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脉冲激光沉积(PLD)薄膜技术的研究现状与展望 总被引:2,自引:0,他引:2
综述了脉冲激光沉积 (PLD)薄膜技术的研究现状 ,并按照研究方向将整个研究领域分为三个部分 :PLD法沉积薄膜的机理 ,PLD的工艺研究以及PLD法沉积的主要薄膜材料 ,分别进行了阐述 ,对相关的研究工作提出了建议 ,并对PLD技术的应用前景做了展望 相似文献
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Ashok Kumar 《Materials and Manufacturing Processes》1999,14(3):397-411
Nitrides coatings have a large number of applications in high-technology industries due to many unique physical, chemical, and mechanical properties. Thin films of aluminum nitride (AIN), silicon nitride (Si3N4), and carbon nitride (CNx) were deposited on Si (100) substrates using the pulsed laser deposition (PLD) method. The seeding of titanium nitride (TiN) before the CNx deposition has promoted the growth of the predominantly crystalline CNx films. The laser deposition parameters and substrate temperature play an important role in fabricating high quality films. The structural and microstructural properties of these films have been characterized using x-ray diffraction, and scanning electron microscope techniques. The Fourier Transform Infrared (FTIR) and x-ray photoelectron spectroscopy (XPS) have been used to investigate the bonding properties in CNx films. The mechanical properties of the films were evaluated to correlate with the processing parameters of the deposited films. It has been shown that the films with crystalline quality structure have higher hardness and modulus values. 相似文献
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脉冲激光制膜新技术及其在功能薄膜研究中的应用 总被引:8,自引:0,他引:8
脉冲激光制膜是近年来发展的富有希望的制膜新技术。本文简要介绍了脉冲激光制膜技术的原理、特点和优势以及在功能薄膜研究中的应用。 相似文献
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Magnetic multilayers of (SrRuO3)
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(SrMnO3)
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were grown artificially using the pulsed laser deposition technique on (001)-oriented SrTiO3 substrates. The temperature and magnetic field dependent reisistivity of the superlattices consisting of ferromagnetic (FM) SrRuO3 and antiferromagnetic (AFM) SrMnO3 are studied as a function of the SrRuO3 unit cells. We observed a pinned/biased moment instead of the biased field in the superlattices and we redefine the structure as AFM/FM(Pin)/FM(Free)/FM(Pin) units below a critical field. 相似文献
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J.M. Lackner Dr. D. Mukherji W. Waldhauser N. Wanderka N. Kardjilov O. Näth S. Jäger F. Schmitz J. Rösler 《真空研究与实践》2008,20(4):14-19
Coating of metallic membranes by pulsed laser deposition There is increasing demand to functionalize meso‐ and nano‐porous materials by coating and make the porous substrate biocompatible or environment friendly. However, coating on a meso‐porous substrate poses great challenges, especially if the pore aspect ratio is high. In the current work the pulsed laser deposition (PLD) method is used for coating Ni3Al‐based meso‐porous membranes with diamond‐like carbon (DLC) layers of high thickness homogeneity and adhesion. 相似文献
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Urease thin films were produced by Matrix Assisted Pulsed Laser Evaporation (MAPLE) and Pulsed Laser Deposition from two types of targets: frozen water solutions of urease with different concentrations (1-10% m/v) and pure urease pellets. The fluence of the ablating KrF excimer laser was varied between 300 and 2200 mJ/cm2. Fourier transform infrared spectra of the deposited films showed no difference as compared to the original urease. Morphologic studies proved that the films consist of a smooth “base” layer with embedded micrometer-sized droplets. Absorption-coefficient measurements contradicted the traditional “absorptive matrix” model for MAPLE deposition. The laser energy was absorbed by urease clusters leading to a local heating-up and evaporation of the frozen matrix from the uppermost layer accompanied by the release of dissolved urease molecules. Significant enzymatic activity of urease was preserved only during matrix assisted transfer. 相似文献
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采用脉冲激光沉积法制备了(GeSe2)100-x-Bix(x=0~12)硫系玻璃薄膜。测量了薄膜的光学透射谱、吸收谱和拉曼光谱。薄膜的光学短波吸收边对应于电子的间接带间跃迁,并由此计算出其光学带隙。拉曼光谱分析表明Bi含量的增加,减小了玻璃的平均键能,导致光学带隙由1.94 eV减小到1.11 eV。Tauc斜率由486 cm-1/2eV-1/2减小到178 cm-1/2eV-1/2。退火过程中的热漂白效应减小了玻璃的结构无序性,使得薄膜的光学带隙和Tauc斜率相应增大。 相似文献
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脉冲激光法淀积MgO薄膜及其结晶性能的研究 总被引:1,自引:0,他引:1
研究了脉冲激光淀积MgO薄膜的过程中,制备工艺参数对薄膜结晶性的影响.研究发现,MgO薄膜的结晶性主要受控于衬底温度和激光能量密度,而薄膜的生长速率则依赖于脉冲频率、衬底与靶材间的距离以及激光能量密度.通过对比不同靶材,即金属Mg靶和烧结陶瓷MgO靶,对薄膜结晶性的影响,发现通过添加一层TiN籽晶层可以显著改善薄膜的结晶质量.最后在优化的制备工艺参数:衬底温度TS=873K,激光能量密度DE=7J/cm2,靶材与衬底间距离DST=70mm,激光脉冲频率FL=5Hz以及采用烧结陶瓷MgO靶材和添加TiN籽晶层的情况下,获得层状生长模式和表面具有原子级平整度的MgO薄膜. 相似文献
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Results of process and film analysis The process of thin film deposition by PLD-method is explained systematically. Exemplary results of process and film analysis by Raman spectroscopy and nano indentation are shown. 相似文献
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采用脉冲激光沉积技术,在Si(100)基片上制备了高致密的氧化铱(IrO2)薄膜,研究了不同沉积温度对薄膜结构的影响。利用X射线衍射(XRD)、拉曼光谱、扫描电镜(SEM)和原子力显微镜(AFM)对制备的IrO2薄膜进行了表征。结果表明:在20Pa氧分压,250℃~500℃范围内,得到的薄膜为多晶的IrO2物相,其晶粒尺寸和粗糙度随着沉积温度的升高而增加;所得到的IrO2薄膜表面粗糙度低,厚度均匀,与基片结合良好。 相似文献
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《Nanotechnology, IEEE Transactions on》2006,5(5):470-477
We present how various features drawn in a miniature shadow mask (nanostencil) can be efficiently transferred to a surface in the form of three-dimensional nanostructures of metals (Pt, Cr), semiconductors (Ge), and complex oxides (e.g.,$hboxBaTiO_3$ ) by room temperature pulsed laser deposition. Selective deposition is obtained by interposing a sieve with apertures down to 100 nm between source and substrate. Nanostenciling allows for the organization of structures in predefined architectures with high accuracy. The patterning process is simple and rapid, since it does not imply additional processing steps. It is also parallel, resistless, and does not interfere with the structures' growth dynamics. The material deposited through the stencil mask conserves the desired functionality even at the level of the individual nanostructures. Nanostenciling can be performed in high or ultrahigh vacuum and is suitable for parallel prototyping of fragile or functionalized surfaces. 相似文献