精确稳定求解时域电场积分方程的一种新方法

时域电场、磁场和混合场积分方程已被广泛用来分析散射体的时域散射响应.基于适当的空间积分方法和隐式的时间步进算(MOT)法在求解时域磁场和混合场积分方程时总是稳定的,然而在求解TDEFIE时则是不稳定的.在本文中,时域电场积分方程的非奇异性积分采用标准的高斯求积法来计算;而利用参数坐标变换和极坐标变换将其奇异性积分转换成为可以分区域精确快速计算的非奇异性积分.通过数值实验表明,利用该方法可以非常精确稳定地求解时域电场积分方程,即使是在时间迭代后期也不必采用任何求平均的过程;另外,该方法可以用于任意时间基函数并可以推广到高阶空间基函数的情形.     

利用时间步进算法精确稳定求解时域积分方程

 时域阻抗矩阵元素的计算需要分别计算场单元和源单元上的空时积分,由于时间基函数的分域性以及时间基函数(如三角型时间基函数)导数的不连续性,使得采用高斯积分方法计算源单元上空时积分的计算精度较差且误差随着时间步长的减小而增大.本文通过将源单元上空时积分转变成为1D时间卷积分和1D空间解析积分来精确计算时域阻抗矩阵元素,并在此基础上利用时间步进算法求解了时域电场、磁场和混合场积分方程.通过计算实例表明该方法在较大的时间步长取值范围内均能确保时域积分方程时间步进算法求解的精度和后时稳定性.     

TDEFIE的奇异性积分的精确快速计算

利用时域积分方程(TDIE)法模拟时域散射现象越来越受到学者们的关注.用于求解TDIE的时间步进(MOT)算法的后时不稳定性严重阻碍了TDIE法的广泛应用和发展.本文首先利用参数坐标和Duffy坐标变换将TDEFIE的奇异性积分转换成非奇异性积分,然后根据时间基函数的特点将该积分转换成可以快速精确计算的分区域积分.数值结果表明,该方法大幅提高了利用MOT算法求解TDE-FIE的MOT算法的后时稳定性和计算精度.     

一种改进稳定性的时域电场积分方程法

研究了时域电场积分方程隐式MOT算法中时间基函数对其稳定性的影响,由理论分析和数值结果得出了选用高频分量较少的时间基函数不利于隐式MOT算法稳定性的结论.在此基础上,将一种多项式时间基函数与新的时间平均方法相结合,提出了一种改进稳定性的隐式MOT算法,计算实例表明比先五步后三步平均法更加精确,比以前的隐式MOT算法更加稳定.     

精确快速计算时域积分方程中奇异性积分的新方法

该文首先利用参数坐标和广义Duffy坐标变换将时域电场积分方程(TDEFIE)的奇异性积分转换成非奇异性积分,然后根据时间基函数的特点将该积分转换成可以快速精确计算的分区域积分。数值计算实例表明,该方法可以大幅度提高求解TDEFIE的后时稳定性和解的精度,而不必采用任何求平均的过程。该方法适用于任意类型的时间基函数并可方便地推广到高阶曲面拟合和高阶空间基函数情形。     

求解时域电场积分方程的稳定时间步进算法

利用面积坐标变换、相对坐标变换、积分区域分解和广义Duffy坐标变换将时域电场积分方程中奇异性积分(共面、共边和共单结点的场源三角形单元上)转化成可精确计算的非奇异性积分.在不同时间基函数(导数连续和导数不连续)、不同时间步长情况下对比分析了该方法和现有的常用方法计算奇异性积分的精度.计算实例表明:时域阻抗矩阵的精确计算有效地改善了时间步进算法的后时稳定性.     

金属-各向异性介质体组合目标频域体表积分方程矩量法

利用体表积分方程矩量法求解了具有任意的介电常数张量和磁导率张量的各向异性介质与金属的组合目标的电磁散射问题.给出了基于RWG面基函数和SWG体基函数的体表积分方程阻抗矩阵元素表达式并详细推导了阻抗矩阵元素所涉及的各种积分运算的计算方法;通过数值计算实例与解析解或其它数值方法的详细对比分析,证明了计算公式的正确性.     

基于时域有限差分法的广义传输矩阵的研究

文章研究了基于时域有限差分法的时域广义传输矩阵方法,时域广义传输矩阵在包含散射体的惠更斯等效面上计算和提取,通过时域积分方程和时域有限差分法的混合应用计算得出。本文同样给出了一个在等效面上RWG基函数和FDTD网格上的变换算法。基于时域有限差分法的时域广义传输矩阵方法比基于时域步进法（MOT）和积分方程的广义传输矩阵方法更加稳定。     

基于高阶叠层矢量基函数的时域电磁场 积分方程方法

本文将准正交高阶叠层矢量基函数用于时域电磁场积分方程(TDIE),求解了三维金属目标的时域电磁散射问题.准正交高阶叠层矢量基函数定义在曲面四边形单元上,并且不要求网格为规范网格,给复杂目标的几何建模和电磁建模带来很大方便.在空间上利用伽略金方法、时间上采用点匹配法求解时域电磁场积分方程,并采用隐式时间步进算法,数值计算结果表明了该方法求解时域积分方程的精确性、高效性与稳定性.     

利用高阶矢量基函数求解时域磁场积分方程

本文利用一种新的高阶矢量基函数求解了三维时域磁场积分方程,该基函数定义在一个曲边三角形贴片上并用拉格朗日插值多项式来表示每一个贴片内的未知电流密度.该基函数的实质就是将拉格朗日插值多项式的插值点选为高斯积分结点,极大地简化和加快了时域积分方程矩量法的繁琐的时间和空间积分运算;另外,该基函数不要求网格为规范网格,给复杂目标的网格剖分带来很大方便.在空间上利用点匹配方法求解了时域磁场积分方程,数值计算结果表明了该方法求解时域积分方程的精确性和高效性.     

Interfacial reaction and shear strength of SnAgCu-xNi/Ni solder joints during aging at 150 °C

The interfacial microstructure and shear strength of Sn3.8Ag0.7Cu-xNi (SAC-xNi, x = 0.5, 1, and 2) composite solders on Ni/Au finished Cu pads were investigated in detail after aging at 150 °C for up to 1000 h. The interfacial characteristics of composite solder joints were affected significantly by the weight percentages of added Ni micro-particles and aging time. After aging for 200 h, the solder joints of SAC, SAC-0.5Ni and -1Ni presented duplex intermetallic compound (IMC) layers regardless of the initial interfacial structure on as-reflowed joints, whose upper and lower IMC layers were comprised of (CuNi)₆Sn₅ and (NiCu)₃Sn₄, respectively. Only a single (NiCu)₃Sn₄ IMC layer was ever observed at the SAC-2Ni/Ni interface on whole aging process. Based on the compositional analysis, the amount of Ni within the IMC regions increased as the proportion of Ni addition increased. The IMC (NiCu)₃Sn₄ layer thickness on the interface of SAC and SAC-0.5Ni grew more slowly when compared to that of SAC-1Ni and -2Ni, while for the (CuNi)₆Sn₅ layer the reverse is true. Except the IMCs sizes are increased with increased aging time, the interfacial IMCs tended to transfer their morphologies to polyhedra. In all composite joints testing, the shear strengths were approximately equal to non-composite joints. The fracturing observed during shear testing of composite joints occurred in the bulk solder, indicating that the SAC-xNi/Ni solder joints had a desirable joint reliability.     

有机发光二极管中ADN掺杂ErQ的1.54μm电致发光

自行设计了基于8-羟基喹啉铒(ErQ)为发射层(EMLs)和二硝酰胺铵(ADN)为蓝光主体材料的近红外有机发光二级管.器件的基本结构为(p-Si/NPB/EML/Bphen/Bphen:Cs2CO3/Sm/Au),设计并比较了三套不同发射层结构(ErQ/ADN为双层结构器件,(ErQ/ADN)×3为多层结构器件,ErQ:ADN为掺杂结构器件)的器件.三组器件在一定的偏压下,均可发出1.54μm的光,对应三价铒离子4I13/2→4I15/2的跃迁.其中,ADN:ErQ(1∶1)掺杂结构的近红外电致发光强度是ADN/ErQ双层结构中的三倍.此外,不同掺杂浓度的ADN:ErQ复合膜做了以下表征:吸收谱、光致发光谱和荧光寿命谱.实验结果证实了在近红外电致发光过程中存在从ADN主体分子到ErQ发射分子的高效率的能量转移.     

Emerging interconnects: a state-of-the-art review and emerging solutions

Aluminium was a primary material for interconnection in integrated circuits (ICs) since their inception. Later, copper was introduced as interconnect material which has better metallic conductivity and resistance to electromigration. As the aggressive technology scaling continues, the copper resistivity increased because of size effects, which causes increase in delay, power dissipation and electromigration. The need to reduce the resistor-capacitor??????? delay, dynamic power utilisation and the crosstalk commotion is as of now the fundamental main impetus behind the presentation of new materials. The purpose of this paper is to do a survey of interconnect material used in IC from introduction of ICs to till date. This paper studies and reviews new materials available for interconnect application which are optical interconnects, carbon nanotube (CNT), graphene nanoribbons (GNRs) and silicon nanowires which are alternatives to copper. While doing a survey of interconnect material, it is found that multiwalled CNTs, multilayer GNR and mixed CNT bundles are promising candidates and are ultimate choice that can strongly address the problems faced by copper but on integration basis copper would last for coming years.     

钠离子对poly(dT).poly(dA).poly(dT)三螺旋DNA分子呼吸模式的影响

利用分子结构的螺旋对称性,建立了一个包括钠离子的三链DNA分子poly(dT)*poly(dA)*poly(dT)的晶格动力学模型,计算了poly(dT)*poly(dA)*poly(dT)的氢键呼吸模式.结果发现钠离子的加入明显地淬灭了位于较低频率的几个最为强烈的Hoogensteen氢键呼吸模式,而对Watson-Crick氢键呼吸模式影响不明显,这说明钠离子能提高poly(dT)*poly(dA)*poly(dT)三螺旋结构的稳定性.该计算结果很好地解释了poly(dT)*poly(dA)*poly(dT)的热融化实验.     

聚对苯撑苯并双(口恶)唑发光及其器件制备

采用光谱技术,研究了聚对苯撑苯并双(口恶)唑(PBO)溶液的光敏发光特性,并用相对法估算出溶液发光效率在50%范围.结合光谱技术、半导体电学和电化学等研究手段,具体研究了以PBO为发光层的单层电致发光器件,研究结果显示,电致发光与薄膜的光致发光有具有相同的发光中心,峰值位于510 nm左右.同时发现,由于存制备过程中不同处理条件使得不同厚度薄膜残留的掺杂物质浓度不同,从而引起薄膜的导电性的不同.使得器件的阈值场强随PBO厚度的减小而逐渐增加.     

BNBST无铅压电陶瓷的制备工艺研究

设计了（Bi0.55Na0.5）1-X（BaaSrb）xTiO3（BNBST[100x-100a／100b]）无铅压电陶瓷新体系。该体系压电陶瓷具有工艺特性及压电响应好，压电常数高的特点，且有实际应用前景的新型压电陶瓷材料体系。采用传统的陶瓷工艺制备了（Bi0.55Na0.5）1-X（BaaSrb）xTiO3无铅压电陶瓷，研究了制备工艺参数对其物化结构性能的影响。生料的热重-差热（TGA-DTA）分析表明，粉料合成过程中，先是SrTiO3、BaTiO3的形成，然后是（Bi0．5Na0．5）Tio，的形成，同时三者形成固溶体；密度测试表明，陶瓷的体积密度随烧结温度的升高而增大，可较易获得理论密度94％的陶瓷；X-射线能谱分析（EDAX）研究表明，陶瓷的Bi、Na的挥发随着烧结温度的升高而加剧。研究结果表明，要制备性能优良的无铅压电陶瓷，需要精确控制制备工艺。     

人小肠粘膜免疫酶的定位研究—光镜和电镜免疫组织化学染色法

本文对免疫酶组织化学的样品制备程序和染色方法做了详细的阐述。用直接法、间接法和ABC法,对人小肠免疫酶的定位,进行了光镜和电镜的观察,染色阳性反应显著,获得了满意的效果。并对染色技巧做了分析和探讨。     

Arsenic deposition as a precursor layer on silicon (211) and (311) surfaces

We investigate the properties of arsenic (As) covered Si(211) and Si(311) surfaces by analyzing data from x-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED) images. We then create a model using total surface energy calculations. It was found that both Si(211) and Si(311) had 0.68±0.08 surface As coverage. Si(211) had 0.28±0.04 Te coverage and Si(311) had 0.24±0.04 Te coverage. The Si(211) surface replaces the terrace and trench Si atoms with As for a lower surface energy, while the Si edge atoms form dimers. The Si(311) surface replaces all terrace atoms and adsorbs an As dimer every other edge site. These configurations imply an improvement in the mean migration path from the bare silicon surface by allowing the impinging atoms for the next epitaxial layer, tellurium (Te), to bind at every other pair of edge atoms, and not the step terrace sites. This would ensure a nonpolar, B-face growth.     

Joint estimation of TOA and DOA in IR-UWB system using a successive propagator method

Impulse radio ultra-wideband (IR-UWB) ranging and positioning require accurate estimation of time-of-arrival (TOA) and direction-of-arrival (DOA). With receiver of two antennas, both of the TOA and DOA parameters can be estimated via two-dimensional (2D) propagator method (PM), in which the 2D spectral peak searching, however, renders much higher computational complexity. This paper proposes a successive PM algorithm for joint TOA and DOA estimation in IR-UWB system to avoid 2D spectral peak searching. The proposed algorithm firstly gets the initial TOA estimates in the two antennas from the propagation matrix, then utilises successively one-dimensional (1D) local searches to achieve the estimation of TOAs in the two antennas, and finally obtains the DOA estimates via the difference in the TOAs between the two antennas. The proposed algorithm, which only requires 1D local searches, can avoid the high computational cost in 2D-PM algorithm. Furthermore, the proposed algorithm can obtain automatically paired parameters and has better joint TOA and DOA estimation performance than conventional PM algorithm, estimation of signal parameters via rotational invariance techniques algorithm and matrix pencil algorithm. Meanwhile, it has very close parameter estimation to that of 2D-PM algorithm. We have also derived the mean square error of TOA and DOA estimation of the proposed algorithm and the Cramer-Rao bound of TOA and DOA estimation in this paper. The simulation results verify the usefulness of the proposed algorithm.     

盲多用户检测技术中的恒模算法分析

恒模算法（CMA）是一种广泛应用于阵列处理、均衡和多用户检测中的盲算法。现对恒模算法及其在盲多用户检测技术中的应用进行了分析,并指出其研究方向。