Transport properties of undoped Cd0.9Zn0.1Te grown by high pressure bridgman technique

The electron drift mobility of undoped Cd_0.9Zn_0.1Te grown by high-pressure Bridgman method is measured by a time-of-flight technique. The sample shows a room temperature mobility and mobility lifetime product of 950 cm²/Vs and 1.6 × 10⁻⁴cm²/V, respectively. The mobility increases monotonically with decreasing temperature to 3000 cm²/Vs at 100 K. The dominant scattering mechanism for the electron transport is discussed by comparing with the theoretical mobility obtained by iterative solution of the Boltzmann equation.     

Infrared transmission spectra of Cd<Subscript>1−x</Subscript>Zn<Subscript>x</Subscript>Te (x = 0.04) crystals

Three indicators (T₁₀₀₀, T₅₀₀₀, and T₁₀₀₀/T₅₀₀₀) are used to appraise the infrared (IR) transmission spectra for Cd_1−xZn_xTe (CZT) slices. By comparing the values of these three indicators, four typical types of IR spectra are characterized for CZT crystals. The CZT crystals possessing the four types of IR spectra are different in microstructures, especially the densities and sizes of Te precipitates, the free carrier concentrations, and the resistivities. Mechanisms for the elimination of tiny and dense Te precipitates are given by analyzing the variation of the IR transmittance in the range of 500–5000 cm⁻¹ during the annealing process.     

A Scanning Probe Microscopy Study of Cd<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Zn<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te

The effects of several ex vacuo methods used in the surface preparation of Cd_1−x Zn _x Te (CZT) have been studied using noncontact atomic force microscopy, scanning tunneling microscopy, and scanning tunneling spectroscopy. Preparation techniques include mechanical lapping, hydroplane bromine-methanol polishing, and in vacuo annealing. The morphology, electrical homogeneity, and local density of states (LDOS) have been studied for each preparation method. Impurities and oxides quickly form on the surface after each preparation method. Annealing in ultrahigh vacuum causes the surface electronic structure to become inhomogeneous whilst the LDOS suggests a compositional change from an oxide surface to p-type CZT.     

改进碲镉汞液相外延方法原位生长正组分梯度薄膜材料

研究了液相外延生长条件对碲镉汞薄膜材料组分梯度的影响,建立了指导液相外延生长的理论模型。通过改变水平推舟液相外延工艺的汞损失速率,生长出具有正组分梯度的碲镉汞薄膜材料。针对这种特定条件下生长的碲镉汞外延薄膜,通过腐蚀减薄光谱测试与二次离子质谱测试证实了材料具有正组分梯度结构。与传统方法生长的具有负组分梯度的碲镉汞薄膜相比,这种薄膜材料具有相近的表面形貌与红外透射光谱曲线;且具有较高的晶体质量,其X射线衍射双晶摇摆曲线半峰宽达到28.8 arcsec。     

In掺杂CdMnTe晶体的Te气氛退火研究

Thermal annealing in Te vapor atmosphere was adopted to improve the properties of indium-doped Cd_1-xMn_xTe（x=0.2,CdMnTe） wafers grown by the vertical Bridgman method.The wafers before and after annealing were characterized by measuring the Te inclusions,etch pit density（EPD）,Mn composition,resistivity, and impurity.IR transmission microscopy and EPD measurements revealed that the densities of Te inclusions reduced from（5-9）×10⁴ cm^-3 to（2-4）×10⁴ cm^-3 and EPD from 10⁵ cm^-2 to 10⁴ cm^-2 after annealing. NIR transmission spectroscopy showed that the Mn composition increased by 0.002-0.005 mole fractions during the annealing.The resistivity of the wafers improved from（2.0-4.5）×10⁸Ω·cm to（1.7-3.8）×10⁹Ω·cm,which suggested that the deep-level donor of Te antisites was successfully introduced after annealing.Inductively coupled plasma-mass spectrometry（ICP-MS） revealed that the concentrations of impurities in the wafer decreased,which indicated the purifying effects of Te vapor annealing on the wafers.All the results demonstrate that the Te vapor annealing of the indium-doped CdMnTe crystal has positive effects on the crystallinity,resistivity and purity of CdMnTe wafers.     

Melt growth and stoichiometry control of (Cd1−xZnx)1+yTe single crystals

Growth of (Cd_1−xZn_x)_1+yTe(CZT) single crystals is tried by a modified Bridgman method using a reservoir chamber containing Cd and Zn metals with a fixed mole ratio. The aim of this method is to obtain the single crystals with controlled deviation y from stoichiometry and homogeneous target composition x. A suitable growth condition was examined experimentally and the effectiveness of this method for controlling the deviation y from stoichiometry and the composition x is confirmed.     

Fast growth of Cd1−xZnxTe single crystals by physical vapor transport

Good quality single crystals of Cd_1−xZn_xTe (x=0.04, 0.08, and 0.115) were obtained by the very fast vapor growth technique developed in this laboratory. The abundance of lamellar twins seems to be less than that in CdTe grown under the same conditions. Chemical etching results indicate a similar quality of the vapor grown crystals to those obtained from melt growth. The overall compositions of the crystals are uniform and approach those of the initial source material with increasing amount transported.     

Chemical–Mechanical Polishing of CdTe and ZnxCd1?xTe Single Crystals by H2O2(HNO3)–HBr–Organic Solvent Etchant Compositions

Chemical–mechanical polishing of CdTe and Zn _x Cd_1−x Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H₂O₂(HNO₃)–HBr–solvent has been investigated. The dependences of the chemical–mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry. The polishing etchant compositions for CdTe and Zn _x Cd_1−x Te single-crystal surfaces and the chemical polishing conditions have been optimized.     

Evaluation of Mn Uniformity in CdMnTe Crystal Grown by the Vertical Bridgman Method

Cd_1−x Mn _x Te is a typical diluted magnetic semiconductor, as well as substrate for the epitaxial growth of Hg_1−x Cd _x Te. In this paper, the homogeneity of a Cd_1−x Mn _x Te (x = 0.2) single-crystal ingot grown by the vertical Bridgman method was studied. The crystal structure and quality of the as-grown ingot were evaluated. Near-infrared (NIR) transmission spectroscopy was adopted to develop a simple optical determination of the Mn concentration in the as-grown ingot. A correlation equation between cut-off wavelength λ _co from NIR transmission spectra and Mn concentration by inductively coupled plasma atomic emission spectrometry (ICP-AES) was established. Using this equation, we investigated the Mn concentration distribution in both the axial and radial directions of the ingot. It was found that the segregation coefficient of Mn in the axial direction of the ingot was 0.95, which is close to unity. The Mn concentration variation in the wafers from the middle part of the ingot was 0.001 mole fraction. All these results proved that homogeneous Cd_0.8Mn_0.2Te crystals can be grown from the vertical Bridgman method.     

采用杂化函数方法研究BxGa1-xN合金中的能带弯曲和交叉

采用Perdewe-Burkee–Ernzerhof的广义梯度近似（GGA-PBE）及Heyd-Scuseria-Ernzerhof屏蔽杂化函数方法(HSE06)对比研究了闪锌矿结构BxGa1-xN合金的电子结构性质。HSE06计算方法给出更接近实验结果的基态性质。采用两种计算方法得到的直接带隙的能带弯曲系数b? 都很大且依赖于成分;由两种方法得到的由直接带隙向间接带隙转变的合金成分非常相近。当向GaN中掺入小于55.7%的硼时,可以得到带隙值比GaN大的直接带隙BxGa1-xN 合金。     

Observation of [100] and [010] dark line defects in optically degraded znsse-based leds by transmission electron microscopy

We have used transmission electron microscopy to study the [100] and [010] dark line defects (DLDs) produced after photodegradation of a ZnSSe-based/GaAs heterostructure. Our results show that the DLDs are networks of elongated dislocation loops or half-loops that originate in the quantum well region during device operation. Our results also show that after photodegradation the grownin or pre-existing Frank-type stacking faults become tangles of dislocations. In contrast, the Shockley-type stacking faults remained unchanged for the photodegradation conditions studied indicating that they are more resistant to photodegradation than the Frank-type stacking faults. Our results suggest that the Frank-type stacking faults are the sources of the DLDs. The mechanism for degradation probably starts by the emission of very small clusters of vacancies from the Frank-type faults. Upon further illumination the dislocation loops bounding the vacancies grow by gliding on {111} planes and become hairpin-like dislocation loops.     

Structural analysis of Ge x Si1−x /Si layers by remote plasma-enhanced chemical vapor deposition on Si (100)

In this work, remote plasma-enhanced chemical vapor deposition (RPCVD) has been used to grow Ge _x Si_1−x /Si layers on Si(100) substrates at 450° C. The RPCVD technique, unlike conventional plasma CVD, uses an Ar (or He) plasma remote from the substrate to indirectly excite the reactant gases (SiH₄ and GeH₄) and drive the chemical deposition reactions. In situ reflection high energy electron diffraction, selected area diffraction, and plan-view and cross-sectional transmission electron microscopy (XTEM) were used to confirm the single crystallinity of these heterostructures, and secondary ion mass spectroscopy was used to verify abrupt transitions in the Ge profile. XTEM shows very uniform layer thicknesses in the quantum well structures, suggesting a Frank/ van der Merwe 2-D growth mechanism. The layers were found to be devoid of extended crystal defects such as misfit dislocations, dislocation loops, and stacking faults, within the TEM detection limits (∼10⁵ dislocations/cm²). Ge _x Si_1−x /Si epitaxial films with various Ge mole fractions were grown, where the Ge contentx is linearly dependent on the GeH₄ partial pressure in the gas phase for at leastx = 0 − 0.3. The incorporation rate of Ge from the gas phase was observed to be slightly higher than that of Si (1.3:1).     

微波法制备高活性H1-xSr2Nb3-xMoxO10 (x = 0, 0.05, 0.1, 0.15 and 0.2) 光催化剂

通过微波辅助法制备出高活性H1-xSr2Nb3-xMoxO10光催化材料,制备过程和时间均被大大缩短。采用X射线粉末衍射（XRD）、扫描电镜（SEM）、紫外-可见吸收吸收光谱（UV-Vis DRS）等表征其材料性能。考察了催化材料在40W汞灯辐照下催化降解甲基橙的催化性能。实验结果表明,MoO3的掺入量为15%（摩尔分数）时,材料的光催化性能最优。     

溅射压力对制备a-GaAs1-xNx 薄膜光学常数的影响

采用反应磁控溅射法在室温条件下制备了a-GaAs_1-xN_x 薄膜。实验测定了薄膜厚度、氮含量、载流子浓度和光学透过率及并研究了其随溅射压的变化。系统研究了溅射压对所制备薄膜的光学带隙、折射率和色散参数的影响。所制备的薄膜为直接带隙材料,利用Cauchy和Wemple模型能够很好地拟合所制备薄膜的折射率色散曲线。     

Drift mobility and photoluminescence measurements on high resistivity Cd1−xZnxTe crystals grown from Te-Rich solution

The drift mobilities of chlorine doped high resistivity Cd_0.8Zn_0.2 Te have been investigated by using the time-of-flight technique. Electron as well as hole mobility in the as-grown crystals is limited by trap-controlled carrier transport. The energy locations of the defects responsible for carrier trapping are determined to be E_c- 0.03 and E_v+ 0.14 eV for electrons and holes, respectively. After annealing at 400°C for 80 h, no evidence of trap-controlled mobility was recognized for electrons. On the other hand, no significant change before and after the annealing was observed for hole transport. Those results and the change in the photoluminescence spectra before and after the annealing are explained by the complex defect model composed of the Cd vacancy and chlorine donor. Further, the alloy scattering potentials of ΔU_e and ΔU_h were estimated by employing the theoretical calculation method recently reported by D. Chattopadhyay [Solid State Commun. 91, 149 (1994)].     

利用拉曼谱鉴别锗硅合金微结构变化

随着硅浓度的增大,计算的拉曼谱结果表明,Ge-Si模式和Si-Si模式向高波数移动,而Ge-Ge模式向低波数移动,这种拉曼谱的变化强烈的依赖于合金微结构的变化。它的模式频率的线性变化依赖于Ge/Si的力学常熟的变化。这种现象可以用来鉴别合金中Si含量的浓度。可以通过拉曼散射表征这种复杂的微结构变化。     

Precise measurements of the dispersion of the index of refraction for Cd1−xZnxTe alloys

By using a prism coupler technique in conjunction with reflectivity measurements, we have obtained highly accurate relations for the dispersion of the indices of refraction n for a series of MBE-grown Cd_1−xZn_xTe alloys. Initially, the prism coupler technique was used to determine n at discrete wavelengths with an accuracy of at least 0.1%, and also to concurrently determine the epilayer thicknesses with an uncertainty of less than 0.5%. Having obtained precise values for both n (at discrete wavelengths) and the thicknesses of the Cd_1−xZn_xTe epilayers, we were then able to correctly decipher the values for n at the maxima and minima of the reflectivity spectra observed on the above epilayers, and thereby generate a continuous variation of the indices of refraction as a function of wavelength. Fitting the dispersion of n in each alloy to a Sellmeier-type dispersion relation, we have obtained the dependence of the constants appearing in this relation on the alloy concentration. This enables one to predict n not only as a function of wavelength, but also as a function of alloy composition.     

Microstructure of reactively sputtered oxide diffusion barriers

Molybdenum oxide (Mo_1-x O _x ) and ruthenium oxide (RuO₂) films were prepared by rf reactive sputtering of Mo or Ru targets in an O₂/Ar plasma. Both films exhibit metallic conductivities. The influence of the deposition parameters on the phase that forms and on the microstructure of Mo_1-x O _x and RuO₂ films is reported. A phase transformation is observed in Mo_1-x O _x films subjected to heat treatment. The diffusion barrier performance of Mo_1-x O _x and RuO₂ layers interposed between Al and Si is compared.     

Improvement of the accuracy of the In-situ ellipsometric measurements of temperature and alloy composition for MBE grown HgCdTe LWIR/MWIR structures

Spectroscopic ellipsometry (SE) has proven to be a very reliable technique for the in-situ monitoring of the substrate temperature and alloy composition during the HgCdTe epitaxy. In this work, the influence of the variations in the angle of incidence and the spectral wavelength shift on the measured accuracy of the growth temperature and alloy composition are studied, and a method for precisely determining these variations independent of the modeling of the SE data has been developed. It is shown that the stability of the fittings of the optical models for in-situ applications increases and that the couplings between model parameter decreases upon either eliminating the angle of incidence as an independent model parameter or correcting for the shifts of the wavelength offset. The variations in the angle of incidence and wavelength shift, which arise in the M88 ellipsometer from reflected beam deflections, were precisely calibrated in two dimensions as a function of alignment parameters, using a thick thermally grown SiO₂/Si sample and were parameterized for our experimental geometry. A new extension of theWVASE software was developed to correct the raw SE data in real time for wavelength shift and the angle of incidence drift. A comparison of the corrected and uncorrected results of in-situ temperature measurements for HgCdTe and CdZnTe(211) B/Si(211) clearly demonstrates that the proposed method significantly enhances the accuracy of temperature and composition readings over a broad range of values in these parameters.     

Large signal and noise properties of heterojunction AlxGa1-xAs/GaAs DDRIMPATTs

Simulation studies are carried out on the large signal and noise properties of heterojunction (HT) Al_xGa_1-xAs/GaAs double drift region (DDR) IMPATT devices at V-band (60 GHz). The dependence of Al mole fraction on the aforementioned properties of the device has been investigated. A full simulation software package has been indigenously developed for this purpose. The large signal simulation is based on a non-sinusoidal voltage excitation model. Three mole fractions of Al and two complementary HT DDR structures for each mole fraction i.e., six DDR structures are considered in this study. The purpose is to discover the most suitable structure and corresponding mole fraction at which high power, high efficiency and low noise are obtained from the device. The noise spectral density and noise measure of all six HT DDR structures are obtained from a noise model and simulation method. Similar studies are carried out on homojunction (HM) DDR GaAs IMPATTs at 60 GHz to compare their RF properties with those of HT DDR devices. The results show that the HT DDR device based on N-Al_xGa_1-xAs/p-GaAs with 30% mole fraction of Al is the best one so far as large signal power output, DC to RF conversion efficiency and noise level are concerned.