光催化Ba2+掺杂TiO2薄膜的常温制备及其性能研究

采用旋转涂膜法制备不同Ba2+掺杂量具有光催化活性的TiO2薄膜.适量Ba2+掺杂减小薄膜接触角,提高薄膜亲水性,从而吸附更多染料分子.适量Ba2+掺杂的TiO2薄膜对紫外光的吸收有所提高,产生更多的电子和空穴.薄膜表面均匀,颗粒为球形,0.01％ Ba2+的掺入能有效地抑制颗粒团聚成二次颗粒.薄膜催化活性随着涂膜次数的增加而提高,涂膜3次以上时活性下降.Ba2+掺杂量为0.01％涂膜3次的TiO2薄膜紫外光下脱色活性红X-3B溶液,脱色率达86.1％.     

不同染料吸附状态下染料敏化太阳能电池电化学阻抗谱研究

研究了TiO2表面染料的吸附状态不同时,染料敏化太阳能电池(DSC)的光电转换性能,并采用电化学交流阻抗技术(EIS)考察了不同染料吸附状态下DSC中的电子界面复合效应。结果表明,在非饱和吸附染料状态下,通过调整TiO2薄膜表面染料分子吸附量,可以降低界面电荷复合效应,使电子在TiO2薄膜中的传输过程中寿命增加,从而提高DSC的填充因子。     

不同染料吸附状态下染料敏化太阳能电池电化学阻抗谱研究

研究了TiO2表面染料的吸附状态不同时,染料敏化太阳能电池(DSC)的光电转换性能,并采用电化学交流阻抗技术(EIS)考察了不同染料吸附状态下DSC中的电子界面复合效应。结果表明,在非饱和吸附染料状态下,通过调整TiO2薄膜表面染料分子吸附量,可以降低界面电荷复合效应,使电子在TiO2薄膜的传输过程中寿命增加,从而提高DSC的填充因子。     

TiO2染料敏化薄膜的制备与结构表征

采用溶胶-凝胶法添加聚乙二醇表面活性剂制备了TiO2纳米粒子,采用滚压涂敷法在玻璃基底上制得TiO2纳米多孔薄膜,采用吸附法对多孔薄膜表面进行染料敏化处理.染料敏化处理前后,薄膜的微结构没有改变,但薄膜表面的成分发生了改变.对薄膜进行了XPS,AFM,SEM和XRD分析.结果表明,TiO2纳米晶薄膜中纳米粒子晶型为锐钛矿,薄膜具有网络多孔结构,TiO2粒子的粒径在20～30nm间,薄膜中空穴的孔径在50～150nm不等,未敏化处理的薄膜空隙中吸附了大量的氧,薄膜敏化处理后,表面的吸附氧被敏化剂分子中的氧取代,染料敏化剂分子通过化学吸附在薄膜表面.     

Al3+-SiO2共掺杂TiO2光催化膜的制备及超亲水改性

为了提高TiO2光催化薄膜的利用效率,实验采用金属离子Al3+和氧化物SiO2共掺杂的方法,制备以TiO2为基体的复合光催化薄膜.利用简单易行的溶胶-凝胶法结合超声分散技术以两种不同的方式,一种是同步将Al3+和SiO2共掺杂于TiO2溶胶中,制备多元素共掺杂混合溶胶,采用浸渍提拉的方法以玻璃片为载体涂膜,然后运用马弗...     

La3+掺杂TiO2纳米纤维的制备、表征与光催化性能

结合溶胶-凝胶法、静电纺丝技术和高温煅烧制备了La3+掺杂TiO2纳米纤维.采用扫描电子显微镜、X射线能谱仪、比表面积及孔隙分析仪、X射线衍射仪和紫外分光光度计对纳米纤维的形貌、晶型、表面和孔隙结构以及光催化性能进行了表征和测试.结果表明,La3+掺杂TiO2纳米纤维表面为多孔的纤维状结构.La3+掺杂明显改善了TiO2纳米纤维的表面孔隙结构,对TiO2纳米纤维的粒子生长有一定的抑制作用.光催化降解性能测试结果表明,当La3+掺杂量为0.04%(质量分数)时,TiO2纳米纤维的光催化性能最佳.     

Ag/TiO2薄膜结构和光催化性能研究

采用溶胶-凝胶技术制备了Ag掺杂的TiO2薄膜.用XRD、氮吸附法、UV-VIS-NIR分光光度计以及XPS对Ag掺杂后TiO2薄膜结构的变化进行了分析;用分光光学法通过在紫外光照下分解亚甲基蓝的实验比较了TiO2薄膜与Ag/TiO2薄膜的光催化性能.结果发现,掺杂适量的Ag有助于TiO2薄膜光催化氧化性能的提高,原因在于:（1）Ag通过引入耗尽层提高了TiO2的电荷分离能力,并吸引空穴向薄膜表面移动,结果使薄膜表面空穴的浓度提高,薄膜光催化效率提高;（2）Ag减小了TiO2粒子的粒径,使TiO2禁带宽度增大,薄膜光催化氧化的能力提高;（3）Ag掺杂后,TiO2薄膜表面对-OH基和水的吸附增加,使光照后TiO2薄膜表面活性自由基·OH的浓度增加,空穴向薄膜所吸附物质的转移能力提高.     

Fe3+偶联吨染料敏化TiO2可见光催化制氢活性

通过Fe3+分别把3种吨染料(xanthene)曙红Y(Eosin Y)、藻红B(Erythrosin B)、虎红(Rose-bengal)固定在TiO2表面制备xanthene-Fe3+-TiO2敏化催化剂.在可见光(λ≥420nm)下,以三乙醇胺为电子给体,3种xanthene-Fe3+-TiO2放氢活性明显高于Fe3+偶联前xanthene-TiO2.UV-vis吸收表征表明3种xanthene-Fe3+-TiO2在可见光的吸收比xanthene-TiO2更强.吸附实验和FTIR表征显示Fe3+均增加3种吨染料在TiO2的吸附量和吸附强度.因而,Fe3+偶联的光催化剂活性大大提高.讨论了吨染料结构对敏化TiO2催化荆活性的影响.     

Fe3+-TiO2薄膜经不同温度退火后的可见光催化性能

采用溶胶-凝胶法制备了掺杂Fe3+的TiO2薄膜,并在不同温度热处理.用SEM、XPS、UV-vis等分析方法进行结构表征和性能测试,通过降解亚甲基蓝溶液测试其可见光光催化活性.结果表明,723K时掺杂Fe3+的TiO2薄膜已经结晶,粒径为40～50nm.掺杂元素以Fe3+并口Fd2+形式存在于TiO2晶格并取代Ti4+形成Ti-O-Fe键,改变了TiO2的表面态,使TiO2带隙变窄,促进了对可见光的吸收.降解实验结果表明,823K热处理后掺杂铁的TiO2薄膜其光催化活性最好,在25W白炽灯模拟可见光下照射3.0h后,亚甲基蓝溶液的降解率接近30%.     

Ce4+/TiO2溶胶对酸性藏青GGR的光催化降解

以钛酸四正丁酯为前驱体,采用溶胶-凝胶法常温制备稀土离子Ce4+掺杂的TiO2溶胶,用以光催化降解酸性藏青GGR,探究掺杂对TiO2溶胶光催化活性的影响.研究Ce4+掺杂量、pH、溶胶浓度和染料初始浓度对溶胶光催化活性的影响.结果表明:未掺杂TiO2溶胶粒径为29.7nm,随Ce4+掺杂量增加粒径逐渐降低至22.4nm,粒径的减小使得TiO2粒子比表面积加大,光催化活性提高.染料降解率随掺杂量增加而提高,当Ce4+的掺杂量超过1.0％时,降解率下降,说明过量的掺杂会抑制TiO2的光催化活性.溶胶pH会影响溶胶中TiO2晶型和带电情况,pH为1-2时溶胶光催化活性最高.溶胶浓度低光催化反应体系中TiO2受激发产生的电子和空穴少,染料降解率低.染料初始浓度高紫外光透过率小,光能利用率低,染料降解速度慢.当溶胶pH为1-2,溶胶浓度0.2mol·L-1,染料初始浓度59mg· L-1时,未掺杂TiO2溶胶对酸性藏青GGR的降解率为64.5％,摩尔掺杂比1.0％的Ce4+/TiO2对染料的降解率达90.2％.掺杂使TiO2的光催化活性提高了25.7％.     

Effects of Al content on the properties of ZnO:Al films prepared by Al<Subscript>2</Subscript>O<Subscript>3</Subscript> and ZnO co-sputtering

Aluminum doped zinc oxide (AZO) films were deposited on quartz substrates by radio-frequency magnetron co-sputtering method with ZnO and Al₂O₃ ceramic targets. The structural, optical and electrical properties of these films as a function of the Al content were investigated. XRD results reveal that the AZO films are wurtzite structure with (002) preferred orientation. The average transmittance of all the films is higher than 80% in a wide wavelength range from 400 to 1,500 nm. The band gap energy, calculated from their optical absorption spectra, is in the range of 3.50–3.66 eV depending on the Al content. Doping of Al³⁺ in the ZnO makes the film surface roughness decrease. The dopant Al³⁺ acts as electron donor by which the electrical conductivity and carrier concentration of the films are obviously increased until the Al³⁺ reaches its saturation content of about 4.50 at.%.     

Room temperature deposition and properties of ZnO:Al thin films by nonreactive DC magnetron sputtering

Transparent and conductive ZnO:Al (AZO) thin films were prepared at room temperature by nonreactive DC magnetron sputtering from ceramic ZnO:Al targets. The effects of Al doping level and argon gas pressure on microstructure, growth behavior, resistivity and transmittance of AZO thin films were investigated. The experimental results show that AZO thin films change from polycrystalline to preferred c-axis-orientation just at high argon gas pressure. The resistivity of AZO films first decreases with the increase of Al content under 3 wt%, then increases when the Al content is over 3 wt%. The argon gas pressure also effect on the resistivity of AZO thin films due to the change of dispersion related the grain and crystal boundary. When the argon gas pressure from 0.6 to 3.0 Pa, the resistivity of AZO films decreases to a lowest resistivity of 1.4 × 10⁻³ Ω cm when the argon gas pressure is 1.5 Pa, then increases gently. The Al content and argon gas pressure had a little influence on transmittance, and the average optical transmittances of AZO thin films were from 86% to 90%, but the absorption edge has a blue shift with the increase of doping level and argon gas pressure.     

Hard amorphous Ti–Al–N coatings deposited by sputtering

Ti–Al–N coatings were deposited by direct current reactive magnetron sputtering using two titanium and two aluminum targets. Two series of films with Al/(Al + Ti) atomic ratios of ≈ 23.5 and ≈ 34.5% were studied. The amount of nitrogen in the films was varied from 0 to 44at.%. The incorporation of N atoms led to a change of the -Ti lattice preferential orientation from <100> to <001>, a decrease in the degree of crystallinity, and subsequently to the collapse of the crystalline structure. Annealing at 975K promotes the formation of the Ti₃Al compound. The hardness increases smoothly with the nitrogen content. The high hardness values (31 and 41GPa) measured for the films with the highest N contents may be explained by the deposition of a nanocomposite phase. For the Ti–Al–N film deposited with Al/(Al + Ti) atomic ratio of 34.5% the -Ti structure was completely transformed to TiO₂ upon oxidation. The high oxidation resistance of the film deposited with 44at.% N at 1075K is characteristic of Ti–Al–N films.     

Photolysis properties of merocyanine dye LB films by various time of UV irradiation

We fabricated the merocyanine dye LB films with arachidic acid (MD LB films). We compared absorption peak of before and after added Cd2+. The optical absorption peak of the MD LB films was shifted to 610 nm at 535 nm, when Cd2+ ions were added. We also investigated the optical absorption peak of the LB films by various time at 365 nm UV. We confirmed J-aggregation and photolysis properties. This is that studied the application possibility of the switching device and the nonvolatile memory.     

泡沫镍负载TiO2和TiO2/Al2O3薄膜的光催化性能研究

以泡沫镍为载体，Al2O3作为过渡中间层，用溶胶-凝胶法在泡沫镍上负载锐钛矿相的TiO2薄膜，制成泡沫金属基的TiO2和TiO2／Al2O3光催化剂，利用XRD和FE-SEM等测试手段对其性质进行表征，用乙醛气体的光催化降解测试其活性．研究表明：泡沫镍负载的TiO2和TiO2／Al2O3薄膜具有良好的光催化活性，特别是TiO2／Al2O3薄膜具有更高的催化活性．这是由于负载的Al2O3过渡中间层增大了载体的比表面积，具有吸附浓缩作用，同时也增加了负载光催化剂的活性位数量．实验表明：TiO2／Al2O3薄膜的光催化活性和稳定性较单一的TiO2薄膜有非常显著的提高．     

P(VDF-HFP)/Al2O3基聚合物电解质薄膜的研究

采用溶液浇注和电解液吸收的方法制得了P（VDF-HFP)/Al2O3基聚合物凝胶电解质薄膜，用这种方法得到的共混薄膜具有较高的电解液吸收率及良好的机械性能，电化学阻抗谱的结果表明，与纳米粒径Al2O3共混得到的薄膜和镍电极具有较低的界面电阻，另外，由于该结构的半结晶性，DSC测试并没有发现该共混薄膜的玻璃化转变温度Tg。将此电解质隔膜组装成半电池后表现出优良的充放电性能。     

Optical and electrical properties of merocyanine dye LB films by various time of UV irradiation and heat treatment

The Langmuir-Blodgett (LB) technique provides many possibilities for the control of film thickness, dimensions, and molecular structures on the nanometer scale. Various kinds of dye molecules have been found to form the J-aggregation which has been used as sensitizers of silver halide photography for long time. In recent years, they attract attention as model systems for investigating the ultra-fast exciton dynamics, materials for ultra-fast nonlinear optical devices, fluorescence probes for mitochondrial membranes. We fabricated the merocyanine dye LB films with arachidic acid (AA). In order to observe the J-aggregation of the merocyanine dye LB films, CdCl2 and KHCO3 solutions were added in subphase. From the optical absorption spectra of the mixed dye LB films (6Me-Ds:AA = 1:2) at different layers, the optical absorption peak was about 520 nm. However, the optical absorption peak of the LB films was shifted to 600 nm, when CdCl2 and KHCO3 solutions were added. This is the consequence result to the J-aggregation of the merocyanine dye. We also investigated the optical absorption peak of the LB films according to various time at 60 degrees C and 275 nm UV. We measured the STM morphology of the merocyanine dye LB film (1 layer) before UV irradiation and heat treatment. The morphology size of the LB film on HOPG was 5 nm. The roughness and molecular size were about 66.163 pm and 0.176 nm, respectively. The J-aggregation of this type was also accompanied by large morphological changes. We analyze the morphology and electrical properties of the LB films by the scanning tunneling microscopy (STM).     

Nonlinear optical investigations on Al doping ratio in ZnO thin film under pulsed Nd:YAG laser irradiation

In the present study, it has been reported on the effect of Al doping on linear and nonlinear optical properties of ZnO thin films synthesized by spray pyrolysis method. The structural properties of ZnO thin films with different Al doping levels (0–4 wt%) were analyzed using X-ray diffraction (XRD). The results obtained from XRD analysis indicated that the grain size decreased as the Al doping value increased. The UV–Vis diffused refraction spectroscopy was used for calculation of band gap. The optical band gap of Al-doped ZnO (AZO) thin films is increased from 3.26 to 3.31 eV with increasing the Al content from 0 to 4 wt%. The measurements of nonlinear optical properties of AZO thin films have been performed using a nanosecond Nd:YAG pulse laser at 532 nm by the Z-scan technique. The undoped ZnO thin film exhibits reverse saturation absorption (RSA) whereas the AZO thin films exhibit saturation absorption (SA) that shows RSA to SA process with adding Al to ZnO structure under laser irradiation. On the other hand, all the films showed a self-defocusing phenomenon because the photons of laser stay on below the absorption edge of the ZnO and AZO films. The third-order nonlinear optical susceptibility, χ⁽³⁾, of AZO thin films, was varied from of the order of 10^?5–10^?4 esu. The results suggest that AZO thin films may be promising candidates for nonlinear optical applications.     

Al_2O_3对稀土配合物掺杂有机改性凝胶玻璃结构及荧光性能的影响

以γ-缩水甘油氧基三甲氧基硅烷作为有机改性先驱体,采用原位合成技术,用溶胶-凝胶法制备稀土离子(Eu3+或Tb3+)、配位体β-二酮噻吩甲酰三氟丙酮或苯甲酸及协同体1,10-菲啰啉共掺的两种有机改性二氧化硅玻璃,测量它们的发射光谱和红外光谱,并进行X射线衍射分析和扫描电镜观察,探讨Al2O3的掺量对凝胶玻璃结构及性能的影响。结果表明:Al3+对稀土离子发射峰的位置没有明显的影响,并使凝胶在室温时的荧光减弱,但它能使稀土离子及原位合成的配合物在较高温度保持相对稳定,提高凝胶玻璃的热稳定性和荧光强度;在制备较实用的具有较强荧光的含稀土离子的凝胶玻璃时,要根据实际需要选取适宜掺量的Al2O3。     

钇铁石榴石薄膜材料的光吸收谱及Bi,Al掺入对谱的影响研究

采用单离子晶场跃迁模型，拟合出钇铁石榴石（ＹＩＧ）薄膜材料的光吸收谱，与实验谱吻合得较好。从实验和理论上分析了（ＢＩＡＩ）ＹＩＧ 薄膜材料的光吸收谱，结果表明，Ａｌ３＋离子的作用如同稀释剂一样，减小了光吸收，Ｂｉ３＋离子由于其强的自旋轨道耦合作用，增大了跃迁振子强度和跃迁线宽，从而增大了光吸收损耗，在此基础上所作的（ＢｉＡｌ）ＹＩＧ的理论谱与实验谱符合得较好。