Hot filament chemical vapour deposition and wear resistance of diamond films on WC-Co substrates coated using PVD-arc deposition technique

Different Cr- and Ti-base films were deposited using PVD-arc deposition onto WC-Co substrates, and multilayered coatings were obtained from the superimposition of diamond coatings, deposited on the PVD interlayer using hot filament chemical vapour deposition (HFCVD). The behaviour of PVD-arc deposited CrN and CrC interlayers between diamond and WC-Co substrates was studied and compared to TiN, TiC, and Ti(C,N) interlayers. Tribological tests with alternative sliding motion were carried out to check the multilayer (PVD + diamond) film adhesion on WC-Co substrate. Multilayer films obtained using PVD arc, characterised by large surface droplets, demonstrated good wear resistance, while diamond deposited on smooth PVD TiN films was not adherent. Multilayered Ti(C,N) + diamond film samples generally showed poor wear resistance.Diamond adhesion on Cr-based PVD coatings deposited on WC-Co substrate was good. In particular, CrN interlayers improved diamond film properties and 6 μm-thick diamond films deposited on CrN showed excellent wear behaviour characterised by the absence of measurable wear volume after sling tests. Good diamond adhesion on Cr-based PVD films has been attributed to chromium carbide formation on PVD film surfaces during the CVD process.     

生物医用氮化碳薄膜的力学性能比较研究

使用磁控溅射法在生物医用NiTi合金基体表面制备了Ti／TiN、Ti／DLC以及Ti／CNx梯度薄膜,利用扫描电镜研究了薄膜的截面形貌,并使用划痕仪及摩擦磨损仪研究比较了薄膜的力学性能。结果表明：薄膜均表面平整,与基底结合紧密。Ti／CNx薄膜与NiTi合金基底的结合力大于Ti／DLC薄膜,略低于Ti／TiN薄膜。3种梯度薄膜均能有效改善NiTi合金的耐磨损性能,其中,Ti／CNx薄膜拥有最低的摩擦系数和最完整的磨损表面,耐磨性最好。     

Nanotribological study of PECVD DLC and reactively sputtered Ti containing carbon films

Amorphous carbon film, also known as DLC film, is a promising material for tribological application. It is noted that properties relevant to tribological application change significantly depending on the method of preparation of these films. These properties are also altered by the compositions of these films. DLC films are well known for their self-lubricating properties, as well. In view of this, the objective of the present work is to compare the tribological properties of diamond like carbon (DLC) film obtained by plasma enhanced chemical vapour deposition (PECVD) with the Ti containing nanocrystalline carbon (Ti/a-C:H) film obtained by unbalanced magnetron sputter deposition (UMSD) in nN load range. Towards that purpose, DLC and Ti/a-C:H films are deposited on silicon substrate by PECVD and UMSD processes respectively. The microstructural features and the mechanical properties of these films are determined by scanning electron microscope (SEM), transmission electron microscope (TEM) and nano indenter. The surface topographies and the friction force surfaces of these films are evaluated by means of an atomic force microscope (AFM). The results show that although PECVD DLC film has higher elastic modulus and higher hardness than UMSD Ti/a-C:H film, the surface roughness and the friction coefficient of PECVD film is significantly higher than that of UMSD Ti/a-C:H film.     

Relationship between interlayer hardness and adhesion and pin-on-disc behaviour for fast atom beam source diamond-like-carbon films

The effect of interlayers of Ti, and Ti(C,N) on the adhesion, hardness and friction coefficient of DLC films deposited using a Fast Atom Beam (FAB) source has been studied. Values obtained for DLC films on top of interlayers were compared with those of DLC films directly deposited on Co-Cr substrates by both the FAB source and RF CVD techniques. The scratch test adhesion of such coatings can be classified in the following ascending order: DLC/Ti, DLC/no interlayer, DLC/Ti(C,N). The surface composite hardness is greatly improved by a Ti(C,N) interlayer. However, DLC films deposited on Ti(C,N) failed during the pin-of-disc test whilst those on Ti and without an interlayer exhibited low friction coefficients and excellent wear performance. An explanation is developed in order to explain the causes of film failure during the pin-on-disc test. For a given interlayer hardness, an adhesion threshold is required to survive the pin-on-disc test. The higher the hardness, the greater the required adhesion threshold, as interfacial shear stresses induced by the pin-on-disc are greater for hard surfaces, due to the smaller contact area.     

Improvement in adhesion of diamond films on cemented WC substrate with Ti–Si interlayers

Diamond films were deposited on the cemented WC+(3–5)% Co substrates by a microwave plasma chemical vapor deposition system. The substrates were pretreated with various processing steps before diamond deposition, including: polishing, etching for Co removal, Ti coating by DC sputter, and amorphous Si coating by E-gun. The residual stress of the films was determined by both Raman shift and low incident beam angle X-ray diffraction (LIBAD) methods. The adhesion of the films was evaluated by indentation adhesion testing. The film morphology and film–substrate interface structure were examined by SEM and Auger electron spectroscopy, respectively. The results show that Ti–Si can be a good interlayer to improve film adhesion and inhibit diffusion of Co to the substrate surface on diamond nucleation. This is due to the formation of strong TiC and SiC bonding to enhance film adhesion; Si acts as a promoter for diamond nucleation, and the residual stress with application of interlayer is much lower than that interlayer-free. The results also show the existence of an optimum Ti thickness for the best film adhesion.     

Dependence of the diamond coating adhesion on the microstructure of SiC-based substrates

Diamond thin films were deposited on the SiC–30TiC–10Cr₃C₂ substrates by using the microwave plasma CVD method and the effect of microstructural morphology of substrate was examined on the diamond–substrate adhesion strength. Two types of substrate were prepared by hot-pressing, one with small and equiaxed β-SiC grains and the other with large and elongated α-SiC grains. The SiC–30TiC–10Cr₃C₂ substrate surfaces were chemically etched to remove (Ti,Cr)C matrix phase by Murakami solution. Better diamond–substrate bonding was obtained on the substrate composed of large, elongated grains. Vickers indentation results indicated that mechanical interlocking between elongated and protruded grains on the etched surface and diamond thin film resulted in an increase in adhesion strength.     

Microstructure and mechanical properties of Mo/DLC nanocomposite films

Mo-doped diamond-like carbon (Mo/DLC) films were deposited on stainless steel and Si wafer substrates via unbalanced magnetron sputtering of molybdenum combined with inductively coupled radio frequency (RF) plasma chemical vapor deposition of CH₄/Ar. The effects of Mo doping and sputtering current on the microstructure and mechanical properties of the as-deposited films were investigated by means of X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), transmission electron microscopy (TEM), Raman spectroscopy, atomic force microscopy (AFM), and nano-indentation. It was found that Mo doping led to increase in the content of sp² carbon, and hence decreased the hardness and elastic modulus of Mo/DLC films as compared with that of DLC films. The content of Mo in the films increased with the increasing sputtering current, and most of Mo reacted with C atoms to form MoC nanocrystallites at a higher sputtering current. Moreover, the Mo-doped DLC films had greatly decreased internal stress and increased adhesion to the substrate than the DLC film, which could be closely related to the unique nanocomposite structure of the Mo-doped films. Namely, the Mo/DLC film was composed of MoC nanoparticles embedded in the cross-linked amorphous carbon matrix, and such a kind of nanostructure was beneficial to retaining the loss of hardness and elastic modulus.     

Structure and topographies of diamond-like carbon films produced on tungsten pre-implanted stainless steel substrate by plasma immersion ion implantation and deposition

DLC films were deposited by plasma immersion ion implantation and deposition (PIII-D) on steel substrates using different pretreatment procedures. Our results show that DLC films with good quality can be produced on the W pre-implanted steel substrates but it is not so on the untreated substrate or on the steel substrate with a W buffer layer. Moreover, altering the pre-implantation parameters gives rise to different distributions and amounts of W that influence the film growth at the latter stage. The final surface morphologies and structures of the deposited DLC films are also strongly affected by the pretreatment parameters.     

Mechanical and tribological properties of diamond-like carbon films prepared on steel by ECR-CVD process

Diamond-like carbon (DLC) films were prepared on AISI 440C steel substrates at room temperature by the electron cyclotron resonance chemical vapor deposition (ECR-CVD) process in C₂H₂/Ar plasma under different conditions. In order to prevent the inter-diffusion of carbon and improve the adhesion strength of DLC films, functionally gradient Ti/TiN/TiCN/TiC supporting underlayers were deposited on the steel substrates in advance. Using the designed interfacial transition layers, relatively thick DLC films (1–2 μm) were successfully prepared on the steel substrates without delamination. By optimizing the deposition parameters, DLC films with hardness up to 28 GPa and friction coefficients lower than 0.15 against the 100Cr6 steel ball were obtained. In addition, the specific wear rates of the films were found to be extremely low (∼10⁻¹⁷ m³/Nm). The friction-induced graphitization mechanism of DLC was confirmed by micro-Raman analysis.     

Electrochemical characteristics of lithium metal anodes with diamond like carbon film coating layer

To overcome the poor electrochemical characteristics of lithium metal anodes due to the dendrite formations, diamond like carbon (DLC) films were deposited onto the surface of lithium metal by radio frequency-plasma enhanced chemical vapor deposition (CVD) technique using acetylene gas as carbon precursor. The substrate temperature was selected as the main experimental parameter to control the bonding characteristic (sp²/sp³ ratio) of the films. The presence of diamond like structures was confirmed by Raman and Fourier transform infra red spectroscopy. The DLC coated lithium metal was then characterized as an anode material for lithium secondary batteries. The results showed that the DLC coated lithium metal anodes exhibited better electrochemical characteristics in terms of higher specific capacity and smaller interfacial impedance. These improved characteristics were attributed to the presence of DLC film coating which might suppress the dendrite's formation by protecting the lithium metal surface from the direct contact with the electrolyte.     

Multilayered graphene films prepared at moderate temperatures using energetic physical vapour deposition

Carbon films were energetically deposited onto copper and nickel foil using a filtered cathodic vacuum arc deposition system. Raman spectroscopy, scanning electron microscopy, transmission electron microscopy and UV–visible spectroscopy showed that graphene films of uniform thickness with up to 10 layers can be deposited onto copper foil at moderate temperatures of 750 °C. The resulting films, which can be prepared at high deposition rates, were comparable to graphene films grown at 1050 °C using chemical vapour deposition (CVD). This difference in growth temperature is attributed to dynamic annealing which occurs as the film grows from the energetic carbon flux. In the case of nickel substrates, it was found that graphene films can also be prepared at moderate substrate temperatures. However much higher carbon doses were required, indicating that the growth mode differs between substrates as observed in CVD grown graphene. The films deposited onto nickel were also highly non uniform in thickness, indicating that the grain structure of the nickel substrate influenced the growth of graphene layers.     

X-ray reflectivity analysis on initial stage of diamond-like carbon film deposition on Si substrate by RF plasma CVD and on removal of the sub-surface layer by oxygen plasma etching

The multi-layered structure of thin diamond-like carbon (DLC) films was investigated by X-ray reflectivity (XRR) analysis. Thin DLC films were deposited on Si substrate by RF plasma chemical vapor deposition (CVD) from acetylene source gas with short duration of plasma operation from 0.08 to 4.99 s. It was confirmed from XRR analysis that the thin DLC film on Si substrate had 3 layers consisting of a subsurface layer on the grown surface, a mixing layer at the interface to Si substrate, and a bulk-DLC layer sandwiched between the 2 layers. The 3 layers had been formed in 0.08 s at beginning of deposition with distinctive bulk-DLC layer of 1.7 nm thick already appeared due to extremely higher deposition rate only at the initial stage of CVD. The thickness of bulk-DLC layer increased with increasing CVD duration while both the mixing layer of higher density and the sub-surface layer of extremely low density continuously existed. By oxygen plasma etching, it was confirmed by XRR analysis that the sub-surface layer was clearly removed and another layer of lower density than the bulk DLC appeared.     

Structural effects of nanocomposite films of amorphous carbon and metal deposited by pulsed-DC reactive magnetron sputtering

The relationship between metal-induced (W, Mo, Nb and Ti) structures and the surface properties of Me–DLC thin films is discussed. Nanocomposite films were deposited on c–Si wafers by pulsed-DC reactive magnetron sputtering controlling the gas ratio CH₄/Ar. The sputtering process of metals such as Ti, Nb and Mo (unlike the tungsten) in the presence of methane shows a low reactivity at low methane concentration. The deposition rate and the spatial distribution of sputtered material depend of Z-ratio of each metal. The surface contamination of metal targets by carbon, owing to methane dilution, limits the incorporation of metals into DLC films according to an exponential decay. Results of electron probe microanalysis and X-ray photoelectron spectroscopy indicate a C rich Me/C composition ratio for low relative methane flows. According to the depth profile by secondary ion mass spectrometry, the films are systematically homogeneous in depth, whereas at high carbon contents they exhibit a metal-rich interfacial layer on the substrate. Moreover, high resolution transmission electron microscopy has evidenced important structural modifications with respect to DLC standard films, with marked differences for each Me/C combination, providing nanodendritic, nanocrystallized or multilayered structures. These particular nanostructures favour the stress decrease and induce significant changes in the tribological characteristics of the films. This study shows the possibilities of controlling the amorphous carbon films structure and surface properties by introducing metal in the DLC matrix.     

A DLC/W-DLC multilayered structure for strain sensing applications

The strain dependence in tungsten-containing diamond-like carbon (W-DLC) film was investigated. The W-DLC film was deposited onto Si substrate by plasma enhanced chemical vapor deposition and DC magnetron co-sputtering of tungsten metal target. The strain dependence of resistance was measured by four-point bending test under well controlled temperature condition. The observed dependence was linear one and calculated gauge factor is 6.1. The high value of the gauge factor is originated from the piezoresistive effect. In addition, double layered structure of DLC/W-DLC film was fabricated. The double layerness and interface structure were investigated by transmission electron microscope. No clear boundary between DLC and W-DLC was observed. This was because of the continuous carbon matrix from the bottom layer of W-DLC to top DLC layer.     

Lubrication performance of diamond-like carbon and fluorinated diamond-like carbon coatings for intravascular guidewires

Diamond-like carbon (DLC) and fluorinated DLC (F-DLC) films were deposited on SUS316L guidewires using radio frequency (RF) plasma enhanced chemical vapor deposition (CVD), and the lubrication performance of DLC- or F-DLC-coated guidewires was then evaluated under in vitro conditions using a novel friction simulator developed for this study. Scanning electron microscopy (SEM) demonstrated that DLC or F-DLC film completely coated the specimens (SUS316L guidewires) and that polishing scars were substantially reduced. In the torturous vessel model, DLC- or F-DLC-coated guidewires exhibited significantly improved lubrication performance (by approximately 30% over that of uncoated wires). DLC and F-DLC films are thus promising candidates for lubricious coating of intravascular guidewires.     

Preparation of diamond like carbon thin films above room temperature and their properties

Diamond like carbon (DLC) thin films were deposited on p-type silicon (p-Si), quartz and ITO substrates by microwave (MW) surface-wave plasma (SWP) chemical vapor deposition (CVD) at different substrate temperatures (RT ∼ 300 °C). Argon (Ar: 200 sccm) was used as carrier gas while acetylene (C₂H₂: 20 sccm) and nitrogen (N: 5 sccm) were used as plasma source. Analytical methods such as X-ray photoelectron spectroscopy (XPS), FT-IR and UV–visible spectroscopy were employed to investigate the structural and optical properties of the DLC thin films respectively. FT-IR spectra show the structural modification of the DLC thin films with substrate temperatures showing the distinct peak around 3350 cm^− 1 wave number; which may corresponds to the sp² C–H bond. Tauc optical gap and film thickness both decreased with increasing substrate temperature. The peaks of XPS core level C 1 s spectra of the DLC thin films shifted towards lower binding energy with substrate temperature. We also got the small photoconductivity action of the film deposited at 300 °C on ITO substrate.     

Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique — filtered arc deposition (FAD). Their electron field emission characteristics and fluorescent displays of the films are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 μA is detected at electric field E_DLC/Si=5.6 V/μm, E_DLC/Au/Si=14.3 V/μm, and E_DLC/Ti/Si=5.2 V/μm, respectively. At 14.3 V/μm, an emission current density J_DLC/Si=15.2 μA/cm², J_DLC/Au/Si=0.4 μA/cm², and J_DLC/Ti/Si=175 μA/cm² is achieved, respectively. It is believed that a thin TiC transition layer exists in the interface between the DLC film and Ti/Si substrate.     

Influence of argon gas pressure and target power on magnetron plasma parameters

The use of thin film sensors for measuring pressure and temperature distribution in tribological contacts was limited to hydrodynamic and elasto-hydrodynic contacts. Under mixed lubrication conditions the sensors regularly failed in the past. Therefore a new sensor generation is to be developed, which withstands the conditions of boundary friction within certain limits. These are based on electrically isolating DLC thin films (diamond-like carbon) as protecting and insulating coatings, between which the sensors are embedded. DLC thin films were deposited by r.f. magnetron sputtering of a graphite target (75 mm in diameter) in a pure argon discharge at low substrate temperatures (60–150 °C). For optimization of film constitution and properties, the target power was changed in the range of 50 W and 500 W and the argon gas pressure between 0.4 Pa and 0.7 Pa. The film characteristics were studied and related to plasma parameters and particle fluxes onto substrate and target during deposition, including ion saturation current density, electron saturation current density, plasma density, electron temperature und plasma potential. These plasma parameters were systematically analyzed in dependence of target power and gas pressure by using electrical double probes.     

A superhard diamond-like carbon film

A superhard hydrogen-free amorphous diamond-like carbon (DLC) film was deposited by pulsed arc discharge using a carbon source accelerator in a vacuum of 2×10⁻⁴ Pa. The growth rate was about 15 nm/min and the optimum ion-plasma energy was about 70 eV. The impact of doping elements (Cu, Zr, Ti, Al, F(Cl), N) on the characteristics of DLC films deposited on metal and silicon substrates was studied aiming at the choice of the optimum coating for low friction couples. The microhardness of thick (≥20 μm) DLC films was studied by Knoop and Vickers indentations, medium thick DLC films (1–3 μm) were investigated using a ‘Fischerscope’, and Young's module of thin films (20–70 nm) was studied by laser induced surface acoustic waves. The bonds in DLC films were investigated by electron energy loss spectroscopy (EELS), X-ray excited Auger electron spectroscopy (XAES), and X-ray photoelectron spectroscopy (XPS). The adhesion of DLC films was defined by the scratch test and Rockwell indentation. The coefficient of friction of the Patinor DLC film was measured by a rubbing cylinders test and by a pin-on-disk test in laboratory air at about 20% humidity and room temperature. The microhardness of the Patinor DLC film was up to 100 GPa and the density of the film was 3.43–3.65 g/cm³. The specific wear rate of the Patinor DLC film is comparable to that of other carbon films.     

The effect of annealing on mechanical and tribological properties of diamond-like carbon multilayer films

The diamond-like carbon (DLC) multilayer films have been deposited by plasma CVD deposition onSi wafer substrate. The deposited films have then been post-annealed in vacuum at 250 °C for 2 h. Changes in internal stress, hardness, critical load, friction coefficient and wear have been investigated toassess the influence of annealing on mechanical and tribological properties of DLC multilayer films. At the same time, DLC single layerfilms are also deposited and annealed in the same method for a comparison.The results show that there is 28–33% decrease in internal stress and 10–13% decrease in hardness of theDLC single layer films after the anneal treatment. However, for the DLC multilayer films, there is 41–43% decreasein internal stress and less than 2% decrease in hardness. In addition, the annealed DLC multilayer filmhas the same friction and wear properties as that un-annealed film. This result indicates that the anneal treatment isan effective method for the DLC multilayer films to reduce the internal stress and to increase the critical load.The by-effect of the annealing, decrease of hardness and wear resistance of the multilayer film, can be restrictedby the multilayer structure.