The refractive index near the fundamental absorption edge inAlxGa1-xAs ternary compound semiconductors

The real part of the complex refractive index is calculated for photon energies over the region from 1.2 to 1.8 eV for Al_xGa _1-xAs compounds as a function of x. No singularity is predicted. Rather, a change in the functional form of the refractive index, n occurs as the photon energy passes through the bandgap energy, G, leading to a local maximum or, more accurately, a plateau region in n as a function of frequency, which is observed experimentally. The effect of a finite-spin orbit-splitting energy and the effect of higher conduction bands are included. Theoretical and experimental results are compared for Al_xGa _1-xAs over a range of mole fractions from x=0 to x=0.198     

Analysis of Hg1-xCdxSe alloys inelectroreflectance

An electrolyte electroreflectance study on Hg_1-xCd_xSe alloy films is first reported. The critical point energies E₀ and E₁ are obtained for different CdSe composition samples and material homogeneities are also discussed     

Monte Carlo study of GaAs/Alx Ga1-xAsMODFETs: effects of AlxGa1-xAs composition

Monte Carlo methods are used to compare electronic transport and device behavior in n⁺-Al_xGa_1-xAs/GaAs modulation-doped field-effect transistors (MODFETs) at 300 K for x =0.10, 0.15, 0.22, 0.30, 0.35, and 0.40. The differences between the x=0.22 and x=0.30 MODFETs with respect to parasitic conduction in Al_xGa_1-xAs, gate currents, and switching times, are of particular interest. The donor-related deep levels in Al_xGa_1-xAs, are disregarded by assuming all donors to be fully ionized, and the focus is only on the confinement and transport of the carriers. The following quantities are studied in detail: transfer characteristics (I_D versus V _G), transconductance (g_m), switching speeds (τ_ON), parasitic conduction in Al_xGa _1-xAs, gate current (I_G), average electron velocities and energies in GaAs and Al_xGa_1-x As, electron concentration in the device domain, k-space transfer (to low mobility L and X valleys), and details of the real-space transfer process     

Schottky diodes of Au on GaAs1-xSbx/GaAs n-Nheterostructures grown by MBE

Au Schottky barrier heights on molecular-beam-epitaxial grown n-GaAs_1-xSb_x/N-GaAs heterostructures with x up to 0.26 have been studied. It was found that φ_bn=0.9-1.77x+2.89x², or φ_bn≈0.77E_g-0.20 for x<0.26. The pinning position of the Fermi level with respect to the valence-band edge for x<0.26 takes the form of E _pin=-0.52x+0.53 eV, which also appears to be valid for an x value up to 1.0     

Monte Carlo studies of the effect of emitter junction grading onthe electron transport in InAlAs/InGaAs heterojunction bipolartransistors

InAlAs/InGaAs HBTs with various emitter junction gradings are simulated using a self-consistent Monte Carlo simulator. The effects of the emitter junction grading and the shift of the emitter-base p-n junction into the emitter depletion region due to diffusion of the base dopant are investigated. A minimum transit time of 1.18 ps is predicted for an In(Ga_1-xAl_x)As grading with x=0.6 at the E-B interface and J_C=0.7×10⁵ A/cm². Graded-base designs do not offer any transit time performance improvement compared with the graded E-B approach. For transient performance, the device switching time is found to remain constant at about 2.2 ps up to x₀~0.7 but increases for larger values. A cutoff frequency as high as 270 GHz was observed for x₀=0.7, indicating that the best transport can be achieved from intermediately graded rather than abrupt E-B junction designs     

Strained InGaAs/GaAs quantum well constricted-mesa lasers andapplication in a vertical-twin-guide tunable laser

Constricted-mesa semiconductor lasers containing a strained-layer InGaAs single-quantum-well-separate-confinement-heterostructure have been demonstrated. Very high etching selectivity between Al_xGa_1-xAs (x=0.9) and Al_xGa _1-xAs (x=<0.6) was achieved using diluted hydrofluoric acid to create a deeply undercut current confinement region, which enables a side contact for current injection. A process combining a self-aligned reactive ion etch and the undercut wet chemical etch has been developed for implementing a vertical twin-guide three-electrode tunable laser structure. Low-threshold currents for both single-guide devices with centered top contacts (5.2 mA) and twin-guide ones with side contacts (6.5 mA) were obtained     

Dark current analysis and characterization ofInxGa1-xAs/InAsyP1-y gradedphotodiodes with x>0.53 for response to longer wavelengths(>1.7 μm)

The dark current properties of In_xGa_1-xAs photodiodes, where x is varied from 0.53 to 0.82 for extending the long wavelength cutoff from 1.7 to 2.6 μm, are described. Detailed analyses of optoelectrical parameters of In_0.82Ga _0.1As photodiodes are presented. Dark current, which is a critical parameter and limits the operation of the photodiode, is analyzed and compared with the experimental values. Typical characteristics of photodiodes with cutoff wavelengths of 1.7 μm (x=0.53), 2.2 μm (x=0.72), and 2.6 μm (x=0.82) are presented. The typical and best values of the dark currents obtained are presented     

Strained-insulatorInxAl1-xAs/n+-In0.53Ga0.47As heterostructure field-effect transistors

In an effort to enhance the conduction band discontinuity between channel and insulator, In_xAl_1-xAs/n⁺-In _0.53Ga_0.47As heterostructure field-effect transistors (HFETs) were fabricated with InAs mole fractions in the In _xAl_1-xAs gate insulator of x=0.52 (lattice matching), 0.48, 0.40, and 0.30. Decreasing the InAs mole fraction in the insulator results in reduced forward- and reverse-bias gate currents, increased reverse gate breakdown voltage, and reduced real-space transfer of hot electrons from channel to gate. Down to x =0.40, these improvements trade off with a slightly reduced transconductance, but the gain in gate bias swing results in an increase in maximum current drivability. From x=0.40 to x=0.30, there is a drastic decrease in transconductance, coincident with a high density of misfit dislocations     

High-performance highly strainedGa0.23In0.77As/Al0.48In0.52As MODFET's obtained by selective and shallow etch guide recesstechniques

Record high f_TL_g products of 57 and 46 GHz-μm have been achieved in Ga_1-x In_x As/AlInAs MODFETs with a strain compensated channel of x=0.77 and a lattice-matched channel of x=0.53, respectively. Although g_m as high as 950 mS/mm has been obtained by conventional deep recess for the gate, these latter devices show a prominent kink effect which lowers f_T and the voltage gain. By limiting the depth of final nonselective recess etch to 3 nm with the help of selective step etches, f_T as high as 47 GHz and g_m as high as 843 mS/mm have been achieved for MODFETs with x=0.77 and L_g=1.1 μm     

Ga1-yInyAs/InAsxP1-1 (y>0.53, x>0) pin photodiodes for long wavelengthregions (λ>2 μm) grown by hydride vapour phase epitaxy

pin photodiodes with a 2.3 μm absorption edge are presented, using hydride vapour phase epitaxy. A Ga₁-_yIn_yAs (y=0.72) absorption layer, lattice-mismatched to the InP substrate, was grown on an InAs_xP_1-x (x=0-0.33) graded composition buffer layer. Typical dark current was 5 μA (0.03 A/cm²) at -6 V. Effective carrier lifetime of 0.05 μs was estimated from I/V characteristics     

Effect of parameter variations on the performance of GaAs/AlGaAsmultiple-quantum-well electroabsorption modulators

A theoretical investigation is presented of the dependence of electroabsorption in GaAs/Al_xGa_1-xAs multiple-quantum-well (MQW) structures on the MQW parameters (Al mole fraction x, well thickness L_z barrier thickness L_b and interface quality) and on the applied electric field studied. The on/off ratio of a modulator using MQWs with x=0.45, L_z=75 Å, and L _b=78 Å is predicted to increase by 20% compared to that of a modulator using MQWs with x=0.3, L_z =100 Å, and L_b=100 Å, when the MQW total active region thickness is 1 μm     

Hg0.4Cd0.6Te 1.55-μm avalanche photodiodenoise analysis in the vicinity of resonant impact ionization connectedwith the spin-orbit split-off band

The authors describe the electrical and optical characterization of three Hg_1-xCd_xTe avalanche photodiodes manufactured using planar technology with composition parameter x near 0.6. This alloy composition leads to devices that are well suited for 1.55-μm detection. From the noise analysis under multiplication, the authors show the tight dependence of the ratio β/α (of the hole; and electron ionization coefficient, respectively) upon x and the ratio Δ/E_g where Δ is the spin-orbit splitting energy and E _g is the bandgap energy. It turns out that in these alloys around x=0.6, Δ is very close to the bandgap energy so β/α reaches its maximum value. Owing to this property, which is characteristic of II-VI compounds, Hg_1-xCd_xTe is a good candidate for 1.3-μm to 1.6-μm avalanche photodiodes     

Low-temperature microwave characteristics of pseudomorphic InxGa1-xAs/In0.52Al0.48Asmodulation-doped field-effect transistors

Low-temperature microwave measurements of both lattice-matched and pseudomorphic In_xGa_1-xAs/In_0.48As (x=0.53, 0.60, and 0.70) channel MODFETs on InP substrates were carried out in a cryogenic measurement system. The measurements were done in the temperature range of 77 to 300 K and in the frequency range of 0.5 to 11.0 GHz at different bias conditions. The cutoff frequency ( f_T) for the In_xGa_1-xAs/In_0.52Al_0.48As MODFETs improved from 22 to 29 GHz, 29 to 38 GHz, and 39 to 51 GHz, for x=0.53, 0.60, and 0.70, respectively, as the temperature was lowered from 300 to 77 K, which is approximately a 31% increase at each composition. No degradations were observed in device performance. These results indicate an excellent potential of the pseudomorphic devices at low temperatures     

Theoretical and experimental studies of the effects of compressiveand tensile strain on the performance of InP-InGaAs multiquantum-welllasers

The authors have studied, both theoretically and experimentally, the effects of biaxial strain upon the performance characteristics of broad-area InP-InGaAsP-In_xGa_1-xAs (0.33⩽x ⩽0.73) separate confinement heterostructure multiquantum-well lasers. The theoretical calculations include the effects of strain on the bandstructure and the Auger recombination rates. A pronounced dependence of the threshold current density J_th upon x is observed. The lowest measured J_th is 589 A/cm² in an 800-μm laser with x=0.68. Also, internal quantum efficiencies as high as unity and loss coefficients as low as 5.6 cm^-1 have been measured for x=0.58     

Diluted magnetic semiconductors

Diluted magnetic semiconductors (DMSs), i.e. semiconducting crystals whose lattice is made up in part of substitutional magnetic ions (e.g. Cd_1-xMn_xTe, Hg_1-xFe_x Se, Zn_1-xCo_xS), are reviewed. The focus is on materials of the type A_1-x^II Mn_xB ^VI, which are the most thoroughly understood. However, the similarities and differences between these materials and the A_1-x ^IIFe_xB^VI and A_1-^IICo_xB^VI systems are discussed wherever information on the latter system is available. The band structure of the materials, which determines their basic semiconducting properties, is examined. Special attention is given to exchange interactions between the magnetic ions themselves (the d -d interaction) and the interaction between the magnetic ions and band electrons (the sp-d interaction). Magnetic phenomena in DMS alloys are considered. Special attention is given to the physics of layered structures, such as quantum wells and superlattices, involving DMS materials. The prospects of device applications made possible by the properties of DMS alloys are assessed     

Magneto-optical studies of semimagnetic superlattices

We report on the magneto-optical studies of II–VI semiconductor superlattices incorporating Cd_1−xMn_xTe semimagnetic semiconductor layers. A variety of the observed phenomena is due to the strong exchange interaction of carrier spins with spins of magnetic ions. The giant Zeeman splitting of the exciton states, the magnetic polaron formation and the spin relaxation of photocarriers in the semimagnetic superlattices are discussed.     

Lattice mobility of holes in strained and unstrained Si1-xGex alloys

Results of the lattice drift mobility in strained and unstrained SiGe alloys are reported for Ge fractions, 0.0⩽x⩽1.0. The mobilities are calculated using acoustic, optical, and alloy scattering mechanisms. Due to the strain-induced symmetry reduction in the band structure of Si_1-xGe_x, the mobility is found to be a tensor with two distinct components parallel and perpendicular to the growth plane. Assuming that the scattering mechanisms are independent of the strain, the strained mobility increases exponentially with increasing Ge content, for x=0.3     

Design and experimental characteristics of strained In0.52Al0.48As/InxGa1-xAs (x>0.53)HEMTs

Strained In_0.52Al_0.48 As/In_xGa _1-xAs (x>0.53) HEMTs (high electron mobility transistors) are studied theoretically and experimentally. A device design procedure is reported that is based on band structure and charge control self-consistent calculations. It predicts the sheet carrier density and electron confinement as a function of doping and thickness of layers. The DC performance at 300 K is presented. Wafer statistics demonstrate improvement of device characteristics with excess indium in the channel (g¯_{m, intr}=500 and 700 mS/mm for x=0.60 and 0.65). Microwave characterization shows the f_T improvement (f_T=40 and 45 GHz for x=0.60 and 0.65, respectively) and the R_ds limitations of the 1-μm-long-gate HEMTs     

The effect of base grading on the gain and high-frequencyperformance of AlGaAs/GaAs heterojunction bipolar transistors

A comprehensive one-dimensional analytical model of the graded-base Al_xGa_1-xAs/GaAs heterojunction bipolar transistor is presented and used to examine the influence of base grading on the current gain and the high-frequency performance of a device with a conventional pyramidal structure. Grading is achieved by varying the Al mole fraction x linearly across the base to a value of zero at the base-collector boundary. Recombination in the space-charge and neutral regions of the device is modeled by considering Schockley-Read-Hall, Auger, and radiative processes. Owing to the different dependencies on base grading of the currents associated with these recombination mechanisms, the base current is minimized, and hence the gain reaches a maximum value, at a moderate level of base grading ( x=0.1 at the base-emitter boundary). The maximum improvement in gain, with respect to the ungraded base case, is about fourfold. It is shown that the reduction in base transit time due to increased base grading leads to a 30% improvement in f_T in the most pronounced case of base grading studied (x=0.3 at the base-emitter boundary). The implications this has for improving f _max via increases in base width and base doping density are briefly examined     

Relationships between m-sequences over GF(q) andGF(qm)

It is shown that m-sequences over GF(q^m ) of length q^nm-1 corresponding to primitive polynomials in GF[q^m,x] of degree n can be generated from known m-sequences over GF(q) of length q^nm-1 obtained from primitive polynomials in GF[q,x] of degree mn. A procedure for generating the m-sequences over GF(q²) from m-sequences over GF(q) was given which enables the generation of m-sequences over GF( p²ⁿ). In addition it was shown that all of the primitive polynomials in GF[q,^m,x] can be obtained from a complete set of the primitive polynomials in GF[q ,x]