Self-assembled InN quantum dots grown on AlN/Si(111) and GaN/Al2O3(0001) by plasma-assisted molecular-beam epitaxy under Stranski–Krastanow mode

We demonstrate that InN quantum dots (QDs) can be spontaneously formed on AlN and GaN surfaces by plasma-assisted molecular-beam epitaxy under the Stranski–Krastanow (S–K) mode. Both Si(111) wafers and metal–organic chemical vapor deposition grown GaN/Al₂O₃(0001) templates were used as substrates in this work. Silicon is particularly interesting as a substrate for InN QD applications because of its electrical conductivity and transparency in the near-infrared. By using reflection high-energy electron diffraction (RHEED), the formation process of InN QDs can be monitored in situ. We observed the 2D–3D transition of S–K growth mode and the lattice constant varied dramatically at the 2D–3D transition point from AlN to InN lattice constant. Furthermore, from the ex situ atomic force microscopy and scanning electron microscopy measurements, we directly imaged InN QDs on the AlN surface with an average diameter of ∼ 14 nm and high areal density of ∼ 1.6 × 10¹¹ cm^− 2.     

Effects of Pb Intercalation on the Structural and Electronic Properties of Epitaxial Graphene on SiC

The effects of Pb intercalation on the structural and electronic properties of epitaxial single‐layer graphene grown on SiC(0001) substrate are investigated using scanning tunneling microscopy (STM), noncontact atomic force microscopy, Kelvin probe force microscopy (KPFM), X‐ray photoelectron spectroscopy, and angle‐resolved photoemission spectroscopy (ARPES) methods. The STM results show the formation of an ordered moiré superstructure pattern induced by Pb atom intercalation underneath the graphene layer. ARPES measurements reveal the presence of two additional linearly dispersing π‐bands, providing evidence for the decoupling of the buffer layer from the underlying SiC substrate. Upon Pb intercalation, the Si 2p core level spectra show a signature for the existence of Pb? Si chemical bonds at the interface region, as manifested in a shift of 1.2 eV of the bulk SiC component toward lower binding energies. The Pb intercalation gives rise to hole‐doping of graphene and results in a shift of the Dirac point energy by about 0.1 eV above the Fermi level, as revealed by the ARPES measurements. The KPFM experiments have shown that decoupling of the graphene layer by Pb intercalation is accompanied by a work function increase. The observed increase in the work function is attributed to the suppression of the electron transfer from the SiC substrate to the graphene layer. The Pb intercalated structure is found to be stable in ambient conditions and at high temperatures up to 1250 °C. These results demonstrate that the construction of a graphene‐capped Pb/SiC system offers a possibility of tuning the graphene electronic properties and exploring intriguing physical properties such as superconductivity and spintronics.     

Low-temperature growth of highly c-oriented InN films on glass substrates with ECR-PEMOCVD

High quality InN films are deposited with an interlayer of high c-orientation (002) AZO (Aluminium-doped Zinc Oxide; ZnO:Al) films on glass substrates by electron cyclotron resonance plasma-enhanced metal organic chemical vapor deposition (ECR-PEMOCVD) at low temperature. AZO films used as a buffer layer are effective for the epitaxial growth of InN films. The influence of Trimethyl Indium (TMIn) flux on the properties of InN films is systematically investigated by reflection high energy electron diffraction (RHEED), X-ray diffraction analysis (XRD), atomic force microscopy (AFM) and optical transmittance spectra. The results indicate that high quality InN films with high c-orientation and small surface roughness are successfully achieved at an optimized Trimethyl Indium (TMIn) flux of 5.5 sccm. The InN/AZO structures have great potential for the development of full spectra solar cells.     

Controlling the Growth Kinetics and Optoelectronic Properties of 2D/3D Lead–Tin Perovskite Heterojunctions

Halide perovskites are emerging as valid alternatives to conventional photovoltaic active materials owing to their low cost and high device performances. This material family also shows exceptional tunability of properties by varying chemical components, crystal structure, and dimensionality, providing a unique set of building blocks for new structures. Here, highly stable self‐assembled lead–tin perovskite heterostructures formed between low‐bandgap 3D and higher‐bandgap 2D components are demonstrated. A combination of surface‐sensitive X‐ray diffraction, spatially resolved photoluminescence, and electron microscopy measurements is used to reveal that microstructural heterojunctions form between high‐bandgap 2D surface crystallites and lower‐bandgap 3D domains. Furthermore, in situ X‐ray diffraction measurements are used during film formation to show that an ammonium thiocyanate additive delays formation of the 3D component and thus provides a tunable lever to substantially increase the fraction of 2D surface crystallites. These novel heterostructures will find use in bottom cells for stable tandem photovoltaics with a surface 2D layer passivating the 3D material, or in energy‐transfer devices requiring controlled energy flow from localized surface crystallites to the bulk.     

Large‐Scale Growth and Field‐Effect Transistors Electrical Engineering of Atomic‐Layer SnS2

2D layers of metal dichalcogenides are of considerable interest for high‐performance electronic devices for their unique electronic properties and atomically thin geometry. 2D SnS₂ nanosheets with a bandgap of ≈2.6 eV have been attracting intensive attention as one potential candidate for modern electrocatalysis, electronic, and/or optoelectronic fields. However, the controllable growth of large‐size and high‐quality SnS₂ atomic layers still remains a challenge. Herein, a salt‐assisted chemical vapor deposition method is provided to synthesize atomic‐layer SnS₂ with a large crystal size up to 410 µm and good uniformity. Particularly, the as‐fabricated SnS₂ nanosheet‐based field‐effect transistors (FETs) show high mobility (2.58 cm² V^?1 s^?1) and high on/off ratio (≈10⁸), which is superior to other reported SnS₂‐based FETs. Additionally, the effects of temperature on the electrical properties are systematically investigated. It is shown that the scattering mechanism transforms from charged impurities scattering to electron–phonon scattering with the temperature. Moreover, SnS₂ can serve as an ideal material for energy storage and catalyst support. The high performance together with controllable growth of SnS₂ endow it with great potential for future applications in electrocatalysis, electronics, and optoelectronics.     

2D AlN Layers Sandwiched Between Graphene and Si Substrates

Due to the superior thickness‐dependent properties, 2D materials have exhibited great potential for applications in next‐generation optoelectronic devices. Despite the significant progress that has been achieved, the synthesis of 2D AlN remains challenging. This work reports on the epitaxial growth of 2D AlN layers via utilizing physically transferred graphene on Si substrates by metal–organic chemical vapor deposition. The 2D AlN layers sandwiched between graphene and Si substrates are confirmed by annular bright‐field scanning transmission electron microscopy and the effect of hydrogenation on the formation of 2D AlN layers is clarified by theoretical calculations with first‐principles calculations based on density functional theory. Moreover, the bandgap of as‐grown 2D AlN layers is theoretically predicted to be ≈9.63 eV and is experimentally determined to be 9.20–9.60 eV. This ultrawide bandgap semiconductor shows great promise in deep‐ultraviolet optoelectronic applications. These results are expected to support innovative and front‐end development of optoelectronic devices.     

Growth and characterization of silicon carbide thin films on silicon using a hollow cathode pulse sputtering technique

Investigations of thin film depositions of silicon carbide (SiC) from pulse sputtering a hollow cathode SiC target are presented. The unique feature of the hollow cathode technique is that germanium can be added to the films. This changes the properties of the SiC. Such changes include evidence of GeC bonds, lowering of the resistivity, and lowering of the bandgap. The analysis includes crystallographic and morphological studies of the deposited films and their quality using X-ray diffraction, transmission electron microscopy, scanning electron microscopy, and Raman spectroscopy data. Basic electrical properties are also presented along with optical bandgap information gathered from spectroscopic ellipsometry data.     

Epitaxial growth of InN on c-plane sapphire by pulsed laser deposition with r.f. nitrogen radical source

We have grown InN films on c-plane sapphire substrates by pulsed laser deposition (PLD) with a radio frequency nitrogen radical source for the first time and investigated the effect of the substrate surface nitridation on the structural and electrical properties of InN films with reflection high energy electron diffraction (RHEED), atomic force microscope, the Hall effect measurements and high-resolution X-ray diffraction (HRXRD). RHEED and HRXRD characterizations revealed that high-quality InN grows epitaxially on sapphire by PLD and its epitaxial relationship is InN (0 0 0 1)∣∣sapphire (0 0 0 1) and InN [2 -1 -1 0]∣∣sapphire [1 0 -1 0]. The InN crystalline quality and the electron mobility are improved by the substrate nitridation process. The area of the pits at the InN surface is reduced by the substrate nitridation process probably due to the reduction in the interface energy between InN and the substrate. The full width at half maximum of the -1 -1 2 4 X-ray rocking curve for InN grown by the present technique without using any buffer layers was as small as 34.8 arcmin. These results indicate that the present technique is promising for the growth of the high-quality InN films.     

Lattice Structure and Bandgap Control of 2D GaN Grown on Graphene/Si Heterostructures

2D group‐III nitride materials have shown a great promise for applications in optoelectronic devices thanks to their thickness‐dependent properties. However, the epitaxial growth of 2D group‐III nitrides remains a challenge. In this work, epitaxial growth of 2D GaN with well‐controlled lattice structures and bandgaps is achieved by plasma‐enhanced metal organic chemical vapor deposition via effective regulation of plasma energy and growth temperature. The structure of graphene/2D GaN/Si heterostructures is carefully investigated by high‐resolution transmission electron microscopy. The formation mechanism of the 2D GaN layer is clearly clarified by theoretical calculations. Furthermore, a bandgap for 2D GaN ranging from ≈4.18 to ≈4.65 eV varying with the numbers of layers is theoretically calculated and experimentally confirmed. 2D GaN with well‐controlled lattice structure and bandgap holds great potential for the development of deep ultraviolet light‐emitting diodes, energy conversion devices, etc.     

New Developments in Transmission Electron Microscopy for Nanotechnology

High‐resolution transmission electron microscopy (HRTEM) is one of the most powerful tools used for characterizing nanomaterials, and it is indispensable for nanotechnology. This paper reviews some of the most recent developments in electron microscopy techniques for characterizing nanomaterials. The review covers the following areas: in‐situ microscopy for studying dynamic shape transformation of nanocrystals; in‐situ nanoscale property measurements on the mechanical, electrical and field emission properties of nanotubes/nanowires; environmental microscopy for direct observation of surface reactions; aberration‐free angstrom‐resolution imaging of light elements (such as oxygen and lithium); high‐angle annular‐dark‐field scanning transmission electron microscopy (STEM); imaging of atom clusters with atomic resolution chemical information; electron holography of magnetic materials; and high‐spatial resolution electron energy‐loss spectroscopy (EELS) for nanoscale electronic and chemical analysis. It is demonstrated that the picometer‐scale science provided by HRTEM is the foundation of nanometer‐scale technology.     

Crystal face-dependent nanopiezotronics of an obliquely aligned InN nanorod array

This paper proposes an obliquely aligned InN nanorod array to maximize nanorod deformation in the application of nanopiezotronics. The surface-dependent piezotronic I-V characteristics of the InN nanorod array with exposed polar (0002) and semipolar ( ?1102) planes were studied by conductive atomic force microscopy. The effects of the piezopotential, created in the InN under straining, and the surface quantum states on the transport behavior of charge carriers in different crystal planes of the InN nanorod were investigated. The crystal plane-dependent electron density in the electron surface accumulation layer and the strain-dependent piezopotential distribution modulate the interfacial contact of the Schottky characteristics for the (0002) plane and the quasi-ohmic behavior for the ( ?1102) plane. Regarding the piezotronic properties under applied forces, the Schottky barrier height increases in conjunction with the deflection force with high current density at large biases because of tunneling. The strain-induced piezopotential can thus tune the transport process of the charge carriers inside the InN nanorod over a larger range than in ZnO. The quantized surface electron accumulation layer is demonstrated to modulate the piezopotential-dependent carrier transport at the metal/InN interfaces and become an important factor in the design of InN-based piezotronic devices and nanogenerators.     

Near-infrared photoluminescence of vertically aligned InN nanorods grown on Si(111) by plasma-assisted molecular-beam epitaxy

We demonstrate that vertically aligned InN nanorods have been grown on Si(111) substrates by plasma-assisted molecular-beam epitaxy (PA-MBE) at low and high growth temperatures (LT- and HT-InN nanorods). High-resolution scanning electron microscopy images clearly show that InN nanorods grown on Si(111) are hexagonal in shape, vertically aligned, well separated and densely distributed on the substrate. The size distribution of LT-InN nanorods is quite uniform, while the HT-InN nanorods exhibit a broad, bimodal distribution. The structural analysis performed by Raman scattering indicates that PA-MBE grown InN nanorods have the wurtzite-type InN single-crystal structure with the rod axis (growth direction) along the c-axis. In addition, both types of nanorods contain high concentrations of electrons (unintentionally doped). Compared to the HT-InN nanorods and the PA-MBE-grown InN epitaxial film, the LT-grown InN nanorods have a considerable number of structural defects. Near-infrared photoluminescence (PL) from LT- (∼ 0.77 eV) and HT-InN (∼ 0.70 eV) nanorods is clearly observed at room temperature. In comparison with the LT-InN nanorods, the PL efficiency of HT-InN nanorods is better and the PL peak energy is closer to that of InN-on-Si epitaxial films (∼ 0.66 eV). We also find that the PL band at low temperatures from nanorods is significantly weaker (compared to the InN film case) and exhibits anomalous temperature effects. We propose that these PL properties are results of considerable structural disorder (especially for the LT-InN nanorods) and strong surface electron accumulation effect (for both types of nanorods).     

Growth of InN Nanowires with Uniform Diameter on Si(111) Substrates: Competition Between Migration and Desorption of In Atoms

The effects of the growth parameters on the uniformity and the aspect ratio of InN nanowires grown on Si(111) substrates have been studied systematically, and a modified quasi‐equilibrium model is proposed. The growth temperature is of great importance for both the nucleation of the nanowires and the migration of In and N atoms, thus affecting the uniformity of the InN nanowires. In order to improve the uniformity of the InN nanowires, both traditional substrate nitridation and pre‐In‐droplet deposition have been implemented. It is found that the substrate nitridation is favorable for the nucleation of InN nanowires. However, the initial In atoms adhered to the substrate are insufficient to sustain the uniform growth of the InN nanowires. We have found that the initial In droplet on the substrate is not only advantageous for the nucleation of the InN nanowire, but also favorable for the In atom equilibrium between the initial In droplets and the direct In flux. Therefore, InN nanowires with a uniform aspect ratio and optimal diameter can be achieved. The results reported herein provide meaningful insights to understanding the growth kinetics during the InN nanowires growth, and open up great possibilities of developing high‐performance group III‐nitride‐based devices.     

Structural and optical characteristics of InN/GaN multiple quantum wells grown by metalorganic chemical vapor deposition

The structural and electrical properties of InN/GaN multiple quantum wells, which were grown by metalorganic chemical vapor deposition, were characterized by transmission electron microscopy (TEM) and electroluminescence measurements. From the TEM micrographs, it was shown that the well layer was grown like a quantum dot. The well layer is expected to be the nano-size structures in the InN multiple quantum well layers. The multi-photon confocal laser scanning microscopy was used to investigate the optical properties of the light emitting diode (LED) structures with InN active layers. It was found that the two-photon excitation was possible in InN system. The pit density was measured by using the far-field optical technique. In the varied current conditions, the blue LED with the InN multiple quantum well structures did not have the wavelength shift. With this result, we can expect that the white LEDs with the InN multiple quantum well structures do not show the color temperature changes with the variations of applied currents.     

Synthesis of long indium nitride nanowires with uniform diameters in large quantities

Large quantities of indium nitride (InN) nanowires are synthesized by the in situ nitriding of indium oxide (In(2)O(3)) powders in an ammonia (NH(3)) flux. Tens of milligrams of nanowires are obtained in one batch. Every 100 mg of In(2)O(3) starting powder can produce up to 65 mg of InN nanowires under the optimized conditions. The synthesized nanowires grow along the [001] direction with excellent crystallinity. They are of high purity and are 30-50 microm in length with an almost uniform diameter of about 100 nm. Photoluminescence measurements of the nanowires exhibit a strong peak at 707 nm. An optical bandgap of about 1.7 eV is estimated based on the absorption spectrum. The experimental results also demonstrate that the approach of nitriding In(2)O(3) powders in situ is feasible for the synthesis of high-purity InN nanowires in large quantities, with good reproducibility and without catalyst materials. The synthesis of InN nanowires in large quantities would be of benefit to the further study and understanding of their intrinsic properties, as well as being advantageous for their potential application in nanodevices.     

Study of surface morphology control and investigation of hexagonal indium nitride nanorods grown on GaN/sapphire substrate

Heteroepitaxial growth of metal-catalyst-free indium nitride (InN) nanorods on GaN/sapphire substrates by radio-frequency metal-organic molecular beam epitaxy (RF-MOMBE) system was investigated. We found that different N/In flow ratios together with the growth temperatures greatly influenced the surface morphology of InN nanorods and their structural properties. The InN nanorods have been characterized in detail using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM). Optical property was evaluated by photoluminescence (PL) measurements. At lower growth temperatures, InN nanorods were successfully grown. A pronounced two-dimensional growth mode was observed at higher growth temperature of 500 degrees C, and these films showed preferred orientation along the c-axis. XRD patterns and SEM images reveal that InN nanorods has high quality wurtzite structure with FWHM approaching 900 arcsec, and they have uniform diameters of about 150 nm and length of about 800 nm. Meanwhile, no metallic droplet was observed at the end of the nanostructured InN, and this is strong evidence that the nanorods are grown via the self-catalyst process. The PL peak at 0.8 eV is attributed to the quantum confinement and Moss-Burstein effects. These observations provide some valuable insights into the physical-chemical process for manufacturing InN nanorods devices.     

In situ microscopy techniques for characterizing the mechanical properties and deformation behavior of two-dimensional (2D) materials

Due to the atomic thickness and planar characteristics, two-dimensional (2D) materials such as graphene and transition metal dichalcogenides (TMDs) are considered to be excellent electronic materials, which endow them with great potential for future device applications. The robust and reliable application of their functional devices requires an in-depth understanding of their mechanical properties and deformation behavior, which is also of fundamental importance in nanomechanics. Considering their exceedingly small sizes and thicknesses, this is a very challenge task. In situ microscopy techniques show great superiority in this respect. This review focuses on the progress in in situ microscopy techniques (including atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM)) in characterizing the mechanical properties and deformation behavior of 2D materials. The technical characteristics, advantages, disadvantages, and main research fields of various in situ AFM, SEM, and TEM techniques are analyzed in detail, and the corresponding mechanical scenarios from point to plane are realized, including local indentation, planar stretching, friction sliding between atomic layers and atomic movement mechanisms. By virtue of their complementary advantages, in situ integrated microscopy techniques enable the simultaneous study of various mechanical properties, nanomechanical behavior, and inherent atomic mechanisms of 2D materials. Based on the present research, we look forward to further optimized in situ integrated microscopy techniques with high spatiotemporal atomic resolution that can reveal the dynamic structure-performance correlations and corresponding atomic mechanisms between the physical properties, such as mechanical, electrical, optical, thermal, and magnetic properties of 2D materials and their crystal structures, electronic structures, atomic layers, defect densities and other influencing factors under multifield coupling conditions. This will provide beneficial predictions and guidance for the design, construction and application of 2D material-based mechanoelectronic, piezoelectric, photoelectric, thermoelectric, etc. nanoelectronic devices.     

Spatial Mapping of Hot‐Spots at Lateral Heterogeneities in Monolayer Transition Metal Dichalcogenides

Lateral heterogeneities in atomically thin 2D materials such as in‐plane heterojunctions and grain boundaries (GBs) provide an extrinsic knob for manipulating the properties of nano‐ and optoelectronic devices and harvesting novel functionalities. However, these heterogeneities have the potential to adversely affect the performance and reliability of the 2D devices through the formation of nanoscopic hot‐spots. In this report, scanning thermal microscopy (SThM) is utilized to map the spatial distribution of the temperature rise within monolayer transition metal dichalcogenide (TMD) devices upon dissipating a high electrical power through a lateral interface. The results directly demonstrate that lateral heterojunctions between MoS₂ and WS₂ do not largely impact the distribution of heat dissipation, while GBs of MoS₂ appreciably localize heating in the device. High‐resolution scanning transmission electron microscopy reveals that the atomic structure is nearly flawless around heterojunctions but can be quite defective near GBs. The results suggest that the interfacial atomic structure plays a crucial role in enabling uniform charge transport without inducing localized heating. Establishing such structure–property‐processing correlation provides a better understanding of lateral heterogeneities in 2D TMD systems which is crucial in the design of future all‐2D electronic circuitry with enhanced functionalities, lifetime, and performance.     

Controllable Synthesis of [11−2−2] Faceted InN Nanopyramids on ZnO for Photoelectrochemical Water Splitting

Indium nitride (InN) is one of the promising narrow band gap semiconductors for utilizing solar energy in photoelectrochemical (PEC) water splitting. However, its widespread application is still hindered by the difficulties in growing high‐quality InN samples. Here, high‐quality InN nanopyramid arrays are synthesized via epitaxial growth on ZnO single‐crystals. The as‐prepared InN nanopyramids have well‐defined exposed facets of [0001], [11?2?2], [1?212], and [?2112], which provide a possible routine for understanding water oxidation processes on the different facets of nanostructures in nanoscale. First‐principles density functional calculations reveal that the nonpolar [11?2?2] face has the highest catalytic activity for water oxidation. PEC investigations demonstrate that the band positions of the InN nanopyramids are strongly altered by the ZnO substrate and a heterogeneous n–n junction is naturally formed at the InN/ZnO interface. The formation of the n–n junction and the built‐in electric field is ascribed to the efficient separation of the photogenerated electron–hole pairs and the good PEC performance of the InN/ZnO. The InN/ZnO shows good photostability and the hydrogen evolution is about 0.56 µmol cm^?2 h^?1, which is about 30 times higher than that of the ZnO substrate. This study demonstrates the potential application of the InN/ZnO photoanodes for PEC water splitting.     

不同衬底温度下预沉积Ge对SiC薄膜生长的影响

分别在未沉积Ge和不同衬底温度(300、 500、700℃)沉积Ge条件下,利用固源分子束外延(SSMBE)技术在Si衬底上外延SiC薄膜.通过反射式高能电子衍射(RHEED)、X射线衍射(XRD)、原子力显微镜(AFM)和傅里叶变换红外光谱(FTIR)等仪器对样品进行测试.测试结果表明,预沉积Ge的样品质量明显好于未沉积Ge的样品,而且随着预沉积温度的升高,薄膜的质量在逐渐地变好.