共查询到19条相似文献,搜索用时 78 毫秒
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AZO透明导电薄膜的特性、制备与应用 总被引:14,自引:2,他引:14
综述了AZO透明导电薄膜的结构特点、冶金学,电学和光学的特性,薄膜研究,应用和开发现状,认为AXO薄膜具有较好的开发前景。 相似文献
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Highly conducting transparent indium-doped zinc oxide (IZO) thin films have been achieved by controlling different growth parameters using radio frequency magnetron sputtering. The structural, electrical, and optical properties of the IZO thin films have been investigated for varied indium content and growth temperature (T G) in order to find out the optimum level of doping to achieve the highest conducting transparent IZO thin films. The highest mobility and carrier concentration of 11.5 cm2/V-s and 3.26 × 1020 cm?3, respectively, have been achieved in IZO doped with 2% indium. It has been shown that as T G of the 2% IZO thin films increase, more and more indium atoms are substituted into Zn sites leading to shift in (002) peaks towards higher angles which correspond to releasing the stress within the IZO thin film. The minimum resistivity of 5.3 × 10?4 Ω-cm has been achieved in 2% indium-doped IZO grown at 700°C. 相似文献
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掺锆氧化锌透明导电薄膜的制备及特性研究 总被引:1,自引:2,他引:1
利用射频磁控溅射法在室温水冷玻璃衬底上成功地制备出了掺锆氧化锌(ZnO:Zr)透明导电薄膜.研究了溅射功率对ZnO:Zr薄膜结构、形貌和光电性能的影响.研究结果表明,溅射功率对ZnO:Zr薄膜的结构和电阻率有显著影响.X射线衍射(XRD)表明,ZnO:Zr薄膜为六角纤锌矿结构的多晶薄膜,且具有C轴择优取向.在溅射功率为150 W时,实验获得的ZnO:Zr薄膜电阻率具有最小值3.8×10-3Ω·cm.实验制备的ZnO:Zr薄膜具有良好的附着性能,可见光区平均透过率超过92%.ZnO:Zr薄膜可以用作薄膜太阳能电池和液晶显示器的透明电极. 相似文献
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掺钛氧化锌透明导电薄膜的制备及特性研究 总被引:4,自引:0,他引:4
利用直流磁控溅射法在室温水冷玻璃衬底上成功地制备出了掺钛氧化锌(ZnO:Ti)透明导电薄膜.研究了靶衬间距对ZnO:Ti薄膜结构、形貌和光电性能的影响.研究结果表明,靶衬间距对ZnO:Ti薄膜的结构和电阻率有显著影响.X射线衍射(XRD)表明,ZnO:Ti薄膜为六角纤锌矿结构的多晶薄膜,且具有c轴择优取向.在靶衬间距为4.6 cm时,实验获得的ZnO:Ti薄膜电阻率具有最小值4.18×10-4Ω·cm.实验制备的ZnO:Ti薄膜具有良好的附着性能,可见光区平均透过率超过92%.ZnO:Ti薄膜可以用作薄膜太阳能电池和液晶显示器的透明电极. 相似文献
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Kyungyea Park Deok‐Kyou Lee Byung‐Sung Kim Haseok Jeon Nae‐Eung Lee Dongmok Whang Hoo‐Jeong Lee Youn Jea Kim Jong‐Hyun Ahn 《Advanced functional materials》2010,20(20):3577-3582
Stretchable and transparent thin film transistors (TFTs) with intrisically brittle oxide semiconductors are built using a wavy structural configuration that can provide high flexibility and stretchability. After device fabrication procedures including high temperature annealing, the oxide semiconductor‐based TFT arrays can be transferred directly to plastic or rubber substrates, without an additional device process, using transfer printing methods. This procedure can avoid some of the thermal degradation problems associated with plastic or rubber substrates by separating them from the annealing procedure needed to improve the device performance. These design and fabrication methods offer the possibility of developing a new format of stretchable electronics. 相似文献