共查询到19条相似文献,搜索用时 78 毫秒
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Comparative photoluminescence study on p-type and n-type ZnO films codoped by nitrogen and aluminium
We report on the temperature-dependent photoluminescence (PL) properties of n-type and p-type ZnO films codoped with N and Al. For the n-type film, the dominant emission at low temperature is exciton bound to neutral donors, while for the p-type film it is exciton bound to neutral acceptor at 3.33 eV. Four defect or impurity levels, including N acceptor, residual acceptor, and two doping-induced unknown deep acceptors, were identified. The energy level of the N acceptor was determined to be 0.23 eV. Excitation energy dependence of the PL was also investigated. It was found that at high excitation energy, the formation of exciton was suppressed by the formation of D+A−eh complexes. 相似文献
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Phosphorus-doped p-type ZnO thin films have been deposited by metalorganic chemical vapor deposition using P2O5 as the dopant source. The conductivity types of the as-grown thin films were strongly temperature-dependent. When the substrate temperature maintains at the optimal one of 420 °C, the evaporating temperature of the phosphorus source plays significant roles in controlling the phosphorus content doping into films, then influences the films' performance. Optimizing the growth parameters, the optimal results were obtained with a resistivity of 6.49 Ω cm, a Hall mobility of 0.40 cm2/V s and a hole concentration of 2.42 × 1018 cm− 3. The optical property of the optimal film was characterized by PL measurements, which indicated the film is of high optical quality. 相似文献
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Power and pressure effects upon magnetron sputtered aluminum doped ZnO films properties 总被引:2,自引:0,他引:2
In this work, polycrystalline aluminum doped zinc oxide (ZnO:Al) films with c-axis (002) orientation have been grown on glass and silicon substrates by RF (radio frequency) magnetron sputtering technique, at room temperature. A systematic study of the effect of sputtering deposition parameters (i.e. RF power and argon gas pressure) on the structural, optical and electrical properties of the films was carried out. We observed that, with increasing RF power the growth rate increased, while it decreased with increasing gas pressure. As mentioned above, the films were polycrystalline in nature with a strong preferred (002) orientation. The intrinsic compressive stress was found to decrease with both increasing RF power and gas pressure, and near stress-free film was obtained at 200 W RF power and 2 × 10− 1 Pa gas pressure. The obtained ZnO:Al films, not only have an average transmittance greater than 90% in the visible region, but also have an optical band gap between 3.33 and 3.47 eV depending on the sputtering parameters. Moreover, a low value of the electrical resistivity (~ 1.25 × 10− 3 Ω cm) was obtained for the film deposited at 200 W and 2 × 10− 3 mbar. 相似文献
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Thin films of undoped and lithium-doped Zinc oxide, (Zn1 − xLix)O; x = 0, 0.05, 0.10 and 0.20 were prepared by sol-gel method using spin-coating technique on silicon substrates [(111)Pt/Ti/SiO2/Si)]. The influence of lithium doping on the structural, electrical and microstructural characteristics have been investigated by means of X-ray diffraction, leakage current, piezoelectric measurements and scanning electron microscopy. The resistivity of the ZnO film is found to increase markedly with low levels (x ≤ 0.05) of lithium doping thereby enhancing their piezoelectric applications. The transverse piezoelectric coefficient, e31? has been determined for the thin films having the composition (Zn0.95Li0.05)O, to study their suitability for piezoelectric applications. 相似文献
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Effect of alumina doping on structural, electrical, and optical properties of sputtered ZnO thin films 总被引:1,自引:0,他引:1
A systematic study of the influence of alumina (Al2O3) doping on the optical, electrical, and structural characteristics of sputtered ZnO thin films is reported in this study. The ZnO thin films were prepared on 1737F Corning glass substrates by R.F. magnetron sputtering from a ZnO target mixed with Al2O3 of 0-4 wt.%. X-ray diffraction (XRD) analysis demonstrates that the ZnO thin films with Al2O3 of 0-4 wt.% have a highly (002) preferred orientation with only one intense diffraction peak with a full width at half maximum (FWHM) less than 0.5°. The electrical properties of the Al2O3-doped ZnO thin films appear to be strongly dependent on the Al2O3 concentration. The resistivity of the films decreases from 74 Ω·cm to 2.2 × 10− 3 Ω·cm as the Al2O3 content increases from 0 to 4 wt.%. The optical transmittance of the Al2O3-doped ZnO thin films is studied as a function of wavelength in the range 200-800 nm. It exhibits high transparency in the visible-NIR wavelength region with some interference fringes and sharp ultraviolet absorption edges. The optical bandgap of the Al2O3-doped ZnO thin films show a short-wavelength shift with increasing of Al2O3 content. 相似文献
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Halina Czternastek 《Vacuum》2008,82(10):994-997
Al-doped ZnO films were prepared by the dc magnetron sputtering technique on Suprasil-1 substrates at a temperature of 470 K. Plasma-emission monitoring was used to stabilize oxygen flow to the deposition chamber. The effect of substrate position during deposition on the structural, electrical and optical properties of the films was investigated. It was found that preparation of low-resistance films with high optical transmission over the visible region is possible under condition of low plasma effects on the growing film. 相似文献
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P. GondoniM. Ghidelli F. Di FonzoV. Russo P. BrunoJ. Martí-Rujas C.E. Bottani A. Li Bassi C.S. Casari 《Thin solid films》2012,520(14):4707-4711
Current research on transparent conductive oxides (TCOs) is focusing on indium-free TCOs, such as Al-doped ZnO (AZO), as an alternative to indium-tin oxide. In this work, AZO thin films were grown by Pulsed Laser Deposition at room temperature in oxygen atmosphere. The O2 pressure was varied from 0.01 Pa to 10 Pa, highlighting the effects of defect formation and oxygen vacancies on the film properties. Structural properties were characterized by X-ray diffraction and Scanning Electron Microscopy, while functional properties were characterized by measurement of electrical conductivity, Hall mobility, carrier density and optical transmission. At an optimal deposition pressure of 2 Pa, optical transparency in the visible range and minimum resistivity (4.5 ? 10− 4 Ω cm) were found, comparable to state-of-the-art TCOs. Mean value of visible transparency was shown to increase with increasing pressure, up to 88% at a deposition pressure of 10 Pa. 相似文献
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The synthesis, characterization and photoresponse studies of undoped and transition metal doped zinc oxide thin films are carried out in this work, in prospect of visible light photo detection and sensor applications. The undoped and transition metal ions such as, Co, Ni and Mn doped ZnO films in this study were synthesized by chemical solution deposition, involving spin-coating. We have characterized the deposited films using X-ray diffraction, scanning electron microscopy, photoluminescence and UV–vis spectroscopy studies. The devices of the films for photoresponse study were fabricated by top Ag contacts on the film surface in metal–semiconductor–metal configuration. The current–voltage characteristics and switching measurements of these devices were studied under the illumination of an incandescent lamp. We found a high ON/OFF ratio of 8 and highest photocurrent density of 0.7 mA/cm2 for Ni doped ZnO film. 相似文献