Performance of p-type silicon-oxide windows in amorphous silicon solar cell

a-SiO_x films have been prepared using silane and pure oxygen as reactive gases in plasma CVD system. Diborane was introduced as a doping gas to obtain p-type conduction silicon oxide. Infrared absorption spectra show the incorporation of Si–O stretch mode around 1000 cm⁻¹. The optical bandgap increases with the oxygen to silane gas ratio, while the electrical conductivity decreases. Hydrogenated amorphous silicon solar cells have been fabricated using p-type a-SiO_x with around 1.85 eV optical bandgap and conductivity greater than 10⁻⁷ S/cm. The measured current–voltage characteristics of the solar cells under 100 mW/cm² artificial light are V_oc=0.84 V, J_sc=14.7 mA/cm², FF=0.635 with a conversion efficiency of 7.84%.     

The influence of porous silicon on junction formation in silicon solar cells

In this work the results of a structural investigation by SEM of porous silicon (PS) before and after diffusion processes are reported. The formation of PS n⁺/p structures were carried out on PS p/p silicon wafers with two methods: from POCl₃ in a conventional furnace and from a phosphorous doped paste in an infrared furnace. Sheet resistance was found to be a strong function of PS structure. Further details on sheet resistance distribution are reported. The electrical contacts in prepared solar cells were obtained by screen printing process, with a Du Ponte photovoltaic silver paste for front contacts and home-prepared silver with 3% aluminium paste for the back ones. Metallization was done in the infrared furnace. Solar cell current–voltage characteristics were measured under an AM 1.5 global spectrum sun simulator. The average results for multi-crystalline silicon solar cells without antireflection coating are: I_sc=720 (mA), V_oc=560 (mV), FF=69%, Eff=10.6% (area 25 cm²).     

Multicrystalline silicon wafers prepared from upgraded metallurgical feedstock

A solution to the problem of the shortage of silicon feedstock used to grow multicrystalline ingots can be the production of a feedstock obtained by the direct purification of upgraded metallurgical silicon by means of a plasma torch. It is found that the dopant concentrations in the material manufactured following this metallurgical route are in the 10¹⁷ cm⁻³ range. Minority carrier diffusion lengths L_n are close to 35 μm in the raw wafers and increases up to 120 μm after the wafers go through the standard processing steps needed to make solar cells: phosphorus diffusion, aluminium–silicon alloying and hydrogenation by deposition of a hydrogen-rich silicon nitride layer followed by an annealing. L_n values are limited by the presence of residual metallic impurities, mainly slow diffusers like aluminium, and also by the high doping level.     

Defect passivation of industrial multicrystalline solar cells based on PECVD silicon nitride

Low surface recombination velocity and significant improvements in bulk quality are key issues for efficiency improvements of solar cells based on a large variety of multicrystalline silicon materials. It has been proven that PECVD silicon nitride layers provide excellent surface and bulk passivation and their deposition processes can be executed with a high throughput as required by the PV industry. The paper discusses the various deposition techniques of PECVD silicon nitride layers and also gives results on material and device properties characterisation. Furthermore the paper focuses on the benefits achieved from the passivation properties of PECVD SiN_x layers on the multi-Si solar cells performance. This paper takes a closer look at the interaction between bulk passivation of multi-Si by PECVD SiN_x and the alloying process when forming an Al-BSF layer. Experiments on state-of-the-art multicrystalline silicon solar cells have shown an enhanced passivation effect if the creation of the alloy and the sintering of a silicon nitride layer (to free hydrogen from its bonds) happen simultaneously. The enhanced passivation is very beneficial for multicrystalline silicon, especially if the defect density is high, but it poses processing problems when considering thin (<200 μm) cells.     

Large-area high efficiency single crystalline silicon solar cells

This paper reports on a 100 cm² single crystalline silicon solar cell with a conversion efficiency of 19.44% (J_sc = 37.65 mA/cm², V_oc = 638 mV, FF = 0.809). The cell structure is as simple as only applying the textured surface, oxide passivation, and back surface field by the screen printing method. The comparison between cell performances of the CZ (Czochralski) and FZ (Floating zone) silicon substrates was investigated. The higher efficiency cells were obtained for the FZ substrate rather than the CZ substrate. The influence of the phosphorus concentration of the emitter on the cell efficiency has also been investigated. A good result was obtained when the surface concentration of phosphorus was 3 × 10²⁰ cm⁻³ and the junction depth was about 0.6 μm.     

Thin silicon string ribbon

Evergreen Solar is a new solar cell company that is commercializing a silicon sheet growth method known as String Ribbon, a method for forming continuous polycrystalline silicon ribbon directly from the melt. Recently, modifications to the growth environment by means of a tunable afterheater have enabled Evergreen to grow flat, 5.6 cm wide and 100 μ thick ribbon with low enough stress to permit solar cell fabrication. The development work was aided by using finite element analysis with a thermoelastic model. Initial work on forming cells on this material was quite promising. The best solar cell made on the 100 μm thick, p-type silicon ribbon ( = 0.1 Ω cm) was 14.7% efficient. It had a V_oc of 639 mV and a fill factor of 0.798 with a J_sc of 28.8 mA/cm². Significant increases in lifetime during processing were not unusual. With better starting lifetimes from higher bulk resistivity values, PC1D modeling indicated that 16% efficient cells should be readily achievable on this material.     

Blue sensitizers for solar cells: Natural dyes from Calafate and Jaboticaba

Blue-violet anthocyanins from Jaboticaba (Myrtus cauliflora Mart) and Calafate (Berberies buxifolia Lam) were employed as TiO₂ dye-sensitizers. Solar cells sensitized by Jaboticaba extracts achieved up to J_sc=9.0 mA cm⁻², V_oc=0.59 V, P_max=1.9 mW cm⁻² and ff=0.54, while for Calafate sensitized cells the values determined were up to J_sc=6.2 mA cm⁻², V_oc=0.47 V, P_max=1.1 mW cm⁻² and ff=0.36. Other natural dyes were evaluated without significant photocurrent, demonstrating that only selected extracts are capable of converting sunlight in electricity. The results obtained with extracts of Jaboticaba and Calafate show a successful conversion of visible light into electricity by using natural dyes as wide band-gap semiconductor sensitizers in dye-sensitized solar cells. It also represents an environmentally friendly alternative for dye-sensitized solar cells with low cost production and an excellent system for educational purposes.     

p-doped μc-Si:H window layers prepared by hot-wire CVD for amorphous solar cell application

We report on boron-doped μc-Si:H films prepared by hot-wire chemical vapor deposition (HWCVD) using silane as a source gas and trimethylboron (TMB) as a dopant gas and their incorporation into all-HW amorphous silicon solar cells. The dark conductivity of these films was in the range of 1–10 (Ω cm)⁻¹. The open circuit voltage V_oc of the solar cells was found to decrease from 840 mV at low hydrogen dilution H-dil=91% to 770 mV at high H-dil =97% during p-layer deposition which can be attributed to the increased crystallinity at higher H-dil and to subsequent band edge discontinuity between μc-Si:H p- and amorphous i-layer. The short circuit current density J_sc and the fill factor FF show an optimum at an intermediate H-dil and decrease for the highest H-dil. To improve the conversion efficiency and the reproducibility of the solar cells, an amorphous-like seed layer was incorporated between TCO and the bulk p-layer. The results obtained until now for amorphous solar cells with and without the seed layer are presented. The I–V parameters for the best p–i–n solar cell obtained so far are J_sc=13.95 mA/cm², V_oc=834 mV, FF=65% and η=7.6%, where the p-layers were prepared with 2% TMB. High open circuit voltages up to 847 mV could be achieved at higher TMB concentrations.     

Concentrator silicon solar cells from silicon industry rejects

Two types of silicon (Si) substrates (40 n-type with uniform base doping and 40 n/n⁺ epitaxial wafers) from the silicon industry rejects were chosen as the starting material for low-cost concentrator solar cells. They were divided into four groups, each consisting of 20 substrates: 10 are n/n⁺ and 10 are n substrates, and the solar cells were prepared for different diffusion times (45, 60, 75 and 90 min). The fabricated solar cells on n/n⁺ substrates (prepared with a diffusion time of 75 min) showed better parameters. In order to improve their performances, particularly the fill factor, 20 new solar cells on n/n⁺ substrates were fabricated using the same procedure (the diffusion time was 75 min)—but with four new front contact patterns. Investigation of current–voltage (I–V) characteristics under AM 1.5 showed that the parameters of these 20 new solar cells have improved in comparison to previous solar cells' parameters, and were as follows: open-circuit voltage (V_OC=0.57 V); short circuit current (I_SC=910 mA), and efficiency (η=9.1%). Their fill factor has increased about 33%. The I–V characteristics of these solar cells were also investigated under different concentration ratios (X), and they exhibited the following parameters (under X=100 suns): V_OC=0.62 V and I_SC=36 A.     

Dependence of the I–V characteristics of amorphous silicon solar cells on illumination intensity and temperature

Current-voltage characteristics of amorphous silicon (a-Si) solar cells are systematically investigated as functions of the illumination intensity and ambient temperature. The principle of superposition of the short-circuit current and the dark current, which is usually assumed for crystalline silicon solar cells, is not applicable to a-Si solar cells. It is shown, that the output current of a-Si solar cells at a given illumination intensity E₂mW/cm²I_E2(V) is expressed by a relatively simple equation, I_E2(V) = I_d(V) + (_{E2/100) × (I100(V) — Id(V))}, when the series resistance of the solar cells is negligible. Here, I_d(V) is the dark current, I₁₀₀(V) is the output current at an illumination of 100 mW/cm², and V is the applied voltage. Empirical formula to describe the dependence of the current-voltage characteristics on the illumination intensity and the temperature are presented and discussed.     

Latest results on semitransparent POWER silicon solar cells

The paper presents the latest results of the polycrystalline wafer engineering result (POWER) silicon solar cell research (G. Willeke, P. Fath, The POWER silicon solar cell, Proceedings of the 12th EPVSEC, Amsterdam, 1994, pp. 766–768). Mono – as well as bifacially active semitransparent silicon solar cells have been created by forming perpendicularly overlapping grooves on the front and the rear side of a silicon wafer resulting in a regular pattern of holes. The developed very simple manufacturing process is fully compatible with an industrial production and uses POCl₃-tube diffusion, PECVD silicon nitride as single ARC and screen-printing metallization. Maximum efficiencies of η=11.2% for monofacial POWER cells on 0.4 Ω cm Cz material with a transparency of 18.2% and η=12.9% for bifacial cells on 1 Ω cm Cz material with a transparency of 16% have been obtained. Results for multicrystalline (mc) semitransparent mono- and bifacially active silicon solar cells are also presented.     

Progress in monolithic series connection of wafer-based crystalline silicon solar cells by the novel ‘HighVo’ (High Voltage) cell concept

Progress in the development of the new HighVo cell concept for monolithic series connection of wafer-based crystalline silicon solar cells is presented. HighVo cells have been produced using standard low-cost silicon wafer technology without any photo lithographic masking step. The cells obtained with a total area of 21 cm² exhibited a voltage at the maximum power point V_MPP of 2.8 V and a conversion efficiency η of 11.4 %. To our knowledge this is the highest conversion efficiency reported so far for monolithically integrated non-thin-film silicon solar cells.     

CIS thin film solar cells with evaporated InSe buffer layers

This paper describes the investigations of CIS-based solar cells with a new In_xSe_y (IS) buffer layer. Studies were concentrated on determining the deposition conditions to get In_xSe_y thin films with adequate properties to be used in substitution of the CdS buffer layer, usually employed in the fabrication of this type of devices. Before the solar cell fabrication, the buffer layers grown by evaporation of the In₂Se₃ compound were characterized through transmittance and X-ray diffraction measurements. It was found that good results can be obtained using indium selenide film as the buffer layer, grown in the In₂Se₃ phase.Solar cells with structure Mo/CIS/In₂Se₃/ZnO were fabricated. The ZnO layer was deposited by reactive evaporation and the absorber CIS layer was grown on Mo by a two-stage process. The preliminary results obtained with this type of solar cells are J_sc=30.8 mA/cm², V_oc=0.445 V, FF≈0.6 and η=8.3% with an irradiance of 100 mW/cm². Solar cells fabricated using a CdS buffer layer deposited by CBD on CIS substrate, prepared under the same conditions used in the fabrication of Mo/CIS/In₂Se₃/ZnO cells, gave the following results: V_oc=0.43 V, J_sc=34 mA/cm², FF≈0.63 and η=9.2%.     

High-efficiency μc-Si/c-Si heterojunction solar cells

P-type microcrystalline silicon (μc-Si (p)) on n-type crystalline silicon (c-Si(n)) heterojunction solar cells is investigated. Thin boron-doped μc-Si layers are deposited by plasma-enhanced chemical vapor deposition on CZ-Si and the V_oc of μc-Si/c-Si heterojunction solar cells is higher than that produced by a conventional thermal diffusion process. Under the appropriate conditions, the structure of thin μc-Si films on (1 0 0), (1 1 0), and (1 1 1) CZ-Si is ordered, so high V_oc of 0.579 V is achieved for 2×2 cm² μc-Si/multi-crystalline silicon (mc-Si) solar cells. The epitaxial-like growth is important in the fabrication of high-efficiency μc-Si/mc-Si heterojunction solar cells.     

Low temperature silicon oxide and nitride for surface passivation of silicon solar cells

Surface passivation at low processing temperature becomes an important topic for crystalline and multicrystalline silicon solar cells. In this work, silicon oxide (250°C) and silicon nitride (300°C) have been developed by Photo-CVD and PECVD technique respectively. Effects of deposition parameters on the optoelectronic and structural properties of the films have been investigated. Interface-trap density (D_it) and fixed charge density (Qf) have been estimated by high frequency (1 MHz) capacitance-voltage measurement on Metal–Insulator–Silicon structure (CV-MIS). The effect of silicon oxide and silicon nitride on the performance of c-Si solar cells have been studied.     

Recent results obtained at IMEC on multicrystalline silicon solar cells

In order to optimize the efficiency of multicrystalline silicon solar cells, the influence of specific process steps and sequences were studied. Therefore clean-room high efficiency as well as industrial screen-printed cells were fabricated. Benefits are found in choosing a substrate with lower base resistivity, using front and rear oxide passivation, using hydrogen passivation for bulk and surfaces, the use of Si₃N₄ with a double function i.e. as an anti-reflection and passivation layer and the use of mechanical V-grooving. Efficiencies of 17% are found on 4 cm² clean-room fabricated cells and 15.2% has been obtained on 100 cm² V-grooved screenprinted industrial cells.     

Production of large-area polymer solar cells by industrial silk screen printing, lifetime considerations and lamination with polyethyleneterephthalate

The possibility of making large area (100 cm²) polymer solar cells based on the conjugated polymer poly 1,4-(2-methoxy-5-ethylhexyloxy)phenylenevinylene (MEH-PPV) was demonstrated. Devices were prepared by etching an electrode pattern on ITO covered polyethyleneterephthalate (PET) substrates. A pattern of conducting silver epoxy allowing for electrical contacts to the device was silk screen printed and hardened. Subsequently a pattern of MEH-PPV was silk screen printed in registry with the ITO electrode pattern on top of the substrate. Final evaporation of an aluminum electrode or sublimation of a Buckminsterfullerene (C₆₀) layer followed by an aluminum electrode completed the device. The typical efficiency of the prototype devices consisting of three solar cells in series were 0.0046% (under AM1.5 conditions) with open-circuit voltages (V_oc) of 0.73 V and short-circuit currents (I_sc) of 20 μA cm⁻². The half-life based on I_sc in air for the devices were 63 h. The cells were laminated in a 125 μm PET encasement. Lamination had a negative effect on the lifetime.We demonstrate the feasibility of industrial production of large area solar cells (1 m²) by silk screen printing and envisage the possibility of production volumes 10000 m² h⁻¹ at a cost that is on the order of 100 times lower than that of the established monocrystalline silicon solar cells in terms of materials cost.     

Texturisation of multicrystalline silicon wafers for solar cells by reactive ion etching through colloidal masks

Texturing of multicrystalline silicon solar cells by reactive ion etching (RIE) is demonstrated as an attractive solution for lowering of reflectance. A suitable sequence of processes is developed to exploit the advantage of RIE in combination with “natural lithography” based on colloidal masks. A homogeneous particle coverage on 4 in. monocrystalline wafers and on 100×100 mm² multicrystalline wafers (Baysix) has been achieved. Finally, texture is obtained by RIE patterning. Data of optical properties are presented. A significant lowering of the reflection of textured wafers compared to untexture is achieved for all states of solar cell production.     

Performance improvements of crystalline silicon by iterative gettering process for short duration and with the use of porous silicon as sacrificial layer

In this work, we demonstrate that an efficient purification method of silicon wafers where iterative sequences were used. Each sequence consists of forming porous silicon (PS) on both sides of the samples, followed by thermal annealing in an infrared furnace under N₂/SiCl₄ ambient. Improvements of the electronic parameters were obtained by optimizing the heat treatments temperatures and the number and duration of the iteration sequences. Best results were obtained for temperatures below 980 °C and for three sequences of 20 min each one. After three sequences the mobility of the majority carrier improved from 94 cm² V⁻¹ s⁻¹ (for untreated wafer) to about 374 cm² V⁻¹ s⁻¹. The observed results were explained taking into account the transport properties of the impurities in the porous media and their concentration at the walls at each iteration. It was found that short iterative sequences give almost the same results than one long sequence duration. Silicon solar cells based on iterative gettered silicon wafers exhibit an increase in the short-circuit current and the open-circuit voltage. This fact seems to be important to ameliorate solar grade silicon (SGS) based solar cells performances.     

Screen printed boron emitters for solar cells

Screen printed (SP) boron emitters are presented as a useful option for the manufacturing of p-type emitters of solar cells. Details are provided on the diffusion process, including deposition, drying and firing steps, the latter performed in an infrared belt furnace. Besides their main dependences on the firing conditions, the sheet resistances and dopant profiles of the resulting emitters reveal the relevance of the drying step and the exhaustion limits of the doping source. A characterization of the recombination concludes that moderate emitter saturation currents (J_oe<0.5 pA/cm²) and acceptable bulk lifetimes (τ_B>40 μs) can be obtained on Czochralski silicon wafers. Finally, Cz n-type 0.7 Ω cm solar cells are presented, which once again prove the feasibility of SP boron emitters and point to issues regarding their metallization.