磁性多层膜的正巨磁电阻特性

采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。在室温条件下多层膜的巨磁电阻效应达到200％～300％，并用磁矩取向的双电流导电模型对正磁电阻的机理进行了解释。     

不同厚度分层沉积对多层NiFeCo/Ag薄膜GMR效应的影响

用射频磁控溅射法制备了调制周期分别为5 nm、10 nm、15 nm、20 nm的NiFeCo/Ag非连续多层膜.用俄歇能谱仪测量薄膜的成分,用原子力显微镜观测NiFeCo膜层及Ag膜层的表面形貌,用四探针法测量了溅射态的及在280℃、360℃、400℃退火后的多层膜的GMR值.结果表明:薄膜厚度越大,NiFeCo膜层及Ag膜层的表面粗糙度越大.在经各种不同温度退火后,具有[NiFeCo(10nm)/Ag(10nm)]×20结构的多层膜的GMR效应均比其它结构的多层膜的GMR效应强.退火温度也会影响多层膜的GMR值.经360℃退火后,在79.6 kA/m的外加饱和场下[NiFeCo(10nm)/Ag(10nm)]×20呈现出最强的巨磁电阻效应,其GMR值达到11%.     

NiFe/Ag多层膜在低场下的巨磁电阻行为

用磁控溅射法制备了NiFe/Ag多层膜 ,并从实用角度对NiFe/Ag多层膜的低场巨磁电阻效应作了研究。分析了该膜系列产生低场巨磁电阻效应的机理 ,并进行了实验研究 ,最终获得在低场 (小于 79 6× 2 5 0A/m)常温下有高达 5 0 %巨磁电阻效应的材料     

巨磁电阻多层结构——从多层膜到多层纳米线

综述了巨磁电阻多层膜（包括连续多层膜,不连续多层膜,颗粒膜,非匀相合金膜及层状与粒状混合型多层膜）研究的一些结论,着重评述了巨磁电阻多层纳米线的研究进展,包括其制备,表征,传输性能的测定方法,电流垂直于膜面的巨磁电阻（CPP－GMR）,及如何利用多层纳米线的CPP－GMR测定材料的自旋扩散长度和自旋散射不对称因子等材料常数。简要介绍了开发前景。     

Fe/Al_2O_3/Fe隧道结的巨磁电阻效应

研究了Fe(2 0 0℃退火 ) /Al2 O3/Fe多层膜隧道结的巨磁电阻效应 ,在室温下获得了 5.89%的巨磁电阻效应 ,并且测量了样品的伏安曲线 ,证明了隧道效应的存在。     

Ag1-xCox颗粒膜巨磁电阻逾渗模型研究

利用离子束溅射方法制备了外加磁场79600A/m的Ag1-xCox颗粒膜,成分用X-ray能谱仪EDAX9100测定;颗粒膜磁电阻采用四端法测量.结果表明,其巨磁电阻随外磁场是线性变化的并用朗道相变理论解释了磁电阻的逾渗现象.     

Fe/Al2O3/Fe隧道结的巨磁电阻效应

研究了Fe(200℃退火)/Al2O3/Fe多层膜隧道结的巨磁电阻效应,在室温下获得了5.89％的巨磁电阻效应,并且测量了样品的伏安曲线,证明了隧道效应的存在。     

三明治结构FeNi/Cu/FeNi多层膜巨磁阻抗效应研究

采用MEMS技术在玻璃基片上制备了三明治结构FeNi/Cu/FeNi多层膜,在1～40 MHz范围内研究了FeNi/Cu/FeNi多层膜中的巨磁阻抗效应特性.当磁场Ha施加在薄膜的长方向时,巨磁阻抗效应随磁场的增加而增加,在某一磁场下达到最大值,然后随磁场的增加而下降到负的巨磁阻抗效应.在频率为5MHz时,巨磁阻抗效应在磁场Ha=800 A/m时达到最大值26.6%.巨磁阻抗效应的最大值及负的巨磁阻抗效应与多层膜中磁各向异性轴的取向及发散有关.另外,当磁场施加在薄膜的短方向时,薄膜表现出负的巨磁阻抗效应,在频率5 MHz、磁场Ha=9600 A/m时,巨磁阻抗效应可达-15.6%.     

质子辐照对多层膜巨磁电阻结构磁性能的影响

研究了质子辐照对多层膜巨磁电阻结构磁性能的影响。利用5 MeV的不同辐照剂量和剂量率的质子对磁控溅射法制备的CoFe/(CoFe/Cu)₁₀/CoFe/Ta多层膜巨磁电阻结构进行辐照实验。XRD分析表明质子辐照没有改变CoFe/Cu的晶格结构。分析磁滞回线和磁电阻曲线得知在实验选取的辐照剂量范围内, 饱和磁化强度和本征电阻随着辐照剂量的增加而增加, 而矫顽场和磁电阻率随剂量的增加而减小。利用质子辐照对自旋相关散射、平均自由程的影响解释了本征电阻的变化, 并基于二流体模型对磁电阻率的变化进行了分析。由此得出, 多层膜巨磁电阻结构具有一定的抗辐照能力。     

质子辐照对多层膜巨磁电阻结构磁性能的影响（英文）

研究了质子辐照对多层膜巨磁电阻结构磁性能的影响。利用5 MeV的不同辐照剂量和剂量率的质子对磁控溅射法制备的CoFe/(CoFe/Cu)10/CoFe/Ta多层膜巨磁电阻结构进行辐照实验。XRD分析表明质子辐照没有改变CoFe/Cu的晶格结构。分析磁滞回线和磁电阻曲线得知在实验选取的辐照剂量范围内,饱和磁化强度和本征电阻随着辐照剂量的增加而增加,而矫顽场和磁电阻率随剂量的增加而减小。利用质子辐照对自旋相关散射、平均自由程的影响解释了本征电阻的变化,并基于二流体模型对磁电阻率的变化进行了分析。由此得出,多层膜巨磁电阻结构具有一定的抗辐照能力。     

FeSiB薄膜的巨磁阻抗和应力阻抗效应研究

软磁材料中存在巨磁阻抗 (giantmagneto impedance ,GMI)效应以及与之相同来源的应力阻抗 (stress impedance ,SI)效应 ,利用这两种效应可以制成具有高灵敏度的微型化的磁场和应力 应变传感器。本文基于传感器的实际应用 ,对图形化的、较大磁致伸缩的FeSiB单层和多层薄膜的巨磁阻抗和应力阻抗效应中频率和退火的影响进行了研究。结果表明 ,对于两种效应 ,经过退火处理的单层和多层膜均可在较低的频率下得到较高的灵敏度 ,而多层膜中的应力阻抗效应将为新型高灵敏传感器的设计和研制开辟一条崭新的途径     

磁控溅射法制备IrMn底钉扎自旋阀研究

采用高真空直流磁控溅射的方法,在玻璃衬底上制备了结构为Ta／buffer layer／IrMn／CoFe／Cu／CoFe／NiFe／Ta的IrMn底钉扎自旋阀。研究了NiFe和Cu作为缓冲层对自旋阀磁性能的影响,并对缓冲层厚度进行了参数优化,当缓冲层厚度为2nm时自旋阀各项性能达到最佳。研究了退火制度对底钉扎自旋阀性能的影响,得到了30000e强磁场下200℃保温1h为最佳处理条件。通过结构的改善和工艺的优化,得到的底钉扎自旋阀的磁电阻率8．51％,矫顽场为0．50e,交换偏置场超过8000e。最后对自旋阀的底钉扎和顶钉扎结构进行了比较。     

Effect of Co Ion Implantation on GMR of [NiFeCo(10 nm)/Ag(10 nm)]×20 Multilayer Film

The composition, phase structure and microstructure of the discontinuous multilayer film [NiFeCo(10 nm)/ Ag(10 nm)]×20 were investigated after Co ion implantation and annealing at 280, 320, 360 and 400℃, respectively. GMR (giant magnetoresistance) ratio of the film with/without Co ion implantation was measured. The results showed that Co ion implantation decreased the granule size of the annealed multilayer film, and increased Hc value and GMR ratio of the multilayer film. After annealing at 360℃, the multilayer film [NiFeCo(10 nm)/Ag(10 nm)]×20 with/without Co ion implantation both exhibited the highest GMR ratio of 12.4%/11% under 79.6 kA/m of applied saturation magnetic field.     

具有覆盖层的Co/Cu/Co三明治的巨磁电阻效应研究

研究了覆盖层为铁磁性的Fe和非铁磁性的Ti、Cu的Co/Cu/Co三明治在室温和低温下的巨磁电阻效应。实验结果表明,室温下有覆盖层时,Co/Cu/Co三明治的巨磁电阻效应值没有明显变化,但以Fe为覆盖层的样品的矫顽力和饱和场明显减小,而Ti、Cu覆盖层对三明治样品的矫顽力和饱和场无太大的影响。温度降低时,覆盖层使Co/Cu/Co三明治的巨磁电阻值显著增加,表明样品的巨磁电阻效应与覆盖层及其与上层Co所形成的界面密切相关。     

Effect of Co Ion Implantation on GMR of [NiFeCo(10 nm)/Ag(10 nm)] ×20Multilayer Film

The composition, phase structure and microstructure of the discontinuous multilayer film [NiFeCo(10 nm)/Ag(10 nm)]×20 were investigated after Co ion implantation and annealing at 280, 320, 360 and 400℃, respectively.GMR (giant magnetoresistance) ratio of the film with/without Co ion implantation was measured. The results showed that Co ion implantation decreased the granule size of the annealed multilayer film, and increased Hc value and GM R ratio of the multilayer film. After annealing at 360℃, the multilayer film [NiFeCo(10 nm)/Ag(10 nm)] ×20with/without Co ion implantation both exhibited the highest GMR ratio of 12.4%/11% under 79.6 kA/m of applied saturation magnetic field.     

生物传感用巨磁电阻传感器及其磁珠检测性能

本文采用直流磁控溅射沉积了结构为NiFeCo(缓冲层)/[Cu/NiFeCo]×10/ Ta,巨磁电阻(GMR)值为9.8%的多层膜,利用微细加工技术制备了基于此GMR多层膜的生物传感器,GMR电阻线条的线宽分别为3μm和5μm.测试了单个GMR传感器的特性,并将该传感器件和外接可调电阻组成惠斯通电桥,采用该GMR电桥对Dynal公司的MyOne磁珠进行了检测.分别测试了施加变化垂直磁场和施加间歇式恒定垂直磁场时GMR电桥信号对传感器表面覆盖磁珠的响应,研究了GMR电桥信号和磁珠覆盖率的关系.选用器件电阻线宽分别为3μm和5μm的传感器测试了器件线宽对传感器灵敏度的影响.结果表明,GMR传感器能够检测到磁珠的存在,最低能检测的磁珠数量约100个,且GMR电桥信号与磁珠覆盖率基本成正比,器件的灵敏度与传感器线宽基本成反比.     

NiFe／Co／Cu／Co结构自旋阀GMR效应及Co夹层的影响研究

用射频磁控溅射发射法成功制备了ＮｉＦｅ／Ｃｕ／Ｃｏ自旋阀多层膜材料,改变Ｃｕ层的厚度,研究材料的ＧＭＲ效应与Ｃｕ层厚度的关系,结果表明Ｃｕ为２．５ｎｍ时样品的ＭＲ值最大,其磁电阻效应ＭＲ可达１．６％,在ＮｉＦｅ和Ｃｕ之间插入一Ｃｏ薄夹层,通过对不同温度厚度Ｃｏ夹层的样品的ＭＲ曲线及磁滞回线的研究,讨论了Ｃｏ夹层对样品磁电阻的影响并分析了原因,结果表明插入适当的Ｃｏ层将提高材料的磁电阻效应,可达２．     

Asymmetry of Magnetization Reversal of Pinned Layer in NiFe/Cu/NiFe/IrMn Spin-Valve Structure

Two types of asymmetry in giant magnetoresistance (GMR) are observed which are not related to a training effect, but indicate different mechanisms of magnetization reversal of the pinned layer in spin-valve (SV) structures for ascending and descending field scans. GMR, exchange bias and coercivity in Si/Ta/NiFe/Cu/NiFe/IrMn/Ta SV-structures were investigated as functions of the thickness of the nonmagnetic spacer. The spacer thickness effects are discussed in correlation with layers microstructure and interfaces morphology variations.     

Ion beam deposition and structural characterization of GMR spinvalves

NiO exchange-biased “bottom” spin valves of the type NiO/NiFe/Co/Cu/Co/NiFe and FeMn exchange-biased “top” spin valves of the type NiFe/Co/Cu/Co/NiFe/FeMn were deposited by ion-beam deposition (except the NiO layer). Their magnetic properties, magneto-transport, and microstructures are characterized and compared with corresponding GMR spin valves deposited by dc magnetron sputtering. High-resolution cross-sectional transmission electron microscopy and X-ray diffraction reveal microstructural differences between ion-beam-deposited and dc magnetron sputtered spin valves. In particular, film texture, surface morphology, GMR ratio, exchange bias, interlayer coupling strength, and coercivity vary widely, but property-structure-processing correlation can be identified. A GMR ratio of ~9.7% was obtained on random textured NiO exchange-biased bottom spin valves by ion-beam deposition     

Overview of progress in giant magnetoresistive sensors based onNiFe/Ag multilayers

The evolution of devices based on NiFe and Ag in thin film giant magnetoresistance (GMR) structures is reviewed and traced from the early continuous multilayer (CML) structures, through granular alloys (GAs) of NiFe and Ag, spin valves (SVs), discontinuous multilayers (DMLs), and the most recent patterned multilayer (PML) structures. The technological motivation far the development of these various structures, based in particular on field sensitivity as an important figure of merit, and their limitations is discussed. Although DMLs are shown to possess the highest sensitivity, 1.2%/Oe, it is shown that they are limited by noise. Various issues affecting the implementation of NiFe/Ag DML sensors are addressed with particular emphasis on noise, since presently noise gates the development of a successful sensor. The MR characteristics of DML sensors are examined as a function of different biasing schemes to reduce noise and improve linearity. It is shown that the transverse response of ten-layer DML sensors when transversely biased may give acceptable noise performance. This represents one of the two fundamental approaches to the reduction of noise in NiFe/Ag MLs, i.e. one based on the concept of increasing the number of easily switchable ferromagnetic “grains” in the structure. The other approach is based on the concept of a sensor consisting of single large domains in each NiFe layer which provided the impetus for the development of patterned multilayer (PML) devices. Finally, the GMR response of these PML structures is briefly discussed