High-power ridge waveguide InGaAsN lasers fabricated with pulsed anodic oxidation

High-power InGaAsN triple-quantum-well strain-compensated lasers grown by metal-organic chemical vapor deposition were fabricated with pulsed anodic oxidation. A maximum light power output of 145 mW was obtained from a 4-/spl mu/m ridge waveguide uncoated laser diode in continuous-wave (CW) mode at room temperature. The devices operated in CW mode up to 130/spl deg/C with a characteristic temperature of 138 K in range of 20/spl deg/C-90/spl deg/C.     

InGaAs-GaAs 980-nm stripe-geometry and circular ring ridge waveguide lasers fabricated with pulsed anodic oxidation

In/sub 0.22/Ga/sub 0.78/As-GaAs quantum-well stripe-geometry and circular ring lasers have been fabricated with pulsed anodic oxidation (PAO). The relationship between ridge heights and laser performance was first studied in the fabrication of stripe lasers. The lowest transparency current density (J/sub tr/) of 61.20 A/cm/sup 2/ was obtained from the stripe laser with a ridge height of 1.23 /spl mu/m, corresponding to an etching depth where all the p-doped layers above active region were removed. With the PAO process, when the ridge height (1.77 /spl mu/m) extended below the active region, J/sub tr/ is 76.03 A/cm/sup 2/, only increased by 24.2%. Based on the experimental results, the circular ring laser, which needs deep etching (below active region) and subsequent PAO, has been fabricated. The fabricated circular ring laser worked under continuous-wave operation at room temperature. Longitudinal mode spacing analysis clearly indicates that the ring resonator is a functional part of the whole circular ring laser.     

Low-divergence single-mode ridge waveguide diode lasers

Ridge waveguide laser diodes of a GaAs-AlGaAs separate-confinement graded-index monolithically stacked triple-quantum-well structure have been fabricated. Chemically assisted ion beam etching (CAIBE) was used to etch a 4- mu m-wide mesa which serves as the waveguide for the device. Results for 4- mu m-wide by 600- mu m-long optically coated devices are presented. Single-longitudinal mode, CW output power in excess of 90 mW and a far-field divergence of 21 degrees *3.5 degrees are demonstrated.<>     

Airbridged high-speed AlGaAs-GaAs ridge waveguide lasers

The design of a high modulation response multiple-quantum-well ridge waveguide laser in AlGaAs-GaAs, with low parasitics is discussed. The device was fabricated on a semi-insulating substrate with a wide top contact, and airbridges have been used to connect the ridge top contact to the bonding pads on the semi-insulating substrate. The 3-dB frequency response of the laser has been measured to be 21 GHz, which is a record for unstrained quantum-well AlGaAs-GaAs lasers.     

High-efficiency native-oxide-passivated high-index-contrast ridge waveguide lasers

A GaAs-based high-index-contrast ridge waveguide laser is fabricated using a self-aligned process of deep dry etching plus oxygen-enhanced wet thermal oxidation of low Al-content AlGaAs. Lasers operating at /spl lambda/=813 nm (CW, 300 K) with external differential quantum efficiencies as high as 78% are demonstrated, indicating effective passivation of the directly-oxidised etched active region sidewall surface.     

High-power (200 mW) singlemode operation of InGaAsN/GaAs ridge waveguide lasers with wavelength around 1.3 /spl mu/m

High-power narrow ridge waveguide lasers emitting with a wavelength around 1.3 /spl mu/m were realised with a single In/sub 0.36/GaAsN/sub 0.022/ quantum well with GaAs barriers. A narrow vertical far-field angle of 35/spl deg/ was obtained. Single lateral mode continuous-wave operation with slope efficiency of 0.57 W/A, series resistance of 2.6 /spl Omega/, and kink-free output power of 210 mW was achieved.     

High power 980 nm ridge waveguide lasers with etch-stop layer

For the first time, the use of an etch-stop layer to precisely control the mesa height in ridge waveguide InGaAs/GaAs lasers is reported. These 980 nm devices emit up to 180 mW of total power in the fundamental spatial mode and lase in a single frequency with sidemode suppression ratios of greater than 25 dB.<>     

Design and fabrication of ridge waveguide folded-cavity in-planesurface-emitting lasers

A 45° angled reactive ion etching combined with an in situ monitoring technique was used to fabricate ridge waveguide folded-cavity in-plane surface-emitting lasers. This laser structure, with two 45°C angle-etched internal total-reflection mirrors and an epitaxially grown distributed Bragg reflector, is very promising for OEIC applications. Laser-structure design and laser fabrication are addressed. A continuous-wave threshold current of 8 mA, the lowest reported in the literature, was achieved on 3-μm-wide, 350-μm long devices     

High-performance 980-nm ridge waveguide lasers with a nearly circular beam

We report high-performance 980-nm ridge waveguide quantum-well lasers with extremely low vertical beam divergence of 13/spl deg/. A very small aspect ratio of 1.6 is obtained at high operating power of 900 mW. In addition to the more circular beam, low threshold, high efficiency, high characteristic temperature, and high output power of over 1.18 W are achieved. The fiber coupled output power can be as high as 680 mW with fiber Bragg grating stabilization. Excellent wavelength and power stability are also demonstrated.     

Stress-induced effects by the anodic oxide in ridge waveguide laserdiodes

This paper studies, both theoretically and experimentally, stress-induced effects on the lateral far-field behavior for ridge-type semiconductor laser diodes where anodic oxide is used for the definition of the stripe width. These effects consist of antiguiding under the stripe region, and of two positive waveguiding features near the stripe edges. For low-threshold devices, these effects may be more important than thermal effects, depending on the stress in the oxide. They put a lower limit on the built-in index guiding to be introduced by lateral etch outside the ridge region in order to maintain fundamental mode operation for wider stripes. The magnitude of these effects may be as large as Δn_ef=1×10^-3. An analytical mathematical model is deduced for computing stresses and strains for a certain ridge-shaped interface which bounds the elastic medium     

Fabrication of low-threshold InGaAs/GaAs ridge waveguide lasers by using in situ monitored reactive ion etching

In situ laser-monitored reactive ion etching is used to control ridge formation with 150-AA accuracy in fabricating double heterostructure InGaAs-GaAs strained layer single-quantum-well ridge waveguide lasers grown by molecular-beam epitaxy. Continuous-wave threshold current as low as 3.6 mA was obtained on devices with cleaved mirrors. High-reflectivity (96-70%) coated devices have the lowest threshold current at 2.1 mA.<>     

Dual-wavelength InGaAs-GaAs ridge waveguide distributed Bragg reflector lasers with tunable mode separation

The design and operation of integrated dual-wavelength sources are reported. These InGaAs-GaAs ridge waveguide (RW) distributed Bragg reflector (DBR) lasers consist of a common gain section and two, separate DBR sections. Multiple current injection is not necessary for these lasers to operate in dual-wavelength. Dual-wavelength operation is easily achieved by simply biasing the gain section. A relatively low coupling coefficient /spl kappa/ in the front grating reduces the added cavity loss for the back grating mode. Therefore, the back grating mode reaches threshold easily. Also, the addition of a spacing section lowers the current induced thermal interaction between the two uniform grating sections, significantly reducing the inadvertent wavelength drift. As a result, biasing the front DBR section results in tunable mode pair separations (/spl Delta//spl lambda/) as small as 0.3 nm and as large as 6.9 nm.     

低阈值电流、高量子效率脊形波导激光器

研制了低阈值电流、高量子效率670nm压缩应变单量子阱GaInP/AIGalnP脊形波导激光器。测量解理成的激光器条,腔长为300μm时,阈值电流为12．8mA,双面外部量子效率之和达到94．6％。     

Low-threshold InGaAsP ridge waveguide lasers at 1.3 µm

The ridge waveguide configuration is shown to provide reliable low-threshold fundamental-transverse-mode lasers that are readily fabricated. Two variants are described: in the simple ridge laser, the 1.3 μm bandgap active layer is sandwiched between InP layers and in the cladded ridge, the active layer is surrounded by 1.1 μm bandgap InGa AsP. Thresholds as low as 34 mA and efficiencies as high as 66 percent are observed. Output power is linear to more than 12 mW. Several lasers have been operated at 30°C for over 1500 h without measurable degradation. Selected lasers exhibit stabilized longitudinal mode behavior over extended temperature and current ranges. The potential manufacturability of this device is its most attractive feature.     

High-power operation in 0.98-μm strained-layer InGaAs-GaAssingle-quantum-well ridge waveguide lasers

High power strained-layer InGaAs-GaAs graded-index separate confinement heterostructure (GRIN-SCH) single-quantum-well (SQW) lasers at an emission wavelength of 0.98 μm have been fabricated. A light power as high as 270 mW and a maximum front power conversion efficiency of 51.5% have been obtained for the antireflective and highly-reflective coated laser with 9-μm-wide ridge and 600-μm-long cavity     

Very narrow linewidth asymmetric cladding InGaAs-GaAs ridge waveguide distributed Bragg reflector lasers

Asymmetric cladding InGaAs-GaAs ridge waveguide distributed Bragg reflector (RW-DBR) lasers are demonstrated with a spectral linewidth as low as 39 kHz for an output power of 24 mW. The fabrication requires only a single standard epitaxial growth of a laser structure while the use of a thin top cladding layer allows for a shallow reactive ion etch of the distributed Bragg reflector. These RW-DBR lasers have a threshold current of 12.4 mA, a slope of 0.3 W/A, and over 40 dB side-mode suppression at a wavelength of 1010 nm.     

铝阳极氧化技术制作三维铝封装基板

采用铝阳极氧化技术,制作了含有阵列型铝通柱的10.16 cm(4英寸)直径封装基板。由金相显微镜观察:基板的厚度在300μm左右,铝通柱的表面直径约158μm,内部最大直径约473μm。分析结果表明:图形掩膜边缘存在侧向阳极氧化效应,因而造成铝通柱实际为纺锤体结构。由半导体网络分析仪测得铝通柱和铝栅格地之间的绝缘电阻达到1011Ω;通过矢量网络分析仪反推出基板介质在1 MHz下的相对介电常数为5.97。这种三维铝封装基板制作工艺简单、成本低廉,可用于系统级封装领域。     

Temperature sensitivity of 1300-nm InGaAsN quantum-well lasers

The temperature sensitivity of metal-organic chemical vapor deposition (MOCVD)-grown highly strained (/spl Delta//spl alpha///spl alpha//spl sim/2.7%) In/sub 0.4/Ga/sub 0.6/Asand In/sub 0.4/Ga/sub 0.6/As/sub 0.995/N/sub 0.005/ quantum-well (QW) active lasers, with lasing wavelength of 1.185 and 1.295 /spl mu/m, respectively, is analyzed in terms of measured fundamental device parameters. From our analysis, the lower To values for the InGaAsN QW lasers can be explained in terms of the temperature dependence of the current injection efficiency, presumably due to increased carrier leakage in the InGaAsN QW lasers.     

InGaAsP ridge waveguide distributed feedback lasers operating near 1.55 µm

Fabrication and performance of ridge waveguide distributed feedback lasers grown by liquid phase epitaxy for operation in the 1.50-1.58 μm spectral region have been studied. These lasers incorporate first- and second-order diffraction gratings written by the electron beam lithography and optical holography and defined by wet chemical etching and novel ion-beam-milling techniques. Ridge waveguides were formed by post-regrowth processing and heteroepitaxial ridge overgrowth. Distributed feedback ridge lasers were characterized by room temperature CW threshold currents as low as 40 mA, two facet external quantum efficiencies of up to 40 percent and stable transverse mode operation up to the output power of 10 mW. In strongly coupled devices, even with a cleaved resonator, the Bragg mode intensity exceeds that of the residual Fabry-Perot modes by a factor of 4000:1. Stable, single longitudinal mode operation was obtained under modulation rates as high as 4 GHz and error free transmission experiments over 60-km lengths of single mode fiber reproducibly performed at data rates as high as 2 Gbit/s.     

AlInGaAs/AlGaAs strained quantum-well ridge waveguide lasers grownby metalorganic chemical vapor deposition

AlInGaAs/AlGaAs strained quantum-well ridge waveguide diode lasers with an emission wavelength of 890 nm are presented. These devices exhibit both single spatial and longitudinal mode operation up to 30 mW of optical output power. A CW threshold current of 13 mA was obtained for a 5-μm-wide ridge waveguide having a cavity length of 500 μm. The differential quantum efficiency was 52%. The lateral and perpendicular far-field radiation patterns (FWHM) from the laser were 6° and 51°, respectively. Reliability testing on uncoated gain-guided lasers made from the same wafer showed no sudden death failures and degradation rates as low as 4.6%/kh