Ambipolar leakage suppression in electron–hole bilayer TFET: investigation and analysis

In this paper, we propose and simulate two new structures of electron–hole bilayer tunnel field-effect transistors (EHBTFET). The proposed devices are n-heterogate with \(\hbox {M}_{1}\) as overlap gate, \(\hbox {M}_{2}\) as underlap gate and employs a high-k dielectric pocket in the drain underlap. Proposed structure 1 employs symmetric underlaps (Lgs = Lgd = Lu). The leakage analysis of this structure shows that the lateral ambipolar leakage between channel and drain is reduced by approximately three orders, the OFF-state leakage is reduced by one order, and the \(I_{\mathrm{ON}}/I_{\mathrm{OFF}}\) ratio is increased by more than one order at \(V_\mathrm{{GS}}=V_{\mathrm{DS}} =1.0\) V as compared to the conventional Si EHBTFET. The performance is improved further by employing asymmetric underlaps (\(\hbox {Lgs}\ne \hbox {Lgd}\)) with double dielectric pockets at source and drain, called as proposed structure 2. The pocket dimensions have been optimized, and an average subthreshold swing of 17.7 mV/dec (25.5% improved) over five decades of current is achieved with an ON current of \(0.23~\upmu \hbox {A}/\upmu \hbox {m}\) (11% improved) in proposed structure 2 in comparison with the conventional EHBTFET. Further, the parasitic leakage paths between overlap/underlap interfaces are blocked and the OFF-state leakage is reduced by more than two orders. A high \(I_{\mathrm{ON}}/I_{\mathrm{OFF}}\,\hbox {ratio}~>10^{9}\) (two orders higher) is achieved at \(V_{\mathrm{DS}} =V_{\mathrm{GS}} =1.0~\hbox {V}\) in the proposed structure 2 in comparison with the conventional one.     

Analog and RF performance of doping-less tunnel FETs with $$\hbox {Si}_{0.55} \hbox {Ge}_{0.45}$$ source

This paper reports studies of a doping-less tunnel field-effect transistor (TFET) with a \(\hbox {Si}_{0.55} \hbox {Ge}_{0.45}\) source structure aimed at improving the performance of charge-plasma-based doping-less TFETs. The proposed device achieves an improved ON-state current (\(I_{{\mathrm{ON}}} \sim {4.88} \times {10}^{-5}\,{\mathrm{A}}/\upmu {\mathrm{m}}\)), an \(I_\mathrm{ON}/I_\mathrm{OFF}\) ratio of \({6.91} \times {10}^{12}\), an average subthreshold slope (\(\hbox {AV-SS}\)) of \(\sim \) \({64.79}\,{\mathrm{mV/dec}}\), and a point subthreshold slope (SS) of 14.95 mV/dec. This paper compares the analog and radio of frequency (RF) parameters of this device with those of a conventional doping-less TFET (DLTFET), including the transconductance (\(g_{{\mathrm{m}}}\)), transconductance-to-drain-current ratio \((g_\mathrm{m}/I_\mathrm{D})\), output conductance \((g_\mathrm{d})\), intrinsic gain (\(A_{{\mathrm{V}}}\)), early voltage (\(V_{{\mathrm{EA}}}\)), total gate capacitance (\( C_{{\mathrm{gg}}}\)), and unity-gain frequency (\(f_{{\mathrm{T}}}\)). Based on the simulated results, the \(\hbox {Si}_{0.55}\hbox {Ge}_{0.45}\)-source DLTFET is found to offer superior analog as well as RF performance.     

Delta-doped tunnel FET (D-TFET) to improve current ratio ($$I_\mathrm{ON}/I_\mathrm{OFF}$$) and ON-current performance

A two dimensional (2D) analytical drain current model has been developed for a delta-doped tunnel field-effect transistor (D-TFET) that can address the ON-current issues of the conventional TFET. Insertion of a highly doped delta layer in the source region paves the way for improved tunneling volume and thus provides high drain current as compared with TFETs. The present model takes into account the effects of the distance between the delta-doping region and the source–channel interface on the subthreshold swing (SS), current ratio, and ON-current performance. The D-TFET is predicted to have a higher current ratio \(\left( {\frac{I_\mathrm{ON} }{I_\mathrm{OFF} }\cong 10^{11}} \right) \) compared with TFETs \(\left( {\frac{I_\mathrm{ON} }{I_\mathrm{OFF} }\cong 10^{10}} \right) \) with a reasonable SS \(\left( {{\sim }52\,\mathrm{mV/dec}} \right) \) and \(V_\mathrm{th}\) performance at an optimal position of 2 nm from the channel. The surface potential, electric field, and minimum tunneling distance have been derived using the solution of the 2D Poisson equation. The accuracy of the D-TFET model is validated using the technology computer aided design (TCAD) device simulator from Synopsys.     

Investigation of trigate JLT with dual-<Emphasis Type="Italic">k</Emphasis> sidewall spacers for enhanced analog/RF FOMs

This paper shows the potential benefits of using the trigate junctionless transistor (JLT) with dual-k sidewall spacers to enhance analog/radio-frequency (RF) performance at 20-nm gate length. Simulation study shows that the source-side-only dual-k spacer (dual-kS) JLT can improve all analog/RF figures of merit (FOMs) compared with the conventional JLT structure. The dual-kS JLT shows improvement in intrinsic voltage gain (\(A_{V0}\)) by \(\sim \)44.58 %, unity-gain cutoff frequency (\(f_\mathrm{T}\)) by \(\sim \)7.67 %, and maximum oscillation frequency (\(f_\mathrm{MAX}\)) by \(\sim \)6.4 % at drain current \((I_\mathrm{ds}) = 10\,\upmu \hbox {A}/\upmu \hbox {m}\) compared with the conventional JLT structure. To justify the improvement in all analog/RF FOMs, it is also found that the dual-kS structure shows high electron velocity near the source region because of the presence of an additional electric field peak near the source region, resulting in increased electron transport efficiency and hence improved transconductance (\(g_\mathrm{m}\)). Furthermore, the dual-kS JLT shows a reduction in the electric field value near the drain end, thereby improving short-channel effects.     

Analytical evaluation of the charge carrier density of organic materials with a Gaussian density of states revisited

An analytical solution for the calculation of the charge carrier density of organic materials with a Gaussian distribution for the density of states is presented and builds upon the ideas presented by Mehmeto?lu (J Comput Electron 13:960–964, 2014) and Paasch et al. (J Appl Phys 107:104501-1–104501-4, 2010). The integral of interest is called the Gauss–Fermi integral and can be viewed as a particular type of integral in a family of the more general Fermi–Dirac-type integrals. The form of the Gauss–Fermi integral will be defined as

$$\begin{aligned} G\left( \alpha ,\beta ,\xi \right) =\mathop {\displaystyle \int }\limits _{-\infty }^{\infty }\frac{ e^{-\alpha \left( x-\beta \right) ^{2}}}{1+e^{x-\xi }}\hbox {d}x\text {,} \end{aligned}$$

where \(G\left( \alpha ,\beta ,\xi \right) \) is a dimensionless function. This article illustrates a technique developed by Selvaggi et al. [3] to derive a mathematical formula for a complete range of parameters \(\alpha \), \(\beta \), and \(\xi \) valid \(\forall \) \(\alpha \) \( \varepsilon \) \( {\mathbb {R}} \ge 0\), \(\forall \) \(\beta \) \(\varepsilon \) \( {\mathbb {R}} \), and \(\forall \) \(\xi \) \(\varepsilon \) \( {\mathbb {R}} \).

     

Evaluation of material constants in NdCa4O(BO3)3 piezoelectric single crystal

A neodymium calcium oxoborate NdCa₄O(BO₃)₃ piezoelectric single crystal that belongs to the monoclinic system with point group m was grown by the Czochralski technique. A practical evaluation method was developed to determine the 27 independent material constants for acoustic wave device applications. A longitudinal effect face–shear vibration was analyzed and used in the resonance–antiresonance measurement. This method avoided measuring d ₁₁ and d ₃₃ directly by use of X-bar and Z-bar, in which leak of electric field would cause large errors because of the very small dielectric constants. At room temperature, dielectric constants were ${{\varepsilon _{11}^{\text{T}} } \mathord{\left/{\vphantom {{\varepsilon _{11}^{\text{T}} } {\varepsilon _0 }}} \right.\kern-0em} {\varepsilon _0 }} = 9.9$ , ${{\varepsilon _{22}^{\text{T}} } \mathord{\left/{\vphantom {{\varepsilon _{22}^{\text{T}} } {\varepsilon _0 }}} \right.\kern-0em} {\varepsilon _0 }} = 15$ , ${{\varepsilon _{33}^{\text{T}} } \mathord{\left/{\vphantom {{\varepsilon _{33}^{\text{T}} } {\varepsilon _0 }}} \right.\kern-0em} {\varepsilon _0 }} = 10$ and ${{\varepsilon _{13}^{\text{T}} } \mathord{\left/{\vphantom {{\varepsilon _{13}^{\text{T}} } {\varepsilon _0 }}} \right.\kern-0em} {\varepsilon _0 }} = - 0.8$ , respectively. All the independent dielectric and elastic constants were determined in this work. The simulation of surface acoustic wave velocity showed a good agreement with the measured value.     

20-nm T-gate composite channel enhancement-mode metamorphic HEMT on GaAs substrates for future THz applications

In this paper, the RF and DC behaviours of a SiN-passivated 20-nm gate length metamorphic high electron mobility transistor (MHEMT) on GaAs substrate with \({\updelta }\)-doped sheets on either side of the composite channel are studied using the Synopsys TCAD tool. The 20-nm enhancement-mode MHEMT with \({\updelta }\)-doped sheets on either side of the \(\hbox {In}_{0.75}\hbox {Ga}_{0.25}\hbox {As}\)/InAs/ \(\hbox {In}_{0.75}\hbox {Ga}_{0.25}\hbox {As}\) multilayer channel shows a transconductance of 3000 mS/mm, cut-off frequency (\({f}_{\mathrm{T}}\)) of 760 GHz and a maximum-oscillation frequency (\({f}_{\mathrm{max}}\)) of 1270 GHz. The threshold voltage of the device is found to be 0.07 V. The room-temperature Hall mobilities of the two-dimensional sheet charge density (2DEG) are measured to be over \(12800\,\hbox {cm}^{2}\)/Vs with a sheet charge density larger than 4 \(\times \) \(10^{12}\,\hbox {cm}^{-2}\). These high-performance enhancement-mode MHEMTs are attractive candidates for future terahertz applications such as high-resolution radars for space research and also for low-noise wide-bandwidth amplifier for future communication systems.     

First-principle calculations of electronic and ferromagnetic properties of $$\hbox {Al}_{1-x}\hbox {V}_{x}\hbox {Sb}$$

We have used the first-principle calculations of density functional theory within full-potential linearized augmented plane-wave method to investigate the electronic and ferromagnetic properties of \(\hbox {Al}_{1-x}\hbox {V}_{x}\hbox {Sb}\) alloys. The electronic structures of \(\hbox {Al}_{0.25}\hbox {V}_{0.75}\hbox {Sb}, \hbox {Al}_{0.5}\hbox {V}_{0.5}\hbox {Sb}\) and \(\hbox {Al}_{0.75}\hbox {V}_{0.25}\hbox {Sb}\) exhibit a half-metallic ferromagnetic character with spin polarization of 100 %. The total magnetic moment per V atom for each compound is integral Bohr magneton of 2 \(\mu _{\mathrm{B}}\), confirming the half-metallic feature of \(\hbox {Al}_{1-x}\hbox {V}_{x}\hbox {Sb}\). Therefore, these materials are half-metallic ferromagnets useful for possible spintronics applications.     

Structural,electrical and optical properties of $$\hbox {InGaZnO}_{4}$$ and $$\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}$$In29Sn3O48: a first-principles study

First-principles calculations were performed to investigate the electrical and optical properties of \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) with Sn-doped \(\hbox {In}_{2}\hbox {O}_{3}\) and \(\hbox {InGaZnO}_{4}\) (IGZO). The band structure, density of states, optical properties including dielectric function, loss function, reflectivity and absorption coefficient are calculated. The calculated total energy shows that the most stable crystal structures are type III for \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) and type II for \(\hbox {InGaZnO}_{4}\). The band structure indicates the both \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) and \(\hbox {InGaZnO}_{4}\) are direct gap semiconductors. The intrinsic band gap of \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) is much narrower than that of \(\hbox {InGaZnO}_{4}\), and results in a better electrical conductivity for \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\). The density of states shows the main hybridization occurring between In-4d and O-2p states for \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) while between In-4d In-5p, Zn-4s and O-2p states for \(\hbox {InGaZnO}_{4}\) near the valence band maximum. The reflectivity index \(R({\omega })\) shows that the peak value of \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) and \(\hbox {InGaZnO}_{4}\) appears only in the ultraviolet range, indicating that these two materials have all excellent transparency. In addition, the absorption coefficient \({\alpha }({\omega })\) of both \(\hbox {In}_{29}\hbox {Sn}_{3}\hbox {O}_{48}\) and \(\hbox {InGaZnO}_{4}\) is high in the ultraviolet frequency range, and therefore they show, a high UV absorption rate.     

Atomistic tight-binding simulations of quaternary-alloyed $$\hbox {Zn}_{x}\hbox {Cd}_{1-x}\hbox {S}_{y}\hbox {Se}_{1-y}$$ nanocrystals

Advancement of alloyed nanocrystals with attractive structural and optical properties for use in a wide range of physical, chemical, and biological applications represents a growing research field. Employing atomistic tight-binding theory combined with the virtual crystal approximation, the electronic structure and optical properties of quaternary-alloyed \(\hbox {Zn}_{{x}}\hbox {Cd}_{1-{x}} \hbox {S}_{{y}}\hbox {Se}_{1-{y}}\) nanocrystals with experimentally synthesized compositions (x and y) and sizes were investigated. Analysis of the results shows that the physical properties are mainly sensitive to the concentrations (x and y) and the diameter. With decreasing x and y contents, the optical bandgap is reduced because the contributions of the materials with narrower bulk bandgap (ZnSe and CdSe) is mostly promoted. The optical bandgap is reduced with increasing diameter due to the quantum confinement effect. The optical bandgap calculated based on tight-binding calculations shows discrepancy of less than 0.4 eV from experiment. Most importantly, the optical emission is continuously tunable across the entire visible spectrum. The conduction and valence bands are predominantly contributed by cation and anion atoms, respectively. The optical properties are obviously improved in Cd- and Se-rich quaternary \(\hbox {Zn}_{{x}}\hbox {Cd}_{1-{x}} \hbox {S}_{{y}}\hbox {Se}_{1-{y}}\) nanocrystals with large diameter. The atomistic electron–hole interactions can be hybrid-engineered by tuning either the contents (x and y) or diameter. The Stokes shift becomes more pronounced with decreasing alloy concentrations (x and y) and diameter, as described by the trend of the atomistic electron–hole exchange interaction. The present systematic study provides a new avenue to understand the unique size- and composition-dependent structural and optical properties of quaternary-alloyed \(\hbox {Zn}_{{x}}\hbox {Cd}_{1-{x}} \hbox {S}_{{y}}\hbox {Se}_{1-{y}}\) nanocrystals for broad use in multicolor bioimaging, biosensing, light-emitting diodes, solar cells, and other nanodevice applications.     

Systematic study of elastic,electronic, and magnetic properties of lanthanum cobaltite oxide

The electronic structure, elastic constants, and magnetic properties of lanthanum cobaltite oxide \(\hbox {La}_{4}\hbox {Co}_{3}\hbox {O}_{9}\) compound, which crystallizes in orthorhombic space group Pnma, are investigated theoretically for the first time using the full potential linearized augmented plane wave (FP-LAPW) method based on the density functional theory plus Hubbard correction term (DFT \(+\) U). The calculated equilibrium lattice constants and fractional atomic coordinates are in a good agreement with available experimental data. Our result for the formation energy and elastic constants confirms that the predicted \(\hbox {La}_{4}\hbox {Co}_{3}\hbox {O}_{9}\) is mechanically stable. This compound is found to be ductile in nature in accordance with Pugh’s criteria. The anisotropy factors (\({A}_{1})\), (\({A}_{2})\), and (\({A}_{3})\) of \(\hbox {La}_{4}\hbox {Co}_{3}\hbox {O}_{9}\) material are also predicted through the elastic constants. The electronic band structures show metallic behavior; the conductivity is mostly governed by Co-3d and O-2p states. The total magnetic moments of the tetrahedral (\(\hbox {CoO}_{4})\) and octahedral (\(\hbox {CoO}_{6})\) environments are, respectively, 2.502 \(\mu _{B}\) and 2.874 \(\mu _{B}\), which are consistent with the experimental measurements.     

Heterogate junctionless tunnel field-effect transistor: future of low-power devices

Gate dielectric materials play a key role in device development and study for various applications. We illustrate herein the impact of hetero (high-k/low-k) gate dielectric materials on the ON-current (\(I_{\mathrm{ON}}\)) and OFF-current (\(I_{\mathrm{OFF}}\)) of the heterogate junctionless tunnel field-effect transistor (FET). The heterogate concept enables a wide range of gate materials for device study. This concept is derived from the well-known continuity of the displacement vector at the interface between low- and high-k gate dielectric materials. Application of high-k gate dielectric material improves the internal electric field in the device, resulting in lower tunneling width with high \(I_{\mathrm{ON}}\) and low \(I_{\mathrm{OFF}}\) current. The impact of work function variations and doping on device performance is also comprehensively investigated.     

A simulation study of voltage-assisted low-energy switching of a perpendicular anisotropy ferromagnet on a topological insulator

We present a novel memory device that consists of a thin ferromagnetic layer of Fe deposited on topological insulator thin film, \(\hbox {Bi}_{2}\hbox {Se}_{3}\). The ferromagnetic layer has perpendicular anisotropy, due to MgO deposited on its top surface. When current is passed on the surface of \(\hbox {Bi}_{2}\hbox {Se}_{3}\), the surface of the \(\hbox {Bi}_{2} \hbox {Se}_{3}\) becomes spin polarized and strong exchange interaction occurs between the d electrons in the ferromagnet and the electrons conducting the current on the surface of the \(\hbox {Bi}_{2}\hbox {Se}_{3}\). Part of the current is also shunted through the ferromagnet, which generates spin transfer torque in the ferromagnet. The exchange interaction torque along with voltage-controlled magnetic anisotropy allows ultralow-energy switching of the ferromagnet. We perform micromagnetic simulations and predict switching time of the order of 2.5 ns and switching energy of the order of 0.88fJ for a ferromagnetic bit with thermal stability of \(43\,k_\mathrm{{B}}T\). Such ultralow-energy and high-speed switching of a perpendicular anisotropy ferromagnet on a topological insulator could be utilized for energy-efficient memory design.     

Oxygen permeability, stability and electrochemical behavior of \Pr _{2} {\text{NiO}}_{{4 + \delta }} -based materials

The high-temperature electronic and ionic transport properties, thermal expansion and stability of dense $ \Pr _{2} {\text{NiO}}_{{4 + \delta }} ,\Pr _{2} {\text{Ni}}_{{0.9}} {\text{Fe}}_{{0.1}} {\text{O}}_{{4 + \delta }} $ and $ \Pr _{2} {\text{Ni}}_{{0.8}} {\text{Cu}}_{{0.2}} {\text{O}}_{{4 + \delta }} $ ceramics have been appraised in comparison with K₂NiF₄-type lanthanum nickelate. Under oxidizing conditions, the extensive oxygen uptake at temperatures below 1073–1223 K leads to reversible decomposition of Pr₂NiO₄-based solid solutions into Ruddlesden–Popper type Pr₄Ni₃O₁₀ and praseodymium oxide phases. The substitution of nickel with copper decreases the oxygen content and phase transition temperature, whilst the incorporation of iron cations has opposite effects. Both types of doping tend to decrease stability in reducing atmospheres as estimated from the oxygen partial pressure dependencies of total conductivity and Seebeck coefficient. The steady-state oxygen permeability of $ \Pr _{2} {\text{NiO}}_{{4 + \delta }} $ ceramics at 1173–1223 K, limited by both surface-exchange kinetics and bulk ionic conduction, is similar to that of $ {\text{La}}_{2} {\text{NiO}}_{{4 + \delta }} $ . The phase transformation on cooling results in considerably higher electronic conductivity and oxygen permeation, but is associated also with significant volume changes revealed by dilatometry. At 973–1073 K, porous $ \Pr _{2} {\text{Ni}}_{{0.8}} {\text{Cu}}_{{0.2}} {\text{O}}_{{4 + \delta }} $ electrodes deposited onto lanthanum gallate-based solid electrolyte exhibit lower anodic overpotentials compared to $ {\text{La}}_{2} {\text{Ni}}_{{0.8}} {\text{Cu}}_{{0.2}} {\text{O}}_{{4 + \delta }} $ , whilst cathodic reduction decreases their performance.     

Numerical analysis of transmission coefficient,LDOS, and DOS in superlattice nanostructures of cubic $$\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}$$ resonant tunneling MODFETs

Numerical analysis of the transmission coefficient, local density of states, and density of states in superlattice nanostructures of cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) resonant tunneling modulation-doped field-effect transistors (MODFETs) using \(\hbox {next}{} \mathbf{nano}^{3}\) software and the contact block reduction method is presented. This method is a variant of non-equilibrium Green’s function formalism, which has been integrated into the \(\hbox {next}\mathbf{nano}^{3}\) software package. Using this formalism in order to model any quantum devices and estimate their charge profiles by computing transmission coefficient, local density of states (LDOS) and density of states (DOS). This formalism can also be used to describe the quantum transport limit in ballistic devices very efficiently. In particular, we investigated the influences of the aluminum mole fraction and the thickness and width of the cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N}\) on the transmission coefficient. The results of this work show that, for narrow width of 5 nm and low Al mole fraction of \(x = 20\,\%\) of barrier layers, cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) superlattice nanostructures with very high density of states of 407 \(\hbox {eV}^{-1}\) at the resonance energy are preferred to achieve the maximum transmission coefficient. We also calculated the local density of states of superlattice nanostructures of cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) to resolve the apparent contradiction between the structure and manufacturability of new-generation resonant tunneling MODFET devices for terahertz and high-power applications.     

Analog performance investigation of dual electrode based doping-less tunnel FET

In this paper, we have proposed a device and named it dual electrode doping-less TFET (DEDLTFET), in which electrodes on top and bottom of source and drain are considered to enhance the ON state current and Analog performances. The charge plasma technique is used to generate electron’s and hole’s clouding depending upon their respective work functions at top and bottom of source/drain electrode. Band-to-band-tunneling rate is similar on both sides of source-channel junctions, which increases ON state current. The analog performance parameters of DEDLTFET are investigated and using device simulation the demonstrated characteristics are compared with doping-less (DLTFET) and the conventional doped double gate TFET (DGTFET), such as transconductance \((\hbox {g}_\mathrm{m})\), transconductance to drain current ratio \((\hbox {g}_\mathrm{m}/\hbox {I}_\mathrm{D})\), output-conductance (g\(_{d})\), output resistance \((\hbox {r}_\mathrm{d})\), early voltage \((\hbox {V}_\mathrm{EA})\), intrinsic gain \((\hbox {A}_\mathrm{V})\), total gate capacitance \((\hbox {C}_\mathrm{gg})\) and unity gain frequency \((\hbox {f}_\mathrm{T})\). From the simulation results, it is observed that DEDLTFET has significantly improved analog performance as compared to DGTFET and DLTFET.     

Single-breath-hold abdominal $${T}_{1}$$ mapping using 3D Cartesian Look-Locker with spatiotemporal sparsity constraints

Objective

Our aim was to develop and validate a 3D Cartesian Look-Locker \({T}_{1}\) mapping technique that achieves high accuracy and whole-liver coverage within a single breath-hold.

Materials and methods

The proposed method combines sparse Cartesian sampling based on a spatiotemporally incoherent Poisson pattern and k-space segmentation, dedicated for high-temporal-resolution imaging. This combination allows capturing tissue with short relaxation times with volumetric coverage. A joint reconstruction of the 3D + inversion time (TI) data via compressed sensing exploits the spatiotemporal sparsity and ensures consistent quality for the subsequent multistep \({T}_{1}\) mapping. Data from the National Institute of Standards and Technology (NIST) phantom and 11 volunteers, along with reference 2D Look-Locker acquisitions, are used for validation. 2D and 3D methods are compared based on \({T}_{1}\) values in different abdominal tissues at 1.5 and 3 T.

Results

\({T}_{1}\) maps obtained from the proposed 3D method compare favorably with those from the 2D reference and additionally allow for reformatting or volumetric analysis. Excellent agreement is shown in phantom [bias\(_{3{\mathrm{T}}}\) < 2%, bias\(_{1.5{\mathrm{T}}}\) < 5% for (120; 2000) ms] and volunteer data (3D and 2D deviation < 4% for liver, muscle, and spleen) for clinically acceptable scan (20 s) and reconstruction times (< 4 min).

Conclusion

Whole-liver \({T}_{1}\) mapping with high accuracy and precision is feasible in one breath-hold using spatiotemporally incoherent, sparse 3D Cartesian sampling.

     

Optimal design of the multiple-apertures-GaN-based vertical HEMTs with $$\hbox {SiO}_{2}$$ current blocking layer

Gallium nitride (GaN) based vertical high electron mobility transistor (HEMT) is very crucial for high power applications. Combination of advantageous material properties of GaN for high speed applications and novel vertical structure makes this device very beneficial for high power application. To improve the device performance especially in high drain bias condition, a novel GaN based vertical HEMT with silicon dioxide \((\hbox {SiO}_{2})\) current blocking layer (CBL) was reported recently. In this paper, effects of the thickness of CBL layer and the aperture length on the electrical and breakdown characteristics of GaN vertical HEMTs with \(\hbox {SiO}_{2}\) CBL are simulated by using two-dimensional quantum-mechanically corrected device simulation. Intensive numerical study on the device enables us to optimize and conclude that devices with \(0.5\hbox {-}\upmu \hbox {m}\)-thick \(\hbox {SiO}_{2}\) layer and \(1\hbox {-}\upmu \hbox {m}\)-long aperture will be beneficial considerations to improve the device performance. Notably, using the multiple apertures can effectively reduce the on-state conducting resistance of the device. On increasing the number of apertures, the drain current is increased but the breakdown voltage is decreased. Therefore, device with four apertures is taken as an optimized result. The maximum drain current of 84 mA at \(\hbox {V}_\mathrm{G}= 1\,\hbox {V}\) and \(\hbox {V}_\mathrm{D}= 30\,\hbox {V}\), and the breakdown voltage of 480 V have been achieved for the optimized device.     

High-blocking-voltage UMOSFETs with reformed electric field distribution

A high-performance vertical GaN metal–oxide–semiconductor field-effect transistor (MOSFET) with a U-shaped gate (UMOSFET) and high blocking voltage is proposed. The main concept behind this work is to reform the electric field distribution to achieve high blocking voltage. The proposed structure includes p-regions in the drift region, which we call reformed electric field (REF) regions. Simulations using the two-dimensional SILVACO simulator reveal the optimum doping concentration, and width and height of the REF regions to achieve the maximum depletion region at the breakdown voltage in the drift region. Also, the electric field distribution in the REF-UMOSFET is reformed by producing additional peaks, which decreases the common peaks under the gate trench. We discuss herein the impact of the height, width, and doping concentration of the REF regions on the ON-resistance (R_ON) and blocking voltage. The blocking voltage, specific ON-resistance, and figure of merit \( \left( {{\text{FOM}} = \frac{{V_{{{\text{BR}}}}^{2} }}{{R_{{{\text{ON}}}} }}} \right) \) are 1140 V, 0.587 mΩ cm² (V_GS = 15 V, V_DS = 1 V), and 2.214 GW/cm², respectively. The blocking voltage and FOM are increased by about 72 % and 171 % in comparison with a conventional UMOSFET (C-UMOSFET).     

First-principles investigation on transport properties of $$\hbox {Zn}_{2}\hbox {SnO}_{4}$$ molecular device and response toward $$\hbox {NO}_{2}$$NO2 gas molecules

The transport properties of a \(\hbox {Zn}_{2}\hbox {SnO}_{4}\) device along with adsorption properties of \(\hbox {NO}_{2}\) gas molecules on \(\hbox {Zn}_{2}\hbox {SnO}_{4}\) (ZTO) molecular devices are investigated with density functional theory using the non-equilibrium Green’s function technique. The transmission spectrum and device density of states spectrum confirm the changes in HOMO–LUMO energy level due to transfer of electrons between the ZTO-based material and the \(\hbox {NO}_{2}\) molecules. I–V characteristics demonstrate the variation in the current upon adsorption of \(\hbox {NO}_{2}\) gas molecules on the ZTO device. The findings of the present study clearly suggest that ZTO molecular devices can be used to detect \(\hbox {NO}_{2}\) gas molecules in the trace level.