Low-voltage,high-performance n-channel organic thin-film transistors based on tantalum pentoxide insulator modified by polar polymers

Polar polymers (polyfluorene copolymers, PFN–PBT) with different polarities are utilized to modify the surface of tantalum pentoxide (Ta₂O₅) insulator in n-channel organic thin-film transistors (OTFTs). A high mobility of 0.55 cm²/Vs, high on/off current ratio of 1.7 × 10⁵, and low threshold voltage of 2.8 V are attained for the OTFT with the modification polymers, the performances of which are much better than those of OTFT with only Ta₂O₅ insulator. The performances of the OTFT with only Ta₂O₅ insulator are only 0.006 cm²/Vs in mobility, 5 × 10³ in on/off ratio, and 12.5 V in threshold voltage. Furthermore, it is found that the threshold voltage of the OTFTs with PFN–PBT modification layer is easily tuned by polarities of the polymers. Further studies show that self-assembly dipole moments in the polymers play an important role in the improvement of the OTFT performances.     

Fabrication of the flexible pentacene thin-film transistors on 304 and 430 stainless steel (SS) substrate

Flexible organic thin-film transistors (OTFT) were fabricated on 304 and 430 stainless steel (SS) substrate with aluminum oxide as a gate insulator and pentacene as an organic semiconductor. Chemical mechanical polishing (CMP) process was used to study the effect of the SS roughens on the dielectric properties of the gate insulator and OTFT characteristics. The surface roughness was decreased from 33.8 nm for 304 SS and 19.5 nm for 430 SS down to ～2.5 nm. The leakage current of the metal–insulator–metal (MIM) structure (Au/Al₂O₃/SS) was reduced with polishing. Mobility and on/off ratio of pentacene TFT with bare SS showed a wide range of values between 0.005 and 0.36 cm²/Vs and between 10³ and 10⁵ depending on the location in the substrate. Pentacene TFTs on polished SS showed an improved performance with a mobility of 0.24–0.42 cm²/Vs regardless of the location in the substrate and on/off ratio of ～10⁵. With self assembled monolayer formation of octadecyltrichlorosilane (OTS) on insulator surface, mobility and on/off ratio of pentacene TFT on polished SS was improved up to 0.85cm²/Vs and ～10⁶. I–V characteristics of pentacene TFT with OTS treated Al₂O₃/304 SS was also obtained in the bent state with a bending diameter (D) of 24, 45 or 70 mm and it was confirmed that the device performed well both in the linear regime and the saturation regime.     

Transparent organic thin-film transistors based on high quality polycrystalline rubrene film as active layers

Transparent organic thin-film transistors (OTFTs) with high performance are demonstrated by using high quality polycrystalline 5,6,11,12-Tetraphenylnaphthacene (rubrene) as an active layer, which is prepared by weak epitaxy growth (WEG) method. Benefiting from epitaxial relationship is formed between the inducing layer and the rubrene films, highly oriented and continuous organic polycrystalline thin films with large grains were obtained, which enhances the carrier transport in the film plane. The mobility of devices reaches 1.3 cm²/Vs, the threshold voltage is lower than ?0.9 V and the on–off current ratio (I_on/I_off) is higher than 10⁶ after the photolithography process. Moreover, the array consisting of the transparent thin-film transistors displays a high optical transparency more than 65% in visible light regions. The high-performance transparent OTFTs promote the practical applications for large-area and flexible active-matrix organic light-emitting diodes (AMOLEDs) display.     

Photo-patternable polyimide gate insulator with fluorine groups for improving performance of 2,7-didecyl[1]benzothieno[3,2-b][1]benzothiopene (C10-BTBT) thin-film transistors

Surface properties of gate insulators strongly affect the device performance of organic thin-film transistors (OTFTs). To improve the performance of OTFTs, we have developed photo-sensitive polyimide gate insulator with fluorine groups. The polyimide gate insulator film could be easily patterned by selective UV exposure without any photoinitiator. The polyimide gate insulator film, fabricated at 130 °C, has a dielectric constant of 2.8 at 10 kHz, and leakage current density of <1.6 × 10^?10 A/cm² while biased from 0 to 90 V. To investigate the potential of the polyimide with fluorine groups as a gate insulator, we fabricated C₁₀-BTBT TFTs. The field-effect mobility and the on/off current ratio of the TFTs were measured to be 0.76 ± 0.09 cm²/V s and >10⁶, respectively.     

Self-aligned flexible organic thin-film transistors with gates patterned by nano-imprint lithography

Many applications that rely on organic electronic circuits still suffer from the limited switching speed of their basic elements – the organic thin film transistor (OTFT). For a given set of materials the OTFT speed scales inversely with the square of the channel length, the parasitic gate overlap capacitance, and the contact resistance. For maximising speed we pattern transistor channels with lengths from 10 μm down to the sub-micrometre regime by industrially scalable UV-nanoimprint lithography. The reduction of the overlap capacitance is achieved by minimising the source–drain to gate overlap lengths to values as low as 0.2 μm by self-aligned electrode definition using substrate reverse side exposure. Pentacene based organic thin film transistors with an exceptionally low line edge roughness <20 nm of the channels, a mobility of 0.1 cm²/Vs, and an on–off ratio of 10⁴, are fabricated on 4″ × 4″ flexible substrates in a carrier-free process scheme. The stability and spatial distribution of the transistor channel lengths are assessed in detail with standard deviations of L ranging from 185 to 28 nm. Such high-performing self-aligned organic thin film transistors enabled a ring-oscillator circuit with an average stage delay below 4 μs at an operation voltage of 7.5 V.     

Channel width effect for organic thin film transistors using TIPS-pentacene employed as a dopant of poly-triarylamine

The effects of the physical channel width on the characteristics of organic thin film transistors (OTFTs), made with 6,13-bis(triisopropyl-silylethynyl)-pentacene (TIPS-pentacene) embedded into poly-triarylamine (PTAA, hole conductor within an active channel), have been examined in this paper. The devices are estimated by measuring the drain-source current (I_DS) for different contact metals such as Au and Ag, at fixed gate and drain voltages. The results show that the threshold voltage (V_T) and I_DS increase with increasing channel width. Furthermore, it has been observed that the field effect mobility is dependent on V_T, which is influenced by the channel width. The OTFTs, produced using Au and Ag contacts, exhibited the highest values of mobility in the saturation regime, namely 5.44 × 10^?2 and 1.33 × 10^?2 cm²/Vs, respectively.     

Self-aligned inversion n-channel In0.2Ga0.8As/GaAs metal–oxide–semiconductor field-effect-transistors with TiN gate and Ga2O3(Gd2O3) dielectric

A self-aligned process for fabricating inversion n-channel metal–oxide–semiconductor field-effect-transistors (MOSFET’s) of strained In_0.2Ga_0.8As on GaAs using TiN as gate metal and Ga₂O₃(Gd₂O₃) as high κ gate dielectric has been developed. A MOSFET with a 4 μm gate length and a 100 μm gate width exhibits a drain current of 1.5 mA/mm at V_g = 4 V and V_d = 2 V, a low gate leakage of <10^?7 A/cm² at 1 MV/cm, an extrinsic transconductance of 1.7 mS/mm at V_g = 3 V, V_d = 2 V, and an on/off ratio of ～10⁵ in drain current. For comparison, a TiN/Ga₂O₃(Gd₂O₃)/In_0.2Ga_0.8As MOS diode after rapid thermal annealing (RTA) to high temperatures of 750 °C exhibits excellent electrical and structural performances: a low leakage current density of 10^?8–10^?9 A/cm², well-behaved capacitance–voltage (C–V) characteristics giving a high dielectric constant of ～16 and a low interfacial density of state of ～(2～6) × 10¹¹ cm^?2 eV^?1, and an atomically sharp smooth Ga₂O₃(Gd₂O₃)/In_0.2Ga_0.8As interface.     

Soluble pentacene thin-film transistor using a high solvent and heat resistive polymeric dielectric with low-temperature processability and its long-term stability

Solution processable organic thin-film transistors (OTFTs) were fabricated using 6,13-bis(triisopropyl-silylethynyl) pentacene (TIPS-pentacene) and low-temperature processable polyimide gate dielectric. The TIPS-pentacene OTFT with the dielectric was found to have a field-effect mobility of 0.15 cm²/Vs, which is comparable to that of OTFT with an inorganic dielectric. The OTFTs with the polyimide dielectric did not show any significant performance degradation as time passed. A field-effect mobility of the OTFTs in 60 days was found to be almost identical to that of pristine OTFT. The combination of TIPS-pentacene and our polyimide gate dielectric can be one of the potential candidates for the fabrication of stable OTFTs for large-area flexible electronics.     

Low-voltage organic thin film transistors with hydrophobic aluminum nitride film as gate insulator

This paper reports on the low-voltage (<5 V) pentacene-based organic thin film transistors (OTFTs) with a hydrophobic aluminum nitride (AlN) gate-dielectric. In this work, a thin (about 50 nm), smooth (roughness about 0.18 nm) and low-leakage AlN gate dielectric is obtained and characterized. The AlN film is hydrophobic and the surface free energy is similar to the organic or the polymer films. The demonstrated AlN–OTFTs were operated at a low-voltage (3–5 V). A low-threshold voltage (−2 V) and an extremely low-subthreshold swing (∼170 mV/dec) were also obtained. Under low-voltage operating conditions, the on/off current ratio exceeded 10⁶, and the field effect mobility was mobility was 1.67 cm²/V s.     

Organic light-emitting diodes based on an ambipolar single crystal

Slice-like organic single crystals of 1,4-bis(2-cyano-2-phenylethenyl)benzene (BCPEB) are grown by the physical vapor transport (PVT) method, and exhibit a very high photoluminescence quantum efficiency (Φ_PL) of 75%. The ambipolar behavior of BCPEB single crystals are confirmed using the time of flight technique. The high efficiency and balanced (μ_h = 0.059 cm²/Vs and μ_e = 0.070 cm²/Vs) carriers’ mobility imply that the BCPEB single crystal is a promising light-emitting layer in the diodes structure. Intense green electroluminescence (EL) from a diode has been successfully demonstrated at an applied electric field of 2 × 10⁵ V/cm.     

Improving the performance of the organic thin-film transistors with thin insulating lithium fluoride buffer layer

The pentacene-based organic thin-film transistors (OTFTs) with a thin insulating lithium fluoride (LiF) buffer layer between the pentacene and source/drain electrodes were fabricated. Compared with conventional OTFTs, the introduction of the buffer layer (1 nm) leads to field-effect mobility increases from 0.16 to 0.5 cm²/Vs, and threshold voltage downshifts from −19 to −8 V for the linear region. The on/off current ratio is improved to a level of 10⁵ for the off-state current decreasing. These improvements are attributed to (i) tunneling injection through the LiF layer and (ii) interface dipole energy barrier decreasing and contact resistance reduction between pentacene and Au. The results demonstrate that it is an effective method to improve the device characteristics by using a buffer layer.     

Effects of different electroplated gate electrodes on electrical performances of flexible organic thin film transistor and flexibility improvement

Various electroplated metal gate electrodes (Ni, Cu, and Au) on flexible polyimide (PI) substrates were applied to the fabrication of inverted staggered pentacene organic thin film transistors (OTFTs). The metal gate electrodes additively electroplated onto the patterned negative photoresist mask on the Cu(seed)/Cr(adhesion) layers sputter-deposited on the O₂-plasma-treated PI substrates were effective in obtaining good adhesion between the metal gate electrode and organic substrate. It was found that the reduction in the surface roughnesses of the electroplated metal gate and of the subsequently deposited PVP (poly-4-vinyl phenol) gate dielectric layers was a critical factor in improving the device performance. The Ni-gated OTFT exhibited the best electrical characteristics, with a field-effect mobility of ≅0.2 cm²/V-s and a current on/off ratio of ≅10³, due to the better chemical stability of the Ni electrode and the smoother surface of the PVP layer on the Ni electrode, as compared to the OTFTs with PVP/Cu or PVP/Au gates. The results of the flexibility test showed that the field-effect mobility and current on/off ratio were not changed significantly when the OTFTs were subjected to 10,000 cyclic bendings with a bending radius of 6 mm in tension mode (outward bending).     

In situ modification of low-cost Cu electrodes for high-performance low-voltage pentacene thin film transistors (TFTs)

We demonstrate low-voltage pentacene thin film transistors (TFTs) using in situ modified low-cost Cu (M-Cu) as source–drain (S/D) electrodes and solution-processed high capacitance (200 nF/cm²) gate dielectrics. Under a gate voltage of ?3 V, the device with M-Cu electrodes shows a much higher apparent mobility (1.0 cm²/V s), a positively shifted threshold voltage (?0.62 V), a lower contact resistance (0.11 MΩ) and a larger transconductance (12 μS) as compared to the device with conventional Au electrodes (corresponding parameters are 0.71 cm²/V s, ?1.44 V, 0.41 MΩ, and 5.7 μS, respectively). The enhancement in the device performance is attributed to the optimized interface properties between S/D electrodes and pentacene. Moreover, after encapsulation the M-Cu electrodes with a thin layer of Au in the aim of suppressing unfavorable surface oxidation, the electronic characteristics of the device are further improved, and highly enhanced apparent mobility (2.3 cm²/V s) and transconductance (19 μS) can be achieved arising from the increased conductivity of the electrode itself. Our study provides a simple and feasible approach to achieve high performance low-voltage OTFTs with low-cost S/D electrodes, which is desirable for large area applications.     

Organic thin film transistors with double insulator layers

We have investigated a double-layer structured gate dielectric for the organic thin films transistor (OTFT) with the purpose of improving the performance of the SiO₂ gate insulator. A 50 nm PMMA layer was coated on top of the SiO₂ gate insulator as organic insulator layer. The results demonstrated that using inorganic/organic compound insulator as the gate dielectric layers is an effective method to fabricate OTFTs with improved electric characteristics and decreased leakage current. Electrical parameters such as carrier mobility and on/off ratio by field effect measurement have been calculated. OTFT based on highly doped Si substrate with a field-effect mobility of 0.004 cm²/V s and on/off ratio of 10⁴ have been obtained.     

A cross-linked poly(methyl methacrylate) gate dielectric by ion-beam irradiation for organic thin-film transistors

The electrical characteristics of pentacene organic thin-film transistors (OTFTs) using cross-linked poly(methyl methacrylate) (PMMA) as the gate dielectric are reported. Ultra-thin films of cross-linked PMMA could be obtained by spin-coating and subsequent irradiation using a 1.515 MeV ⁴He⁺ ion beam. The resulting film, with a thickness of 33 nm, possessed a low leakage current density of about 10^?6 A cm^?2 for fields up to 2 MV cm^?1. OTFTs incorporating the cross-linked dielectric operated at relatively low voltages, <10 V, and exhibited a mobility of 1.1 cm² V^?1 s^?1, a threshold voltage of ?1 V, a sub-threshold slope of 220 mV per decade and an on/off current ratio of 1.0 × 10⁶.     

Operational frequency degradation induced trapping in scaled GaN HEMTs

Cut-off frequency increase from 12.1 GHz to 26.4 GHz, 52.1 GHz and 91.4 GHz is observed when the 1 μm gate length GaN HEMT is laterally scaled down to L_G = 0.5 μm, L_G = 0.25 μm and L_G = 0.125 μm, respectively. The study is based on accurately calibrated transfer characteristics (I_D-V_GS) of the 1 μm gate length device using Silvaco TCAD. If the scaling is also performed horizontally, proportionally to the lateral (full scaling), the maximum drain current is reduced by 38.2% when the gate-to-channel separation scales from 33 nm to 8.25 nm. Degradation of the RF performance of a GaN HEMT due to the electric field induced acceptor traps experienced under a high electrical stress is found to be about 8% for 1 μm gate length device. The degradation of scaled HEMTs reduces to 3.5% and 7.3% for the 0.25 μm and 0.125 gate length devices, respectively. The traps at energy level of E_T = E_V + 0.9 eV (carbon) with concentrations of N_IT = 5 × 10¹⁶cm^− 3, N_IT = 5 × 10¹⁷cm^− 3 and N_IT = 5 × 10¹⁸cm^− 3 are located in the drain access region where highest electrical field is expected. The effect of traps on the cut-off frequency is reduced for devices with shorter gate lengths down to 0.125 μm.     

Stable organic thin-film transistor in a pixel for plastic electronics

We have studied the fabrication of stable organic thin-film transistor (OTFT) for plastic electronics using hybrid multi-layer (HML) of parylene/Au/photoacryl/IZO (indium zinc oxide) on organic semiconductor. The HML-passivated OTFTs exhibited the field-effect mobility (μ_fe) of 0.2–0.3 cm²/V s with an on/off current ratio of 10⁷ after annealing at 180 °C. The changes in on-, off- and subthreshold-currents of the HML-passivated OTFT were negligibly small during the storage of 781 h. Moreover, the hysteresis in transfer characteristics was negligible even after exposure of the OTFT to air for 781 h. These results indicate that HML-passivation is suitable for stable OTFT array for plastic electronics.     

Effect of the work function of gate electrode on hysteresis characteristics of organic thin-film transistors with Ta2O5/polymer as gate insulator

Organic thin-film transistors (OTFTs) using high dielectric constant material tantalum pentoxide (Ta₂O₅) and benzocyclobutenone (BCBO) derivatives as double-layer insulator were fabricated. Three metals with different work function, including Al (4.3 eV), Cr (4.5 eV) and Au (5.1 eV), were employed as gate electrodes to study the correlation between work function of gate metals and hysteresis characteristics of OTFTs. The devices with low work function metal Al or Cr as gate electrode exhibited high hysteresis (about 2.5 V threshold voltage shift). However, low hysteresis (about 0.7 V threshold voltage shift) OTFTs were attained based on high work function metal Au as gate electrode. The hysteresis characteristics were studied by the repetitive gate voltage sweep of OTFTs, and capacitance–voltage (C–V) and trap loss-voltage (G_p/ω?V) measurements of metal–insulator–semiconductor (MIS) devices. It is proved that the hysteresis characteristics of OTFTs are relative to the electron injection from gate metal to Ta₂O₅ insulator. The electron barrier height between gate metal and Ta₂O₅ is enhanced by using Au as gate electrode, and then the electron injection from gate metal to Ta₂O₅ is reduced. Finally, low hysteresis OTFTs were fabricated using Au as gate electrode.     

Photocurable propyl-cinnamate-functionalized polyhedral oligomeric silsesquioxane as a gate dielectric for organic thin film transistors

A polyhedral oligomeric silsesquioxane (POSS)-based insulating material with photocurable propyl-cinnamate groups (POSS-CYNNAM) was designed and synthesized through simple single step reaction for use as a gate dielectric in organic thin-film transistors (OTFT). POSS-CYNNAM was soluble in common organic solvents and formed a smooth thin film after spin-casting. A thin film of POSS-CYNNAM was cross-linked and completely solidified under UV irradiation without the use of additives such as photoacid generators or photoradical initiators. ITO/insulator/Au devices were fabricated and characterized to measure the dielectric properties of POSS-CYNNAM thin films, such as leakage current and capacitance. A pentacene-based OTFT using the synthesized insulator as the gate dielectric layer was fabricated on the transparent indium tin oxide (ITO) electrode, and its performance was compared to OTFTs using thermally cross-linked poly(vinyl phenol) (PVP) as the insulator. The fabricated POSS-CYNNAM OTFT showed a comparable performance to devices based on the PVP insulator with 0.1 cm²/Vs of the field effect mobility and 4.2 × 10⁵ of an on/off ratio.     

Study on mobility enhancement in MOVPE-grown AlGaN/AlN/GaN HEMT structures using a thin AlN interfacial layer

Al_0.26Ga_0.74N/AlN/GaN high-electron-mobility transistor (HEMT) structures with AlN interfacial layers of various thicknesses were grown on 100-mm-diameter sapphire substrates by metalorganic vapor phase epitaxy, and their structural and electrical properties were characterized. A sample with an optimum AlN layer thickness of 1.0 nm showed a highly enhanced Hall mobility (μ_Hall) of 1770 cm²/Vs with a low sheet resistance (ρ_s) of 365 Ω/sq. (2DEG density n_s = 1.0 × 10¹³/cm²) at room temperature compared with those of a sample without the AlN interfacial layer (μ_Hall = 1287 cm²/Vs, ρ_s = 539 Ω/sq., and n_s = 0.9 × 10¹³/cm²). Electron transport properties in AlGaN/AlN/GaN structures were theoretically studied, and the calculated results indicated that the insertion of an AlN layer into the AlGaN/GaN heterointerface can significantly enhance the 2DEG mobility due to the reduction of alloy disorder scattering. HEMTs were successfully fabricated and characterized. It was confirmed that AlGaN/AlN/GaN HEMTs with the optimum AlN layer thickness show superior DC properties compared with conventional AlGaN/GaN HEMTs.