溶胶-凝胶提拉法制备ZnO薄膜及其性能研究

采用溶胶-凝胶提拉法在石英玻璃衬底上生长了ZnO薄膜.对薄膜的XRD分析表明ZnO薄膜为纤锌矿结构并沿c轴择优取向生长.透射光谱表明薄膜的禁带宽度为3.28eV,与ZnO体材料的禁带宽度3.30eV基本相同.用荧光光谱分析了经过400～600℃热处理获得的ZnO薄膜,结果表明ZnO薄膜在室温下可获得较强的紫外带边发射.适当选择热处理温度可以获得无可见波段发射的ZnO薄膜.     

半导体ZnO晶体生长及其性能研究进展

ZnO晶体是直接宽带隙半导体材料，室温下禁带宽度为3.37eV，激子束缚能为60meV。其禁带宽度对应紫外光的波长，有望开发蓝绿色、蓝光、紫外光等多种发光器件。对ZnO晶体的生长方法及研究进展做了简要的叙述。     

脉冲激光沉积法室温下ZnO薄膜的制备与表征

在室温条件下,采用脉冲激光沉积技术在玻璃衬底上生长了ZnO薄膜.对薄膜的XRD分析表明,ZnO薄膜为六方纤锌矿结构并沿c轴取向生长,且(002)衍射峰的半高峰宽仅为0.24°.薄膜沿c轴方向受到一定的张应力为1.7×108 N/m2.原子力显微镜分析表明薄膜表面较为平整,平均粗糙度约为6.5 nm,晶粒尺寸约为50 nm.此外,透射光谱分析表明薄膜的禁带宽度为3.25 eV,与ZnO体材料的禁带宽度3.30 eV基本相同.     

Cu掺杂ZnO的光致发光光谱

ZnO是宽禁带半导体,室温下禁带宽度为3.37eV,激子束缚能高达60meV,是制备光电器件的优选材料。然而,p型掺杂仍是亟待解决的问题。ⅠB元素Cu被认为在ZnO中产生受主能级,可以实现ZnO的p型掺杂。综述了各种制备方法、制备条件和激发条件下得到的Cu掺杂ZnO薄膜、纳米线和纳米棒的光致发光谱和机理,总结出Cu掺杂ZnO光致发光谱的带边发射会因为Cu的掺杂强度降低,或出现发射中心红移等现象。可见光区域由于Cu掺杂会产生新的蓝光、绿光和橙光发射峰,蓝光发射峰可能与Cu2+-Cu+跃迁或VZn和Zni有关;绿光发射峰可能与Cu杂质或VO-VZn跃迁有关,Cu掺杂还可能引入非辐射复合的点缺陷中心;橙光发射峰则可能由于Cu杂质受主能级向深施主能级跃迁而产生。     

溶胶-凝胶法制备ZnO基稀释磁性半导体薄膜

用溶胶－凝胶法制备了具有良好光学性质和C轴取向的ZnO:Fe薄膜。ZnO:Fe薄膜具有尖锐的带边发光，禁带宽度约为3.3eV，半高宽13nm。磁性测量表明，ZnO：Fe薄膜在室温下具有铁磁性，饱和磁化强度约为10^-3emu量级，矫顽力为30奥斯特（Oe)。     

静电纺丝制备ZnO纳米纤维及其应用研究进展

ZnO是一种禁带宽度为3.37eV的宽禁带n型半导体,是重要的光学及电子材料。随着纳米技术的发展,ZnO纳米材料的制备及应用取得了重要的发展。其中静电纺丝是制备ZnO纳米纤维的一种简单且有效的技术,可方便获得直径为数十至数百纳米的连续纤维。因此,关于静电纺丝制备ZnO纳米纤维的研究越来越受到人们的关注。主要综述了静电纺丝法制备单一组分和复合组分ZnO纳米纤维的研究进展,以及ZnO纳米纤维在光催化、化学传感、生物传感和气体传感等领域的应用研究,并对其进行了展望。     

氧化锌掺钇透明导电薄膜的制备及光电特性研究

采用射频磁控溅射法,室温下在玻璃衬底上制备出了具有良好附着性、低电阻率和高透过率的新型透明导电薄膜YZO(ZnO掺杂Y2O3简称YZO)。在薄膜厚度为600nm的情况下,研究了薄膜电学特性随溅射功率和溅射气压的变化情况。X射线衍射谱表明YZO薄膜是多晶膜,具有ZnO的六角纤锌矿结构,最佳取向为(002)方向。最佳溅射条件下制备的薄膜电阻率为8.71×10-4Ω.cm,在可见光范围内平均透过率达到92.3%,禁带宽度为3.57eV。     

脉冲电沉积法制备SnS薄膜及其光电性质研究

在ITO玻璃衬底上使用脉冲电沉积法制备了SnS薄膜,研究了不同的开启脉冲电位对薄膜表面,薄膜结构以及光学性质的影响。结果表明,在不同开启脉冲电位下制备出来的SnS薄膜的禁带宽度可以在1.3~1.62 eV范围内变化,并且随着开启脉冲电位的增大,薄膜的禁带宽度逐渐变大。在开启脉冲电位为-0.70V(vs.SCE)时,制备的薄膜禁带宽度为1.53 eV,在可见光范围内光吸收系数均达到104cm-1以上。扫描电子显微镜的测试结果表明所得薄膜的表面平整并且均匀。结合X射线衍射结果可证实制备出的薄膜是由正交结构晶粒组成的多晶体。对薄膜进行变温电学性质的测试,得到了薄膜电导率温度谱,发现室温下薄膜的电导率为10-6S.cm-1。同时,在实验上发现了薄膜与Al电极形成了肖特基接触,由电学测试推导出肖特基势垒高度为0.58 eV。     

Zn0.9Mg0.1O:Ga宽带隙导电膜的 PLD制备及性能研究

利用脉冲激光沉积法(PLD)制备了Ga掺杂的Zn0.9Mg0.1O(ZMOGa)宽带隙透明导电薄膜.采用各种分析手段研究了沉积温度和真空退火处理对薄膜结构、表面形貌及光电性能的影响.结果表明,制备的薄膜具有ZnO(002)择优取向;200℃下沉积的薄膜通过3×10-3Pa的真空400℃退火2h后,其电阻率由8.12×10-4Ω·cm减小到4.74×10-4Ω·cm,禁带宽度则由原来的3.83eV增加到3.90eV.退火处理增强了薄膜的择优取向和结晶度、增加了禁带宽度、提高了载流子浓度并使其透射谱线的光学吸收边发生蓝移现象.     

超声喷雾热解法制备MgxZn1-xO薄膜及其性能研究

采用超声喷雾热解法在石英玻璃衬底上生长出不同组分的宽禁带MgxZn1-xO薄膜(z=0、0.08、0.16、0.25).通过X射线衍射(XRD)、扫描电子显微镜(SEM)和分光光度计等分析测试手段对MgxZn1-xO薄膜的晶体结构、透光性及禁带宽度进行了研究.结果表明,随着Mg含量的增加,MgxZn1-xO薄膜仍然保持着ZnO的纤锌矿结构,没有生成MgO相,Mg可以有效地溶入ZnO的晶格中.MgxZn1-xO薄膜具有良好的透光性,在可见波段的光透过率达85%以上;此外,随着Mg含量的增加,MgxZn1-xO薄膜的吸收边出现蓝移现象,禁带宽度从3.30eV增大到3.54eV.     

Zinc oxide epitaxial thin film deposited over carbon on various substrate by pulsed laser deposition technique

Zinc Oxide (ZnO) is a promising candidate material for optical and electronic devices due to its direct wide band gap (3.37 eV) and high exciton binding energy (60 meV). For applications in various fields such as light emitting diode (LED) and laser diodes, growth of p-type ZnO is a prerequisite. ZnO is an intrinsically n-type semiconductor. In this paper we report on the synthesis of Zinc Oxide-Carbon (ZnO:C) thin films using pulsed laser deposition technique (PLD). The deposition parameters were optimized to obtain high quality epitaxial ZnO films over a carbon layer. The structural and optical properties were studied by glazing index X-ray diffraction (GIXRD), photoluminescence (PL), optical absorption (OA), and Raman spectroscopy. Rutherford backscattering spectroscopy (RBS), scanning electron microscopy with energy dispersive spectroscopy (SEMEDS) and atomic force microscopy (AFM) were employed to determine the composition and surface morphology of these thin films. The GIXRD pattern of the synthesized films exhibited hexagonal wurtzite crystal structure with a preferred (002) orientation. PL spectroscopy results showed that the emission intensity was maximum at -380 nm at a deposition temperature of 573 K. In the Raman spectra, the E2 phonon frequency around at 438 cm(-1) is a characteristic peak of the wurtzite lattice and could be seen in all samples. Furthermore, the optical direct band gap of ZnO films was found to be in the visible region. The growth of the epitaxial layer is discussed in the light of carbon atoms from the buffer layer. Our work demonstrates that the carbon is a novel dopant in the group of doped ZnO semiconductor materials. The introduction of carbon impurities enhanced the visible emission of red-green luminescence. It is concluded that the carbon impurities promote the zinc related native defect in ZnO.     

Influence of O2 pressure on the properties of heavily-doped ZnO:Sb thin films grown by pulsed laser deposition

Heavily Sb-doped ZnO films were deposited on the glass substrates by pulsed laser deposition (PLD). X-ray diffraction (XRD) and photoelectron spectroscopy (XPS) were employed to characterize their microstructures and chemical valence states. Transmittance spectra and Hall measurements were used to evaluate their optical and electrical properties. It was found that the as-prepared ZnO:Sb thin films showed a single-hexagonal-phase structure, with the optical band gap tuning from 3.33 to 3.11 eV. The variation in the band gap was attributed to a large co-axis strain in the alloy films induced by Sb incorporation. Besides, the alloy films showed a semi-insulated characteristic with high resistivity of ~10⁴ Ω cm, which was possibly related to a compensation of intrinsic defects.     

Electrodeposition of template free hierarchical ZnO nanorod arrays via a chloride medium

We have successfully grown template and buffer free ZnO nanorod films via chloride medium by controlling bath temperature in a simple and cost effective electrochemical deposition method. Thin films of ZnO nano-rods were obtained by applying a potential of ?0.75 V by employing Ag/AgCl reference electrode for 4 h of deposition time. The CV measurements were carried out to determine potential required to deposit ZnO nanorod films whereas chronoamperometry studies were carried out to investigate current and time required to deposit ZnO nanorod films. The formation of ZnO nanorod has been confirmed by scanning electron microscopy (SEM) and Raman spectroscopy. Low angle XRD analysis confirms that ZnO nanorod films have preferred orientation along (101) direction with hexagonal wurtzite crystal structure. The SEM micrographs show nice surface morphology with uniform, dense and highly crystalline hexagonal ZnO nanorods formation. Bath temperature has a little influence on the orientation of nanorods but has a great impact on their aspect ratio. Increase in bath temperature show improvement in crystallinity, increase in diameter and uniform distribution of nanorods. Compositional analysis shows that the amount of oxygen is ~49.35 % and that of Zn is ~50.65 %. The optical band gap values were found to be 3.19 and 3.26 eV for ZnO nanorods prepared at bath temperature 70 and 80 °C respectively. These results indicate that by controlling the bath temperature band gap of ZnO nanorods can be tailored. The obtained results suggest that it is possible to synthesize ZnO nanorod films by a simple, cost effective electrodeposition process which can be useful for opto-electronic devices fabrication.     

Investigation of the substrate effect for Zr doped ZnO thin film deposition by thermionic vacuum arc technique

ZnO is a fundamental wide band gap semiconductor. Especially, doped elements change the optical properties of the ZnO thin film, drastically. Doped ZnO semiconductor is a promising materials for the transparent conductive oxide layer. Especially, Zr doped ZnO is a potential material for the high performance TCO. In this paper, ZnO semiconductors were doped with Zr element and microstructural, surface and optical properties of the Zr doped ZnO thin films were investigated. Zr doped ZnO thin films were deposited thermionic vacuum arc (TVA) technique. TVA is a rapid and high vacuum deposition method. A glass, polyethylene terephthalate and Si wafer (111) were used as a substrate material. Zr doped ZnO thin films deposited by TVA technique and their substrate effect investigated. As a results, deposited thin films has a high transparency. The crystal orientation of the films are in polycrystal formation. Especially, substrate crystal orientation strongly change the crystal formation of the films. Substrate crystal structure can change the optical band gap, microstructural properties and deposited layer formation. According to the atomic force microscopy and field emission scanning electron microscopy measurements, all deposited layer shows homogeneous, compact and low roughness. The band values of the deposited thin film were approximately found as to be 3.1–3.4 eV. According to the results, Zr elements created more optical defect and shifted to the band gap value towards to blue region.     

Optical properties of ZnO/ZnS and ZnO/ZnTe heterostructures for photovoltaic applications

Although ZnO and ZnS are abundant, stable, and environmentally benign, their band gap energies (3.44, 3.72 eV, respectively) are too large for optimal photovoltaic efficiency. By using band-corrected pseudopotential density functional theory calculations, we study how the band gap, optical absorption, and carrier localization can be controlled by forming quantum-well-like and nanowire-based heterostructures of ZnO/ZnS and ZnO/ZnTe. In the case of ZnO/ZnS core/shell nanowires, which can be synthesized using existing methods, we obtain a band gap of 2.07 eV, which corresponds to a Shockley-Quiesser efficiency limit of 23%. On the basis of these nanowire results, we propose that ZnO/ZnS core/shell nanowires can be used as photovoltaic devices with organic polymer semiconductors as p-channel contacts.     

Nanostructured ZnO hexagons and optical properties

We report the solvothermal synthesis of nanostructured ZnO hexagons by hydrothermal method via intermediate zinc adipate. The intermediate zinc adipate was obtained using precursors zinc acetate and adipic acid in aqueous and organic medium. Detailed XRD analysis of the zinc adipate was studied for the first time. Thermal study of intermediate showed the formation of ZnO at 400 °C. XRD study demonstrated the existence of wrutzite ZnO of high degree of crystallinity with crystallite size in the range of 20–25 nm. Scanning Electron Microscopy (SEM) showed distinguished morphology in different medium. Transmission Electron Microscopy (TEM) demonstrated nanostructured ZnO hexagons with average size 25–50 nm. The band gap for aqueous and organic mediated ZnO was found to be 3.24 and 3.26 eV, respectively. The band gap obtained is higher than the bulk ZnO, which implies nanocrystalline nature of the material.     

Influence of Al concentration on structural and optical properties of Al-doped ZnO thin films

Undoped ZnO and Al-doped zinc oxide (ZnO:Al) thin films with different Al concentrations were prepared onto Si (100) substrate by pulsed filtered cathodic vacuum arc deposition system at room temperature. The influence of doping on the structural and optical properties of thin films was investigated. The preferential (002) orientation was weakened by high aluminum doping in films. Raman measurement was performed for the doping effects in the ZnO. Atomic force microscopy images revealed that the surface of undoped ZnO film grown at RT was smoother than that of the Al-doped ZnO (ZnO:Al) films. The reflectance of all films was studied as a function of wavelength using UV–Vis–NIR spectrophotometer. Average total reflectance values of about 35 % in the wavelength range of 400–800 nm were obtained. Optical band gap of the films was determined using the reflectance spectra by means of Kubelka–Munk formula. From optical properties, the band gap energy was estimated for all films.     

Optoelectronics behaviour of ZnO nanorods for UV detection

In this study ZnO nanorods have been synthesized by a chemical precipitation method. The room temperature UV–Vis absorption spectra of the ZnO nanorods indicated two absorption peaks in the UV region, one in the near UV region and the other attributed to the band gap of ZnO. The Photoluminescence spectra of ZnO nanorods show two emission bands, one ultraviolet emission band at 378 nm and the other in the defect related yellow emission band near 550 nm. The stimulated yellow luminescence of ZnO nanorods were affected by the synthesis time and annealing temperature. The same ZnO nanorods were deposited onto the ITO substrate to form a UV photoconductive detector. The ratio of the UV photogenerated current to dark current was as high as nine times under 3 V bias. Hence, these nanorods can be promising materials in the use of UV radiation detection.     

Au-N共掺杂ZnO电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理平面波超软赝势法,结合广义梯度近似(GGA)研究了Au、N共掺杂纤锌矿ZnO的能带结构、电子态密度,以及复介电函数、光学吸收等光学性质,并与本征ZnO和N掺杂ZnO情况进行了对比.计算结果表明Au、N共掺杂ZnO仍是直接带隙半导体材料,掺杂后ZnO的带隙收缩,价带展宽.在价带顶电子密度分布较N掺杂ZnO情况的局域性减弱,更有利于获得p型ZnO.与未掺杂ZnO相比,介电函数和吸收系数在可见和紫外区域得到显著增强.     

Hybrid nanostructures of Au nanocrystals and ZnO nanorods: Layer-by-layer assembly and tunable blue-shift band gap emission

A layer-by-layer assembly technique was developed to synthesize the hybrid nanostructures of Au nanocrystals with diameter of about 5 nm and ZnO nanorods via the electrostatic interaction. In comparison with ZnO nanorods, the Au-ZnO hybrid nanostructures exhibited the broadened and red-shifted surface plasmon band, enhanced band gap emission, and suppressed defect emission due to the strong interfacial coupling between Au and ZnO. Moreover, the band gap emission of the Au-ZnO hybrid nanostructures is controllably blue-shifted with decreasing distance between the Au nanocrystals and ZnO nanorods tuned by the amount of the polyelectrolyte layers due to the exciton and plasmon interactions.