发射极δ掺杂的InGaAs/InPDHBT的特性分析

设计了一种新结构的InGaAs/InP双异质结晶体管(DHBT),其中发射结采用δ掺杂和阻挡层结构,集电极采用N+掺杂复合结结构.考虑隧穿作用和发射结空间电荷区复合电流的影响,计算了δ掺杂浓度和N+、n-层厚度等参数变化对InGaAs/InP DHBT电流、I-V输出特性、电流增益的影响,计算结果表明,随着这些参数值增大,InGaAs/InP DHBT输出特性逐渐改善.当δ掺杂浓度大于2×1012cm-3时,电流增益趋于饱和.     

退火温度对ZnO/Si异质结光电转换特性的影响

采用直流反应溅射法在P-Si(100)衬底上制备了ZnO薄膜,XRD测量表明ZnO为沿c轴高度取向的多晶薄膜,1-V特性曲线表明,ZnO/Si异质结具有明显的整流特性.研究了退火温度对异质结光电转换特性的影响,结果显示,合适的退火温度能显著增大异质结的开路电压和短路电流,进而增大异质结的光电转换效率,经400℃退火后异质结获得最佳的转换效率.当退火温度达到或超过500℃时,异质结的反向电流迅速增加,光生电压和光生电流大幅度减小.通过对ZnO薄膜结构和电学性质的测量和分析,推测异质结的光电转换特性改变主要受ZnO薄膜的电学性质影响.     

Si/SiGe异质结双极晶体管的研制

通过理论分析计算，计算机模拟和工艺实验，对Si/SiGe异质结双极晶体管（HBT）的结构参数进行了精细的优化设计，特别是采用了本征间隔层和新颖的Ge分布曲线，有效地削弱了基区杂质外扩散，基区复合和异质结势垒效应的不利影响。开发了兼容于硅工艺的锗硅HBT工艺，并据此试制出了Si/SiGeHBT，测量结果表明，器件的直流和交流特性均较好，电流放大系数为50，截止频率fT为5.1GHz。     

La_(1-x)Sr_xMnO_3薄膜的制备、微观结构及电性能

以无机盐为原料,采用溶胶-凝胶法在Si衬底上制备了La1-xSrxMnO3(LSMO)薄膜。XRD和TEM测试表明LSMO薄膜呈现纳米多晶菱形钙钛矿结构,薄膜的(012)、(110)晶面间距分别为0.38nm、0.28nm。SEM分析表明LSMO薄膜表面平整、光滑致密。电学测试La1-xSrxMnO3/Si异质结的I-V特性曲线表明,随着Sr掺杂量的增加,同一偏压下的开启电压变小,当电压大于10V时,La1-xSrxMnO3/Si异质结的电流迅速增大,呈现传统的p-n结特征。     

RTD振荡特性的模拟与研究

为解决共振隧穿二极管(RTD)振荡功率的提高受到稳定性限制的问题,利用高级设计系统(ADS)电路仿真,研究了RTD分别与RLC(电阻、电容、电感)、HEMT(高电子迁移率晶体管)及HBT(异质结双极晶体管)构成的大信号振荡电路,分析了其负阻、双稳特性产生振荡的机理,探索了RTD的连接器件对RTD特性的调制作用.研究表明,振荡电压(或电流)的峰值与谷值之差越大,输出电压(或电流)的振荡幅度就越大,且比单纯增大RTD结面积来增大输出功率的做法有更好的稳定性,据此有望解决功率受限的问题;RTD连接的器件对R TD特性的调制作用与连接方式有关,通过改变连接方式可以扩大RTD在射频收发系统中的应用.     

平面Si/PCBM与纳米Si/PCBM有机-无机杂化异质结的对比研究（英文）

本研究采用平面硅与纳米硅分别与旋涂法生长的[6,6]-苯基C61-丁酸甲酯(PCBM)形成有机–无机杂化异质结,对比研究了两种异质结界面电学特性的差异。结果显示,平面Si/PCBM和纳米Si/PCBM两种异质结都表现出明显的整流特性,但相对于平面Si/PCBM异质结,纳米Si/PCBM异质结有较大的导通电压和较小的电流密度。为了深入研究导致这种差异的相关物理机制,通过阻抗谱(IS)表征技术进一步研究了两种异质结因界面变化而产生的电阻、电容的变化趋势。阻抗测试分析表明,Si/PCBM异质结界面存在的大量缺陷致使寄生效应进一步增大,影响了器件中电荷的输运。     

Mg_2Si/Si异质结的制备及I-V特性研究

采用磁控溅射和热处理系统制备Mg_2Si/Si异质结。首先在n-Si(111)衬底上沉积Mg膜,经热处理后得到Mg_2Si/Si异质结。利用XRD、SEM、表面轮廓仪、伏安特性测试仪和霍尔效应测试仪,研究了Mg_2Si/Si异质结的晶体结构、表面形貌、Mg_2Si薄膜厚度、I-V特性及导电类型。结果表明,成功制备了Mg_2Si/Si异质结,并得到其平均载流子浓度(-9.30×1012 cm-3)、导通电压(0.31V)、导通电流(0.6mA)、工作电压(0.53V)等,测得该异质结为n-n型。     

半导体异质结构材料及其应用

本文概述和评论了异质结构材料的优异性能及其在微电子器件和电路；光电子器件和电路领域的应用，特别强调它们在调制掺杂场效应晶体管，异质结双极晶体管和半导体激光器方面的应用。     

基于p+-Si与n-ZnO纳米线的p-n异质结的制备及其性质研究

利用CVD蒸汽俘获法，在p^＋硅片上制备了垂直生长的n型ZnO纳米线阵列，用XRD和SEM分析了样品的结构与形貌。测试发现样品的I-V曲线符合典型的p-n异质结特性，正向开启电压为0．5V，反向饱和电流为0．02mA。计算了异质结的理想因子η，发现当异质结两端偏压在0V-0．3V的低压区域，理想因子为1．85，而在0．3v-0．8v的高偏压区域，理想因子为8．36。解释了理想因子偏高的原因是由于金属一半导体接触以及ZnO纳米线与p^＋-si界而存在缺陷。     

8nm基区宽度负阻双异质结晶体管的设计与研制

本文利用分子束外延(MBE)技术能精确控制外延层厚度的特点,与选择性腐蚀技术相结合,实现了纳米级超薄基区宽度.利用集电极电压VCE调制中性基区宽度可以改变基极电阻,从而产生微分负电阻(NDR),根据这一物理机制,设计并研制成功性能优良的8 nm基区n-InGaP/P+-GaAs/n-InGaP负阻双异质结晶体管(NDRDHBT).该器件显示出基极电压VBE调制的"∧"型负阻集电极电流IC-集电极电压VCE特性,电流峰谷比(PVCR)趋于无穷大;表征基极电压调制电流能力的峰值电流跨导ΔIP/ΔVBE高达11.2 ms;击穿电压达到12 V,可用于高频振荡调制和高速数字电路.     

InGaP/GaAs微波HBT器件与电路研究及应用进展

概述了近年来微波InGaP/GaAs异质结双极晶管(HBT)器件和集成电路的研究和应用现状,着重阐述了HBT器件的热设计、降低偏移电压、离子注入隔离、湿法腐蚀,以及用于电路设计的等效电路模型等关键问题.     

具有高电流处理能力的多发射极条微波功率GeSi HBT

本文对多发射极条(指)微波功率GeSi HBT进行了设计、制造和测试,并就测试结果对电流处理能力进行了研究.实验结果表明,对20～80指的GeSi HBT,发射极单位长度的电流密度I0在1.67～1.06A/cm之间变化.随发射极条数的增加,I0逐渐减少,分析认为这是由发射极条之间的热耦合引起有源区的温度非均匀分布而导致的.并且通过测试所得到的I0值,证明多指GeSi HBT可通过选择合适的发射极条数、条长和发射区面积获得更高的电流处理能力.     

Integrated a ZnSe MSM Photodiode and an InGaP/GaAs HBT on a GaAs Substrate for High Sensitivity Short Wavelength Photodetector

A ZnSe MSM photodiode and an InGaP/GaAs HBT have been integrated successfully on a GaAs substrate by use of the selective-area epitaxy technique. The optical and electrical characterizations of the integrated photoreceiver as well as individual components used in this device structure were estimated. Photocurrent induced from the metal-semiconductor-metal (MSM) photodiode was amplified linearly by a common-emitter circuit composed of a HBT. A current amplification ratio and a voltage amplification sensitivity of the integrated device measured in this work were 20.8 and ${-}29.6$ mV/$mu$ W, respectively. The result does not only demonstrate the high sensitivity monolithic photoreceiver but indicates the potential of the selective-area epitaxy technique in the development of WBG-based short wavelength integrated devices.      

The effects of offset voltage on the amplitude and bandwidth ofkick-out pulses used in the nose-to-nose sampler impulse responsecharacterization method

The amplitude and bandwidth of kick-out pulses used in the nose-to-nose sampler impulse response characterization method were measured as a function of offset voltage. The measuring instrument was of similar bandwidth and its effects on the measurement were not removed. The amplitude is almost linear for offset voltages from -500 mV to 500 mV, except for values from about -50 mV to 50 mV. Slight changes in bandwidth were observed for offset voltages from -250 mV to 250 mV with significant bandwidth loss observed for offset voltages outside this range     

Electrical and optical properties of p-SiC/n-GaN heterostructures

We report on the optical, electrical and structural properties of GaN films heteroepitaxially grown by low pressure chemical vapor deposition on 6H-SiC substrates. We employed photoluminescence (PL), Hall effect measurements, scanning tunneling microscopy (STM) and X-ray analysis to determine the quality of our films. Heterojunction diodes were fabricated on p-type SiC and characterized by temperature dependent current–voltage and capacitance–voltage techniques. The results are interpreted within the thermionic emission model and the barrier found is attributed to the conduction band offset between 6H-SiC and wurtzite GaN. The diodes show electroluminescence of the donor-acceptor pair recombination type of 6H-SiC at room temperature. By analysis of the injection behavior we can interpret our data, determining the high valence band offset between 6H-SiC and -GaN to 0.67 eV. This high valence band offset favors applications for hetero-bipolar transistors (HBT).     

Metallorganic Vapor Phase Epitaxy of(AlGa)InP on GaAs at Atmospheric Pressure

High quality (AlGa)InP epilayers lattice matched on GaAs substrates were grown by atmosphericpressure metallorganic vapor phase epitaxy (AP-MOVPE).The relationship between surfacemorphologies and lattice mismatches was studied.The influence of Al incorporation to thephotoluminescence and electronic properties of AlGaInP was measured.The applicability of growthat atmospheric pressure and the passivation of Zn in AlGaInP were discussed.     

An Ultra-Low Drift Amplifier Using a New Type of Series-Shunt MOSFET Chopper

A chopper amplifier of a new type is proposed for the amplification of nanovolt-order dc voltage. The chopper is built by connecting a shunt switch, which is driven at twice the chopper frequency, to the output terminals of a conventional and balanced-type series-shunt MOSFET chopper. The present chopper is free from offset voltage arising from spike voltages and has an input voltage offset temperature coefficient of less than 0.1 nV/°C for a signal source of less than 1 k?, and a long-term drift of 2 nV/18 h for signal source resistance of 6.1 ?.     

含Eu~(3+)红色窄带发射的电压变色有机电致发光

本文研究了含有稀土有机配合物的有机电致发光（ＯＥＬ）器件。这种器件在改变驱动电压时可获得不同的ＯＥＬ发射颜色，其中红色成分来自Ｅｕ（１１１）离子的特征发射。在正向偏压为１０，１５和２０Ｖ时可分别获得红，绿和黄色的ＯＥＬ发射。     

外加磁场对应变RTD电流负阻“平台”的抑制作用

本文在实验上观察到GaAs/A1As/InGaAs应变共振隧穿二极管(RTD)在电流负阻区出现一段"平台"现象,该现象来源于发射极子能级和量子阱子能级之间的相互耦合.在外加磁场的作用下,它们之间的耦合得到抑制,在一定的磁场下,负阻"平台"现象消失.此外,峰值电流随磁场增加而减小,导致峰谷电流比下降,同时峰值电压也发生相应的变化.     

Investigation of an AlInAs/GaInAs superlattice-confined emitter bipolar transistor (SCEBT)

A new AlInAs/GaInAs superlattice-confined emitter bipolar transistor (SCEBT) structure with a 20-period superlattice confinement layer has been successfully fabricated and demonstrated. In the studied SCEBT, the 20-period AlInAs/GaInAs superlattice confinement layer is employed to provide the electron injection through emitter–base (E–B) homojunction and block the hole back injection from base to emitter. An extremely small offset voltage of 61 mV and the common-emitter current gain about 25 have been obtained at room temperature. From experimental results, it is seen that the potential spike at the effective E–B junction is negligible. So, the proposed device provides a good promise for practical circuit applications.