石墨烯上生长GaN纳米线

采用金属Ga升华法在石墨烯/蓝宝石衬底上生长了高质量GaN纳米线,研究了不同的生长条件,如NH3流量、反应时间、催化剂和缓冲层等对GaN纳米线形貌的影响,采用扫描电子显微镜(SEM)对GaN纳米线进行表征.研究发现,在适当的NH3流量且无催化剂时,衬底上可以生长出粗细均匀的GaN纳米线.反应时间为5 min时,纳米线密集分布在衬底上,表面光滑.在石墨烯/蓝宝石上预先低温生长GaN缓冲层,然后升温至1 100℃进行GaN纳米线生长,获得了具有择优取向的GaN纳米线结构.研究表明,石墨烯和缓冲层对获得GaN纳米线结构有序阵列具有重要的作用.     

Spontaneous growth of GaN nanowire nuclei on N- and Al-polar AlN: A piezoresponse force microscopy study of crystallographic polarity

The polarity of gallium nitride (GaN) nanowire nuclei grown on AlN layers was studied by piezoresponse force microscopy (PFM). N- or Al-polar AlN layers were grown by molecular beam epitaxy (MBE) on Si (111) substrates by use of Al- or N-rich growth conditions, respectively. Short and low density GaN nanowires were then grown on each AlN polarity type. PFM measurements verified the expected AlN layer polarity and further indicated that predominantly N-polar nanowires are produced for growth on both AlN polarity types. Cross-section scanning transmission electron microscopy (STEM) images further reveal that the nanowires on Al-polar AlN films are nucleated on regions in the AlN layer that contain inversion domains, which propagate into the GaN nanowire nuclei. PFM measurements were found to be a convenient technique for mapping the polarity of a statistically significant number of individual GaN nanowires.     

钯缓冲层制备GaN纳米线及光学特性分析

利用射频磁控技术,在Si衬底上以Pd为缓冲层、Ga2O3粉末作为生长GaN的Ga源,成功制备出大量GaN纳米线。通过扫描电子显微镜、透射电子显微镜和高分辨透射电子显微镜观察分析得出GaN纳米线为单晶结构,纳米线的直径为10～60nm,长度达几十个微米。X射线衍射和X射线能量散射谱显示合成的纳米线为GaN单晶结构。傅里叶变换红外吸收光谱和光致发光光谱测试表明,制得的GaN纳米线与GaN体材料相比具有不同的光学特性。     

Modal gain in a semiconductor nanowire laser with anisotropic bandstructure

We investigate optical gain for the modes guided by semiconductor nanowires. We focus on optically anisotropic wurtzite-type semiconductors (such as GaN) and the situation when the optical axis of the crystal coincides with the geometrical axis of the nanowire. For GaN nanowire lasers, the calculation of the modal gain requires the knowledge of two confinement factors for a given mode and two gain coefficients for the bulk crystal. We show that the confinement factors for nanowire lasers are very large in comparison to those for heterostructure lasers, and can even exceed unity. To estimate the bulk gain in GaN we use the free-carrier model and emphasize the importance of accounting for anisotropy of gain. Using the calculated confinement factors and bulk gain, we predict that free-standing nanowires with small radius (R /spl lsim/ 70 nm) lase into the HE/sub 11/ mode, thicker nanowires (70 nm /spl lsim/ R /spl lsim/ 90 nm) lase into the TE/sub 01/ mode.     

Growth and Characterization of GaN Nanowires for Hydrogen Sensors

We report on the growth and characterization of high-quality GaN nanowires for hydrogen sensors. We grew the GaN nanowires by catalytic chemical vapor deposition (CVD) using gold thin films as a catalyst on a Si wafer with an insulating SiO₂ layer. Structural characterization of the as-grown nanowires by several methods shows that the nanowires are single-crystal wurtzite GaN.␣Photoluminescence measurements under 325 nm excitation show a near-band-edge emission peak around ∼3.4 eV. The hydrogen sensors are fabricated by contacting the as-grown GaN nanowires by source and drain electrodes and coating them with a thin layer of Pd. Hydrogen sensing experiments using the fabricated devices show high sensitivity response (ppm detection limit at room temperature) and excellent recovery. This work opens up the possibility of using high-quality GaN nanowire networks for hydrogen sensing applications.     

Metalorganic chemical vapor deposition of GaN nanowires: From catalyst-assisted to catalyst-free growth,and from self-assembled to selective-area growth

With the increasing attention dedicated to GaN nanowires for the realization of advanced optoelectronic devices, important efforts have been devoted to the nanowire growth optimization. This review covers the developments achieved so far in the growth of GaN nanowires by Metal Organic Chemical Vapor Deposition. Different approaches are discussed, including growth with and without catalyst, self-assembled growth as well as selective-area growth; their respective advantages and limits are detailed.     

Synthesis and Field Emission Properties of Helical GaN Nanowires

Helical gallium nitride nanowires were synthesized by chemical vapor deposition using a Pt catalyst. The prepared helical GaN nanowires with a single-crystalline hexagonal wurtzite structure have a coil diameter of 150–280 nm and lengths of up to tens of micrometers. The helical GaN nanowires have six equivalent 〈0 $ \bar{1} $ 11〉 growth directions along the [0001] axis. Field emission measurements show that helical GaN nanowire sheets possess excellent field emission properties, with a low turn-on field of ~4.5 V/μm and a high field enhancement factor of ~2,751. It is believed that this material’s excellent electron emission behavior can be attributed to its unique three-dimensional spiral structure. The growth mechanism of helical GaN nanowires has also been analyzed.     

InGaN/GaN多量子阱纳米线发光二极管制备及研究

用SiO2纳米图形层作为模板在以蓝宝石为衬底的n-GaN单晶层上制备了InGaN/GaN多量子阱纳米线,并成功实现了其发光二极管器件(LED).场发射扫描电子显微镜(FESEM)的测量结果表明,InGaN/GaN多量子阱纳米线具有光滑的表面形貌和三角形的剖面结构.室温下阴极射线荧光谱(CL)的测试发现了位于461 nm...     

Defects in GaN Nanowires

High‐resolution transmission electron microscopy (HRTEM) and cross‐sectional transmission electron microscopy (XTEM) are used to characterize common defects in wurtzite GaN nanowires grown via a vapor–liquid–solid (VLS) mechanism. HRTEM shows that these nanowires contain numerous (001) stacking defects interspersed with small cubic GaN regions. Using XTEM, bicrystalline nanowires are discovered with twofold rotational twin axes along their growth directions, and are found to grow along high‐index directions or vicinal to low‐index planes. We propose a defect‐mediated VLS growth model to qualitatively account for the prevalence of these extended defects, and discuss the implications of these defects for nanowire growth kinetics and device behavior.     

Formation of GaN Nanowires by Ammoniating Ga2O3 Films Deposited on Oxidized Al Layers on Si Substrate

Large quantities of gallium nitride（GaN） nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950℃ in a quartz tube. The nanowires have been confirmed as crystalline wurtzite GaN by X-ray diffraction, X-ray photoelectron spectrometry scanning electron microscope and selected-area electron diffraction. Transmission electron microscope （TEM） and scanning electron microscopy（SEM） reveal that the nanowires are amorphous and irregular, with diameters ranging from 30 nm to 80 nm and lengths up to tens of microns. Selected-area electron diffraction indicates that the nanowire with the hexagonal wurtzite structure is the single crystalline. The growth mechanism is discussed briefly.     

GaN nanowires on diamond

The current research of GaN nanowires on diamond substrates is reviewed and extended by recent results. Both the self-assembled and the selective area growth mechanisms using plasma-assisted molecular beam epitaxy are summarized. Structural and optical properties of as-grown nanowires as well as doping-related issues are discussed and compared to nanowires on silicon substrate. The electronic characteristics of p-diamond/n-GaN nanowire heterojunctions are addressed theoretically by band structure simulations and experimentally by transport measurements. Finally, electroluminescence of a fabricated prototype nanoLED device is demonstrated.     

Electrical transport properties of single GaN and InN nanowires

The transport properties of single GaN and InN nanowires grown by thermal catalytic chemical vapor deposition were measured as a function of temperature, annealing condition (for GaN) and length/square of radius ratio (for InN). The as-grown GaN nanowires were insulating and exhibited n-type conductivity (n ≈ 2×10¹⁷ cm⁻³, mobility of 30 cm²/V s) after annealing at 700°C. A simple fabrication process for GaN nanowire field-effect transistors on Si substrates was employed to measure the temperature dependence of resistance. The transport was dominated by tunneling in these annealed nanowires. InN nanowires showed resistivity on the order of 4×10⁻⁴ Ω cm and the specific contact resistivity for unalloyed Pd/Ti/Pt/Au ohmic contacts was near 1.09×10⁻⁷ Ω cm². For In N nanowires with diameters <100 nm, the total resistance did not increase linearly with length/square of radius ratio but decreased exponentially, presumably due to more pronounced surface effect. The temperature dependence of resistance showed a positive temperature coefficient and a functional form characteristic of metallic conduction in the InN nanowires.     

Reprint of: GaN nanowires on diamond

The current research of GaN nanowires on diamond substrates is reviewed and extended by recent results. Both the self-assembled and the selective area growth mechanisms using plasma-assisted molecular beam epitaxy are summarized. Structural and optical properties of as-grown nanowires as well as doping-related issues are discussed and compared to nanowires on silicon substrate. The electronic characteristics of p-diamond/n-GaN nanowire heterojunctions are addressed theoretically by band structure simulations and experimentally by transport measurements. Finally, electroluminescence of a fabricated prototype nanoLED device is demonstrated.     

Title: Using Alignment and 2D Network Simulations to Study Charge Transport Through Doped ZnO Nanowire Thin Film Electrodes

Factors affecting charge transport through ZnO nanowire mat films were studied by aligning ZnO nanowires on substrates and coupling experimental measurements with 2D nanowire network simulations. Gallium doped ZnO nanowires were aligned on thermally oxidized silicon wafer by shearing a nanowire dispersion in ethanol. Sheet resistances of nanowire thin films that had current flowing parallel to nanowire alignment direction were compared to thin films that had current flowing perpendicular to nanowire alignment direction. Perpendicular devices showed ～5 fold greater sheet resistance than parallel devices supporting the hypothesis that aligning nanowires would increase conductivity of ZnO nanowire electrodes. 2‐D nanowire network simulations of thin films showed that the device sheet resistance was dominated by inter‐wire contact resistance. For a given resistivity of ZnO nanowires, the thin film electrodes would have the lowest possible sheet resistance if the inter‐wire contact resistance was one order of magnitude lower than the single nanowire resistance. Simulations suggest that the conductivity of such thin film devices could be further enhanced by using longer nanowires.     

"自上而下"法制备高性能GaN纳米线阵列

针对自下而上生长GaN纳米线的尺寸、形态、取向不易控制的问题,文中采用自上而下刻蚀的方法来制备GaN纳米线材料。以图形化的金属Ni作为掩膜对GaN进行ICP刻蚀,系统研究了刻蚀参数,主要是ICP功率以及RF功率对GaN纳米线形貌以及拉曼、PL光谱的影响,同时也对比了干法刻蚀后,有无湿法处理的影响。研究发现,当ICP功率为1 000 W,RF功率为100 W时,GaN纳米线的拉曼和PL光谱强度较大,表明此功率下刻蚀的纳米线损伤较小。经过KOH浸泡30 min后,GaN纳米线的形貌得到了改善,拉曼和PL光谱强度均优于单纯的干法刻蚀,为下一步器件的制备提供了良好的材料基础。     

Growth and characterization of ZnO nanowires on p-type GaN

ZnO nanowires were grown by catalyst-free metal-organic vapour-phase epitaxy on top of a p-type GaN buffer. The optical properties of the ZnO nanowires were investigated by temperature-dependent and time-resolved photoluminescence and compared to those of ZnO nanowires directly grown on sapphire. The luminescence intensity decrease with temperature of the nanowires grown on GaN reveals an original behavior since it is constant over 120 K, showing the existence of strong localization centers. In addition, the temperature-dependent decay time measurements indicate a lower density of non-radiative channels for the nanowires grown on GaN.     

石墨烯上生长GaN纳米线的研究

在常压条件下采用化学气相淀积(CVD)技术在有石墨烯插入层的衬底上生长GaN纳米线,研究了生长温度、石墨烯插入层、催化剂等因素对GaN纳米线的形貌、光学特性以及结构的影响.通过扫描电子显微镜(SEM)、光致发光(PL)谱、拉曼(Raman)谱和透射电子显微镜(TEM)等表征手段对GaN纳米线的形貌、光学特性以及结构进行表征.结果表明,在1 100℃条件下,同时有石墨烯插层和催化剂的衬底表面能够获得低应力单晶GaN纳米线.石墨烯、催化剂对于获得低应力单晶GaN纳米线有重要的作用.     

Shape Evolution of Highly Lattice-Mismatched InN/InGaN Nanowire Heterostructures

We have investigated the structure and shape of GaN-based nanowires grown on (001) Si substrates for optoelectronic device applications. The nanowire heterostructures contained InN disks and In_0.4Ga_0.6N barrier layers in the active region. The resulting nanowire array comprised two differently shaped nanowires: shorter pencil-like nanowires and longer bead-like nanowires. The two different nanowire shapes evolve due to a variation in the In incorporation rate, which was faster for the bead-like nanowires. Both types of nanowires exhibited evidence of significant migration of both Ga and In during growth. Ga tended to diffuse away and down along the sidewalls, resulting in a Ga-rich shell for all nanowires. Despite the complex structure and great variability in the In composition, the optical properties of the nanowire arrays were very good, with strong luminescence peaking at ～ 1.63 μm.     

氨化Ga2O3/Mg薄膜制备簇状GaN纳米线

通过在1050°C时氨化Ga2O3/Mg薄膜制备出簇状GaN纳米线。用X射线衍射(XRD),傅里叶红外吸收光谱(FTIR)扫描电子显微镜(SEM)和高分辨电子显微镜(HRTEM)对样品进行测试分析。结果表明,GaN纳米线为六万纤锌矿结构单晶相并且成族生长,直径在200～500nm米左右,其长度可达5～10μm。几乎所有纳米线的直径均有逐渐缩小的趋势。对Mg膜的作用进行了初步的分析。     

Synthesis of GaN nanowires and nanorods via self-growth mode control

The synthesis of hexagonal wurzite one-dimensional (1D) GaN nanostructures on c-Al₂O₃ substrates was investigated using a thermal chemical vapor deposition (CVD) process. The diameter of the GaN nanostructures was controlled by varying the growth time using a mixture of GaN powder and Ga metal with the ammonia gas reaction. The morphologies of the GaN nanowires and nanorods were confirmed by field emission scanning electron microscopy. The micro-Raman spectroscopy and X-ray scattering measurements indicated that the GaN nanostructures had a hexagonal wurzite structure without any oxide phases. We investigated the difference in the structural properties between the GaN nanowires and nanorods. Deep-level emission bands were not observed in cathodoluminescence measurements from either the GaN nanowires or nanorods, indicating the incorporation of low-level impurities into our 1D GaN nanostructures.