at room temperature has been successfully fabricated by molecular beam epitaxy(MBE) via cycled(InAs)1/(GaAs)1 monolayer deposition method.Photoluminescence(PL) measurement shows that very narrow PL linewidth of 19.2 meV at 300 K has been reached for the first time,indicating effective suppression of inhomogeneous broadening of optical emission from the In0.5Ga0.5As islands structure.Our results provide important information for optimizing the epitaxial structures of 1.3μm wavelength quantum dot （QD） devices.     

Cu/SiO2逐层沉积增强无杂质空位诱导InGaAsP/InGaAsP量子阱混杂

研究了Cu/SiO_2逐层沉积增强的无杂质空位诱导InGaAsP/InGaAsP多量子阱混杂(QWI)行为。在多量子阱(MQW)外延片表面,采用等离子体增强的化学气相沉积(PECVD)不同厚度的SiO_2,然后溅射5 nm Cu,在不同温度下进行快速热退火(RTA)诱发量子阱混杂。通过光荧光(PL)谱表征样品在QWI前后的变化。实验结果表明,当RTA温度小于700℃时,PL谱峰值波长只有微移,且变化与其他参数关系不大;当RTA温度大于700℃时,PL谱峰值波长移动与介质层厚度和RTA时间都密切相关,当SiO_2厚度为200 nm,退火温度为750℃,时间为200 s时,可获得54.3 nm的最大波长蓝移。该种QWI方法能够诱导InGaAsP MQW带隙移动,QWI效果与InGaAsP MQW中原子互扩散激活能、互扩散原子密度以及在RTA过程中热应力有关。     

Analysis of mechanisms of carrier emission in the p-i-n structures with In(Ga)As quantum dots

With the help of the photocurrent spectroscopy, the mechanism of emission of charge carriers from energy levels of the (In,Ga)As/(Al,Ga)As quantum dots of different design are studied. Thermal activation is shown to be the main mechanism of carrier emission from the quantum dots for the isolated layer of quantum dots separated by wide (Al,Ga)As spacer layers. At a small width of the (Al,Ga)As spacer layer, when electron binding of separate layers of the quantum dots in the vertical direction takes place, the role of the tunneling mechanism of carrier emission between the vertically coupled quantum dots increases.     

Si3N4无杂质空位诱导InGaAs/InP 量子阱结构带隙的蓝移

用光荧光谱和二次离子质谱的方法,研究了由Si3N4电介质薄膜引起的无杂质空位诱导InGaAs/InP多量子阱结构的带隙蓝移。实验中选用Si3N4作为电介质层,用以产生空位,并经快速热退火处理。实验结果表明,带隙蓝移同退火时间和退火温度有关,合理选用退火条件可以控制带隙的蓝移量。二次离子质谱分析表明,电介质盖层Si3N4和快速热退火导致量子阱中阱和垒之间互扩,这种互扩是导致带隙蓝移的主要原因。     

Optical properties of InAs<Subscript>1−x</Subscript>N<Subscript>x</Subscript>/In<Subscript>0.53</Subscript>Ga<Subscript>0.47</Subscript>As single quantum wells grown by gas source molecular beam epitaxy

Optical properties of InAs_1−xN_x/In_0.53Ga_0.47As (hereafter, abbreviated as InAsN/InGaAs) single quantum wells (SQWs) grown on InP substrates by gas source molecular-beam epitaxy are studied using photoluminescence (PL) measurements. By comparing the low-temperature PL spectra of InAs/InGaAs and InAsN/InGaAs SQWs, InAs and InAsN phases are found to coexist in the InAsN layer. Such serious alloy inhomogeneities result in obvious exciton localization by potential irregularities. The blue shift of the PL peak after rapid thermal annealing (RTA) is found to originate mainly from As-N interdiffusion inside the well layer. According to the temperature-dependent PL results, uniformity of the InAsN layer can be effectively improved by RTA, and the exciton localization is, thus, relieved. Comparison of luminescence quenching and excitation-power-dependent PL behavior between the QWs with and without nitrogen content suggests that the quality of the QW is degraded by the introduction of nitrogen, and the degradation can only be partially recovered by post-growth RTA.     

氢离子注入法提高InAsP/InP应变多量子阱发光特性

采用气态源分子束外延系统生长了InAsP/InP应变多量子阱,研究了H 注入对量子阱光致发光谱的影响以及高温快速退火对离子注入后的量子阱发光谱的影响.发现采用较低H 注入能量(剂量)时,量子阱发光强度得到增强;随着H 注入能量(剂量)的增大,量子阱发光强度随之减小.H 注入过程中,部分隧穿H 会湮灭掉量子阱结构界面缺陷,同时H 也会对量子阱结构带来损伤,两者的竞争影响量子阱发光强度的变化.高温快速退火处理后,离子注入后的量子阱样品发光峰位在低温10K相对于未注入样品发生蓝移,蓝移量随着H 注入能量或剂量的增大而增加.退火过程中缺陷扩散以及缺陷扩散导致的阱层和垒层之间不同元素互混是量子阱发光峰位蓝移的原因.     

Optical and morphological properties of InGaAs/AIGaAs self-assembled quantum dot nanostructures for 980 nm room temperature emission

This work deals with the study of optical and morphological properties of InGaAs/AlGaAs quantum dot （QD） structures grown by molecular beam epitaxy （MBE）. Photoluminescence （PL） emission energies, activation energies of PL quenching and QD sizes are studied as functions of the Al content in the AlyGal-yAs confining layers （CL）. We show that the PL emission energy of In（Ga）As/AlyGal-yAs QD structures increases with increasing y and that the sizes of InAs/AlyGal-yAs QDs decrease with increasing y. By the comparison of the experimental results with those of an effective-mass model developed to calculate the QD fundamental transition energies, we show that the blueshift of emission energy has to be ascribed not only to the increase in barrier discontinuities that confine the carriers into QDs but even to effects related to changes of the QD morphology dependent on CL composition. Moreover, we show that the Al content in the barriers determines also the activation energy of thermal quenching of PL, which depends on the thermal escape of carriers from QD levels. These studies resulted in the preparation of structures with efficient light-emission in the 980 nm spectral window of interest for lightwave communications.     

In_xGa_（1－x）As／Al_yGa（1－y）As多量子阱的高压光致发光研究

用金刚石对顶砧压力装置在液氮温度下和０～４ＧＰａ的压力范围内测量了不同阱宽（１．７～１１．０ｎｍ）的ＩｎｘＧａ（１－ｘ）Ａｓ／Ａｌ（１－ｙ）Ｇａ（１－ｙ）Ａｓ（ｘ，ｙ＝０．１５，０；０．１５，０．３３；０，０．３３）多量子阱的静压光致发光谱，发现在Ｉｎ０．１５Ｇａ０．８５Ａｓ／ＧａＡｓ多量子阱中导带第一子带到重空穴第一子带间激子跃迁产生的光致发光峰能量的压力系数随阱宽的增加而减小，在Ｉｎ０．１５Ｇａ０．８５Ａｓ／Ａｌ０．３３Ｇａ０．６７Ａｓ和ＧａＡｓ／Ａｌ０．３３Ｇａ０．６７Ａｓ多量子阱中相应发光峰的压力系数随附宽的增加而增加．根据Ｋｒｏｎｉｙ－Ｐｅｎｎｅｙ模型计算了发光峰能量的压力系数随阱宽的变化关系，结果表明导带不连续性随压力的增加（减小）及电子有效质量随压力的增加是压力系数随阱宽增加而减小（增加）的主要原因．     

掺Si对AlGaInP/GaInP多量子阱发光性能的影响

研究了Si掺杂对MOCVD生长的（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱发光性能的影响．样品分为两类：一类只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构;另一类为完整的多量子阱LED结构．对于只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构的样品,掺Si没有改变量子阱发光波长,但使得量子阱发光强度略有下降,发光峰半高宽明显增大．这应是掺Si使量子阱界面质量变差导致的．而在完整LED结构的情况下,掺Si却大大提高了量子阱的发光强度．相对于未掺杂多量子阱LED结构,垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍,并对这一现象进行了讨论．     

Long-wavelength GaInNAs(Sb) lasers on GaAs

The boom in fiber-optic communications has caused a high demand for GaAs-based lasers in the 1.3-1.6-μm range. This has led to the introduction of small amounts of nitrogen into InGaAs to reduce the bandgap sufficiently, resulting in a new material that is lattice matched to GaAs. More recently, the addition of Sb has allowed further reduction of the bandgap, leading to the first demonstration of 1.5-μm GaAs-based lasers by the authors. Additional work has focused on the use of GaAs, GaNAs, and now GaNAsSb barriers as cladding for GaInNAsSb quantum wells. We present the results of photoluminescence, as well as in-plane lasers studies, made with these combinations of materials. With GaNAs or GaNAsSb barriers, the blue shift due to post-growth annealing is suppressed, and longer wavelength laser emission is achieved. Long wavelength luminescence out to 1.6 μm from GaInNAsSb quantum wells, with GaNAsSb barriers, was observed. In-plane lasers from these samples yielded lasers operating out to 1.49 μm, a minimum threshold current density of 500 A/cm² per quantum well, a maximum differential quantum efficiency of 75%, and pulsed power up to 350 mW at room temperature     

多变量离子注入型量子阱混杂效应

为实现InP基单片集成光电子器件和系统,对InGaAsP/InGaAsP分别限制异质结多量子阱激光器结构展开量子阱混杂(QWI)技术研究。在不同能量P离子注入、不同快速热退火(RTA)条件以及循环退火下,研究了有源区量子阱混杂技术,实验结果采用光致发光(PL)谱进行表征。实验结果表明:在不同变量下皆可获得量子阱混杂效果,其中退火温度影响最为显著,且循环退火可进一步提高量子阱混杂效果;PL谱蓝移随着退火温度、退火时间和注入能量的增大而增大,退火温度对蓝移的影响最大,在注入剂量为1×10^14 ion/cm2,注入能量为600keV,750℃二次退火150s时获得最大蓝移量116nm。研究结果为未来基于QWI技术设计和制备单片集成光电子器件和系统奠定了基础。     

Quantum light source devices of In(Ga)As semiconductor self-assembled quantum dots

A brief introduction of semiconductor self-assembled quantum dots (QDs) applied in single-photon sources is given. Single QDs in confined quantum optical microcavity systems are reviewed along with their optical properties and coupling characteristics. Subsequently, the recent progresses in In(Ga)As QDs systems are summarized including the preparation of quantum light sources, multiple methods for embedding single QDs into different microcavities and the scalability of single-photon emitting wavelength. Particularly, several In(Ga)As QD single-photon devices are surveyed including In(Ga)As QDs coupling with nanowires, InAs QDs coupling with distributed Bragg reflection microcavity and the In(Ga)As QDs coupling with micropillar microcavities. Furthermore, applications in the field of single QDs technology are illustrated, such as the entangled photon emission by spontaneous parametric down conversion, the single-photon quantum storage, the chip preparation of single-photon sources as well as the single-photon resonance-fluorescence measurements.     

Characterization of MOVPE-grown (Al, In, Ga) N heterostructures by quantitative analytical electron microscopy

The low pressure metalorganic vapor phase epitaxy growth of wurzite (Al, In, Ga)N heterostructures on sapphire substrates is investigated by quantitative analytical scanning transmission electron microscopy techniques like atomic number (Z-) contrast imaging and convergent beam electron diffraction (CBED). Especially (In, Ga)N quantum wells of different thicknesses as well as superlattices were analyzed with respect to defects, chemical composition variations, interface abruptness and strain (relaxation) effects. The interfaces in In_0.12Ga_0.88N/GaN quantum wells appear to be asymmetric. Additionally, we found composition variations of Δx_In≥0.03 within the InGaN quantum wells. The application of electron diffraction techniques (CBED) yields quantitative information on strain and relaxation effects. For the case of 17 nm thick InGaN quantum wells, we observed relaxation effects which are not present in the investigated thin quantum wells of 2 nm thickness. The experimentally obtained diffraction patterns were compared to simulations in order to get values for strain within the quantum wells. Additionally, the influence of dislocations on the digression of superlattices is investigated.     

Control of emission wavelength for InGaAs/GaAs quantum wells and laser structures on their basis by means of proton irradiation

Features of controlling the wavelength of emission from laser heterostructures with strained InGaAs/GaAs quantum wells by irradiation with medium-energy (with the energy as high as 150 keV) protons are studied. It is established that irradiation with H⁺ ions and subsequent thermal annealing at a temperature of 700°C make it possible to decrease the wavelength of emission from quantum wells. As the dose of ions is increased from 10¹³ to 10¹⁶ cm⁻², the magnitude of change in the wavelength increases to 20 nm. Starting with a dose of 10¹⁵ cm⁻², a significant decrease in the intensity of emission is observed. The optimum dose of H⁺ ions (6 × 10¹⁴ cm⁻²) and annealing temperature (700°C) for modifying the InGaAs/GaAs/InGaP laser structures are determined; it is shown that, in this case, one can obtain a shift of ∼(8–10) nm for the wavelength of laser radiation with low losses in intensity with the quality of the surface of laser structures retained. The observed “blue” shift is caused by implantation-stimulated processes of intermixing of the In and Ga atoms at the InGaAs/GaAs interface.     

MOCVD生长InGaAs／Alj0.2Ga0.8As应变多量子阱

用MOCVD方法生长了3种InGaAs/Al0.2Ga0.8As应变多量子阱（MQWs）样品，用于研究在气相中TMIn的含量对MQWs的发光波长和半峰宽（FWHM）以及在X射线中零级峰位的影响。研究表明，随着In组分在MQW中的增加，MQWs中应变也随之增加，这是造成FWHM增大的原因。同时也研究了应变MQWs中In组分与气相中TMIn含量的关系，为准确设计和控制MQWs的组分提供了依据。     

Processing parameters for selective intermixing of GaAs/AIGaAs quantum wells

Some of the parameters which determine the amount of intermixing of GaAs/AIGaAs quantum wells (QWs) using SiO₂ capping and rapid thermal annealing (RTA) have been studied using photoluminescence (PL) techniques. The degree of intermixing of QWs was found to be larger for thicker SiO₂ capping layers and for shorter distances between the QWs and the oxide-wafer interface. A maximum PL energy difference of 90 meV was observed between the region covered by a 1.3 μm thick oxide layer and the non-oxide region in a wafer that was annealed at 1100° C for 15 s.     

InGaAs／GaAs自组织量子点光致发光特性研究

用PL谱测试研究了GaAs和不同In组份InxGa1-xAs(x=0.1,0.2,0.3)覆盖层对分子外延生长的InAs/GaAs自组织量子点发光特性的影响,用InxGa1-xAs外延层覆盖InAs/GaAs量子点,比用GaAs做 其发光峰能量向低有端移动,发光峰半高度变窄,量子点发光峰能量随温度的红移幅度较小,理论计算证实这是由于覆盖层InxGa1-xAs减小了InAs表面应力导致发光峰红移,而In元素有效抑制了InAs/GaAs界面组份的混杂,量子点的均匀性得到改善,PL谱半高宽变窄,用InGaAs覆盖的In0.5Ga0.5As/GaAs自组织量子点实现了1．3μm发光,室温下PL谱半高宽为19．2meV,是目前最好的实验结果。     

Material characterization of an ion-implantation process for p-type (InGa)As/GaAs quantum-well structures

We have performed a detailed study of the formation of Be⁺-implanted contacts to modulation-doped, p-channel, (InGa)As/GaAs, single-strained quantum wells. Photoluminescence at 4 K from these structures is shown to be an excellent monitor of implant and annealing effects, as corroborated by Hall-effect measurements. Rapid thermal annealing produced higher electrical activation of the Be implants than did arsine-over-pressure annealing at comparable temperatures, similar to the trend in bulk GaAs. In contrast to conventional, alloyed-contact technologies, the rapid-annealed, implanted structures provided ohmic contact to the quantum well even at 4 K.     

Structural and optical investigation of InGaN/GaN multiple quantum well structures with various indium compositions

We have studied the influence of indium (In) composition on the structural and optical properties of In_x Ga_1−xN/GaN multiple quantum wells (MQWs) with In compositions of more than 25% by means of high-resolution x-ray diffraction (HRXRD), photoluminescence (PL), and transmission electron microscopy (TEM). With increasing the In composition, structural quality deterioration is observed from the broadening of the full width athalf maximum of the HRXRD superlattice peak, the broad multiple emission peaks oflow temperature PL, and the increase of defect density in GaN capping layers and InGaN/GaN MQWs. V-defects, dislocations, and two types of tetragonal shape defects are observed within the MQW with 33% In composition by high resolution TEM. In addition, we found that V-defects result in different growth rates of the GaN barriers according to the degree of the bending of InGaN well layers, which changes the period thickness of the superlattice and might be the source of the multiple emission peaks observed in the In_xGa_1−xN/GaN MQWs with high in compositions.