The effect of Cu addition on the electrochemical corrosion and passivation behavior of stainless steels

The effect of Cu addition on the electrochemical corrosion behavior of austenitic, ferritic and martensitic stainless steels in both the active and passive state was investigated by potentiodynamic polarization and electrochemical impedance spectroscopy in 0.1 M H₂SO₄. The semiconducting properties of the passive films were investigated by capacitance measurements by using the Mott-Schottky approach. Cu addition generally improved corrosion resistance and facilitated passivation but did not notably affect the resistance of the passive films. Capacitance results revealed that the passive films behave as n-type and p-type semiconductors at potentials below and above the flatband potential, respectively. Cu addition caused an increase in the donor and acceptor densities, which we have attempted to correlate with the passive film stability.     

Atomic emission spectroelectrochemistry applied to dealloying phenomena II. Selective dissolution of iron and chromium during active-passive cycles of an austenitic stainless steel

Atomic emission spectroelectrochemistry was used to investigate selective dissolution of a 304 austenitic stainless steel sample in 2 M H₂SO₄. The partial dissolution rates of Fe, Cr, Ni, Mn, Mo, and Cu were measured as function of time during a series of potentiostatic triggered activation/passivation cycles. When first exposed to sulfuric acid solution, the steel sample was in a passive state with a total steady state ionic dissolution rate expressed as an equivalent current density of 10 μA cm⁻². A transition into the active and passive state could be triggered by cathodic (−700 mV vs. Ag/AgCl) and anodic (+400 to +700 mV vs. Ag/AgCl) potentiostatic pulses respectively of variable time. Excess Cr dissolution was observed during the activation cycle as compared to Fe and a depletion of Cr dissolution was observed during the passivation cycle. These results are interpreted in terms of the dissolution of a Cr rich passive layer during activation and selective dissolution of Fe, Mn, Ni and other elements to form a Cr rich passive layer during passivation. Quantitative analysis of the excess Cr showed that the residual film contained approximately 0.38 μg Cr/cm². Fe does not appear to be incorporated into the film at this early stage of passive film growth. Residual films of metallic nickel and copper were formed on the surface during the active period that subsequently dissolved during passivation.     

The corrosion behavior of Fe-10Cr nanocrystalline coating

Fe-10Cr nanocrystalline (nc) coatings with a grain size of 20-30 nm were synthesized on glass substrates by magnetron sputtering. The corrosion behavior was investigated in 0.05 mol/L H₂SO₄ + 0.25 mol/L Na₂SO₄ and 0.05 mol/L H₂SO₄ + 0.5 mol/L NaCl solution by polarization curves, EIS and Mott-Schottky analysis. The results showed that compared to Fe-10Cr cast alloy, the active dissolution of the coating was accelerated; the passive film contained more Cr and therefore the coating was easier to passivate. The passive films formed on Fe-10Cr nc and cast alloy exhibited n-type semiconducting behavior in acidic solutions without Cl⁻ and p-type semiconducting behavior in acidic solutions with Cl⁻. The lower breakdown potential for both materials in the solution with Cl⁻ is related to the p-type passive film formed on them. For Fe-10Cr nc, lower donor density and increased Cr content were responsible for the chemical stability of the passive film.     

Bias voltage dependent electrochemical impedance spectroscopy of p- and n-type silicon substrates

For a comprehensive interpretation of the electrochemical processes occurring at a semiconductor/electrolyte interface, an accurate value of the flatband potential versus the reference electrode is needed together with the current/voltage response. The present work is mainly devoted to the analysis of impedance diagrams recorded with n- and p-type silicon electrodes in the dark, in a pure diluted HF solution under different bias values, the potential range being chosen so as the dc current is maintained at a low value, e.g. less than 5 μA cm⁻², and even less than 10 nA cm⁻² in the case of p-type Si under cathodic polarization.Two series of impedance diagrams were recorded. Firstly, the bias value was settled in the potential range where the depletion layer was generated within the semiconductor substrate. In this condition, the high resistance of the space charge region and the resulting low value of the dc current permitted to obtain well-defined semicircles leading to the derivation of both R and C values equivalent to the depletion layer charge distribution. The method based on the analysis of the voltage dependent R-value was compared to the usual Mott-Schottky plot treatment, and proved to be efficient for the determination of a reliable value of the flatband potential versus the reference electrode.In the second series, the analysis of the impedance diagrams was focused on the range of potentials corresponding to the onset of an accumulation layer within the semiconductor. In the case of p-Si, this condition corresponds to the rapid anodic etching of the silicon substrate. At a particular value of the bias, an important induction loop was observed in addition to the usual capacitive behaviour. A Fourier transform treatment demonstrated that the impedance components were interrelated to the time dependent current response under constant bias potential. Then, simultaneous experiments based on chronoamperometry measurements suggested that the electrochemical processes involved in the reaction of Si substrate with HF solution was correlated to a two-step charge transfer mechanism. This interpretation is valid for both the inductive loop obtained in electrochemical impedance spectroscopy and the rise of current versus time observed in chronoamperometry.     

Electrochromic WO3−x films with reduced lattice deformation stress and fast response time

Electrochromic properties of electrochemically deposited and etched (EDE) WO_3−x films have been investigated using voltammetry and nanogravimetry to elucidate the amount of residual stress associated with lattice polarization and deformation in WO_3−x nanoparticles. The cathodic WO_3−x deposition from pertungstic acid solution and unusual properties of the cathodic electroetching of the oxide in tetraethyl ammonium chloride solution are reported and elucidated on the basis of Electrochemical Quartz Crystal Nanogravimetry (EQCN) measurements. The stress enhanced resonant frequency shift was observed upon WO_3−x film coloration. However, the stress enhancement appeared to be much lower (up to 4-6 times) than that measured for films synthesized by other methods. The stress reduction in WO_3−x films under study has been attributed to the stress relaxing propensity of EDE film to suppress the compressive stress wave. A considerable isotopic effect has been observed in nanogravimetry of the H⁺ and D⁺ ion intercalation into WO_3−x films. We have found that the isotopic effect is primarily due to the true mass loading difference between hydrogen and deuterium ions, for the same concentration of color centers (2.65 × 10²¹ cm⁻³), since EQCN frequency shifts associated with stress in the film for H⁺ and D⁺ are very close to each other.     

Effects of NO2 ions on localised corrosion of steel in NaHCO3 + NaCl electrolytes

Pitting corrosion of carbon steel electrodes in 0.1 mol L⁻¹ NaHCO₃ + 0.02 mol L⁻¹ NaCl solutions was induced by anodic polarisation. The evolution of the breakdown potential E_b with NO₂⁻ concentration was investigated by linear voltammetry. E_b increased from −15 ± 5 mV/SCE for [NO₂⁻] = 0 up to 400 ± 50 mV/SCE for [NO₂⁻] = 0.1 mol L⁻¹. During anodic polarisation at potentials comprised between E_b([NO₂⁻] = 0) and E_b([NO₂⁻] ≠ 0), the behaviour of the whole electrode surface, followed by chronoamperometry, was compared to the behaviour of one single pit, followed via scanning vibrating electrode technique (SVET). Addition of a NaNO₂ solution after the beginning of the polarisation led to a rapid repassivation of pre-existing well-grown pits. In situ micro-Raman spectroscopy was then used to identify the corrosion products forming inside the pits. The first species to be detected in the presence of NO₂⁻ were mainly dissolved Fe(III) species, more likely [Fe^III(H₂O)₆]³⁺ complexes. Iron(II) carbonate FeCO₃, siderite, and carbonated green rust GR(CO₃²⁻) were also detected in the active pits, as in the absence of nitrite. But they were accompanied by maghemite γ-Fe₂O₃, a phase structurally similar to the passive film, that forms from the Fe(III) complexes. The Raman analyses then correlate with the SVET observations and confirm that the main effect of nitrite ions is to oxidize iron(II) into iron(III). The passive film would then form from the Fe(III) species still bound to the steel surface.     

Electrochemical corrosion behavior of nanocrystallized bulk 304 stainless steel

By employing Mott-Schottky analysis in conjunction with the point defect model (PDM), we compared donor density and donor diffusion coefficients in the passive films formed on the surface of nanocrystallized bulk 304 stainless steel (NB304ss) and cast 304 stainless steel (304ss) in 0.05 mol/L H₂SO₄ + 0.25 mol/L Na₂SO₄ solution. The donor density at the metal/film interface of the NB304ss was lower than that at the metal film interface of the cast 304ss. Based on the Mott-Schottky analysis, an exponential relationship between donor density and formation potentials of the passive films on the NB304ss and the cast 304ss was built up. The results showed that the donor diffusion coefficients in the passive film formed on the surface of NB304ss was lower than that in the cast 304ss. The lower donor density and the lower diffusion coefficient restrained the electrochemical reaction in the passive film and improved the stability of the passive film. That is the reason why the passive film formed on the NB304ss was more protective.     

Electrochemical studies on the alternating current corrosion of mild steel under cathodic protection condition in marine environments

Alternating current (AC) corrosion of mild steel in marine environments under cathodic protection (CP) condition was studied. Electrochemical studies at the two protection potentials namely −780 and −1100 mV versus SCE were examined by different techniques. DC polarization study was carried out for mild steel in natural seawater and 18.5 g/L NaCl solution to evolve corrosion current density. The corrosion rate determination, pH of the end experimental solution and surface morphology of the mild steel specimens under the influence of different AC current densities were studied. The amount of leaching of iron into the solution was estimated using inductively coupled plasma spectrometry. All these techniques revealed that AC influences the corrosion of mild steel in the presence of marine environments even though CP was given. Surface micrographs revealed that spreading of red rust products noticed on the mild steel surface. At −780 mV CP, red rusts are visually seen when the AC source was above 10 A/m² in both the media but red rusts are appeared after 20 A/m² in the case of −1100 mV CP. Weight loss measurements coupled with surface examination and solution analysis is a effective tool to characterize and quantify the AC corrosion of mild steel in marine environments.     

Li diffusion in LiNi0.5Mn0.5O2 thin film electrodes prepared by pulsed laser deposition

Kinetic and transport parameters of Li ion during its extraction/insertion into thin film LiNi_0.5Mn_0.5O₂ free of binder and conductive additive were provided in this work. LiNi_0.5Mn_0.5O₂ thin film electrodes were grown on Au substrates by pulsed laser deposition (PLD) and post-annealed. The annealed films exhibit a pure layered phase with a high degree of crystallinity. Surface morphology and thin film thickness were investigated by field emission scanning electron microscopy (FESEM). The charge/discharge behavior and rate capability of the thin film electrodes were investigated on Li/LiNi_0.5Mn_0.5O₂ cells at different current densities. The kinetics of Li diffusion in these thin film electrodes were investigated by cyclic voltammetry (CV) and galvanostatic intermittent titration technique (GITT). CV was measured between 2.5 and 4.5 V at different scan rates from 0.1 to 2 mV/s. The apparent chemical diffusion coefficients of Li in the thin film electrode were calculated to be 3.13 × 10⁻¹³ cm²/s for Li intercalation and 7.44 × 10⁻¹⁴ cm²/s for Li deintercalation. The chemical diffusion coefficients of Li in the thin film electrode were determined to be in the range of 10⁻¹²-10⁻¹⁶ cm²/s at different cell potentials by GITT. It is found that the Li diffusivity is highly dependent on the cell potential.     

In situ Raman spectroscopy and electrochemical techniques for studying corrosion and corrosion inhibition of iron in sodium chloride solutions

The corrosion of single crystal pure iron in 3.5% NaCl solutions and its inhibition by 3-amino-5-mercapto-1,2,4-triazole (AMTA) have been studied using in situ and ex situ Raman spectroscopy, cyclic voltammetry (CV), open-circuit potential (OCP), potentiodynamic polarization (PDP), chronoamperometry (CA), and electrochemical impedance spectroscopy (EIS) measurements. CV experiments indicated that the iron electrode in the chloride solution alone showed an anodic peak at ∼−650 mV after the 5th cycle shifted to ∼−610 mV after the 20th cycle; another cathodic peak appeared at ∼−990 mV. In the presence of 1.0 mM AMTA, these two peaks shifted to ∼550 and −1050 mV, respectively. OCP, PDP, CA and EIS revealed that the presence of AMTA and the increase of its concentration move the corrosion potential to more positive values and decrease both the corrosion current and corrosion rate. This effect also increases with increasing the immersion time of iron electrode to 24 h in the test electrolyte. In situ and ex situ Raman investigations confirmed that the addition of AMTA molecules to the chloride solution strongly inhibits the iron corrosion through their adsorption onto the surface blocking its active sites and preventing its corrosion.     

Cathodoluminescence and electron field emission of boron-doped a-C:N films

The optical and electrical properties of so-called carbon nitride films (a-C:N) and boron doped so-called carbon nitride films (a-C:N:B) are studied with cathodoluminescence (CL) spectroscopy and electron field emission measurement. The a-C:N films were first deposited on Si by a filtered cathodic arc plasma system, and then boron ions (∼1 × 10¹⁶ cm⁻²) were implanted into the a-C:N films to form a-C:N:B films by a medium current implanter. The structural and morphological properties of a-C:N and a-C:N:B films were then analyzed using secondary ion mass spectrometer, X-ray photoelectron spectroscopy, FT-IR spectra, Raman spectroscopy and atomic force microscopy. The a-C:N film exhibits luminescence of blue light (∼2.67 eV) and red light (∼1.91 eV), and the a-C:N:B film displays luminescence of blue light (∼2.67 eV) in CL spectra measured at 300 K. Furthermore, the incorporated boron atoms change the electron field emission property, which shows a higher turn on field for the a-C:N:B film (3.6 V/μm) than that for the a-C:N film (2.8 V/μm).     

Anodic titania films as anode materials for lithium ion batteries

Titania thin films were prepared through the anodisation of titanium metal in a 1.0 M sulphuric acid solution at 80 °C utilising a series of pulsed dc constant currents of increasing magnitude. Films were then tested as a potential anode material for lithium batteries using a variety of techniques. Electrochemical testing revealed that the films (3.8 cm²) offered good rate capabilities affording a constant capacity of 48 μAh for a constant current of 10 μA which decreased to 25 μAh on increasing the current to 1250 μA. Cyclic voltammetry was conducted over a range of scan rates from which capacitive currents were examined and rate constants, transfer coefficients and diffusion coefficients calculated. Electrochemical impedance spectroscopy was conducted over six potentials in the range 0.1-2.7 V with the experimental data successfully modelled using an equivalent circuit with the notation R(Q(RW))C. TEM observation of focussed ion beam milled cross-sections showed significant structural differences between the as-anodised film and those cycled in a lithium battery. Raman spectroscopy showed that the films had an anatase character that transformed into an unidentified lithium-containing, titanate phase on cycling. Based on a film thickness of 100 nm, and assuming density of 4 g cm⁻³ such films offered a stable capacity of 316 mAh g⁻¹.     

Electrochemical characteristics of LSCF-SDC composite cathode for intermediate temperature SOFC

A kind of composite cathode, La_0.58Sr_0.4Co_0.2Fe_0.8O_3−δ-Ce_0.8Sm_0.2O_2−δ (LSCF-SDC), was presented in this paper. The electrochemical performance of the cathode on the electrolyte of SDC and YSZ coated with a thin SDC (YSZ/SDC) layer was studied by electrochemical impedance spectroscopy (EIS) and cathodic polarization techniques for their potential utilization in the intermediate temperature solid oxide fuel cell (IT-SOFC). Also studied was the relationship between the electro-catalytic characteristics and the electrode microstructure. Results showed that the LSCF-SDC composite electrode performed better on the SDC electrolyte than on the electrolyte of YSZ/SDC. The polarization resistance, R_p, of the cathode on the SDC electrolyte was 0.23 Ω cm² at 700 °C and 0.067 Ω cm² at 750 °C, much lower than the corresponding R_p of the same cathode on the YSZ/SDC electrolyte. At 750 °C, the cathodic overpotential of the composite cathode on the SDC electrolyte was 99.7 mV at the current density of 1.0 A cm⁻².     

Electrochemical enhancement of adsorption capacity of activated carbon fibers and their surface physicochemical characterizations

The adsorption of activated carbon fibers (ACFs) and their surface characteristics were investigated before and after electrochemical polarization. The adsorption kinetics of m-cresol showed the dependence on polarized potential, and the adsorption rate constant increased by 77.1%, from 6.38 × 10⁻³ min⁻¹ at open-circuit (OC) to 1.13 × 10⁻² min⁻¹ at polarization of 600 mV. The adsorption isotherms at different potentials were in good agreement with Langmuir isotherm model, and the maximum adsorption capacity increased from 2.28 mmol g⁻¹ at OC to 3.67 mmol g⁻¹ at polarized potential of 600 mV. These indicated that electrochemical polarization could effectively improve the adsorption rate and capacity of ACFs. The surface characteristics of ACFs before and after electrochemical polarization were evaluated by N₂ adsorption-desorption isotherms, scanning electron microscope (SEM), zeta potential and Fourier transform infrared spectroscopy (FTIR). The results showed that the BET specific surface area and pore size increased as the potential rose. However, the surface chemical properties of ACFs hardly changed under electrochemical polarization of less than 600 mV. This study was beneficial to understand the mechanism of electrochemically enhanced adsorption.     

In situ photoelectrochemistry and Raman spectroscopic characterization on the surface oxide film of nickel electrode in 30 wt.% KOH solution

The oxide films of nickel electrode formed in 30 wt.% KOH solution under potentiodynamic conditions were characterized by means of electrochemical, in situ PhotoElectrochemistry Measurement (PEM) and Confocal Microprobe Raman spectroscopic techniques. The results showed that a composite oxide film was produced on nickel electrode, in which aroused cathodic or anodic photocurrent depending upon polarization potentials. The cathodic photocurrent at −0.8 V was raised from the amorphous film containing nickel hydroxide and nickel monoxide, and mainly attributed to the formation of NiO through the separation of the cavity and electron when laser light irradiates nickel electrode. With the potential increasing to more positive values, Ni₃O₄ and high-valence nickel oxides with the structure of NiO₂ were formed successively. The composite film formed in positive potential aroused anodic photocurrent from 0.33 V. The anodic photocurrent was attributed the formation of oxygen through the cavity reaction with hydroxyl on solution interface. In addition, it is demonstrated that the reduction resultants of high-valence nickel oxides were amorphous, and the oxide film could not be reduced completely. A stable oxide film could be gradually formed on the surface of nickel electrode with the cycling and aging in 30 wt.% KOH solution.     

Templated growth of cadmium zinc telluride (CZT) nanowires using pulsed-potentials in hot non-aqueous solution

A single step non-aqueous electrodeposition of cadmium zinc telluride (CZT) nanowires on nanoporous TiO₂ substrate was investigated under pulsed-potential conditions. Propylene carbonate was used as the non-aqueous medium. Cyclic voltammogram studies were carried out to understand the growth mechanism of CZT. EDAX and XRD measurements indicated formation of a compound semiconductor with a stoichiometry of Cd_1−xZn_xTe, where x varied between 0.04 and 0.2. Variation of the pulsed-cathodic potentials could modulate the composition of the CZT. More negative cathodic potentials resulted in increased Zn content. The nanowires showed an electronic band gap of about 1.6 eV. Mott-Schottky analyses indicated p-type semiconductor properties of both as-deposited and annealed CZT materials. Increase in Zn content increased the charge carrier density. Annealing of the deposits resulted in lower charge carrier densities, in the order of 10¹⁵ cm⁻³.     

Electrochemical characterization of Co-doped Sr0.8Ce0.2MnO3−δ cathodes on Sm0.2Ce0.8O1.9-electrolyte for intermediate-temperature solid oxide fuel cells

Electrochemical properties of Co-doped Sr_0.8Ce_0.2MnO_3−δ cathode were investigated at the cathode/Sm_0.2Ce_0.8O_1.9 electrolyte interface. The electrochemical impedance spectroscopy was measured under applied cathodic voltages (E = −0.4 to 0 V). At E = 0 V, the area-specific resistance decreased from 2.20 Ω cm² to 0.19 Ω cm² at 700 °C with Co doping. Under the cathodic polarization, the rate determining step of oxygen reduction process was different for both cathodes: the charge transfer for Sr_0.8Ce_0.2MnO_3−δ and the diffusion process for Sr_0.8Ce_0.2Mn_0.8Co_0.2O_3−δ. Besides, the overpotential also decreased from 124 mV to 19 mV at the current density of 0.1 A cm⁻² at 800 °C with Co doping. The improved electrochemical properties of Co-doped Sr_0.8Ce_0.2MnO_3−δ can be ascribed to the formation of more oxygen vacancies and more active sites for oxygen reduction reaction.     

Nucleation of Sn and Sn-Cu alloys on Pt during electrodeposition from Sn-citrate and Sn-Cu-citrate solutions

The initial stages of Sn and Sn-Cu electrodeposition from Sn-citrate and Sn-Cu-citrate solutions on Pt were studied using both current-controlled and potential-controlled electrochemical techniques. For both Sn-citrate and Sn-Cu-citrate solutions, when the current density is controlled to lower than 15 mA/cm², potentials remain almost constant which is appropriate to plate dense and uniform films. When the current density is controlled to between 25 and 35 mA/cm², potentials drop quickly initially, followed by a gradual increase to a constant value. When current density is controlled to higher than 50 mA/cm², potential oscillation happens, and significant hydrogen evolution prevents the formation of dense and continuous Sn and Sn-Cu films. A constant transition time constant indicates a diffusion-controlled process. The diffusion coefficient calculated from the Sand equation is about 3.8 × 10⁻⁶ cm²/s for the Sn-citrate solution and 4.1 × 10⁻⁶ cm²/s for the Sn-Cu-citrate solution. The morphology of both Sn and Sn-Cu deposits plated under different potentials was examined by atomic force microscopy (AFM) and the distribution of each element were analyzed using Auger imaging. Analysis of both the electrochemical results at −0.72, −1.1 and −1.5 V and AFM images for both Sn and Sn-Cu deposits at −1.1 and −1.5 V suggested progressive nucleation controlled by diffusion for both Sn and Sn-Cu electrodeposition. Tin reacted with Pt to form PtSn₄, and co-deposited with Cu to form Cu₆Sn₅ during nucleation, with more Sn forming at higher applied potentials.     

Pulsed electrodeposition of bismuth telluride films: Influence of pulse parameters over nucleation and morphology

Pulsed electrodeposition methods were applied to the preparation of bismuth telluride films. Over the potential ranges from −170 mV to −600 mV, the formation of Bi₂Te₃ nuclei proceeded through a three-dimensional instantaneous nucleation mode. The nuclei densities for several values of potential were ranged between ∼10⁶ nuclei cm⁻² and ∼10⁸ nuclei cm⁻². For a pulsed galvanostatic electroplating, the best covering percentage and a stoichiometry close to the desired Bi₂Te₃ were obtained with the parameters t_on, t_off and J_c, respectively, equal to 10 ms, 1000 ms and −100 mA cm⁻².     

Electrochemical evaluation of the surface of chalcopyrite during dissolution in sulfuric acid solution

The dissolution of a massive chalcopyrite electrode (98.1% chalcopyrite, 1.9% siderite) was studied in 0.5 M sulfuric acid solution. Different anodic potentials were applied and the behavior of the electrode was observed by means of EIS, potentiodynamic, and Mott-Schottky techniques. Electrochemical impedance spectroscopy studies at open circuit potential (around −235 mV vs. MSE) proved the existence of a thin surface layer on the electrode. This layer was stable up to 100 mV vs. MSE and was assumed to be Cu_1−xFe_1−yS₂ (y?x) based on reports from previous studies. By increasing the potential to the range of 100-300 mV vs. MSE, the previously formed layer partially dissolved and a second layer (Cu_1−x−zS₂) formed on the surface. Both of the layers showed the characteristics of passive layers at low potentiodynamic scan rate (0.05 mV s⁻¹) while at high scan rates they acted like pseudo-passive layers. However, in the potential range of 300-420 mV vs. MSE, both of these surface layers dissolved and active dissolution of the electrode started. Further increase in potential caused the formation of a CuS layer which hindered the dissolution rate of the electrode. The formation of CuS is concomitant with Fe₂(SO₄)₃ formation and the latter may act as a nucleation precursor for jarosite at higher potentials (around 750 mV vs. MSE). Jarosite precipitation on the electrode surface hindered the dissolution of chalcopyrite at higher potentials. Different equivalent electrochemical circuits were modeled for each potential range and the model regression results compared with the experimental results of EIS to determine the proposed sequence of chalcopyrite dissolution.