Ni80Cr20合金薄膜制备影响因素的试验研究

利用直流磁控溅射的方法制备Ni80Cr20合金薄膜,以氩气流量、氩气工作压强、溅射功率作为三因素进行正交试验,在溅射时间相同的条件下分别测试了薄膜厚度、表面粗糙度、电阻率并进行了极差分析。分析结果表明:在一定范围内,氩气工作压强与溅射功率对薄膜厚度的影响较大;在氩气工作压强为3.0Pa时,薄膜厚度与溅射功率近似成正比关系;随着氩气流量的增大,Ni80Cr20薄膜厚度呈现先增大后减小的趋势;在氩气流量为50cm~3/min时,薄膜厚度达到最大值;各因素对薄膜表面粗糙度及电阻率影响不明显。     

沉积温度对磁控溅射Ti/TiN多层膜光学和电学性能的影响

采用直流反应磁控溅射法于不同温度下在Si(111)基底上制备了Ti/TiN多层膜,采用X射线衍射仪和原子力显微镜对膜的物相和表面形貌进行了分析,研究了沉积温度对膜结构及其光学、电学性能的影响。结果表明:不同沉积温度下制备的Ti/TiN多层膜均由钛和TiN相组成,多层膜与单层TiN膜一样,其表面粗糙度随沉积温度的升高而减小,电阻率随沉积温度的升高显著降低;其表面形貌则比单层膜更加致密和均匀;多层膜红外反射率与其电阻率有关,当电阻率减小时,红外反射率增大。     

氩气对金刚石膜碳价键、粒径和表面形貌的影响

为调整微钻表面金刚石薄膜的晶粒尺寸和粗糙度以满足PCB板钻孔的工况要求,调节氩气和氢气流量比,采用热丝化学气相沉积法,以甲烷、氢气及氩气为气源在硅基体上沉积出一系列金刚石薄膜。利用拉曼光谱仪、X射线衍射仪(XRD)、扫描电子显微镜(SEM)及原子力显微镜(AFM),分别表征不同氩气流量下制备的金刚石薄膜的碳价键结构、晶面取向、晶粒尺寸和表面粗糙度。结果表明:随着氩气流量增大,金刚石薄膜中的石墨含量呈升高趋势,薄膜趋向(111)晶面择优生长,晶粒尺寸从微米级(1. 27μm)细化至纳米级,薄膜粗糙度先升高后降低,最低为65 nm。研究表明,存在最优的氩气流量使得制备的薄膜具有适宜的结构特点,如碳价键含量高、(111)晶面取向度高、晶粒尺寸小和粗糙度低,可满足PCB板超细钻孔的要求。     

工艺参数对TiN薄膜光学性能的影响

在玻璃基片上用直流磁控溅射的方法制备氮化钛薄膜,研究了在不同氢气氯气流量比(λAr/N2)条件下和不同镀膜时间内所制备TiN薄膜对紫外一可见一近红外光的透光性能,以及对中远红外光反射能力影响.结果表明,随着氩氮流量比(λAr/N2)的增大,TiN薄膜在可见光到近红外区域透光性逐渐减小,但其对中远红外光反射能力不断增强.镀膜时间的增加使其方块电阻R□急剧减小,中远红外光反射率迅速升高到接近70%.     

氮气反应溅射制备软X射线Co/Ti多层膜

针对"水窗"波段(280~540eV)对多层膜反射镜的应用需求,在Ti的L吸收边(452.5eV)附近,优化设计了Co/Ti多层膜的膜系结构。计算了不同界面粗糙度条件下的反射率,结果显示,界面粗糙度对多层膜反射率有较大影响。采用直流磁控溅射方法在超光滑硅基片上制备了Co/Ti多层膜,通过将氮气引入原有的溅射气体氩气中作为反应气体,明显减小了制备的多层膜的界面粗糙度。利用X射线掠入射反射实验和透射电子显微镜测试了多层膜结构,并在北京同步辐射装置(BSRF)3W1B实验站测量了不同氮气浓度下多层膜的反射率。结果显示,氮气含量为5%的溅射气体制备的多层膜样品反射率最高,即将纯氩气溅射制备得到的反射率9.5%提高到了12.0%。得到的结果表明,将氮气加入反应溅射气体可以有效改善Co/Ti多层膜的性能。     

真空电弧沉积薄膜显微硬度与工艺参数的关系

测试了各种工艺条件下真空电弧沉积 (VAD)的TiN薄膜的显微硬度 ,并研究了TiN薄膜硬度随基材、电弧电流、基片温度、氮气压力及负偏压的变化。实验结果表明 :在多数基材上 ,薄膜硬度均接近或超过 2 0GPa ,且薄膜的硬度与基材的硬度不呈比例关系 ,TiN薄膜的硬度随电流的增加有减少的趋势 ;在相当宽的温区内 ,TiN薄膜的硬度随温度上升而增大 ,而且在高温下的硬度值比低温时稳定 ,总体上 ,VAD比其它离子镀具有更宽阔的T区 ;在氮气压力为 0 .1Pa～ 1Pa的区域内 ,TiN薄膜的硬度稳定在 2 0MPa以上 ,而且适当的负偏压有利于提高TiN薄膜的硬度。     

反应磁控溅射法制备ZnO/Al(O)/ZnO薄膜的光学和电学性能

采用反应磁控溅射法,通过控制中间层沉积时的氧气流量,在聚对苯二甲酸乙二醇酯基底上制备了ZnO/Al(O)/ZnO薄膜,研究了氧气流量对Al(O)薄膜的微观形貌、表面粗糙度,以及对ZnO/Al(O)/ZnO薄膜光学和电学性能的影响。结果表明:随着氧气流量的增加,铝在ZnO薄膜表面由三维岛状生长转变为二维层片状生长,Al(O)薄膜表面粗糙度先增大后减小再增大,当氧气流量为6.7×10~(-3)cm~3·s~(-1)时最小;随着氧气流量的增加,ZnO/Al(O)/ZnO薄膜在较长波长范围内的透过率增大,方阻增大,霍尔迁移率和载流子浓度下降;综合考虑光学和电学性能,适宜的氧气流量为6.7×10~(-3)cm~3·s~(-1)。     

脉冲偏压对PECVD制备DLC薄膜的结构及性能的影响

在不锈钢基材表面利用等离子体增强化学气相沉积技术(PECVD)改变脉冲偏压制备不同结构类金刚石薄膜(DLC)。分别采用表面轮廓仪、扫描电镜、拉曼光谱及电子探针分析薄膜的表面粗糙度、断面形貌、薄膜结构及成分,采用纳米压痕仪及划痕仪测试薄膜的纳米硬度、弹性模量和膜基结合力,采用球盘摩擦试验机测试薄膜在大气环境中的摩擦学性能。结果表明:脉冲偏压显著影响PECVD制备的DLC薄膜的表面粗糙度、微观形貌、膜基结合力、纳米硬度及摩擦学性能;随偏压的增大,DLC薄膜的表面粗糙度,摩擦因数及磨损量都先减小后增大,而膜基结合力则先增大后减小。其中2.0 k V偏压制备的DLC薄膜具有最强的膜基结合力,而1.6 k V偏压制备的DLC薄膜具有最低的表面粗糙度、最高的硬度和最优的减摩耐磨性能。     

氮气流量比对CrN涂层结构及摩擦磨损性能的影响

采用直流磁控溅射技术在不同氮气流量比下在YG6基体上制备CrN涂层,通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)及能谱仪(EDS)分析涂层相组成、涂层形貌与涂层元素成分,利用数字式显微硬度仪、划痕仪测定涂层硬度与涂层结合力,在摩擦磨损试验机考察涂层摩擦学性能。结果表明:氮气流量比(氮气流量占气体总流量的比例)为20%、30%时,CrN/YG6涂层结构相对疏松,呈柱状生长;氮气流量比为40%、50%时,CrN/YG6涂层结构较致密,呈三角颗粒状生长;随氮气流量比增大,涂层硬度先增大后减小,当氮气流量比为40%时达到最大值HV1 752.5;CrN涂层的摩擦因数随氮气流量比的增大变化不大,但磨损率先增大后减小再增大,当氮气流量比为40%时达到最小值2.03×10~(-8)mm~3/(N·mm)。研究表明,当氮气流量比为40%时,所制备的CrN涂层具有良好的综合性能。     

钢表面功能氮化铝陶瓷膜制备方法研究

为实现工程中对油膜厚度无损检测的目的,需要在钢表面制备Al N压电薄膜,作为声发射接收元件。采用直流反应磁控溅射技术,利用Al作为过渡基层,在不锈钢上沉积Al N薄膜。研究了改变溅射功率、氮气流量比等工艺条件对Al N薄膜生长的影响。利用X射线衍射仪(XRD)和原子力显微镜(AFM)对薄膜取向性及表面质量做了表征。实验结果表明,溅射功率的增加有利于Al N薄膜的择优取向生长,但过高的功率会影响薄膜表面的粗糙度;氮气流量比过低或过高都会影响Al N的生长,应将其控制在30%~70%的范围为宜。     

磁过滤阴极弧法TiN薄膜的制备及其微观机械性能研究

采用“S”型磁过滤阴极弧等离子体沉积技术,室温下在（111）面单晶硅上沉积氮化钛薄膜。采用AFM和XRD技术分别对薄膜的表面形貌和晶体择优取向进行了表征,并用微刻划的方法分析薄膜的微观机械性能。结果表明,薄膜表面光滑致密,随偏压的增大,表面颗粒粒径先增大后减小,并且从（111）面的择优取向转变成（220）面。在刻划实验中,随载荷增加,薄膜先后经历了完全弹性变形,弹-塑性变形和脆性断裂阶段。利用直接和间接2种方法对得到的薄膜的临界载荷进行分析对比,发现在不同负偏压下,薄膜的内应力和临界载荷不同。随着负偏压的增大,薄膜的内应力逐渐增大,临界载荷逐渐减小。在-100V偏压下制备的氮化钛薄膜的微观机械性能最为理想。     

反应等离子喷涂TiN/AlN涂层的性能研究

TiN涂层可以通过传统的物理或者化学气相沉积（PVD及CVD）工艺制备,但其缺点是沉积速率低,涂层厚度过薄;这些都严重地限制了TiN涂层材料在磨、蚀服役条件下的应用.本文利用反应等离子喷涂的方法制备了TiN/AlN涂层并研究分析了涂层的组织及摩擦磨损性能.结果表明：TiN/AlN涂层韧性比TiN涂层有所提高;TiN/AlN涂层不仅有较低的摩擦系数,且在高载下的磨损性能比TiN涂层有较大的提高.     

A study of the friction and wear performance of MoSx thin films produced by ion beam enhanced deposition and magnetron sputtering

MoS_x thin films were deposited by ion beam enhanced deposition (IBED) and magnetron sputtering (MS) onto the surface of IBEN Si₃N₄ and TiN thin films. The friction and wear performances of thin films and 52100 steel were compared using an SRV model reciprocating testing machine. The results showed that all MoS_x films exhibit good tribological behavior. The MS MoS_x thin film has better wear resistance and the IBED MoS_x film has a longer wear life. The wear resistance of IBED Si₃N₄ and TiN thin film plus MoS_x film is 3–4 times and 8–20 times that of single IBED Si₃N₄ and TiN thin films and 52100 steel respectively. The analyses indicate that the difference in friction and wear performance between the two kinds of MoS_x thin film is determined by the x value of MoS_x, its microstructure and the atom mixing effect at the interface.     

两步压入法--薄膜力学性能的可靠测量方法

提出了采用力学探针测量薄膜力学性能的两步压入法.该方法通过大载荷压入展示基体变形对薄膜硬度的影响,从而选择不影响基体变形的小载荷测出薄膜的硬度和弹性模量.对高速钢基片上的TiN硬质薄膜,单晶硅片上的金属Ni薄膜和(Ti,Al)N/VN纳米多层膜的测量表明,两步压入法能够测出各种性质薄膜的力学性能,并且具有准确可靠的特点.此外,两步法对(Ti,Al)N/VN纳米多层膜的力学性能的测量表明,该体系的纳米多层膜存在硬度和弹性模量异常升高的超硬、超模量效应.     

丝织构对薄膜X射线残余应力分析的影响

具有择尤取向的薄膜材料因弹性呈现各向异性,在利用X射线衍射法测定薄膜残余应力时,常发生d-sin^2ψ测试曲线的非线性振荡,无法得到准确的应力值。本文利用Voigt、Reuss和Kroner模型计算了TiN薄膜的弹性常数随ψ角的分布在低ψ角区发生的弯曲。与实测PVDTiN薄膜的应力测试曲线的弯曲情况相似,说明丝织构的确可能造成薄膜应力测试d-sin^2ψ曲线的低ψ角弯曲。     

Identification of intergranular phases in ceramic nanocomposites

Analytical FEG-TEM was used for nanostructural and nanochemical characterization of Al₂O₃–TiN (composite I) and Si₃N₄–TiN (composite II) ceramic composite systems. The presence of vitreous intergranular phases in pockets at multiple grain junctions and in thin films (≈ 0.8 nm thick) at grain boundaries was revealed by high resolution and Fresnel fringe imaging techniques. The existence of a Ti-rich thin intergranular film at alumina grain boundaries was revealed by EDS line-scanning across internal interfaces at the 1.5 nm lateral resolution level. Extracting interface specific information at subnanometre levels by means of quantitative spatial difference EELS allowed an identification of intergranular phases. Ti sub-oxide existed in thin films at Al₂O₃ and TiN grain boundaries, whereas a mixed Al–Ti–O–N glassy phase was observed in pockets at triple grain junctions in composite I. In composite II, residual siliceous oxide and oxynitride glass phases were identified in thin films at Si₃N₄ grain boundaries and multiple grain junctions, respectively. These observations indicated that the chemistry of the intergranular phase in thin grain boundary films is notably different from that in larger pockets at multiple grain junctions.     

A comparative study on the microstructure and tribological properties of Si3N4 and TiN films produced by the IBED method

The tribological properties of Si₃N₄ and TiN thin films produced by ion beam enhanced deposition (IBED) were compared on a SRV friction and wear testing machine. The friction coefficient of all thin films shows a descending tendency with increase in load, and is lower than that of 52100 steel. All the IBED films show a much better wear resistance than 52100 steel, especially in the higher load and frequency ranges; it can reach six times that of the latter. In order to understand the reasons for their excellent properties, the microstructure, microhardness and bonding strength with the substrate were analysed by SEM, X-ray diffraction, Knoop hardness and scratching test methods separately. The results show that the TiN(1) film exhibits the best tribological properties, which are closely related with its greater hardness and bonding strength.     

PIII方法制备的TiN膜的性能

用一种新型的等离子体浸没式离子注入技术(PIII),在Cr12MoV钢基体上制备了TiN膜,经XPS分析发现,膜中的组织为TiN、TiO2和Ti2O3。对有与无TiN膜的Cr12MoV钢试样进行对比,测定了维氏硬度,耐磨性以及磨痕。结果表明:TiN膜具有高的硬度和优良的抗摩擦性能。     

20CrNiMo钢表面磁控溅射制备TiN/ZrN多层薄膜的形貌及摩擦学性能

利用非对称双极脉冲磁控溅射技术在20CrNiMo钢表面制备了TiN/ZrN多层薄膜,利用扫描电子显微镜和原子力显微镜观察了薄膜的截面和表面形貌,用划痕仪测试了薄膜与基体的结合力,通过球-盘摩擦磨损试验机对薄膜的摩擦学性能进行了研究。结果表明:制备的TiN/ZrN多层薄膜厚度约为2.1μm,薄膜均匀且致密,表面粗糙度为13.63nm;薄膜与基体结合较牢固,临界载荷达到51.0N;薄膜具有优良的减摩性,摩擦因数为0.16,较基体20CrNiMo钢的0.33明显减小,使该钢的耐磨性能得到提高。     

Characteristic evaluation of friction and wear in the C-N and TiN coated gear

C-N films were deposited on the 20CrMo alloy steel substrate by the Plasma Source Ion Implantation (PSII) method and TiN films were coated on the same material by the Physical Vapor Deposition (PVD) method. It was found that friction coefficient of C-N coating were relatively lower than TiN coating. And with the load increased, the friction coefficients of C-N coating and TiN coating were both decreased. Then the author puts forward the test rig, working under the conditions of 1,800 rpm, 20 N·m for 100 h. The observations by microscope showed the wear reduced. The antiwearing performance enhanced prominently. But the TiN coated gear had a more serious friction phenomenon than C-N coated gear. This is caused by that coating of TiN, which was made at a high temperature about 500°C. The high temperature led to the substrate intenerated and the surface hardness had decreased from 850 HV to 630 HV. PSII method eliminates the tempering problem of the coating of C-N films, which had better wear resistance than TiN films. The friction and wear resistance of gears which coated by C-N films ameliorated significantly.