纳米粒子掺杂的光致聚合物全息记录材料的发展及展望

光致聚合物全息记录材料在大数据存储、全息显示等领域有广泛的应用,但是,曝光前后单体的聚合导致材料收缩限制了光致聚合物全息记录材料的进一步推广。本文介绍了全息光学的原理,光致聚合物全息记录材料的记录机理,通过分析当前纳米粒子掺杂的光致聚合物材料研究成果,对该领域的发展现状及前景进行判断。     

光致聚合物材料中各组分对光聚合速度的影响及其在全息存储中的应用实验

本文研究了光敏剂、光引发剂、光促进剂、单体及高分子成膜树脂等成份对全息光致聚合物薄膜光存储性能的影响，在一定范围内，材料中光引发剂浓度的提高使光聚合速度显著增加，链转移剂浓度则存在一个最佳的相对浓度，适当地增加液态辅助单体含量及其所含双键官能团的数目，会明显增加光聚合速度，在聚醋酸乙烯酯薄膜中单体聚合速度明显优于在醋酸纤维素中的速度，所制备的光致聚合物材料实现了同一位置的多幅全息图像的存储和再现，表明了该材料有用于大容量全息存储的可能。     

TiO2纳米粒子掺杂的有机双化学反应体系光致聚合物全息存储材料

制备了一种TiO2纳米粒子掺杂的有机双化学反应体系光致聚合物全息存储材料,并对其全息特性进行了研究。实验表明,该无机/有机光聚物材料薄膜厚度为240um时,掺杂的TiO2纳米粒子与单体的浓度比为5∶95时,获得了84%的高衍射效率,7.9×10-4的折射率调制度、6.5cm2/J的感光灵敏度和低至0.12%的缩皱率。并且使用此材料进行了多幅全息图的角度复用拍摄,图像清晰,信噪比与保真度较好。我们认为该无机/有机光聚物材料具有较好的全息存储性能,适合在高密度全息存储领域应用。     

含氟丙烯酸酯光致聚合物的全息特性研究

提高记录单体在成膜物中的迁移速率,加大记录单体与成膜物的折射率差,可以实现光致聚合物的折射率空间调制最大化.本工作以高折射率的超支化聚酯(折射率1.586)为成膜树脂,利用超支化聚合物分子结构疏松、便于小分子在其间扩散的特性,同时以低折射率的单官能团含氟丙烯酸酯(折射率1.372)和高活性的双官能团丙烯酸酯(折射率1.457)为记录单体制备了光致聚合物全息膜,以衍射效率为指标优化单体构成和全息膜的厚度,研究了该全息膜的衍射效率、空间分辨率、折射率调制度等性能.该光致聚合物全息材料的折射率调制度为4.82×10-3,衍射效率达到99.4%,在空间分辨率3750 lp/mm的衍射效率仍然达到85.6%,感光灵敏度56 mJ/cm2.     

改性超支化聚酯用于激光全息记录材料

超支化聚合物的分子链之间无缠绕,堆砌疏松,小分子在其间容易扩散、迁移。因此,可能是制备激光全息记录材料的基体树脂。以偏苯三酸酐(TMA)、环氧氯丙烷(ECH)为原料,合成了末端为羟基的超支化聚酯;再分别以苯甲酸/DCC、苯甲酰氯/叔胺2种封端方式对超支化聚酯进行封端改性,制得了苯甲酰基团为末端的亲油性超支化聚酯;以改性的亲油性超支化聚酯为成膜树脂,多种(甲基)丙烯酸酯为光聚合反应的单体,配制了光致聚合物全息记录材料;研究了超支化聚酯的合成以及封端改性反应,比较了光聚合单体、光致聚合物薄膜厚度、曝光条件等对全息衍射效率的影响。用514.5nm的Ar+激光器,空间分辨率为2748线对/mm时,光致聚合物薄膜的灵敏度约为9.5m J/cm2,全息光栅衍射效率可达93%,具有较好的全息记录特性。     

无毒、环保型光致聚合物全息记录材料研究进展

光致聚合物全息记录材料具有存储容量大、读写速度快等优点,但是当前的很多产品所用成分具有毒性和致癌性,得到研究人员的广泛关注。本文介绍了国内外研究机构和公司的主要产品,并对其毒性进行分析,总结了国内外研究人员对无毒、环保型的光致聚合物产品的探索成果,并对进一步的发展提出展望,本文的研究结果可为科研工作人员进一步开发无毒、环保型的光致聚合物全息记录产品提供重要的参考。     

形状记忆聚合物

综述了形状记忆聚合物的4种基本类型：热致、电致、光致和化学感应型,介绍了热致形状记忆聚合物的记忆机理,概述了聚降冰片烯、反式聚异戊二烯、交联聚乙烯及聚氨酯等形状记忆聚合物研究进展,同时介绍了形状记忆聚合物材料在医疗、包装、建筑、玩具、汽车、报警器材等领域的应用。     

谈谈双折射知识

目前用于光盘存储的基片材料是聚碳酸酯(Polycarbonate)、聚甲基丙烯酸甲酯、改性双酚A环氧树脂和非晶态聚烯烃等高聚物光盘基片,其中聚碳酸酯是最重要的光盘基片材料。作为聚合物光盘基片材料．要求具有高的透光率、光学纯度、尺寸稳定性和热     

浅谈全息光存储技术

全息光存储技术是以全息图的形式将数据信息记录到存储材料中的一种新兴存储技术。由全息方法本身的物理特性所决定,它不仅保存了物光的振幅信息,而且还保存了其完整的空间位相信息。全息光存储虽然具有高存储容量、高读写速率、高可靠性等优点,但选用兼具性能、容量和价格综合优势的存储材料,实现合适的性能价格比仍是全息光存储技术大规模推广应用亟待解决的问题。     

信息存储新领域——全息存储及其材料

从目前磁记录、磁光记录以及光盘记录的现状和发展趋势出发,指出现有的记录方法不能满足未来超大容量、高存取速率的要求。而全息存储将是最理想的存储技术。文章介绍了全息存储技术的概念、原理和特点,着重探讨了全息存储对记录材料的性能要求。最后对目前几种常见全息材料的性能进行比较,按照其不同的存储原理和理化性能,分析各自的优点和不足。文章最后指出,全息存储将在未来的社会生活中扮演重要角色。     

Nitroanilines enhancing the holographic data storage characteristics of the 9,10‐phenanthrenequinone‐doped poly(methyl methacrylate) photopolymer

This article describes an approach toward improving the characteristics of a photopolymer for holographic data storage application. The maximum diffraction efficiency (η_max) and dynamic range (M#) of 9,10‐phenanthrenequinone (PQ)‐doped poly(methyl methacrylate; PMMA) both improved significantly after co‐doping with one of three nitroanilines—N,N‐dimethyl‐4‐nitroaniline (DMNA), N‐methyl‐4‐nitroaniline (MNA), and 4‐nitroaniline (pNA). In particular, the value of η_max increased from 38% for the PMMA/PQ system to 72% for the PMMA/PQ/DMNA system (a 1.89‐fold improvement) and the value of M# increased accordingly from 2.7 to 7.3 (a 2.70‐fold improvement). Thus, the holographic data storage characteristics of PMMA/PQ photopolymers can be improved through co‐doping with nitroaniline compounds. We also investigated the mechanism of the nitroaniline‐induced improvement in optical storage performance using proton nuclear magnetic resonance and X‐ray photoelectron spectroscopy. © 2012 Wiley Periodicals, Inc. J. Appl. Polym. Sci., 2013     

Polymers as substrates and media for data storage

Technological developments in the 1990s will be determined by progress in the field of microelectronics, particularly with regard to information processing and data storage. Progress in information storage is directly related to the ability to store large amounts of data in the smallest possible space, preferably in erasable form. Polymers are used as components in the standard storage systems of today: as carrier films for magnetic tapes, as photoresists and electron beam resists, and as substrates for magnetic and optical discs used for music or video replication and data storage. Storage systems with higher packing densities such as magnetooptical and phase change systems or memories based on photopolymers or polymers with liquid crystalline side chains are currently under development. In these systems, polymers will be used both as components and as actual storage materials. The development and the availability of advanced erasable memories with high storage densities could be accelerated by the availability and the system-related modification of “intelligent” polymer materials. Worldwide activities in this interesting field have barely progressed beyond the initial stages. This progress report describes the current state of the art and compares the various developments in an attempt to forecast the possible significance of polymer memories with high data packaging densities in relation to the established technologies.     

Photopolymers for rapid prototyping

Rapid prototyping by means of stereolithography using different types of photopolymers has gained increasing interest because cellular structures can be built at a high resolution with sub-μm feature sizes. Structures made with digital light processing and microstereolithography and rapid prototyping based on two-photon absorption photopolymerization techniques are presented. Soluble photopolymers were developed to substitute crosslinked photopolymers as mold materials and to extend the variety of materials which can be cast. With these molds, the processing of ‘bio-inspired’ ceramic composites with a controlled architecture from a macroscopic scale down to the nanometer range is possible. Another example is the development of biophotopolymers that are based on commercially available reactive diluents and modified gelatin for the fabrication of cellular bone replacement materials. Biocompatibility was investigated by seeding with osteoblast-like cells.     

光折变三维存储器~([1])

磁盘和光盘存储是当今最主要的数据存储方式。这种二维存储已经逐渐达到其存储极限 ,已经不能满足当今信息存储的要求。光折变三维全息存储是最有前途的存储新技术 ,可以对数据进行并行处理 ,具有超大容量 (1 0 1 3 bit/cm3 )、数据传输率高 (1 0 9bit/s)等优点。搀杂铌酸锂晶体是目前最理想的三维光折变存储材料。     

Holographic recording characteristics and physical mechanism of zinc methacrylate/nitroaniline‐co‐doped poly(methyl methacrylate)/9,10‐phenanthrenequinone photopolymers

In this study we developed an approach to improve the characteristics of photopolymers for holographic data storage. Through codoping different compounds, N,N‐dimethyl‐4‐nitroaniline (DMNA) and zinc methylacrylate (Zn(MA)₂), into 9,10‐phenanthrenequinone (PQ) doped poly(methyl methacrylate) (PMMA), the diffraction efficiency and the value of dynamic range (M#) have been progressed. We enhanced the diffraction efficiency (from 36.1 to 86.2%) and the dynamic range (M#, from 2.9 to 10.7) of PQ‐doped PMMA through codoping with DMNA and Zn(MA)₂. Using mass spectrometry and X‐ray photoelectron spectroscopy, we investigated the mechanism behind the improvements in optical storage induced by the presence of Zn(MA)₂ and DMNA in PMMA/PQ. POLYM. ENG. SCI., 2013. © 2012 Society of Plastics Engineers     

On C60 fullerene photopolymerization

C₆₀ photopolymerization has been studied in the solvents CCl₄ , CH₂Cl₂ , cyclohexane and decalin. Irradiation of C₆₀ solutions under nitrogen flow produced C₆₀ photopolymers, the structure of which was studied by electronic and FTIR spectroscopy and found to be comparable to that of C₆₀ photopolymers prepared by solid-state photopolymerization or by C₆₀ piezopolymerization (polymerization under high pressure). The role of oxygen as photopolymerization inhibitor in cyclohexane and in the formation of oxygenated photopolymers in halogenated solvents has been investigated and is discussed. The effect of light wavelength on the photopolymerization has been investigated and is discussed. It was found that for λ>265 nm, CCl₄ is photolysed and plays a role in promoting its photopolymerization, while for λ>300 nm no interference from CCl₄ occurs. © 1999 Society of Chemical Industry     

Antimicrobial dual-cured photopolymers of vanillin alcohol diglycidyl ether and glycerol dimethacrylate

Considering the current efforts for to develop new antimicrobial polymers from renewable resources suitable for application in environmentally friendly light-based technologies, novel dual-cured photopolymers of vanillin alcohol diglycidyl ether and glycerol dimethacrylate are developed. The kinetics of the sequential and simultaneous dual-curing processes, combining free radical and cationic photopolymerizations, is investigated by real-time photorheometry. Comparison of dual-curing systems with different ratios of biobased epoxy and acrylate monomers revealed that the increase in the acrylate content increases the photocuring rate and improves the mechanical performance (Young's modulus increases from 76.64 to 190.71 MPa) and thermal stability (the 10% weight loss increases from 227 to 274°C) of the polymers, while the increase in the vanillin epoxy content results in better antimicrobial activity. Developed photopolymers create unfavorable conditions for the growth of microorganisms and reduce their population by up to 0% in 24 h. The excellent antibacterial and antifungal activity of new photopolymers allows them to be considered as biobased alternatives to petroleum-based antimicrobial coatings, films, or optical 3D printed objects.     

Development and structuring of combined positive‐negative/negative‐positive resists using laser ablation as positive dry etching technique

Novel photopolymers, based on cinnamylidenemalonyl groups, were designed for excimer laser ablation lithography. These polymers are highly sensitive to laser ablation at a specific irradiation wavelength, i. e., 308 nm, but can also be applied as classical, negative photoresist. The crosslinking of the polymer is accomplished by irradiation at >395 nm. The sensitivity of the photopolymers to laser ablation before and after crosslinking is nearly equal. The combination of these two processes, i. e., laser ablation and photocrosslinking, can be applied for the fabrication of arrays of microstructures. The laser ablation step is used to fabricate microstructures, while the classical wet processing is used for large area structuring. Combined processes of crosslinking‐wet development and laser microstructuring, but also vice versa were carried out. The microstructures had the same high resolution, independent of the processing order.     

Fe∶In∶LiNbO_3晶体近红外非挥发全息存储实验研究

采用双中心存储方式在双掺杂Fe∶In∶LiNbO3晶体中实现了近红外非挥发全息存储,研究了Fe∶In∶LiNbO3晶体在1064nm波长下的全息存储性能。实验结果表明:使用近红外光作为存储光时,其存储灵敏度随存储时间和光透射掩膜图夹角的变化趋势与双中心短波长存储时不同。通过与传统双掺杂铌酸锂晶体的可见波段存储效果对比,发现同时掺杂Fe和In离子可增强晶体对近红外光的吸收,获得更高的浅中心光生伏特系数,从而能够在Fe∶In∶LiNbO3晶体中实现近红外波段的光折变全息存储。