离子束溅射作用下聚四氟乙烯薄膜的制备方法

在多功能离子束辅助沉积装置上采用交替溅射和冷却聚四氟乙烯靶材的方法制备了薄膜。由ＸＰＳ的结果可知，所得薄膜主要由ＣＦ２结构组成；ＦＴ－ＩＲ的结果表明，所得薄膜由Ｃ－Ｆ的最强吸收峰和聚四氟乙烯的特征吸收峰构成。所得薄膜的这些结构特征与聚四氟乙烯的结构是一致的。     

离子束溅射沉积作用下聚四氟乙烯膜的制备和结构分析

本文首先利用离子束溅射聚四氟乙烯靶材的方法制备了薄膜，进而研究了其结构。由ＸＰＳ的结果可知，所得薄膜主要由ＣＦ２结构组成；由ＦＴ－ＩＲ的结果可知，在１１６９ｃｍ＾－１和１０８３ｃｍ＾－１处出现了Ｃ－Ｆ的最强吸收峰，在７３４ｃｍ＾－１，６１９ｃｍ＾－１和５００ｃｍ＾－１处出现了聚四氟乙烯的特征吸收峰。ＸＰＳ和ＦＴ－ＩＲ的结果是一致的，所得薄膜呈现聚四氟乙烯的结构特征。     

双离子束溅射沉积二氧化硅薄膜

利用双离子束溅射沉积技术,在锗、硅、K9玻璃、不锈钢基底上沉积了二氧化硅薄膜。考察了不同束辐照条件下二氧化硅薄膜的电阻率、折的率、红外吸收谱和显微组织结构。     

离子束溅射薄膜特性

用离子束溅射制备Ａｕ、Ｓｉ、Ａｌ、ＮｉＦｅ、Ｔａ和Ｗ薄膜，并将其物理性质同射频溅射和电子束蒸发沉积的薄膜进行了比较．一般说来，对给定材料的沉积薄膜，就其所测量的物理性质来说是大体相似的，与沉积的方法无关．在离子束溅射系统中，我们是把沉积率作为离子束的加速电压和靶对离子束轨道的偏角的函数来研究的。沉积率在７５０伏的加速电压以后大体趋于稳定，对某些材料来说，在靶对离子束偏角为３０°时观察到沉积率的峰值。在３５０℃下真空退火３０分钟前后比较了离子束溅射ＮｉＦｅ 薄膜的性质，退火结果使得这种薄膜的电阻率略为降低，而其对应的磁阻率（ ）有所增加。电子微探针测量表明，薄膜中电离气体渗入很少。看来离子束溅射的薄膜比其他工艺流积的薄膜要好。尤其是在蚀刻工艺中有突出的优点。因为离子束溅射是在无场区域中进行的，所以由于电子轰击对基片加热甚少，使光刻胶图象不会变坏，便于下一次继续蚀刻。     

离子束溅射铜钨薄膜的结构

为了进一步探讨离子束溅射铜钨薄膜的结构,在铁片上离子束溅射铜钨薄膜,研究了轰击离子束能量及低能辅助轰击方式对薄膜相结构和厚度的影响.结果表明:随轰击铜靶离子束能量增加,钨由近似非晶亚稳态转变成晶态;由于溅射粒子落到基片前的反射效应,薄膜中间比边缘薄,且随轰击铜靶离子束能量增加,薄膜变薄到一定程度时开始增厚;当使用低能辅...     

离子束溅射沉积羟基磷灰石涂层钛种植体材料的制备和表征

采用Ａｒ＾＋离子束溅射沉积技术和钛基体上沉积羟基磷灰石薄膜涂层,Ａｒ＾＋离子束的能量分别为０．９ｋｅＶ、１．２ｋｅＶ和１．５ｋｅＶ。利用Ｘ射线衍射（ＸＲＤ）、扫描电（ＳＥＭ０、透射电镜（ＴＥＭ）和红外光谱（ＦＴＩＲ）等检测方法,对制备的羟基磷灰石薄膜涂层进行了表征。Ｘ射线衍射和透射电结果表明该薄膜涂层为非晶态;红外光谱中无羟基（ＯＨ）特征峰存在,ＣＯ３根吸收峰的出现说明制备过程中会引入ＣＯ３根;扫     

采用电子回旋共振微波等离子体增强的溅射沉积薄膜技术

利用高等离子体密度、高电子温度和高离化率的ECR微波等离子体增强二极溅射、磁控溅射反应沉积金属氨化物薄膜。实验结果表明，ECR微波等离子体具有降低薄膜沉积温度，提高薄膜沉积速率和改善薄膜质量的作用。特别是采用基片施加脉冲负偏压的ECR微波等离子体源离子增强反应磁控溅射沉积技术，设备成本低，工艺方法简单，可获得与离子束增强沉积（IBAD）相近的对薄膜结构和特性的改性作用，可制备高质量金属氢化物薄膜。     

聚焦重离子束溅射沉积薄膜

本文介绍了聚焦重离子束溅射装置的结构和运行参数。该装置的最高加速电压为10kV,最大离子束流为2mA,蕞小离子束斑为φ1.5mm。利用这台装置,沉积了二十六种金属材料的有衬底薄膜、五种元素的无衬底薄膜和一些稀土氧化物薄膜。研究了单位面积沉积率与靶材质量数的关系。给出了一些升华材料的溅射沉积参数。     

离子束溅射制备CuInSe_2薄膜的研究

利用离子束溅射沉积技术,设计三元复合靶,直接制备CuInSe_2(CIS)薄膜.通过X射线衍射仪(XRD)、原子力显微镜(AFM)和分光光度计检测在不同衬底温度和退火温度条件下制备的CIS薄膜的微结构、表面形貌和光学性能.实验结果表明:使用离子束溅射沉积技术制备的CIS薄膜具有黄铜矿结构,在一定的条件下,适当温度的热处理可以制备结构紧密、颗粒均匀、致密性和结晶性良好的CIS薄膜,具有强烈的单一晶向生长现象.     

采用电子回旋共振微波等离子体增强的溅射沉积薄膜技术

利用高等离子体密度、高电子温度和高离化率的ＥＣＲ微波等离子体增强二极溅射、磁控溅射反应沉积金属氮化物薄膜。实验结果表明，ＥＣＲ微波等离子体具有降低薄膜沉积温度，提高薄膜沉积速率和改善薄膜质量的作用。特别是采用基片施加脉冲负偏压的ＥＣＲ微波等离子体源离子增强反应磁控溅射沉积技术，设备成本低，工艺方法简单，可获得与离子束增强沉积相近的对薄膜结构和特性的改性作用，可制备高质量金属氮化物薄膜。     

医用TiO2/SiO2薄膜表面共价键合肝素研究

以γ－氨丙基三乙氧基硅烷和戊二醛作为偶联剂研究了TiO2与SiO2-TiO2生物陶瓷膜表面固定肝素，利用红外光谱（FT－IR）和X光电子能谱（XPS）的测量结果表征薄膜表面肝素化前后的结构和组成：对接触角和体外血液相容性的研究表明，肝素化处理后，薄膜表面的亲水性和抗凝血性显著提高。     

Characterization of infrared matrix-assisted laser desorption ionization samples by Fourier transform infrared attenuated total reflection spectroscopy

Fourier transform infrared attenuated total reflection (FT-IR ATR) spectroscopy was used to characterize thin films of succinic acid, a matrix compound commonly used with infrared matrix-assisted laser desorption ionization (IR-MALDI) mass spectrometry. IR spectra of succinic acid thin films deposited alone and in combination with the analyte biomolecules insulin and cytochrome c were obtained by FT-IR ATR spectroscopy. Spectra of analyte and matrix alone were similar to those obtained previously from KBr pellets, Nujol mull, or thin-film absorption, although the ATR spectra have significantly lower background interferences. Thin films deposited from mixtures of water and methanol have additional peaks compared to films deposited from a methanol solution. These additional peaks are attributed to carboxylate groups stabilized by residual water molecules. No evidence was found to suggest that residual water absorption contributes to absorption at wavelengths typically used for IR-MALDI. Absorption of energy by analyte vibrational modes with rapid energy transfer to the matrix is suggested as a contributor to desorption and ionization consistent with the FT-IR ATR results.     

聚苯胺/磺化酞菁铜自组装复合薄膜的制备与表征

运用层层自组装的技术制备了聚苯胺/磺化酞菁铜(PANI/CuTsPc)超分子复合薄膜,并通过紫外-可见-近红外吸收光谱、傅立叶红外光谱、X射线衍射仪与原子力显微镜对薄膜进行了表征与分析.紫外-可见-近红外吸收光谱表明,PANI和CuTsPe具有良好的层层自组装特性,沉积过程具有均匀性与重复性;傅立叶红外光谱表明,复合薄膜是由PANI和CuTsPc组成的,PANI和cuTsPc通过静电力的作用组装成膜;X射线衍射结果表明,复合薄膜是非晶态的;原子力显微镜观察到薄膜表面是比较均匀和致密的,但有一定的粗糙度.     

直流磁控溅射技术制备TiNxOy薄膜

利用直流磁控溅射技术在玻璃衬底上制备了TiNxOy薄膜样品。发现薄膜的颜色、晶体结构、光学性质等都强烈依赖于反应气体的流量。利用光电子能谱（XPS）、X射线衍射（XRD）、UV—Vis分光光度计、扫描电子显微镜（SEM）等测试手段对样品进行表征。结果表明：随着O2流量的逐步增加,薄膜逐渐呈现非晶态,晶粒逐渐变小。薄膜结构从TiN到TiNxOy再向TiO2过渡。透射光谱显示从TiN的不透明逐渐增加到透明度为80％,且吸收阈发生蓝移。     

Preparation and characterisation of silver particulate films on softened polystyrene substrates

The preparation of silver particulate films on softened polystyrene (PS) substrates and their characterisation using Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS) and optical absorption spectroscopy is reported in this paper. Silver films of 150 nm thickness were vacuum deposited onto PS coated glass substrates held at temperatures in the range 415–475 K at different deposition rates of 4 to 12 Å/s. SEM studies indicate that films deposited at 415 K are close to a semicontinuous structure and the structure is discontinuous at higher temperatures. The film morphology is strongly dependent on the deposition rate at any given substrate temperature. The film agglomeration increases with increasing rate of deposition. In the XPS studies, considerable attenuation of the signal corresponding to silver is observed at lower electron take of angles (ETOAs). This indicates that Ag is formed beneath the PS surface. Optical absorption studies showed an interesting red shift of the plasmon resonance wavelength for lower deposition rates again indicating that a sub-surface particulate structure is formed at lower deposition rates. These results are consistent with reported observations.     

One-step synthesis and luminescent properties of nanocrystalline YVO4:Eu3+ powders

In this paper, nanocrystalline YVO4:Eu3+ powders have been successfully synthesized via high-temperature solution-phase synthesis process. The nanocrystalline YVO4:Eu3+ particles were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), UV/Nis absorption spectra and luminescence spectra, luminescence decay curve and Fourier transform infrared (FT-IR), X-ray photoelectron spectra (XPS) respectively. The as-prepared nanocrystalline YVO4:Eu3+ particles are well crystallized with ellipsoidal morphology. The emission of YVO4:Eu3+ particles show emission originating from the 5D0 level, with 5D0-7F2 at 616 nm as the most prominent group. The excitation spectrum fits basically with the absorption spectrum from the vanadate ions. FT-IR and XPS spectra indicate that the surface ligands of nanocrystalline particles were oleic acid and oleylamine. The lifetime for the luminescence of Eu3+ in the as-prepared YVO4:Eu3+ samples are shorter than that of the bulk material due to the absorption of organic ligands on the nanoparticle surface.     

盐酸蒸气处理对酞菁氧钛薄膜的影响

用HC1蒸气对真空蒸发沉积的酞菁氧钛薄膜进行了处理 ,并用UV Vis吸收谱、X射线光电子能谱 (XPS)和X射线衍射 (XRD)进行了分析。吸收谱结果表明HC1与酞菁氧钛蒸气作用后产生一个新的吸收峰 ,峰值位于 82 0nm附近。此峰的出现使得酞菁氧钛光吸收带 (Q带 )加宽进入红外波段。光电子谱分析表明酞菁氧钛薄膜的成分发生了变化 ,其中Cl和O的含量随HC1蒸气处理时间的增加而增加 ,而N和Ti的含量随HC1蒸气处理时间的增加而减小 ,说明HC1蒸气可与真空蒸发沉积的酞菁氧钛薄膜发生作用。XRD测试结果表明 ,经HC1蒸气处理后的酞菁氧钛薄膜的衍射谱中出现了若干新的衍射峰 ,表明酞菁氧钛分子的排列结构也发生了变化     

含氟硅低表面能共聚物的制备与表征

将丙烯酸六氟丁酯和γ-甲基丙烯酰氧基丙基三甲氧基硅烷与(甲基)丙烯酸(酯)进行共聚,合成含氟硅共聚物.用红外光谱(FT-IR)、X射线光电子能谱(XPS)和热重分析(TGA)对共聚物的结构和性能进行表征,并测试了共聚物膜的吸水率及对水和油的接触角.XPS结果表明,共聚物膜表面的F和Si元素相对物质的量明显高于150 n...     

碳含量对碳氮化硅薄膜化学结构和力学性能的影响

利用微波电子回旋共振（MW-ECR）等离子体增强非平衡磁控溅射法制备了碳氮化硅（SiCN）薄膜。研究结果表明，碳含量对薄膜化学结构、力学性能有很大影响。傅里叶变换红外光谱（FT-IR）和X射线光电子能谱（XPS）表征显示，随着碳靶溅射偏压由-450V提高到-650V，薄膜中碳含量由19．0％增加到27．1％，sp^3C-N键含量增多，薄膜生长速率由3．83nm／min提高到5．83nm／min，硬度在-600V时达到最大值25．36GPa。上述结果表明，提高碳靶溅射偏压，可以提高薄膜含碳量，得到性能较好的SiCN薄膜。     

Sol-gel silica thin films with copper selenide

The silica sol-gel films with copper selenide produced by the selenization of metallic copper nanoparticles were fabricated. The composition of the films was studied with X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and optical absorption spectroscopy. Several copper selenide phases were detected with XRD and contribute into the complicated behavior of core levels (Cu2p, Se3d, and Si2p) and Auger levels (Cu) in the XPS analysis. The optical absorption features of the films in the visible and near-infra red range are presented. The consistent interpretation of experimental data is proposed based on assumption of copper multivalence in the system “particles-silica matrix”.