Synthesis,characterization and gas sensing performance of SnO<Subscript>2</Subscript> thin films prepared by spray pyrolysis

In this work, SnO₂ thin films were deposited onto alumina substrates at 350°C by spray pyrolysis technique. The films were studied after annealing in air at temperatures 550°C, 750°C and 950°C for 30 min. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical absorption spectroscopy technique. The grain size was observed to increase with the increase in annealing temperature. Absorbance spectra were taken to examine the optical properties and bandgap energy was observed to decrease with the increase in annealing temperature. These films were tested in various gases at different operating temperatures ranging from 50–450°C. The film showed maximum sensitivity to H ₂S gas. The H₂S sensing properties of the SnO₂ films were investigated with different annealing temperatures and H ₂S gas concentrations. It was found that the annealing temperature significantly affects the sensitivity of the SnO₂ to the H ₂S. The sensitivity was found to be maximum for the film annealed at temperature 950°C at an operating temperature of 100°C. The quick response and fast recovery are the main features of this film. The effect of annealing temperature on the optical, structural, morphological and gas sensing properties of the films were studied and discussed.     

Effect of the substrate temperature on the properties of spray-deposited SnO2:F thin films

The effect of the substrate temperature on the properties of spray-deposited SnO₂:F thin films is investigated. X-ray diffraction patterns show that the crystallinity of the films is enhanced with the increasing of substrate temperature. Comparing the SEM images, both the particle size and density are increased at a higher deposition temperature. The lowest sheet resistance of 8.43 Ω/□ is obtained at the substrate temperature of 350 °C. In addition, the average optical transmittance of the three films reaches up to 85 % in the visible range. The absorption coefficient is the lowest at 350 °C. The band gap increases from 3.36 to 3.61 eV while the electrical resistivity of SnO₂:F thin films decreases from 8.51 × 10^?3 to 9.86 × 10^?4 Ω cm as elevating the substrate temperature from 250 to 350 °C.     

Thermal oxidation of amorphous GaSe thin films

In this work the results of the thermal oxidation of GaSe thin films in air at different temperatures are presented. The structural and morphological characteristics of the thermally annealed products were studied by X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM). The as-deposited GaSe films were amorphous and they transformed into polycrystalline GaSe films with a hexagonal crystal structure at a temperature around 400 °C. Thermal oxidation at 650 °C resulted in the formation of mixed Ga₂Se₃ and Ga₂O₃ compounds both in the monoclinic phase. At higher temperatures, Ga₂Se₃ disappeared and complete oxidation of the initial compound occurred. The optical energy gaps of products were determined at room temperature by transmittance measurements using UV–vis–NIR spectroscopy.     

Preparation and characterization of nanostructured ZnO thin films for photoelectrochemical splitting of water

Nanostructured zinc oxide thin films (ZnO) were prepared on conducting glass support (SnO₂: F overlayer) via sol-gel starting from colloidal solution of zinc acetate 2-hydrate in ethanol and 2-methoxy ethanol. Films were obtained by spin coating at 1500 rpm under room conditions (temperature, 28–35°C) and were subsequently sintered in air at three different temperatures (400, 500 and 600°C). The evolution of oxide coatings under thermal treatment was studied by glancing incidence X-ray diffraction and scanning electron microscopy. Average particle size, resistivity and bandgap energy were also determined. Photoelectrochemical properties of thin films and their suitability for splitting of water were investigated. Study suggests that thin films of ZnO, sintered at 600°C are better for photoconversion than the films sintered at 400 or 500°C. Plausible explanations have been provided.     

Structural,morphological, optical and gas sensing properties of pure and Ce doped SnO<Subscript>2</Subscript> thin films prepared by jet nebulizer spray pyrolysis (JNSP) technique

Pure and cerium (Ce) doped tin oxide (SnO₂) thin films are prepared on glass substrates by jet nebulizer spray pyrolysis technique at 450 °C. The synthesized films are characterized by X-ray diffraction (XRD), scanning electron microscopy, energy dispersive analysis X-ray, ultra violet visible spectrometer (UV–Vis) and stylus profilometer. Crystalline structure, crystallite size, lattice parameters, texture coefficient and stacking fault of the SnO₂ thin films have been determined using X-ray diffractometer. The XRD results indicate that the films are grown with (110) plane preferred orientation. The surface morphology, elemental analysis and film thickness of the SnO₂ films are analyzed and discussed. Optical band gap energy are calculated with transmittance data obtained from UV–Visible spectra. Optical characterization reveals that the band gap energy is found decreased from 3.49 to 2.68 eV. Pure and Ce doped SnO₂ thin film gas sensors are fabricated and their gas sensing properties are tested for various gases maintained at different temperature between 150 and 250 °C. The 10 wt% Ce doped SnO₂ sensor shows good selectivity towards ethanol (at operating temperature 250 °C). The influence of Ce concentration and operating temperature on the sensor performance is discussed. The better sensing ability for ethanol is observed compared with methanol, acetone, ammonia, and 2-methoxy ethanol gases.     

Effect of substrate temperature on properties of Cu(In,Ga, Al)Se<Subscript>2</Subscript> films grown by magnetron sputtering

Cu(In, Ga, Al)Se₂ (CIGAS) thin films were deposited by magnetron sputtering on Si(100) and soda-lime glass substrates at different substrate temperatures, followed by post-deposition annealing at 350 or 520 °C for 5 h in vacuum. Electron probe micro-analysis and secondary ion mass spectroscopy were used to determine the composition of the films and the distribution of Al across the film thickness, respectively. X-ray diffraction analysis showed that the (112) peak of CIGAS films shifts to higher 2θ values with increasing substrate temperature but remains unchanged when the films were annealed at 520 °C for 5 h. Scanning electron microscopy and atomic force microscopy images revealed dense and well-defined grains for both as-deposited and annealed films. However, notable increase in grain size and roughness was observed for films deposited at 500 °C. The bandgap of CIGAS films was determined from the optical transmittance and reflectance spectra and was found to increase as the substrate temperature was increased.     

Role of annealing temperature on microstructural and electro-optical properties of ITO films produced by sputtering

This study probes the effect of annealing temperature on electrical, optical and microstructural properties of indium tin oxide (ITO) films deposited onto soda lime glass substrates by conventional direct current (DC) magnetron reactive sputtering technique at 100 watt using an ITO ceramic target (In₂O₃:SnO₂, 90:10 wt%) in argon atmosphere at room temperature. The films obtained are exposed to the calcination process at different temperature up to 700 °C. X–ray diffractometer (XRD), ultra violet-visible spectrometer (UV–vis) and atomic force microscopy (AFM) measurements are performed to characterize the samples. Moreover, phase purity, surface morphology, optical and photocatalytic properties of the films are compared with each other. The results obtained show that all the properties depend strongly on the annealing temperature. XRD results indicate that all the samples produced contain the In₂O₃ phase only and exhibit the polycrystalline and cubic bixbite structure with more intensity of diffraction lines with increasing the annealing temperature until 400 °C; in fact the strongest intensity of (222) peak is obtained for the sample annealed at 400 °C, meaning that the sample has the greatest ratio I ₂₂₂/I ₄₀₀ and the maximum grain size (54 nm). As for the AFM results, the sample prepared at 400 °C has the best microstructure with the lower surface roughness. Additionally, the transmittance measurements illustrate that the amplitude of interference oscillation is in the range from 78 (for the film annealed at 400 °C) to 93 % (for the film annealed at 100 °C). The refractive index, packing density, porosity and optical band gap of the ITO thin films are also evaluated from the transmittance spectra. According to the results, the film annealed at 400 °C obtains the better optical properties due to the high refractive index while the film produced at 100 °C exhibits much better photoactivity than the other films as a result of the large optical energy band gap.     

Preparation of Sb:SnO2 thin films and its effect on opto-electrical properties

The present study focuses on pure and antimony (Sb)-doped tin oxide thin film and its influence on their structural, optical, and electrical properties. Both undoped and Sb-doped SnO₂ thin films have been grown by using simple, inexpensive pyrolysis spray technique. The deposition temperature was optimized to 450 °C. X-ray diffractions pattern have revealed that the films are polycrystalline and have tetragonal rutile-type crystal structure. Undoped SnO₂ films grow along (110) preferred orientation, while the Sb-doped SnO₂ films grow along (200) direction. The size of Sb-doped tin oxide crystals changes from 26.3 to 58.0 nm when dopant concentration is changed from 5 to 25 wt%. The transmission spectra revealed that all the samples are transparent in the visible region, and the optical bandgap varies between 3.92 and 3.98 eV. SEM analysis shows that the surface morphology and grain size are affected by the doping rate. All the films exhibit a high transmittance in the visible region and show a sharp fundamental absorption edge at about 0.38–0.40 nm. The maximum electrical conductivity of 362.5 S/cm was obtained for the film doped with 5 wt% Sb. However, the carrier concentration is increased from 0.708?×?10¹⁸ to 4.058?×?10²⁰ cm³. The electrical study reveals that the films have n-type electrical conductivity and depend on Sb concentration. We observed a decrease in sheet resistance and resistivity with the increase in Sb dopant concentration. For the dopant concentration of 5 wt% of Sb in SnO₂, the Rs and ρ were found minimum with the values of 88.55 (Ω cm^?2) and 2.75 (Ω cm), respectively. We observed an increase in carrier concentration and a decrease in mobility with the addition of Sb up to 25 wt%. The highest figure of merit values 2.5?×?10^–3 Ω^?1 is obtained for the 5wt% Sb, which may be considered potential materials for solar cells' transparent windows.

     

Optical properties of lead iodide between 0.4946 and 6.185 eV

The optical and dielectric constants of PbI₂ thin films have been determined from transmittance and reflectance measurements, for photon energies between 0.4946 and 6.185 eV. The absorption coefficient, bandgap energy, and dielectric constants were determined at room temperature by the normal incidence method. The first three lines of the hydrogenic exciton series associated with the absorption edge are well resolved in reflectivity measurements. The transmittance measurements enable the evaluation of the value of bandgap energy E_g. The bandgap energy of PbI₂ at room temperature was found to be 2.55 eV. A careful analysis of the absorption coefficients indicated the crystalline character of the sample studied; a similar diagnosis was obtained from X-ray evidence. SEM analysis revealed that as the thickness of the films increases the material becomes amorphous.     

Structural,optical and electrical studies on nanocrystalline tin oxide (SnO<Subscript>2</Subscript>) thin films by electron beam evaporation technique

Nanocrystalline tin oxide (SnO₂) thin films were coated using electron beam evaporation technique on glass substrates. To study the gleaming out look of the structure and surface morphological changes, the films were annealed in the temperature 350–550 °C for 1 h. The annealed films were subjected to X-ray diffraction (XRD) and atomic force microscopy (AFM) studies. The XRD patterns of SnO₂ thin films as-deposited and annealed at 350 °C illustrate that the films were amorphous, and beyond 350 °C and thereafter they became polycrystalline with tetragonal structure. The crystallite size of the annealed films, obtained through the XRD analysis, increased with the increasing annealing temperature, and it was found to be from 3.6 to 12 nm. The photoluminescence (PL) studies on these films were also carried out. The origin of luminescence was assigned to the defects of the nanocrystalline SnO₂ films. The Optical studies (UV-VIS) were performed and the optical band gab energy (Eg) calculations, the dependence of absorption coefficient on the photon energy at short wavelengths, were found to be increasing from 3.65 to 3.91 eV is also investigated.     

Physical properties of tin oxide films deposited by oxidation of SnCl2

Highly transparent and conducting SnO₂ films, as required in thin film heterojunction solar cells, were deposited onto Pyrex glass substrates by oxidation of SnCl₂ in the temperature range 350–500°C. Oxygen with a flow rate of between 1 and 3.251 min^-1 was used as both the carrier gas and the oxidizing agent. For films deposited in these conditions the resistivity varies from 10^-2 to 10^-3 Ω cm with transmission in the range 87%–71%. It was observed that both the resistivity and the transmission decrease with increasing deposition temperature. The resistivity of films deposited at a fixed deposition temperature passes through a minimum as the oxygen flow rate is increased. Hence, SnO₂ films with low resistivity and high transmission can be produced by the oxidation of SnCl₂ at relatively low temperatures using the oxygen flow rate corresponding to the minimum resistivity. For example, in the present work, low resistivity (4.4 × 10^-3 Ω cm) and high transmission (87%) were observed for films deposited at 400°C with an oxygen flow rate of 1.81 min^-1. The effects of the deposition temperature, oxygen flow rate and deposition time on the thickness, deposition rate, resistivity and absorption coefficient are discussed in detail.     

Effect of annealing on microstructural and optoelectronic properties of nanocrystalline TiO2 thin films

In this study, semi-transparent nanostructured titanium oxide (TiO₂) thin films have been prepared by sol–gel technique. The titanium isopropoxide was used as a source of TiO₂ and methanol as a solvent and heat treated at 60°C. The as prepared powder was sintered at various temperatures in the range of 400–700°C and has been deposited onto a glass substrate using spin coating technique. The effect of annealing temperature on structural, morphological, electrical and optical properties was studied by using X-ray diffraction (XRD), high resolution transmittance electron microscopy (HRTEM), atomic force microscopy (AFM), scanning electron microscopy (SEM), dc resistivity measurement and optical absorption studies. The XRD measurements confirmed that the films grown by this technique have good crystalline nature with tetragonal-mixed anatase and rutile phases and a homogeneous surface. The HRTEM image of TiO₂ thin film (annealed at 700°C) showed grains of about 50–60?nm in size with aggregation of 10–15?nm crystallites. Electron diffraction pattern shows that the TiO₂ films exhibited a tetragonal structure. SEM images showed that the nanoparticles are fine and varies with annealing temperature. The optical band gap energy decreases with increasing annealing temperature. This means that the optical quality of TiO₂ films is improved by annealing. The dc electrical conductivity lies in the range of 10^?6 to 10^?5?Ω?cm^?1 and it decreases by the order of 10 with increase in annealing temperature from 400°C to 700°C. It is observed that the sample Ti700°C has a smooth and flat texture suitable for different optoelectronic applications.     

Sensor properties of Pt doped SnO2 thin films for detecting CO

Polycristalline Pt-doped SnO₂ thin films have been integrated to silicon substrate by ultrasonic spray deposition. This deposition technique differs from the usual SnO₂ deposition methods by using a liquid source. It allows one to obtain a very fine and homogeneous dispersion of Pt aggregates which act as a catalyst for the low temperature CO detection (25–100°C) by conductance change. The influence of synthesis temperature (460–560°C), concentration of Pt additive (0.1–5 at.%) on gas sensitivity has been studied. The realisation of gas sensor includes a gas sensitive highly porous layer (SnO₂/Pt, thickness: ∼1 μm). The results of electrical measurements under 300 ppm of CO for thin films in a dynamic and quasistatic regime are discussed. The narrow peak of gas sensitivity in the range of low temperatures (25–100°C) is obtained for about 2 at.% Pt in the SnO₂ film.     

Effect of annealing temperature on optical and electrical properties of ZrO2–SnO2 nanocomposite thin films

ZrO₂–SnO₂ nanocomposite thin films were deposited onto quartz substrate by sol–gel dip-coating technique. Films were annealed at 500, 800 and 1,200 °C respectively. X-ray diffraction pattern showed a mixture of three phases: tetragonal ZrO₂ and SnO₂ and orthorhombic ZrSnO₄. ZrSnO₄ phase and grain size increased with annealing temperature. Fourier transform infra-red spectroscopy spectra indicated the reduction of –OH groups and increase in ZrO₂–SnO₂, by increasing the treatment temperature. Scanning electron microscopy observations showed nucleation and particle growth on the films. The electrical conductivity decreased with increase in annealing temperature. An average transmittance greater than 80 % (in UV–visible region) was observed for all the films. The optical constants of the films were calculated. A decrease in optical band gap from 4.79 to 4.59 eV was observed with increase in annealing temperature. Photoluminescence (PL) spectra revealed an emission peak at 424 nm which indicates the presence of oxygen vacancy in ZrSnO₄. PL spectra of the films exhibited an increase in the emission intensity with increase in temperature which substantiates enhancement of ZrSnO₄ phase and reduction in the non-radiative defects in the films. The nanocomposite modifies the structure of the individual metal oxides, accompanied by the crystallite size change and makes it ideal for gas sensor and optical applications.     

Effect of substrate temperature on structural, morphological and optical properties of crystalline titanium dioxide films prepared by DC reactive magnetron sputtering

Titanium dioxide (TiO₂) thin films have been deposited with various substrate temperatures by dc reactive magnetron sputtering method onto glass substrate. The effects of substrate temperature on the crystallization behavior and optical properties of the films have been studied. Chemical composition of the films was investigated by X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) analysis of the films revealed that they have polycrystalline tetragonal structure with strong (101) texture. The surface morphological study revealed the crystalline nature of the films at higher substrate temperatures. The TiO₂ films show the main bands in the range 400–700 cm^?1, which are attributed to Ti–O stretching and Ti–O–Ti bridging. The transmittance spectra of the TiO₂ thin film measured with various substrate temperatures ranged from 75 to 90 % in the visible light region. The optical band gap values of the films are increasing from 3.44 to 4.0 eV at growth temperature from 100 to 400 °C. The structural and optical properties of the films improved with the increase in the deposition temperature.     

Structural characterization and frequency response of sol–gel derived Bi3/2MgNb3/2O7 thin films

The Bi_3/2MgNb_3/2O₇ (BMN) thin films were prepared via a modified sol–gel process on glass substrates at various post-annealing temperatures. The crystalline structure, morphology and frequency response have been investigated systematically. The X-ray diffraction results indicated that the BMN thin films had different orientations depending on post-annealing temperature. Thin films annealed above 650 °C presented well crystallized cubic pyrochlore structure with (222) orientation, and (400) preferentially oriented were observed when they were annealed below 600 °C. The surface morphology images of the BMN thin films revealed different grain size and grain size distribution, and the average grain size increased from 28.3 to 37.0 nm as the post-annealing temperature increasing. The low frequency dielectric properties of the BMN thin films were closely correlated with the (222) orientation, which was favorable to enhanced dielectric constant and tunability. The high-frequency optical measurements revealed an average transmittance (T _av ) varying between 76.6 and 82.2 % and band gap energy (E _g ) ranging from 3.40 to 3.44 as a function of the temperature and the crystallite size. Thin film annealed at 700 °C possessed the best crystallinity and highest (222) orientation, and showed the best electrical properties, with a dielectric constant of 105 at 1 MHz, dielectric tunability of 25.8 %, and an average optical transmittance of 82.2 % in the visible range (400–800 nm), making it promising for optical/electronic tunable devices applications.     

The role of growth parameters on structural,morphology and optical properties of sprayed ZnS thin films

ZnS thin films were prepared by spray pyrolysis technique using aqueous of zinc chloride and thiourea at molar ratio of 1:1, 1:2, and 2:1. The depositions were carried out on substrates heated from 400 to 520 °C The films were then annealed under sulphur atmosphere for 90 min at 450 and 550 °C. The crystallites exhibit preferential orientation along the [002]_α or [111]_β directions. The films were characterized by XRD and SEM. The structure and morphology of sprayed films are controlled by both, the substrate temperature and the precursors molar ratio in the solution. The values of optical bandgap have been determined from the absorption spectra.     

Improvement of crystal quality and UV transparence of dielectric Ga2O3 thin films via thermal annealing in N2 atmosphere

Ga₂O₃ thin films were deposited on sapphire (0001) substrates by low-pressure metal organic chemical vapor deposition. The influence of annealing in N₂ atmosphere at the temperature in the range of 800–1,000 °C was investigated by X-ray diffraction and optical transmittance spectra. With an increase of annealing temperature from 800 to 950 °C, the transformation from the initial amorphous film to polycrystalline β-Ga₂O₃ thin film was observed, and the transmittance was also improved remarkably. The optical band gap energy of the sample annealed at 950 °C was evaluated as ~5 eV. Whereas, after an annealing at 1,000 °C, the crystal quality became worse and the transmittance degraded. The mechanism of annealing in N₂ atmosphere was discussed in view of phase transition.     

Optical, electrical properties and reproducible resistance switching of GeO2 thin films by sol-gel process

Electrical, optical properties and microstructures of GeO₂ thin films prepared by the sol-gel method on ITO substrates at different preheating and annealing temperatures have been investigated. All films exhibited GeO₂ (101) orientations perpendicular to the substrate surface and the grain size increased with increasing preheating and annealing temperature. The dependence of the microstructure, optical transmittance spectra, optical bandgap and dielectric characteristics on preheating and annealing temperatures was also investigated. Considering the primary memory switching behavior of GeO₂, ReRAM based on GeO₂ shows promise for future nonvolatile memory applications.     

Structural and optical properties of Ag2SeTe nano thin films prepared by thermal evaporation

Semiconducting Ag₂SeTe thin films were prepared with different thicknesses onto glass substrates at room temperature using thermal evaporation technique. The structural properties were determined as a function of thickness by XRD exhibiting no preferential orientation along any plane, however the films are found to have peaks corresponding to mixed phase. The XRD studies were used to calculate the crystallite size and microstrain of the Ag₂SeTe films. The calculated microstructure parameters reveal that the crystallite size increases and micro strain decreases with increasing film thickness. The refractive index, dielectric constants and thereby the optical bandgap of the films were calculated from transmittance spectral data recorded in the range 400?C1200 nm by UV?CVIS-Spectrometer. The direct optical bandgap of the Ag₂SeTe thin films deposited on glass substrates with different thicknesses 50?C230 nm were found to be in the range 1.48?C1.59 eV. The carrier density value is estimated to be around 9.8 × 10²¹ cm^?1 for the film thickness of 150 nm. The compositions estimated from the optical band gap studies reveal a value of 0.75 for Tellurium concentration. These structural and optical parameters are found to be very sensitive to the thin film thickness.