808 nm半导体分布反馈激光器的光栅设计与制作

半导体分布反馈（ DFB）激光器的核心工艺之一是分布反馈光栅的制作，设计了808 nm DFB激光器的一级光栅结构。利用纳米压印技术与干法刻蚀附加湿法腐蚀制作了周期为120 nm的梯形布拉格光栅结构，使用MATLAB和Pics3D软件模拟了一次外延结构的光场分布和能带图。通过优化湿法腐蚀所用腐蚀液各组分比例、腐蚀温度、腐蚀时间等条件，得到了理想的湿法腐蚀工艺参数。扫描电子显微镜表征显示，光栅周期为120 nm，光栅深度约为85 nm，占空比约为47%，光栅边缘线条平直，表面平滑，周期均匀。创新型的引入湿法腐蚀工艺和腐蚀牺牲层使光栅表面的洁净度得到保证，提高了二次外延质量的同时，也为进一步制作DFB激光器高性能芯片奠定了良好的基础。     

大功率宽条分布反馈激光器研究

大功率半导体激光器一般用作抽运源,但其抽运的离子吸收峰带宽一般都比较小。为提高大功率半导体激光器对固体或光纤激光器等的抽运效率,就要降低半导体激光器的输出波长随注入电流和热沉温度的漂移系数。分析了光栅深度和光栅填充因子对激光器输出波长锁定效果的影响,实验验证确定出合适的光栅参数,依据优化条件得出合适的激光器腔长,制备出锁定效果良好的宽条分布反馈激光器。该激光器的单管腔长2.4mm,发光条宽100μm,连续最大输出功率400mW,热沉温度为15℃时的输出波长为954nm,输出波长随注入电流的漂移系数为0.67nm/A,输出波长的温漂系数为0.046nm/K。     

基于氮化镓的通信波段可调DFB激光器的研究

为了利用悬空的周期可调光栅控制激光器的波长输出,采用了微机电系统技术中微驱动器与分布反馈激光器光栅相结合的结构,根据严格耦合波理论和介质平板波导理论,针对光通信的C波段,利用有限元软件COMSOL,建立了基于氮化镓的波长可调分布反馈激光器2维稳态模型。分析了1550nm处2维电场模式图以及激射波长线宽图,得到了激射波长与光栅周期的对应关系。结果表明,在光栅厚度、高度以及增益层厚度等结构参量一定的情况下,激射波长与光栅周期呈现与理论分析基本一致的似线性关系。该研究为该器件设计以及制备的后期工作开展提供了理论指导意义。     

基于氮化铝的1310nm波段可调DFB激光器的设计

依据严格耦合波理论和介质平板波导理论,基于MEMS(微机电系统)技术,利用周期可调谐的布拉格光栅设计了一种基于氮化铝的波长可调DFB-LD(分布反馈激光器)。采用梳齿状驱动器驱动光栅动态调节,并利用有限元软件COMSOL对其在1 310nm波段进行模拟仿真。对激光器电场模式图进行分析,确定了DFB-LD的光栅结构参数。分析表明,激光器输出波长与光栅周期呈线性关系,且一个光栅周期对应多个不同的光栅高度值。在小于模式截止光栅高度的情况下呈20nm周期性分布。依据光栅周期和激射波长的关系,提出了制作1 290~1 330nm波段可调激光器的可能性。     

全息光刻制备LC-DFB及光栅刻蚀优化

成功制备出室温激射波长为2 μm的GaSb基侧向耦合分布反馈量子阱激光器.采用全息曝光及电感耦合等离子体刻蚀技术制备二阶布拉格光栅.优化了光栅制备的刻蚀条件,并获得室温2 μm单纵模激射.激光器输出光功率超过5 mW,最大边模抑制比达到24 dB.     

全息光刻制备LC-DFB及光栅刻蚀优化（英文）

成功制备出室温激射波长为2μm的Ga Sb基侧向耦合分布反馈量子阱激光器.采用全息曝光及电感耦合等离子体刻蚀技术制备二阶布拉格光栅.优化了光栅制备的刻蚀条件,并获得室温2μm单纵模激射.激光器输出光功率超过5 m W,最大边模抑制比达到24 d B.     

ICP刻蚀优化及在多波长分布反馈式激光器阵列中的应用北大核心CSCD

研究了CH_4/H_2/Cl_2感应耦合等离子体刻蚀技术中的关键工艺参数对刻蚀性能的影响。通过对CH_4/H_2/Cl_2气体流量及流量比的优化,在自行设计的InP/InGaAlAs多量子阱结构的外延片上,实现了一种高速低损耗、形貌良好的Bragg光栅制作方法。基于优化后的工艺参数制作了多周期结构的λ/4相移光栅,实现了单片集成的四波长1.3μm分布反馈式激光器阵列。该激光器阵列中激光器的阈值电流典型值为11mA,外微分效率可达0.40 W/A,且实现了边摸抑制比大于46dB的稳定的单纵模激光输出。研究结果表明优化后的ICP光栅刻蚀工艺具有良好的刻蚀精度和可靠性。     

全息光刻制备808nm分布反馈半导体激光器的光栅

实验优化设计了808 nm分布反馈(DFB)半导体激光器的二级布拉格光栅结构,介绍了808 nm DFB半导体激光器光栅制备的工艺过程。采用全息光刻方法和湿法腐蚀技术在Ga As衬底片上制备了周期为240 nm的光栅图形,全息光刻系统采用条纹锁定技术降低条纹抖动和提高干涉稳定性,腐蚀液中H3PO4、H2O2和H2O的体积比为1:1:10,腐蚀时间为30 s。光学显微镜、扫描电子显微镜(SEM)和原子力显微镜(AFM)测试显示,光栅周期为240 nm,占空比为0.25,深度为80 nm,具有完美的表面形貌及良好的连续性和均匀性。     

808nm DFB半导体激光器的光栅制备

实验优化设计了808nm DFB半导体激光器的二级布拉格光栅结构,介绍了808 nm分布反馈（DFB）半导体激光器光栅制备的工艺过程。采用全息光刻方法和湿法腐蚀技术在GaAs衬底片上制备了周期为240nm的光栅图形,全息光刻系统采用条纹锁定技术降低条纹抖动和提高干涉稳定性,腐蚀液采用H3PO4 : H2O2 : H2O (1 : 1 : 10),腐蚀时间为30s。光学显微镜、扫描电子显微镜（SEM）和原子力显微镜（AFM）测试显示,光栅周期为240nm,占空比为0.25,深度为80nm,具有完美的表面形貌,及良好的连续性和均匀性。     

宽温度锁定808 nm激光器阵列

为了提高808 nm激光器对固体激光器的泵浦效率，对其波长稳定性进行了研究。阐述了光栅设计的理论基础。将纳米压印、干法刻蚀及湿法腐蚀工艺相结合，制备了含有一阶光栅的808 nm分布反馈（DFB）激光器阵列。在准连续条件（脉宽为200μs，频率为20 Hz）下对所制备的激光器进行性能测试。测试结果表明：所制备的808 nm DFB激光器阵列的发射波长随温度的漂移系数为0.06 nm/℃，温度锁定范围可达70℃（-10～60℃），随电流的漂移系数为0.006 nm/A。     

纳米压印制作半导体激光器的分布反馈光栅

分布反馈(DFB)光栅的制作是半导体激光器芯片的关键工艺,通过纳米压印技术在InP基片表面涂覆的光刻胶上压印出DFB光栅图形,并分别通过湿法腐蚀和干法刻蚀技术将光栅图形转移到InP基片上。所制作的DFB光栅周期为240nm(对应于1 550nm波长的DFB激光器),光栅中间具有λ/4相移结构。采用纳米压印技术制作的DFB光栅相对于通常双光束干涉法制作的光栅具有更好的均匀性以及更低的线条粗糙度,而且解决了双光束干涉法无法制作非均匀光栅的技术难题。相对于电子束直写光刻法,采用纳米压印技术制作DFB光栅具有快速与低成本的优势。采用纳米压印技术在InP基片上成功制作具有相移结构的DFB光栅,为进一步进行低成本高性能的半导体激光器芯片的制作奠定了良好基础。     

Electrical control of the distributed feedback organic semiconductor laser based on holographic polymer dispersed liquid crystal grating

In this paper, we demonstrate the electrical control of the distributed feedback (DFB) organic semiconductor laser based on a holographic polymer dispersed liquid crystal (HPDLC) grating for the first time. The grating is fabricated on the top of the organic semiconductor film to act as an external feedback structure. Experimental results show that the lasing intensity can be decreased by increasing the external electric field, and the lasing wavelength exhibits a slight blue-shift of 1.4 nm during the modulation process, indicating a good stability. The modulated performances are attributed to the decreases in the refractive index modulation and average refractive index of the HPDLC grating respectively as a result of the field-induced liquid crystal reorientation. This study provides some new ideas for the improvement of DFB organic semiconductor laser to enable envisioned applications in laser displays and integrated photonic circuits.     

A two-step laterally tapered 1.55-/spl mu/m SSC DFB laser fabricated by using a nonselective grating process

We demonstrate a two-step laterally tapered 1.55-/spl mu/m spot size converter distributed feedback laser diode (SSC DFB LD) having a planar buried heterostructure-type active waveguide and a ridge-type passive waveguide fabricated by using a nonselective grating process. Unlike conventional SSC DFB LDs, where a selective grating is employed, this SSC DFB LD employed a nonselective grating over the entire device region in order to make its fabrication much simpler than that of the conventional SSC DFB LDs. The two-step laterally tapered SSC is effective in removing an unwanted wavelength peak originating from the SSC section having a multiquantum well and a grating under it. The fabricated SSC DFB LD operates at 1.553-/spl mu/m wavelength and shows a far field pattern in horizontal and vertical directions of 13.4/spl deg/ and 19.5/spl deg/, respectively.     

Continuously chirped DFB gratings by specially bent waveguides fortunable lasers

We have implemented and studied a new type of tunable multiple-section semiconductor distributed feedback (DFB) laser using tailored chirped DFB gratings. Arbitrarily and continuously chirped DFB gratings are defined by bent waveguides on homogeneous grating fields with ultrahigh spatial precision. The mathematical bending functions are optimized in this case to provide enlarged wavelength tuning ranges. We present the results of model calculations, the technological device realization and experimental results of the DFB laser characterization e.g. a tuning range of 5.5 nm without wavelength gaps and high side mode suppression ratio     

Distributed feedback gain-coupled lasers based on InGaAs quantum-wire arrays

Fabrication and characterization of a current-injected InGaAs-GaAs quantum-wire gain-coupled distributed feedback (DFB) laser operating at 77 K at a wavelength of 923 nm are presented. Threshold current densities in broad area lasers were measured to be as low as 160 A/cm/sup 2/. The side-mode suppression ratio at twice threshold is 35 dB. A 4-/spl mu/m rib waveguide device has a threshold of 14 mA. The patterning process for the second-order DFB grating fabricated with deep UV holography and wet-chemical etching is described.     

Two-step laterally tapered spot-size converter 1.55-/spl mu/m DFB laser diode having a high slope efficiency

We demonstrate a two-step lateral tapered 1.55-/spl mu/m spot-size converter distributed feedback laser diode (SSC DFB LD) having slope efficiencies as high as 0.457 and 0.319 mW/mA measured at 25 /spl deg/C and 85 /spl deg/C, respectively. The SSC DFB LD fabricated by using a nonselective grating process has a double core waveguide structure including a planar buried heterostructure type active waveguide and a ridge type passive waveguide. The fabricated SSC DFB LD operates at 1.553-/spl mu/m wavelength and shows a far-field pattern in horizontal and vertical directions of 7.3/spl deg/ and 11.6/spl deg/, respectively.     

Monolithic DWDM source with precise channel spacing

We report a low-cost manufacturing approach for fabricating monolithic multi-wavelength sources for dense wavelength division multiplexing(DWDM)systems that offers high yield and eliminates crystal regrowth and selective area epitaxy steps that are essential in traditional fabrication methods.The source integrates an array of distributed feedback(DFB)lasers with a passive coupler and semiconductor optical amplifier(SOA).Ridge waveguide lasers with sampled Bragg side wall gratings have been integrated using quantum well intermixing to achieve a fully functional four-channel DWDM source with 0.8 nm wavelength spacing and residual errors<0.13 nm.The output power from the SOA is>10 mW per channel making the source suitable for use in passive optical networks(PONs).We have also investigated using multisection phase-shifted sampled gratings to both increase the effective grating coupling coefficient and precisely control the channel lasing wavelength spacing.An 8-channel DFB laser array with 100 GHz channel spacing was demonstrated using a sampled grating with twoπ-phase-shifted sections in each sampling period.The entire array was fabricated by only a single step of electron beam lithography.