薄膜纳米复合材料膜的研究进展和应用

薄膜纳米复合材料(TFNC)膜的开发为海水淡化行业带来了巨大的机遇.这篇综述重点介绍了目前常见的纳米颗粒掺杂反渗透膜,并对其性能进行了全面深入的分析.目前研究较多的纳米颗粒包括碳基,金属和金属氧化物基以及其他纳米尺寸填料,它们在TFNC膜的通量、脱盐率、耐氯性和防污性能的影响表现出显著效果.但在实际应用和规模化生产中存...     

二甲基甲酰胺中Eu-Bi合金薄膜的电化学制备研究

利用循环伏安法和恒电位沉积法探讨了．353K时在EuCl3 0．1mol／L)-Bi(NO3)3(0．05mol／L)-二甲基甲酰胺-LiClO4体系中Eu-Bj合金薄膜的电化学制备?研究了沉积时的电流密度、沉积时间、以及Eu(Ⅲ)的浓度比对沉积膜质量的影响。实验结果表明，在EuCl3(0．13mol／L)-Bi(NO3)3(0.06mol／L)-二甲基甲酰胺-LiClO4体系中，当控制恰当的沉积条件，均可得到表面均匀、附着力强、有金属光泽的黑色非晶态Eu-Bi合金膜，其中Eu的质量分数可达10．56 wt％～34．24wt％，所得到的沉积膜通过SEM，EDS和XRD进行分析。     

超声辅助滚压振动磨制备氧化锌纳米颗粒薄膜及其性能

以商业锌粉为原料,采用超声化学法制备ZnO纳米颗粒薄膜,主要步骤为:滚压振动研磨锌粉;超声分散制备ZnO分散液;分别以聚乙烯醇、硅溶胶为成膜助剂和粘结剂,制备纳米ZnO薄膜。对比研究了60°C和90°C下所得纳米ZnO薄膜的结构、表面形貌和电学性能。结果表明,所得氧化锌为六角纤锌矿结构,无杂质存在。60°C干燥所得ZnO薄膜表面较90°C干燥所得薄膜更为细致、均匀。60°C和90°C干燥所得薄膜的导通电压分别为1.2 V和4.0 V。     

硒化银薄膜-氧化锰纳米颗粒自组装薄膜电阻转变特性的研究

采用热分解法制备粒径约为30 nm的单分散氧化锰纳米颗粒,然后通过浸渍提拉法将这些纳米颗粒在铂底电极上自组装成氧化锰薄膜,接着利用热蒸镀工艺沉积硒化银薄膜,最后利用磁控溅射工艺沉积钛顶电极,获得具有Ti/Ag₂Se/MnO/Pt结构的阻变存储器。该器件表现出双极性电阻转变特性,并且具有良好的循环特性和数据保持特性,表明Ti/Ag₂Se/MnO/Pt阻变存储器在非易失性存储器件中具有潜在的应用前景。     

水选废旧塑料薄膜再生颗粒的增容改性研究

为改善水选废旧塑料薄膜再生颗粒基体树脂之间的相容性,提高其力学性能以制备管道专用聚烯烃颗粒,分别向再生颗粒中加入乙烯–丙烯共聚物(KT–1)、马来酸酐接枝聚丙烯(KT–2)、马来酸酐接枝乙烯–辛烯无规共聚物(KT–9)等3种增容剂,经双螺杆挤出机熔融共混制得再生塑料材料,分别研究了这3种增容剂对再生颗粒基体树脂相容性和材料性能的影响。结果表明,3种增容剂的加入对再生颗粒的相容性都有不同程度的改善且均提高了材料的热稳定性。KT–1对材料的力学性能几乎无影响,但在一定程度上提高了材料的结晶性能;KT–2的增容作用最好,当KT–2的质量分数为10%时,材料的结晶性能得到提高,与未加增容剂的材料相比,其拉伸强度提高了23%,冲击强度提高了53%,失重1%时的温度提高了25℃,综合性能最优;当KT–9质量分数为10%时,材料的韧性得到大幅提高,但其结晶度和拉伸强度均有所下降,即KT–9作为弹性体增韧的效果大于其作为增容剂增容的效果。     

导电纳米颗粒对Sb:SnO2薄膜性能影响研究

采用水热晶化法,通过控制水热反应条件、溶液的浓度以及矿化剂的种类等因素,制备出分散性及导电性良好的SnO2纳米颗粒.采用溶胶-凝胶浸渍镀膜的方法制备Sb掺杂SnO2薄膜,在镀膜溶液的配制过程中引入SnO2纳米颗粒悬浮液,经陈化后最终得到镀膜溶液.采用van der Pauw法、UV/VIS分光光度计以及Fourier变换红外光谱仪研究和分析了添加纳米颗粒对膜层导电性能、光学性能以及膜层结构的影响;采用场发射扫描电镜研究了膜层的表面形貌.结果表明导电纳米颗粒的加入可有效提高膜层的导电性能,当SnO2纳米颗粒添加质量分数为10%时,膜层的电阻率为6.5×10…3Ω·cm;添加和未添加纳米颗粒的膜层的可见光透过率均为85%.纳米颗粒参与了溶胶-凝胶制备薄膜网络的形成,提高了膜层结构的连续性,从而使膜层具有较好的导电性能和光学性能.     

NaCl颗粒对多孔PDMS薄膜构建柔性传感器灵敏度和响应特性的影响

通过在PDMS膜中加入Na Cl微米颗粒形成孔结构,制得以多孔PDMS膜构建的柔性电容传感器,测试了不同Na Cl质量分数下的灵敏度,同时对系统耐久性与响应速率进行了分析。结果表明,纯PDMS薄膜形成了较为光滑的表面,加入Na Cl颗粒的薄膜形成了大量的孔隙结构。Na Cl颗粒质量分数为20%的多孔传感器的灵敏度为0. 68 k Pa-1,相对于无孔PDMS薄膜传感器得到显著改善。当压力增大时,灵敏度减小。对颗粒进行更长时间研磨后得到更小粒径,获得更高的薄膜传感器灵敏度。孔结构能够促进薄膜传感器对外界压力形成更明显的数值反馈。当对传感器施加5. 0 Pa压力后,传感器实现了4 s以内的响应时间,可满足快速反应的要求。压力施加与去除的迟滞变化曲线基本重合,传感器只存在很低的迟滞。传感器弯曲前后灵敏度基本一致。     

稳恒磁场下CuCo颗粒膜电沉积制备与巨磁电阻效应

在稳恒磁场下电沉积制备了CuCo功能膜材料. 用SEM和XRD对镀层组分、微观结构进行观察和分析,并测量了膜层的巨磁电阻效应. 颗粒膜的组成随磁场强度变化而改变,0.6~0.8 T下沉积的膜层中Co含量较高,更强磁场反而抑制了Co的沉积. 施加磁场能使膜层晶粒更加致密,0.6 T磁场下制备的膜层晶粒较小,并使膜层(111)晶面择优取向增强. 磁阻测试表明,0.6 T磁场下制备的CuCo颗粒膜经真空退火处理后,巨磁电阻较无磁场下提高约25%.     

Effective Permeability of NiZnCo Ferrite Granular Thin Films

Spinel NiZnCo ferrite granular films 1.5 μm in thickness were prepared on glass substrates by the spray plating method at 90°C with a bias magnetic field of 300 Oe. The soft magnetic film exhibited large saturation magnetization of 270 kA/m and high resistivity of 127Ω cm. The coercivity and in-plane anisotropy field took small values of 8.7 and 20 Oe. The exact magnetization precessional equation under the weak alternating field was applied to construct a calculation model of the effective permeability excited by an incident field parallel to the film plane. Comparisons of calculated results with experimental ones were in agreement on magnitude. The disagreement between theory and experiment was attributed to a large damping coefficient of the ferrite film. A static permeability μ' of around 89 and very high resonance frequency of 2.1 GHz were achieved. The value of magnetic loss μ" was above 15 even in a wide frequency range between 1 and 3.5 GHz.     

Si基片上的镧钙锰氧巨磁阻薄膜材料的微结构分析

采用溶胶-凝胶法在Si单晶上制备了定向生长的巨磁阻锰氧化物La0.8Ca0.2MnO3(LCMO)薄膜样品,并用X射线衍射(XRD)、偏光显微镜及原子力显微镜(AFM)对薄膜样品的微结构进行了分析。实验发现在某些特定的条件下LCMO薄膜形成网格结构的现象,并尝试根据分形理论用计算机程序对这种网格现象进行了形貌模拟。     

Sulfurized Co-Mo Alloy Thin Films as Efficient Electrocatalysts for Hydrogen Evolution Reaction

Catalysis Letters - Here, we successfully fabricated sulfurized Co-Mo alloy thin film electrodes with different compositions and studied their catalytic properties for hydrogen evolution reaction...     

硅烷薄膜

制备了一种涂膜．其特征为：涂膜由含至少—个活性基团选自卤素原子、烷氧基和异氰酸酯基的硅烷化合物形成。涂膜分子部分通过硅、锗、锡、钛和锆元素中的至少一种以共价键方式附着于底材表面，部分相互聚合。涂膜透明．膜厚1nm-0．5μm，膜至少可以通过5次耐磨试验．方法为采用1：1的糖和酱油的混合物．在300℃下加热20min．然后冷却．烘干并粘附的污迹可以用湿布手工擦拭除去。     

铁电薄膜的微图形化研究

铁电薄膜在微电子和光电子技术中有着重要的或潜在的应用,可以制作随机存取存储器,热释电阵列探测器,铁民微电子机械系统等,在这些器件的制作过程中,铁电薄膜的微图形化是非常重要的一环,本文简要介绍了几种重要的铁电薄膜微图形化方法及有关研究结果,并比较了这些方法的优缺点。     

Preparation of Thin Mullite Films

Aluminosilicate glass films having compositions approximately that of mullite produced by reactive sputtering of aluminum-silicon alloys are discussed. Data are given on the speed of deposition under certain conditions for a variety of metal and ceramic substrates. Mullite crystals with the needle habit are formed from the initial amorphous film by subsequent heat treatment of about 1 hour at temperatures of 1100° to 1400°C. The number and size of the crystals are affected by firing conditions, composition, and thickness of the film and by nucleating agents such as carbon on the surface of the film as indicated by transmission electron micrographs of unsupported films. The reaction of the oxide films with some supporting ceramic substrates has also been studied.     

Thin Films in Electron Microscopy

Thin films play an important role in electron microscopy as they can be used to improve the contrast and stability of specimens, as well as to make specimens electrically conductive. In order to avoid overlapping of specimen and coating structures, it is necessary to understand how thin films are formed in the various coating technologies and how to create them reproducibly as part of the different preparation techniques for electron microscopy. In contrast, electron microscopy can be applied to learn more about the structural details of thin films used, for instance, in the optical coating industry. Heat shock fracturing and Pt-C surface replication of the cross sections resulted in reliable transmission electron micrographs (TEM) of the coating microstructure. These studies demonstrate that, under optimal conditions, it is possible to find a correlation between the measured optical properties and the microstructure of the coatings. TEM replica investigations reveal single events, so they can be useful if discrepancies in the (statistical) physical data have to be investigated.     

Platinum-Containing Diamond-like Carbon Thin Films

This paper reports a composite thin film of platinum–diamond-like carbon (Pt-DLC). "Nonreactive" and reactive rf sputter deposition techniques were used for the preparation of these thin films under various ratios of Ar/CH₄. As-deposited thin films were characterized for microstructures using transmission electron microscopy and Raman spectroscopy, compositions using electron probe for microanalysis, surface morphology using scanning electron microscopy, and sheet resistance using four-point probe. Correlations among the growth parameter, film composition, and structure are presented. Such correlations were found to depend on the deposition technique. Improved electrical conductivity and reduced film stress were also found due to the addition of platinum to DLC.     

ITO薄膜的研究进展

ITO是锡掺杂氧化铟薄膜的简称,属于透明导电氧化物材料。常规沉积方法制备的ITO薄膜通常为非晶态或体心立方晶系晶体,为n型半导体材料,其载流子为自由电子,主要来源于沉积过程中薄膜化学计量比偏离或阳离子掺杂形成的施主杂质。ITO薄膜是当前研究和使用最为广泛的透明导电氧化物薄膜材料,由于具有低电阻率、高可见光透过率、高红外反射率等独特物理特性而被大量应用于平板显示器、太阳能电池、发光二极管、气体传感器、飞机风挡玻璃除霜器等领域。此外,ITO薄膜对微波还具有高达85%的衰减作用,因而在电磁屏蔽等军用领域显示出巨大的潜在应用价值。过去几十年里,针对ITO薄膜的研究工作主要聚焦于薄膜的光电性能上。当前,伴随着ITO薄膜的应用范围在航空航天和军用武器装备等领域的拓展,ITO薄膜在恶劣力学环境中的使用日渐增多。因此,除光电性能外,ITO薄膜的力学性能也开始受到研究者越来越多的关注,人们对薄膜器件在各类恶劣使用环境中的稳定性及耐久性提出了更高的要求,这一要求使得对ITO薄膜力学性能的深入研究分析有了重要的理论及实际意义。本文综述了近年来ITO薄膜在微结构特性、能带结构、光电性能及力学性能等方面的研究进展,简略探讨了ITO薄膜的研究发展方向。