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1.
基于0.35μm CMOS工艺设计了一款无片外电容低压差线性稳压器(cap-free LDO),通过误差放大器组成的环路控制稳态误差,通过摆率增强电路构成的环路改善瞬态响应。该LDO输出电压为1.72V,压差80mV,最大输出电流50mA。测试结果显示:负载电流(IL)在0.5μs内瞬变50mA时,俯冲电压和过冲电压均为80mV左右,重回稳态的时间均小于1.5μs。  相似文献   

2.
设计了一种高性能无片外电容型LDO线性稳压器.其中,EA采用推挽输出放大器设计,在静态时保持低功耗,瞬态响应时提供大的输出电流,提高LDO的响应速率.高环路增益使LDO电路具有很高的稳压精度;采用零点补偿技术,保证了LDO环路稳定性.LDO采用0.13μm CMOS工艺设计,仿真结果表明,在1.2V^2.0V输入电压下,LDO输出稳定的1.0V电压,输出负载电流为50μA^100mA,最大负载电容可达到100pF,低频PSR为-67.5dB@100mA^-85.5dB@50μA,负载调整率0.8μV/mA,LDO的静态电流为50μA,整体版图面积为0.016 3mm2.  相似文献   

3.
通过对LDO瞬态响应的分析,基于负载电流动态泄放技术,提出一种新型LDO线性稳压电路,减小了负载电流阶跃变化对输出电压的影响,从而改善了系统的瞬态响应特性.采用0.18μm CMOS工艺模型进行仿真.结果表明,负载电流从1mA到120mA阶跃变化时,输出电压负向过冲减小60.1mV,恢复时间缩短33.4μs;从120mA到1mA阶跃变化时,输出电压正向过冲减小47mV,恢复时间缩短214.3μs.  相似文献   

4.
针对传统车载芯片中高压型低压差线性稳压器(LDO)的负载电流小、电源抑制比低、瞬态响应差等问题,提出了一种增强型高压LDO,通过一种新型高压预调制电路,提高了高压LDO的电源抑制比;通过一种新型摆率增强电路,改善了高压LDO的瞬态响应。电路基于BCD-120 V CMOS工艺完成建模,仿真结果显示,电压可调范围为5.5~55 V,输出5 V;负载电流为800 mA;低频电源抑制比为96 dB;1μs内负载电流从1 mA跳变到800 mA时,输出端最大上冲电压为26.6 mV,响应时间为8μs;下冲电压为45.4 mV,响应时间为7μs,满足车规级局域互联网(LIN)总线中高压LDO的性能要求。  相似文献   

5.
介绍了一款具有两种频率补偿技术的低压差(LDO)线性稳压器。在LDO误差放大器的设计中,同时采用嵌套密勒补偿技术和具有可变负载的动态密勒补偿技术,确保LDO在负载电流变化60mA范围内的稳定性。该LDO采用联华电子公司(UMC)0.11μm CMOS工艺实现,所设计的LDO输入电压1.5~3.3V,负载最大电流60mA,输出电压稳定在1.23V。芯片测试结果表明,当负载电流从1mA突变为60mA或者从60mA突变为1mA时,LDO的输出稳定时间小于30μs,且输出电压变化小于12mV。在3.3V的输入电压下,LDO的静态电流为50μA,且在满负载变化时输出电压的变化仅有18mV。  相似文献   

6.
设计了一种快速瞬态响应的无片外电容型LDO。采用高增益高带宽的超级跨导结构(STC)的误差放大器,利用动态偏置技术与电容耦合技术,极大地增强了摆率。引入额外的快速响应环路,进一步提升了瞬态响应速度。基于0.18 μm CMOS工艺进行设计。结果表明,该LDO的最低供电电压为1 V,漏失电压仅为200 mV,可提供最大100 mA的负载电流,能在最大输出电容为100 pF、最低负载为50 μA的条件下保证电路稳定。负载电流在0.5 μs内由50 μA跳变至100 mA时,LDO输出导致的过冲电压和下冲电压分别为200 mV和306 mV。  相似文献   

7.
设计了一种基于自适应偏置放大器的具有快速瞬态响应的无输出电容LDO.自适应偏置放大器在发生负载瞬态响应时能够调节自身偏置电流以提供较大的输出电流来增加摆率;瞬态响应提升电路通过减小负载电容充放电电流而减小了输出电压的建立时间;通过并联反馈补偿来提高环路的稳定性.仿真结果表明,所设计的无输出电容LDO最大输出电流200mA,最小跌落电压200mV,静态电流仅16μA,全负载正负阶跃变化响应时间分别为2.5μs和3.5μs.  相似文献   

8.
周玉成  廖德阳  马磊  桑磊  黄文 《微电子学》2023,53(4):608-613
提出了一种稳定性高、瞬态特性良好、无片外电容的低压差线性稳压器(LDO)。采用推挽式微分器检测负载瞬态变化引起的输出电压变化,加大对功率管栅极寄生电容的充放电电流,增强系统的瞬态响应能力;在误差放大器后接入缓冲级,将功率管栅极极点推向高频,并采用密勒电容进行频率补偿,使系统在全负载范围内稳定。基于TSMC 65 nm CMOS工艺进行流片,核心电路面积为0.035 mm2。测试结果表明,最低供电电压为1.1 V时,压降仅为100 mV,负载电流1 μs内在1 mA和150 mA之间跳变时,LDO的最大输出过冲电压与下冲电压分别为200 mV和180 mV。  相似文献   

9.
设计了以增强型AB跟随器作为缓冲级的带瞬态增强电路的线性稳压器(LDO)。在保证LDO环路稳定性的同时,将增强型AB跟随器的偏置电流改为动态偏置电流,同时加入瞬态增强电路来改善系统重载到轻载来回跳变时的瞬态性能。仿真结果表明,该稳压器输入电压2.7~5 V,输出电压2.5 V,压差200 m V,电路空载时静态电流18μA,最大负载电流100 m A;在输出电容为100 pF时,负载电流以99×10~(–3)A/μs跳变,输出电压下冲和过冲分别为89 m V和110 m V,均在1.5μs内恢复稳定。  相似文献   

10.
张琪  胡佳俊  陈后鹏  李喜  王倩  范茜  金荣  宋志棠 《微电子学》2016,46(2):211-214, 223
为满足SoC系统负载快速变化的要求,提出了一种新型摆率增强型片上LDO系统。通过增加有效的内部检测电路,使LDO的功率管栅极电压可以快速地响应输出负载跳变,提高电路响应速度。采用中芯国际40 nm CMOS工艺模型,对电路进行仿真。仿真结果表明,当LDO的负载电流以100 mA/μs跳变时,电路的最大上冲电压为110 mV,下冲电压为230 mV,恢复时间分别为1.45 μs和1.6 μs。同时,在2 V电源电压下,电路的静态电流只有42 μA。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

13.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

14.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

15.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

16.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

17.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

18.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

19.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

20.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

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